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公开(公告)号：US20050219497A1
公开(公告)日：2005-10-06
申请号：US10812994
申请日：2004-03-31
申请人： Arno Bleeker
发明人： Arno Bleeker
IPC分类号： G02B26/08 , G03F7/20 , H01L21/027 , G03B27/72
CPC分类号： G03F7/70291
摘要： A lithographic apparatus and method are used to pattern a substrate. The system and method includes an illumination system for supplying a projection beam of radiation, an array of individually controllable elements for imparting the projection beam with a pattern in its cross-section, and a substrate table for supporting the substrate during an exposure operation. A projection system projects the patterned beam onto a target portion of the substrate. A control system sends a control signal for setting each said individually controllable elements to a desired state. A compensation device for adjusting the control signal applied to a first individually controllable element based on the control signal to be applied to at least one other individually controllable element. This can be done to reduce image degradation arising from cross-talk between individually controllable elements.
摘要翻译： 使用光刻设备和方法来对衬底进行图案化。 该系统和方法包括用于提供投影射线束的照明系统，用于使投影光束在其横截面上赋予图案的独立可控元件的阵列，以及用于在曝光操作期间支撑衬底的衬底台。 投影系统将图案化的光束投影到基板的目标部分上。 控制系统发送用于将每个所述可单独控制的元件设置到期望状态的控制信号。 一种补偿装置，用于基于要施加到至少一个其他单独可控元件的控制信号来调整施加到第一独立可控元件的控制信号。 这可以做到，以减少由个别可控元件之间的串扰引起的图像劣化。
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公开(公告)号：US06876440B1
公开(公告)日：2005-04-05
申请号：US10674070
申请日：2003-09-30
IPC分类号： G02B26/08 , G02F1/01 , G03B21/18 , G03B27/00 , G03B27/32 , G03B27/68 , G03C5/00 , G03F7/20 , G03F9/00 , G06F17/50 , H01L21/027
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
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43.发明申请Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones 有权用于补偿不使用曝光区重叠的无掩模光刻系统中印刷图案的缝合干扰的方法和系统公开(公告)号：US20050068467A1
公开(公告)日：2005-03-31
申请号：US10673922
申请日：2003-09-30
申请人： Arno Bleeker , Wenceslao Cebuhar , Azat Latypov
发明人： Arno Bleeker , Wenceslao Cebuhar , Azat Latypov
IPC分类号： G02F1/1335 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70291 , G03F7/70475
摘要： A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.
摘要翻译： 提供了一种用于在感光表面的区域内形成图案的方法和系统。 一种示例性方法包括根据预定图像数据执行感光表面的第一曝光，其中第一曝光在第一次通过期间发生并在该区域内产生第一图像。 调整图像数据以补偿识别的图像缺陷图像缺陷，图像缺陷在第一图像的区域内。 在第二次通过期间，根据调整后的图像数据执行感光表面的第二次曝光。
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公开(公告)号：US20050012916A1
公开(公告)日：2005-01-20
申请号：US10850567
申请日：2004-05-21
IPC分类号： G02B3/00 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70275 , G03F7/70291
摘要： A lithographic projection apparatus comprises a microlens array for generating a plurality of source images in a two-dimensional array, a programmable patterning means having a plurality of addressable elements acting as shutters for the source images and a projection subsystem for projecting a n image of the array of source images onto a substrate. A greater working distance can thereby be obtained
摘要翻译： 光刻投影装置包括用于以二维阵列产生多个源图像的微透镜阵列，具有用作源图像的快门的多个可寻址元件的可编程图案形成装置和用于投影阵列的图像的投影子系统 的源图像到基板上。 从而可以获得更大的工作距离
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45.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones 有权用于补偿不使用曝光区重叠的无掩模光刻系统中印刷图案的缝合干扰的方法和系统公开(公告)号：US07688423B2
公开(公告)日：2010-03-30
申请号：US12178522
申请日：2008-07-23
CPC分类号： G03F7/70291 , G03F7/70475
摘要： A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.
