公开(公告)号：US07075618B2

公开(公告)日：2006-07-11

申请号：US10269984

申请日：2002-10-15

Applicant: Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Takahiro Matsumoto ,  Satoru Oishi

Inventor： Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Takahiro Matsumoto ,  Satoru Oishi

IPC: G03B27/42 ,  G03B27/32

CPC classification number: G03F7/70525 ,  G03F7/70633 ,  G03F9/7046

Abstract: A system for controlling an apparatus. The system includes an operating device for operating the apparatus based on a first parameter value and a second parameter value, an inspecting device for inspecting operation results of the apparatus corresponding to the first parameter value, an estimating device for estimating operation results of the apparatus corresponding to the first parameter value on the basis of the operation results corresponding to the first parameter value, and a revising device for revising parameter values to operate the apparatus on the basis of the operation results obtained by the inspecting device and the estimated operation results obtained by the estimating device.

Abstract translation: 一种用于控制装置的系统。 该系统包括用于基于第一参数值和第二参数值操作设备的操作装置，用于检查与第一参数值相对应的装置的操作结果的检查装置，用于估计对应于装置的操作结果的估计装置 基于与第一参数值相对应的运算结果的第一参数值，以及修正装置，用于根据检查装置得到的运算结果修正参数值以操作装置，以及修正装置 估计装置。

公开(公告)号：US06975384B2

公开(公告)日：2005-12-13

申请号：US10393604

申请日：2003-03-21

Applicant: Hideki Ina

Inventor： Hideki Ina

IPC: G03F7/22 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52 ,  G03B27/42

CPC classification number: G03F9/7034 ,  G03F9/7023

Abstract: An exposure method for exposing a pattern formed on a reticle onto an object includes a flatness measurement step for measuring the flatness of the object and storing the information obtained, a position measurement step for measuring positions at plural points on the object, and a changing step for changing at least one of the position and tilt of the object on the basis of the information obtained by the flatness measurement step, and information on the position obtained by the position measurement step.

Abstract translation: 用于将形成在掩模版上的图案曝光到物体上的曝光方法包括：平坦度测量步骤，用于测量物体的平坦度并存储所获得的信息;位置测量步骤，用于测量物体上的多个点处的位置;以及改变步骤 用于基于由平坦度测量步骤获得的信息以及通过位置测量步骤获得的位置的信息来改变对象的位置和倾斜中的至少一个。

公开(公告)号：US20050209720A1

公开(公告)日：2005-09-22

申请号：US11124211

申请日：2005-05-09

Applicant: Hideki Ina ,  Nobuaki Ogushi ,  Masaya Ogura

Inventor： Hideki Ina ,  Nobuaki Ogushi ,  Masaya Ogura

IPC: G05B19/418 ,  G05B23/02 ,  H01L21/02 ,  G05B19/18 ,  G05B15/02

CPC classification number: G05B19/4184 ,  G05B23/0216 ,  G06Q10/06 ,  Y02P90/14 ,  Y02P90/18

Abstract: A system for quickly and easily optimizing the parameters of an industrial machine or solving any trouble in industrial machine is provided. A factory (100) and vendor (200) are connected through a data communication network (300). A management apparatus (120) selectively gives the operation right of an industrial machine (110) to a factory-side operation apparatus (130) or a vendor-side operation apparatus (210) arranged at a remote site. The operation apparatus having the given operation right can operate the industrial machine (110) and obtain information representing the operation condition of the industrial machine.

Abstract translation: 提供了一种用于快速，轻松地优化工业机器的参数或解决工业机器中的任何故障的系统。 工厂（100）和供应商（200）通过数据通信网络（300）连接。 管理装置（120）选择性地将工业机器（110）的操作权力提供给布置在远程站点的出厂侧操作装置（130）或供应商侧操作装置（210）。 具有给定操作权限的操作装置可以操作工业机器（110）并获得表示工业机器的操作状态的信息。

公开(公告)号：US6080512A

公开(公告)日：2000-06-27

申请号：US66839

申请日：1998-04-28

Applicant: Hideki Ina

Inventor： Hideki Ina

IPC: G03F1/54 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00

CPC classification number: G03F7/70091 ,  G03F7/70241

Abstract: A pattern exposure and transfer method wherein a reticle has a pattern, including a chromium pattern, to be transferred, the chromium pattern of the reticle having a thickness, with respect to a wavelength .lambda., which is approximately N.multidot..lambda./2 or N.multidot..lambda., where N is a positive integer. The reticle is illuminated with light having a center wavelength .lambda., whereby the pattern of the reticle is transferred onto a photosensitive substrate through a projection optical system. The transfer of the reticle pattern is executed in a state of illumination .sigma. such that no sub-peak appears in an optical image.

