Abstract:
The present invention provides a method of manufacturing a touch screen, comprising the steps of: a) forming a conductive layer on a substrate; b) forming an etching resist pattern on the conductive layer; and c) forming a conductive pattern having a line width smaller than the line width of the etching resist pattern by over-etching the conductive layer by using the etching resist pattern and a touch screen manufactured by the method. According to the present invention, a touch screen comprising a conductive pattern having an ultrafine line width can be economically and efficiently provided.
Abstract:
A method of removing a portion of an oxide layer includes forming first byproducts by reacting a reaction gas with the oxide layer, the reaction gas including fluorine and nitrogen, reacting the reaction gas with the first byproducts to form second byproducts, and removing the second byproducts.
Abstract:
A method for forming a black matrix includes (S1) applying a black matrix-forming ink to an intaglio-patterned elastic mold; (S2) removing an ink applied to an embossed portion of the elastic mold; (S3) transcribing the ink remaining in an intagliated portion of the elastic mold to a substrate; and (S4) curing and drying the ink transcribed to the substrate. The step (S2) may be performed in a way of closely adhering a surface of an ink removing unit having a surface energy from to to the embossed portion of the elastic mold and then taking away the ink removing unit from the embossed portion. This method allows forming a black matrix in a simple and economic way by applying the gravure process.
Abstract translation:形成黑色矩阵的方法包括:(S1)将黑色矩阵形成油墨施加到凹版图案的弹性模具上; (S2)去除施加到弹性模具的压花部分的油墨; (S3)将残留在弹性模具的变形部分中的墨水转印到基板上; 和(S4)固化和干燥转录到基底上的油墨。 步骤(S2)可以以下方式进行,即将具有表面能的粉墨去除单元的表面紧密粘合在一起,所述表面能是从油墨的表面能/ erg / cm 2>到油墨的表面能+8 erg / cm 2>到弹性模具的压花部分,然后从压花部分中取出除墨单元。 该方法允许通过应用凹版印刷工艺以简单且经济的方式形成黑色矩阵。
Abstract:
A method and resultant device, in which metal nanoparticles are self-assembled into two-dimensional lattices. A periodic hole pattern (wells) is fabricated on a photoresist substrate, the wells having an aspect ratio of less than 0.37. The nanoparticles are synthesized within inverse micelles of a polymer, preferably a block copolymer, and are self-assembled onto the photoresist nanopatterns. The nanoparticles are selectively positioned in the holes due to the capillary forces related to the pattern geometry, with a controllable number of particles per lattice point.
Abstract:
The present invention relates to a silicone-based coating composition improved adhesion and dyeability, and more specifically, to a silicone-based coating composition prepared by adding a compound(s) having at least one functional group selected from the group consisting of amino, carboxylic acid, mercapto, methylol, anhydride, and isocyanate into an organic-inorganic sol prepared by a sol-gel reaction of organosilanes at high temperature, a method of preparing the same, and an optical lens prepared therefrom. The dyeability of the coating composition is improved by conducting sol-gel reaction at high temperature, and the adhesion to the substrate is improved by adding the compound capable of hydrogen bond and condensation reaction. Therefore, the coating layer of the present invention is proper to be applied to a coating layer for a plastic lens such as glasses, an industrial glass, or goggles for leisure because of good dyeability and adhesion to substrate.
Abstract:
The present invention relates to a method of preparing a photochromic film or plate comprising printing a photochromic substance in the unit of an independent spot on a part or the whole of a basic material and forming a protective layer on the basic material, on which the photochromic substance is coated, so as to protect the photochromic substance. According to the present invention, the photochromic substance is printed in the unit of an independent spot so that the printed unit spots are isolated from each other, thereby prolonging the life of the photochromic substance.
Abstract:
Provided are a composition for printing for use in a printing method which uses a silicon-based blanket, including: 1) a binder resin, 2) a low boiling point solvent having a boiling point of less than 100° C., 3) a medium boiling point solvent having a boiling point of 100° C. or more and less than 180° C., and 4) a high boiling point solvent having a boiling point of 180° C. or more, wherein the medium boiling point solvent and the high-boiling solvent have a difference in solubility parameter with the binder resin of 3 (cal·cm)1/2 or less, a difference in solubility parameter with the silicon-based blanket of 4 (cal·cm)1/2 or more, and a swelling parameter for the silicon-based blanket of 2 or less, and a printing method using the same.
Abstract:
The present invention relates to a conductive ink composition including metal particles, a first solvent having a vapor pressure of 3 torr or less at 25° C., a second solvent having a vapor pressure of more than 3 torr at 25° C., and metal carboxylate, a printing method using the same, and a conductive pattern manufactured by using the same.
Abstract:
The present invention relates to a blanket for offset printing and a manufacturing method thereof. The blanket for offset printing according to an exemplary embodiment of the present invention comprises a cushion layer, a support layer, and at least two surface printing layers, wherein the at least two surface printing layers comprise a silicon-based resin in which at least one of a hardness value, a fluorine group content value, and a silicon oil content value is different. The blanket for offset printing according to the exemplary embodiment of the present invention comprises the surface printing layer formed in at least two layers to prevent the surface printing layer from being swollen due to ink, thereby reducing a process waiting time and improving a process margin.
Abstract:
The present invention provides a method for manufacturing a conductive pattern, comprising the steps of: a) forming a conductive film on a substrate; b) forming an etching resist pattern on the conductive film; and c) forming a conductive pattern having a smaller line width than a width of the etching resist pattern by over-etching the conductive film by using the etching resist pattern, and a conductive pattern manufactured by using the same. According to the exemplary embodiment of the present invention, it is possible to effectively and economically provide a conductive pattern having a ultrafine line width.