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公开(公告)号：US06647626B2
公开(公告)日：2003-11-18
申请号：US09759470
申请日：2001-01-12
申请人： Tsuyoshi Nakano
发明人： Tsuyoshi Nakano
IPC分类号： B26B1914
CPC分类号： B26B19/145 , B26B19/14
摘要： In an electric rotary shaver in which outer cutters are provided in outer cutter holes formed in a cutter frame so that the outer cutters can move in the axial direction and tilt in any desired direction with inner cutters disposed between the outer cutters and inner cutter drive shafts that are urged in the axial direction toward the outer cutter, the outer surfaces of the outer cutters and the inner surfaces of the outer cutter holes being caused to make a sliding contact so that the outer cutters tilt in any desired direction in the outer cutter holes. The circumference of each outer cutter is curved so as to snugly engage with the curved outer surface of each outer cutter hole.
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42.发明授权
公开(公告)号：US4528034A
公开(公告)日：1985-07-09
申请号：US478498
申请日：1983-03-24
申请人： Atsushige Sato , Ishi Miura , Yasuhiro Kumei , Osamu Okuno , Tsuyoshi Nakano , Bunsaku Yoshida
发明人： Atsushige Sato , Ishi Miura , Yasuhiro Kumei , Osamu Okuno , Tsuyoshi Nakano , Bunsaku Yoshida
摘要： Selenium-containing amalgam alloys for dental restoration comprises 0.1-50% by weight of any one of the following alloy powders (A), (B) and (C) mixed with 50-99.9% by weight of the following amalgam alloy powders (D).(A): Silver alloy powders containing no less than 50% by weight of silver and 0.01-10% by weight of selenium,(B): Copper alloy powders containing no less than 50% by weight of copper and 0.01-5% by weight of selenium,(C): Alloy powders mix of (A) with (B) wherein the total amount of silver and copper is adjusted to no less than 50% by weight, and the amount of selenium to 0.01-10% by weight, and(D): Silver-tin-copper amalgam alloy powders. At least one of the any one of (A), (B) and (C) and (D) may be pre-amalgamated with mercury in an amount of no higher than 3% by weight based on the total weight thereof.
摘要翻译： 用于牙科修复的含硒汞齐合金包含以下合金粉末（A），（B）和（C）中的任何一种与以下汞齐合金粉末（D）的50-99.9重量％混合的0.1-50重量％ ）。 （A）：含有不少于50重量％银和0.01-10重量％硒的银合金粉末，（B）：铜合金粉末含有不少于50重量％的铜和0.01-5％的 硒重量（C）：（A）与（B）的合金粉末混合物，其中将银和铜的总量调节至不小于50重量％，硒的量为0.01-10重量％ ，和（D）：银 - 锡 - 铜汞合金粉末。 （A），（B）和（C）和（D）中的任何一个中的至少一个可以以不高于3重量％的量以汞的总重量为先汞合并。
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公开(公告)号：US09308899B2
公开(公告)日：2016-04-12
申请号：US11657569
申请日：2007-01-25
CPC分类号： B60T7/107 , B60T7/12 , B60T7/122 , B60T13/746 , B60W10/06 , B60W10/184 , B60W30/18018 , B60W2710/065 , F02N11/0833 , F02N2200/124 , Y02T10/48
摘要： A brake control section can select an automatic mode in which a mechanical brake is automatically transitioned from a released state to a braking state in response to the running condition of a vehicle. A diagnostic section outputs a fail signal when an abnormal condition of the brake control section is detected. A power control section automatically stops a drive power source of the vehicle when the running condition of the vehicle satisfies a predetermined condition for determining a vehicle stop. When the automatic mode of the brake control section is released or when the diagnostic section outputs a fail signal of the brake control section, the power control section is inhibited to automatically stop the drive power source, so that an unintentional movement of the vehicle caused by an inclination of the road surface and the automatic stop of the drive power source can be prevented.