Abstract translation: 图案曝光和转印方法，其中掩模版具有包含铬图案的待转印的图案，所述掩模版的铬图案相对于约为N×λ/ 2或N×λ的波长λ具有厚度， 其中N是正整数。 用中心波长λ的光照射掩模版，由此通过投影光学系统将掩模版的图案转印到感光基片上。 光栅图案的转印在照明西格玛的状态下执行，使得在光学图像中不出现子峰值。

公开(公告)号：US5790258A

公开(公告)日：1998-08-04

申请号：US883585

申请日：1997-06-26

Applicant: Noriyuki Mitome ,  Hideki Ina

Inventor： Noriyuki Mitome ,  Hideki Ina

IPC: G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

CPC classification number: G03F9/70

Abstract: A position detection device for detecting the position of an object includes a light source for generating light, an illumination device introducing the light from the light source to the object, and a detector for detecting the position of the object on the basis of a sensed optical image. The detection device further includes an image forming optical system for forming the image of the object on a detection surface of the detector at a first magnification. The device also includes an optical member insertable into and retractable from an optical path of the light travelling from the object to the detector. Insertion of the optical member into the optical path allows the light from the object which has been passed through at least part of the optical member and the image forming optical system to form the image of the object on the detection surface of the detector at a second magnification smaller than the first magnification.

Abstract translation: 用于检测物体的位置的位置检测装置包括：用于产生光的光源;将来自光源的光引入物体的照明装置;以及用于基于检测到的光学检测物体检测物体的位置的检测器 图片。 检测装置还包括用于以第一放大率在检测器的检测表面上形成物体的图像的成像光学系统。 该装置还包括光学构件，该光学构件可插入并从可从对象传播到检测器的光的光路缩回。 将光学构件插入光路允许来自已经通过光学构件的至少一部分的物体的光和成像光学系统在第二个检测器的检测表面上形成物体的图像 放大倍率小于第一倍率。

公开(公告)号：US4883359A

公开(公告)日：1989-11-28

申请号：US186773

申请日：1988-04-25

Applicant: Hideki Ina ,  Akiyoshi Suzuki

Inventor： Hideki Ina ,  Akiyoshi Suzuki

IPC: G03F9/00

CPC classification number: G03F9/7076 ,  G03F9/00

Abstract: An alignment method and a pattern forming method using the same, wherein a substrate onto which a complete pattern is to be transferred is held by a holder having formed thereon at least two alignment marks disposed in a predetermined positional relation with each other. Separate masks having relatively complementing pattern segments are used. Each of the masks is aligned with corresponding portion of the holder through an associated one of the alignment marks. As the result, the pattern segments transferred onto the substrate is aligned with each other and the continuity of the pattern is assured on the substrate. Also provided is an alignment mark forming method and a pattern forming method using the same, wherein the region on a substrate in which a continuous pattern is to be formed is divided into at least two sections and alignment marks for these sections are simultaneously formed on the substrate by means of one single mask, so that the segments of the pattern which are first to be transferred onto the sections of the substrate can be aligned with each other when they are transferred onto the substrate.

Abstract translation: 使用该方法的定位方法和图案形成方法，其中，要在其上形成完整图案的基板由其上形成有至少两个彼此以预定位置关系的对准标记的保持器保持。 使用具有相对互补图案片段的分离掩模。 每个掩模通过相关联的一个对准标记与保持器的相应部分对齐。 结果，转移到衬底上的图案片段彼此对准，并且在衬底上确保图案的连续性。 还提供了一种对准标记形成方法和使用其的图案形成方法，其中将要形成连续图案的基板上的区域划分为至少两个部分，并且在这些部分上同时形成用于这些部分的对准标记 通过一个单一的掩模进行衬底，使得当衬底转移到衬底上时，首先要转移到衬底的部分上的图案的段可以彼此对准。

公开(公告)号：US4830499A

公开(公告)日：1989-05-16

申请号：US94086

申请日：1987-09-04

Applicant: Michio Kohno ,  Hideki Ina ,  Akiyoshi Suzuki

Inventor： Michio Kohno ,  Hideki Ina ,  Akiyoshi Suzuki

IPC: G03B27/32 ,  G01B11/00 ,  G02B17/02 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC classification number: G03F9/70 ,  G02B17/02 ,  H01L21/30

Abstract: An optical device includes an objective lens, a relay lens group for relaying the beam from the objective lens, and a compensator for compensating the variation in the optical path length, which occurs when the relative position between said objective lens and said relay lens group changes, by expanding or contracting the optical path.

