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公开(公告)号：US20240027918A1
公开(公告)日：2024-01-25
申请号：US18004555
申请日：2021-05-27
发明人： Simon Gijsbert Josephus MATHIJSSEN , Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Kaustuve BHATTACHARYYA , Samee Ur REHMAN
CPC分类号： G03F7/70633 , G03F9/7046 , G03F9/7042
摘要： Disclosed is a method of improving a measurement of a parameter of interest. The method comprises obtaining metrology data comprising a plurality of measured values of the parameter of interest, relating to one or more targets on a substrate, each measured value relating to a different measurement combination of a target of said one or more targets and a measurement condition used to measure that target and asymmetry metric data relating to asymmetry for said one or more targets. A respective relationship is determined for each of said measurement combinations relating a true value for the parameter of interest to the asymmetry metric data, based on an assumption that there is a common true value for the parameter of interest over said measurement combinations. These relationships are used to improve a measurement of the parameter of interest.
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公开(公告)号：US20230229094A1
公开(公告)日：2023-07-20
申请号：US18151334
申请日：2023-01-06
发明人： Simon Reinald HUISMAN , Arjan Johannes Anton BEUKMAN , Arie Jeffrey DEN BOEF , Sebastianus Adrianus GOORDEN , Nitish KUMAR , Jin LIAN , Zili ZHOU
CPC分类号： G03F9/7065 , G02B26/0833 , G02B27/283 , G03F7/70575 , G03F7/70616
摘要： Disclosed is an illumination arrangement for spectrally shaping a broadband illumination beam to obtain a spectrally shaped illumination beam. The illumination arrangement comprises a beam dispersing element for dispersing the broadband illumination beam and a spatial light modulator for spatially modulating the broadband illumination beam subsequent to being dispersed. The illumination arrangement further comprises at least one of a beam expanding element for expanding said broadband illumination beam in at least one direction, located between an input of the illumination arrangement and the spatial light modulator; and a lens array, each lens of which for directing a respective wavelength band of the broadband illumination beam subsequent to being dispersed onto a respective region of the spatial light modulator.
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43.发明申请公开(公告)号：US20230062585A1
公开(公告)日：2023-03-02
申请号：US17856213
申请日：2022-07-01
发明人： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Armand Eugene Albert KOOLEN , Nitesh PANDEY , Vasco Tomas TENNER , Willem Marie Julia Marcel COENE , Patrick WARNAAR
摘要： Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US20220057192A1
公开(公告)日：2022-02-24
申请号：US17519641
申请日：2021-11-05
发明人： Kaustuve BHATTACHARYYA , Henricus Wilhelmus Maria VAN BUEL , Christophe David FOUQUET , Hendrik Jan Hidde SMILDE , Maurits VAN DER SCHAAR , Arie Jeffrey DEN BOEF , Richard Johannes Franciscus VAN HAREN , Xing Lan LIU , Johannes Marcus Maria BELTMAN , Andreas FUCHS , Omer Abubaker Omer ADAM , Michael KUBIS , Martin Jacobus Johan JAK
摘要： A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.
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45.发明申请公开(公告)号：US20200249584A1
公开(公告)日：2020-08-06
申请号：US16856128
申请日：2020-04-23
IPC分类号： G03F7/20 , G01N21/88 , G01B11/27 , G01N21/956
摘要： A method of adjusting a metrology apparatus, the method including: spatially dividing an intensity distribution of a pupil plane of the metrology apparatus into a plurality of pixels; and reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting intensities of the plurality of pixels.
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公开(公告)号：US20200218167A1
公开(公告)日：2020-07-09
申请号：US16826479
申请日：2020-03-23
摘要： A metrology apparatus for and a method of determining a characteristic of interest relating to at least one structure on a substrate. The metrology apparatus comprises a sensor and an optical system. The sensor is for detecting characteristics of radiation impinging on the sensor. The optical system comprises an illumination path and a detection path. The optical system is configured to illuminate the at least one structure with radiation received from a source via the illumination path. The optical system is configured to receive radiation scattered by the at least one structure and to transmit the received radiation to the sensor via the detection path.
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47.发明申请公开(公告)号：US20200217648A1
公开(公告)日：2020-07-09
申请号：US16817552
申请日：2020-03-12
摘要： A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern, Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.
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公开(公告)号：US20200072599A1
公开(公告)日：2020-03-05
申请号：US16558457
申请日：2019-09-03
摘要： A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source for generating illumination radiation; at least two illumination branches for illuminating the structure on the substrate, the illumination branches being configured to illuminate the structure from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.
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公开(公告)号：US20190271915A1
公开(公告)日：2019-09-05
申请号：US16413985
申请日：2019-05-16
IPC分类号： G03F7/20 , G01N21/47 , G01N21/956
摘要： A method including: obtaining a measurement of a metrology target on a substrate processed using a patterning process, the measurement having been obtained using measurement radiation; and deriving a parameter of interest of the patterning process from the measurement, wherein the parameter of interest is corrected by a stack difference parameter, the stack difference parameter representing an un-designed difference in physical configuration between adjacent periodic structures of the target or between the metrology target and another adjacent target on the substrate.
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公开(公告)号：US20190086201A1
公开(公告)日：2019-03-21
申请号：US16121780
申请日：2018-09-05
IPC分类号： G01B11/27
摘要： A method of determining a parameter of a patterning process applied to an object comprising two features (for example an overlay of the two features) comprises: irradiating the two features of the object with a radiation beam and receiving at least a portion of the radiation beam scattered from the two features of the object. The at least a portion of the radiation beam comprises: a first portion comprising at least one diffraction order and a second portion comprising at least one diffraction order that is different to a diffraction order of the first portion. The method further comprises moderating a phase difference between the first and second portions and combining the first and second portions such that they interfere to produce a time dependent intensity signal. The method further comprises determining the parameter of the patterning process from a contrast of the time dependent intensity signal.
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