摘要翻译： 制动控制部可以选择自动模式，其中机械制动器响应于车辆的行驶状态而自动地从释放状态转换到制动状态。 当检测到制动控制部分的异常状况时，诊断部分输出故障信号。 当车辆的行驶状态满足用于确定车辆停止的预定条件时，电力控制部分自动停止车辆的驱动电源。 当制动控制部分的自动模式被释放时，或当诊断部分输出制动控制部分的故障信号时，禁止功率控制部分自动停止驱动电源，使得车辆的无意的运动 可以防止路面的倾斜和驱动电源的自动停止。
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公开(公告)号：US08507950B2
公开(公告)日：2013-08-13
申请号：US13191173
申请日：2011-07-26
申请人： Junya Hada , Tsuyoshi Nakano
发明人： Junya Hada , Tsuyoshi Nakano
CPC分类号： H01L29/7785 , H01L21/0237 , H01L21/02381 , H01L21/02395 , H01L21/02463 , H01L21/02538 , H01L21/02543 , H01L21/02546 , H01L21/02576 , H01L21/0262
摘要： A method of producing a semiconductor wafer includes placing a base wafer within a reaction chamber, and epitaxially growing a p-type Group 3-5 compound semiconductor on the base wafer by supplying, into the reaction chamber, a Group 3 source gas consisting of an organometallic compound of a Group 3 element, a Group 5 source gas consisting of a compound of a Group 5 element, and an impurity gas including an impurity that is to be incorporated as a dopant into a semiconductor to serve as a donor. Here, during the epitaxial growth of the p-type Group 3-5 compound semiconductor, the flow rate of the impurity gas and the flow rate ratio of the Group 5 source gas to the Group 3 source gas are set so that the product N×d (cm−2) of the residual carrier concentration N (cm−3) and the thickness d (cm) of the p-type Group 3-5 compound semiconductor may be 8.0×1011 or less.
摘要翻译： 一种制造半导体晶片的方法包括将基底晶片放置在反应室内，并通过向反应室内向基底晶片外延生长p型组3-5化合物半导体，形成由 第3族元素的有机金属化合物，由第5族元素的化合物组成的第5族源气体和包含作为掺杂剂的杂质的杂质气体作为供体的半导体。 这里，在p型组3-5化合物半导体的外延生长中，设定杂质气体的流量和第5族源气体与3族源气体的流量比，使得产物N× 残留载流子浓度N（cm-3）的d（cm-2）和p型组3-5化合物半导体的厚度d（cm）可以为8.0×1011以下。
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45.发明授权公开(公告)号：US07935984B2
公开(公告)日：2011-05-03
申请号：US12227794
申请日：2007-05-28
申请人： Tsuyoshi Nakano
发明人： Tsuyoshi Nakano
IPC分类号： H01L29/66
CPC分类号： H01L29/66462 , H01L21/02395 , H01L21/02463 , H01L21/02546 , H01L21/0262
摘要： There are provided a higher-performance compound semiconductor epitaxial substrate having improved electron mobility characteristics and its production method. The compound semiconductor epitaxial substrate includes a channel layer in which electrons travel and an epitaxial layer on each of a front side and a back side of the channel layer, wherein a total p-type carrier concentration A (/cm2) per unit area in the epitaxial layer on the back side of the channel layer and a total p-type carrier concentration B (/cm2) per unit area in the epitaxial layer on the front side of the channel layer satisfy the following expression (1): 0
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公开(公告)号：US20100049391A1
公开(公告)日：2010-02-25
申请号：US12506366
申请日：2009-07-21
申请人： Tsuyoshi Nakano
发明人： Tsuyoshi Nakano
IPC分类号： G05D1/00
CPC分类号： G05D1/024 , G05D1/027 , G05D2201/0216
摘要： An autonomous moving apparatus arranged to travel autonomously in a surrounding environment preferably includes: a distance measuring sensor arranged to output detection waves, detect a distance between the apparatus and an object which has reflected the detection wave based on a reflection state of the detection wave, and acquire information about the distance between the apparatus and the object which exists in the surroundings of the apparatus; an inclination sensor arranged to detect an inclination of the distance measuring sensor; and a control unit arranged to estimate the self-position in the surrounding environment and generate the global map of the surrounding environment based on the distance information. When the distance measuring sensor is determined to be inclined based on a detection result of the inclination sensor, the control unit stops estimating the self-position based on the distance information and stops generating the global map based on the distance information.