摘要翻译： 提供了一种用于在感光表面的区域内形成图案的方法和系统。 一种示例性方法包括根据预定图像数据执行感光表面的第一曝光，其中第一曝光在第一次通过期间发生并在该区域内产生第一图像。 调整图像数据以补偿识别的图像缺陷图像缺陷，图像缺陷在第一图像的区域内。 在第二次通过期间，根据调整后的图像数据执行感光表面的第二次曝光。
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46.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern 有权用于补偿印刷图案的缝合干扰的方法和系统公开(公告)号：US07630054B2
公开(公告)日：2009-12-08
申请号：US12000522
申请日：2007-12-13
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided of using a patterning device. An exemplary method includes performing a first exposure of a surface corresponding to image data, determining an image deficiency within a region of the first image, adjusting the image data to compensate for the image deficiency, and performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface. The first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface.
摘要翻译： 提供了使用图案形成装置的方法和系统。 示例性方法包括执行与图像数据相对应的表面的第一曝光，确定第一图像的区域内的图像不足，调整图像数据以补偿图像不足，以及执行对应于图像数据的表面的第二次曝光 在图案形成装置相对于表面的第二遍期间的调整图像数据。 第一曝光在图案形成装置相对于表面的第一遍期间发生，以在表面上产生第一图像。
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47.发明申请公开(公告)号：US20090033893A1
公开(公告)日：2009-02-05
申请号：US12178522
申请日：2008-07-23
申请人： Arno Bleeker , Winceslao A. Cebuhar , Azat Latypov
发明人： Arno Bleeker , Winceslao A. Cebuhar , Azat Latypov
CPC分类号： G03F7/70291 , G03F7/70475
摘要： A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.
摘要翻译： 提供了一种用于在感光表面的区域内形成图案的方法和系统。 一种示例性方法包括根据预定图像数据执行感光表面的第一曝光，其中第一曝光在第一次通过期间发生并在该区域内产生第一图像。 调整图像数据以补偿识别的图像缺陷图像缺陷，图像缺陷在第一图像的区域内。 在第二次通过期间，根据调整后的图像数据执行感光表面的第二次曝光。
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48.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones 有权用于补偿不使用曝光区重叠的无掩模光刻系统中印刷图案的缝合干扰的方法和系统公开(公告)号：US07410736B2
公开(公告)日：2008-08-12
申请号：US10673922
申请日：2003-09-30
申请人： Arno Bleeker , Wenceslao A. Cebuhar , Azat Latypov
发明人： Arno Bleeker , Wenceslao A. Cebuhar , Azat Latypov
CPC分类号： G03F7/70291 , G03F7/70475
摘要： A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.
摘要翻译： 提供了一种用于在感光表面的区域内形成图案的方法和系统。 一种示例性方法包括根据预定图像数据执行感光表面的第一曝光，其中第一曝光在第一次通过期间发生并在该区域内产生第一图像。 调整图像数据以补偿识别的图像缺陷图像缺陷，图像缺陷在第一图像的区域内。 在第二次通过期间，根据调整后的图像数据执行感光表面的第二次曝光。
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49.发明申请公开(公告)号：US20070145306A1
公开(公告)日：2007-06-28
申请号：US11705147
申请日：2007-02-12
申请人： Johannes Baselmans , Arno Bleeker
发明人： Johannes Baselmans , Arno Bleeker
CPC分类号： G03F7/70516 , G03F7/70291 , G03F7/70591
摘要： To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
摘要翻译： 为了校准具有可编程图案形成装置的光刻设备，使用具有大于对应于可编程图案形成装置的单个像素的点的尺寸的检测器元件的诸如CCD，CMOS传感器或光电二极管阵列的传感器。 像素被单独或分组选择性地激活。
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公开(公告)号：US20070046919A1
公开(公告)日：2007-03-01
申请号：US11593041
申请日：2006-11-06
IPC分类号： G03B27/54
CPC分类号： G03F7/70275 , G03F7/70283 , G03F7/70291 , G03F7/70308
摘要： Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
摘要翻译： 提供了一种用于促进使用多个可单独控制的元件来调制在聚焦元件阵列的每个聚焦元件处接收的辐射强度的方法和系统，以控制在其上聚焦的基底上的区域中的辐射强度 元素引导辐射。
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