Abstract translation: 光学装置包括物镜，用于中继来自物镜的光束的中继透镜组以及用于补偿光路长度变化的补偿器，当所述物镜和所述中继透镜组之间的相对位置发生变化时 ，通过扩大或缩小光路。

公开(公告)号：US4641035A

公开(公告)日：1987-02-03

申请号：US642760

申请日：1984-08-21

Applicant: Akiyoshi Suzuki ,  Hideki Ina

Inventor： Akiyoshi Suzuki ,  Hideki Ina

IPC: G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01N21/86 ,  G01V9/04

CPC classification number: G03F9/70 ,  H01L21/30

Abstract: An apparatus and method for position detection for an object having a detection pattern formed by a concavity or convexity. The position detecting apparatus includes a scanning system for scanning the object with a light beam, a photoelectric transducer for receiving the information light reflected from the detection pattern to produce an electric signal, and a processing unit for computing, on the basis of the electric signal, the position of the detection pattern. Unwanted components included in the information light are prevented from being received by the photoelectric transducer, or electric signals corresponding to the unwanted components are excluded, so that the accuracy of signal processing and the accuracy of position detection are improved.

Abstract translation: 一种用于具有通过凹凸形成的检测图案的物体的位置检测的装置和方法。 该位置检测装置包括用光束扫描物体的扫描系统，用于接收从检测图案反射的信息光以产生电信号的光电传感器，以及用于根据电信号计算的处理单元 ，检测模式的位置。 信息光中包含的不需要的组件被光电传感器阻止，或排除与不需要的部件相对应的电信号，从而提高了信号处理的精度和位置检测的精度。

公开(公告)号：US09039402B2

公开(公告)日：2015-05-26

申请号：US12566513

申请日：2009-09-24

Applicant: Eigo Kawakami ,  Shingo Okushima ,  Hideki Ina ,  Junichi Seki ,  Atsunori Terasaki ,  Motoki Okinaka

Inventor： Eigo Kawakami ,  Shingo Okushima ,  Hideki Ina ,  Junichi Seki ,  Atsunori Terasaki ,  Motoki Okinaka

IPC: B29C43/02 ,  B29C43/00 ,  B29C43/14 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B29C59/02 ,  B29C43/58

CPC classification number: B29C43/021 ,  B29C43/003 ,  B29C43/14 ,  B29C43/58 ,  B29C2043/025 ,  B29C2043/142 ,  B29C2043/5833 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: There is provided an imprinting apparatus that transfers a pattern of a mold to a resin on a substrate, the imprinting apparatus including a deposition mechanism configured to deposit the resin onto the substrate; a first driving mechanism configured to change a relative position, on a plane parallel to the surface of the substrate, of the substrate and the mold; a second driving mechanism configured to change the relative position, on a plane parallel to the surface of the substrate, of the substrate and the deposition mechanism; and a control unit configured to control the deposition mechanism and the driving mechanism so as to perform a resin deposition process of depositing the resin onto the substrate and an imprint process of transferring the pattern of the mold to the resin on the substrate in parallel.

Abstract translation: 提供了一种压印装置，其将模具的图案转移到基板上的树脂，所述压印装置包括沉积机构，所述沉积机构被配置为将所述树脂沉积到所述基板上; 第一驱动机构，其构造成在基板的表面平行的平面上改变基板和模具的相对位置; 第二驱动机构，被配置为在与基板的表面平行的平面上改变基板和沉积机构的相对位置; 以及控制单元，被配置为控制沉积机构和驱动机构，以便执行将树脂沉积到基板上的树脂沉积工艺和将模具图案平行地转移到基板上的树脂的压印工艺。

公开(公告)号：US08404169B2

公开(公告)日：2013-03-26

申请号：US12566572

申请日：2009-09-24

Applicant: Eigo Kawakami ,  Hideki Ina ,  Junichi Seki ,  Atsunori Terasaki ,  Shingo Okushima ,  Motoki Okinaka

Inventor： Eigo Kawakami ,  Hideki Ina ,  Junichi Seki ,  Atsunori Terasaki ,  Shingo Okushima ,  Motoki Okinaka

IPC: B29B11/08 ,  B29C45/76

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

Abstract: An imprint apparatus for pressing resin and a mold to each other in a Z-axis direction to form a resin pattern on a shot region includes: a mold chuck; an X-Y stage; a reference mark formed on the stage; a first scope configured to measure a positional deviation in an x-y plane between a mold mark and the reference mark; a second scope configured to measure a position of a substrate mark in the plane not via the mold mark; and a dispenser configured to dispense resin. In the plane, the dispenser center is deviated in position from the mold chuck center by a first distance in a first direction, and the second scope center is deviated in position from the dispenser center by a distance smaller than twice the first distance in the first direction or a second direction opposite thereto.

Abstract translation: 在Z轴方向上按压树脂和模具以在射出区域形成树脂图案的压印装置包括：模具卡盘; X-Y舞台; 在舞台上形成参考标记; 第一范围，被配置为测量模具标记和参考标记之间的x-y平面中的位置偏差; 第二范围，被配置为不经由模具标记来测量所述平面中的基板标记的位置; 以及配置成分配树脂的分配器。 在平面中，分配器中心从第一方向偏离模具卡盘中心第一距离，并且第二范围中心从分配器中心偏离距离小于第一距离的距离的距离 方向或与其相反的第二方向。