摘要翻译： 布置成在周围环境中自主行进的自主移动装置优选地包括：距离测量传感器，其布置成输出检测波，基于检测波的反射状态检测装置与已经反射了检测波的物体之间的距离; 并且获取关于设备和存在于设备的周围的物体之间的距离的信息; 倾斜传感器，布置成检测距离测量传感器的倾斜度; 以及控制单元，被布置为基于所述距离信息来估计周围环境中的自身位置并生成周围环境的全局映射。 当基于倾斜传感器的检测结果确定距离测量传感器倾斜时，控制单元基于距离信息停止估计自身位置，并基于距离信息停止生成全局映射。
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公开(公告)号：US20090214081A1
公开(公告)日：2009-08-27
申请号：US12390745
申请日：2009-02-23
申请人： Tsuyoshi NAKANO , Susumu Kubota , Yasukazu Okamoto
发明人： Tsuyoshi NAKANO , Susumu Kubota , Yasukazu Okamoto
IPC分类号： G06K9/00
CPC分类号： G06K9/00785 , G06T7/248 , G06T2207/10021 , G06T2207/30236
摘要： A disparity profile indicating a relation between a perpendicular position on time series images and a disparity on a target monitoring area based on an arrangement of a camera is calculated. Processing areas are set, by setting a height of each of the processing areas using a length at the bottom of the image obtained by converting a reference value of a height of an object according to the profile, while setting a position of each bottom of processing areas on the image. An object having a height higher than a certain height with respect to the monitoring area, unify an object detection result in each processing area according to the disparity of the object, and detect the object of the whole monitoring area from each processing area is detected. Position and speed for the object detected by the object primary detection unit are estimated.
摘要翻译： 计算出基于相机的布置的时间序列图像上的垂直位置与目标监视区域上的视差之间的关系的视差轮廓。 通过使用通过根据轮廓转换对象的高度的参考值而获得的图像的底部的长度来设置每个处理区域的高度，同时设置每个处理区域的每个底部的位置 图像上的区域。 相对于监视区域具有高于一定高度的高度的物体，根据物体的不一致性，将每个处理区域中的物体检测结果统一起来，并且检测来自每个处理区域的整个监视区域的对象。 估计由对象主检测单元检测到的对象的位置和速度。
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公开(公告)号：US07540090B2
公开(公告)日：2009-06-02
申请号：US12070283
申请日：2008-02-15
申请人： Tsuyoshi Nakano
发明人： Tsuyoshi Nakano
IPC分类号： B26B19/16
CPC分类号： B26B19/3846 , B26B19/141 , B26B19/143
摘要： A rotary shaver including an outer cutter frame (18) provided on a shaver main body (10), an outer cutter (14) that is installed in this outer cutter frame (18) and has ring-shaped thin layer portions (28a, 28b) whose upper surfaces are the shaving surfaces, and an inner cutter (16) that has cutter bodies (38) that rotates and make sliding contact with the lower surface of the thin layer portions of the outer cutter to cut hair that entered hair introduction openings (30a, 30b) formed in the thin layer portions; wherein the hair introduction openings have a slit shape extending in substantially the radial direction of the thin layer portions, and the cutting edge angle (p, q) at the lower end(s) of the side wall surface(s) of the hair introduction openings (30a, 30b) defined by the ribs (32a, 32b) is an acute angle.
摘要翻译： 一种旋转剃须刀，其包括设置在剃须刀主体（10）上的外刀架（18），安装在该外切刀架（18）中的外刀片（14），并具有环形薄层部分（28a，28b ）和内刀片（16），其具有与外刀片的薄层部分的下表面旋转并滑动接触的切割器主体（38），以切割进入毛发引入开口的毛发 （30a，30b）形成在薄层部分中; 其特征在于，所述毛发导入口具有在所述薄层部的大致径向延伸的狭缝形状，以及所述毛发引导部的侧壁面的下端的切削刃角度（p，q） 由肋（32a，32b）限定的开口（30a，30b）是锐角。
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公开(公告)号：US07356929B2
公开(公告)日：2008-04-15
申请号：US11353710
申请日：2006-02-14
申请人： Tsuyoshi Nakano
发明人： Tsuyoshi Nakano
IPC分类号： B26B19/16
CPC分类号： B26B19/3846 , B26B19/141 , B26B19/143
摘要： A rotary shaver including an outer cutter frame (18) provided on a shaver main body (10), an outer cutter (14) that is installed in this outer cutter frame (18) and has ring-shaped thin layer portions (28a, 28b) whose upper surfaces are the shaving surfaces, and an inner cutter (16) that has cutter bodies (38) that rotates and make sliding contact with the lower surface of the thin layer portions of the outer cutter to cut hair that entered hair introduction openings (30a, 30b) formed in the thin layer portions; wherein the hair introduction openings have a slit shape extending in substantially the radial direction of the thin layer portions, and the cutting edge angle (p, q) at the lower end(s) of the side wall surface(s) of the hair introduction openings (30a, 30b) defined by the ribs (32a, 32b) is an acute angle.
摘要翻译： 一种旋转剃须刀，包括设置在剃须刀主体（10）上的外刀架（18），安装在该外切刀架（18）中的外刀片（14），并具有环形薄层部分（28a， 28b），其上表面是剃须表面，以及内切割器（16），其具有旋转并与外刀片的薄层部分的下表面滑动接触的切割器主体，以切割进入头发的毛发 形成在薄层部分中的引入开口（30a，30b） 其特征在于，所述毛发导入口具有在所述薄层部的大致径向延伸的狭缝形状，以及所述毛发引导部的侧壁面的下端的切削刃角度（p，q） 由肋（32a，32b）限定的开口（30a，30b）是锐角。
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公开(公告)号：US20060179659A1
公开(公告)日：2006-08-17
申请号：US11353709
申请日：2006-02-14
申请人： Tsuyoshi Nakano
发明人： Tsuyoshi Nakano
IPC分类号： B26B19/14
CPC分类号： B26B19/3846 , B26B19/14 , B26B19/143 , B26B19/38
摘要： A rotary shaver including an outer cutter frame (18) installed on the shaver main body (10), an outer cutter (14) installed in this outer cutter frame (18) and is formed with hair introduction openings (30a, 30b) in ring-shaped thin layer portions (28a, 28b) whose upper surfaces make the shaving surfaces, and an inner cutter (16) that has a cutter body (38) that rotates while making sliding contact from below with the lower surface of the thin layer portions to cut hair that entered the hair introduction opening; wherein the hair introduction openings have a slit shape of substantially constant width and extend in the thin layer portions (28a, 28b) in substantially the radial direction, and they are also curved in a substantially wave shape in their lengthwise direction.
摘要翻译： 一种旋转剃须刀，其包括安装在所述剃须刀主体（10）上的外刀片架（18），安装在所述外切刀架（18）中的外切刀（14），并且形成有头发导入口（30a，30b） 在其上表面形成剃须表面的环形薄层部分（28a，28b）中，以及具有切割器主体（38）的内切割器（16），所述切割器主体（38）从下方滑动接触而旋转， 所述薄层部分切割进入所述毛发导入口的毛发; 其特征在于，所述毛发引入开口具有基本上恒定的宽度的狭缝形状，并且在所述薄层部（28a，28b）的大致径向延伸，并且它们也沿其长度方向弯曲成大致波状。
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