公开(公告)号：US20080083329A1

公开(公告)日：2008-04-10

申请号：US11903397

申请日：2007-09-20

Applicant: Boris Kobrin ,  Romuald Nowak ,  Jeffrey Chinn ,  Richard Yi

Inventor： Boris Kobrin ,  Romuald Nowak ,  Jeffrey Chinn ,  Richard Yi

IPC: B01D46/46

CPC classification number: C23C16/4402

Abstract: We have devised an apparatus useful for and a method of removing impurities from vaporous precursor compositions used to generate reactive precursor vapors from which thin films/layers are formed under sub-atmospheric conditions. The method is particularly useful when the layer deposition apparatus provides for precise addition of quantities of different combinations of reactants during a single step or when there are a number of different individual steps in the layer formation process, where the presence of impurities has a significant affect on both the quantity of reactants being charged and the overall composition of the reactant mixture from which the layer is deposited. The method is particularly useful when the vapor pressure of a liquid reactive precursor is less than about 250 Torr at atmospheric pressure.

Abstract translation: 我们已经设计了一种可用于从用于产生反应性前体蒸气的气态前体组合物中除去杂质的装置，其中在大气下条件下形成薄膜/层。 当层沉积设备在单一步骤期间提供量的不同组合的反应物的精确添加时或当层形成过程中存在多个不同的单独步骤时，该方法是特别有用的，其中杂质的存在具有显着的影响 在被充电的反应物的量和沉积层的反应物混合物的总体组成。 当液体反应性前体的蒸气压在大气压下小于约250乇时，该方法特别有用。

公开(公告)号：US20080081151A1

公开(公告)日：2008-04-03

申请号：US11978123

申请日：2007-10-26

Applicant: Boris Kobrin ,  Jeffrey Chinn ,  Romuald Nowak ,  Richard Yi

Inventor： Boris Kobrin ,  Jeffrey Chinn ,  Romuald Nowak ,  Richard Yi

IPC: B32B5/00 ,  B05D1/36 ,  B32B7/00 ,  C23C16/44 ,  C23C16/00 ,  B05D3/04

CPC classification number: C23C16/0227 ,  B05D1/185 ,  B05D1/60 ,  B05D3/142 ,  B05D3/145 ,  B05D7/52 ,  B05D7/56 ,  B82Y30/00 ,  B82Y40/00 ,  C03C17/42 ,  C03C23/006 ,  C23C16/0245 ,  C23C16/0272 ,  C23C16/401 ,  C23C16/402 ,  C23C16/448 ,  C23C16/4485 ,  C23C16/455 ,  C23C16/45557 ,  C23C16/56 ,  Y10T428/12618 ,  Y10T428/12632 ,  Y10T428/24 ,  Y10T428/24355 ,  Y10T428/24967 ,  Y10T428/24975 ,  Y10T428/261 ,  Y10T428/265 ,  Y10T428/31663 ,  Y10T428/31667

Abstract: An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and a SAM organic-based layer is directly deposited over the oxide-based layer. Typically a series of alternating layers of oxide-based layer and organic-based layer are applied.

Abstract translation: 描述了一种用于在基底上施加多层膜/涂层的改进的气相沉积方法和装置。 该方法用于沉积与衬底直接接触的氧化物基层的厚度作为衬底的化学组成的函数来控制多层涂层，由此随后沉积的层更好地结合到氧化物基层。 改进的方法用于沉积多层涂层，其中氧化物基层直接沉积在衬底上，并且基于氧化物的层直接沉积SAM有机基层。 通常，应用一系列交替层的氧化物基层和基于有机的层。

公开(公告)号：US07183633B2

公开(公告)日：2007-02-27

申请号：US10469516

申请日：2002-03-01

Applicant: Michael J. Daneman ,  Franklin Wall ,  Behrang Behin ,  Murali Chaparala ,  Mark W. Chang ,  Scott Dalton ,  Timothy Beerling ,  Stephen Panyko ,  Meng-Hsiung Kiang ,  Boris Kobrin ,  Chuang-Chia Lin

Inventor： Michael J. Daneman ,  Franklin Wall ,  Behrang Behin ,  Murali Chaparala ,  Mark W. Chang ,  Scott Dalton ,  Timothy Beerling ,  Stephen Panyko ,  Meng-Hsiung Kiang ,  Boris Kobrin ,  Chuang-Chia Lin

IPC: H01L23/02 ,  G02B26/08 ,  G02B6/42

CPC classification number: G02B6/3518 ,  G02B6/3546 ,  G02B6/356 ,  G02B6/357 ,  G02B6/3572 ,  G02B6/3584 ,  G02B26/0841

Abstract: An optical cross-connect switch comprises a base (216), a flap (211) and one or more electrically conductive landing pads (222) connected to the flap (211). The flap (211) has a bottom portion that is movably coupled to the base (216) such that the flap (211) is movable with respect to a plane of the base (216) from a first orientation to a second orientation. The one or more landing pads (222) are electrically isolated from the flap (211) and electrically coupled to be equipotential with a landing surface.

Abstract translation: 光学交叉连接开关包括底座（216），翼片（211）和连接到翼片（211）的一个或多个导电着陆垫（222）。 翼片（211）具有可移动地联接到基部（216）的底部部分，使得翼片（211）能够相对于基部（216）的平面从第一方向移动到第二方向。 一个或多个着陆垫（222）与翼片（211）电隔离并且电耦合以与着陆表面等电位。

公开(公告)号：US20060251795A1

公开(公告)日：2006-11-09

申请号：US11123487

申请日：2005-05-05

Applicant: Boris Kobrin ,  Romuald Nowak ,  Jeffrey Chinn ,  Richard Yi

Inventor： Boris Kobrin ,  Romuald Nowak ,  Jeffrey Chinn ,  Richard Yi

IPC: A61L33/00

CPC classification number: B82Y30/00 ,  A61L27/34 ,  A61L29/085 ,  A61L31/10 ,  B82Y40/00 ,  Y10T428/261 ,  Y10T428/31667 ,  C08L71/02

Abstract: We have developed an improved vapor-phase deposition method and apparatus for the application of layers and coatings on various substrates. The method and apparatus are useful in the fabrication of biofunctional devices, Bio-MEMS devices, and in the fabrication of microfluidic devices for biological applications. In one important embodiment, oxide/polyethylene glycol coatings provide increased hydrophilicity and improved biocompatibility for medical devices and implants.

Abstract translation: 我们已经开发了一种改进的气相沉积方法和装置，用于在各种基底上施加层和涂层。 该方法和装置可用于制造生物功能装置，生物MEMS装置以及制造用于生物应用的微流体装置。 在一个重要的实施方案中，氧化物/聚乙二醇涂层为医疗装置和植入物提供增加的亲水性和改善的生物相容性。

公开(公告)号：US09782917B2

公开(公告)日：2017-10-10

申请号：US13756348

申请日：2013-01-31

Applicant: Boris Kobrin ,  Ian McMackin

Inventor： Boris Kobrin ,  Ian McMackin

IPC: B29C33/38 ,  G03F1/70 ,  G03F7/00

CPC classification number: B29C33/38 ,  B29C33/3842 ,  B29C33/3857 ,  B29C33/3878 ,  B29C33/3885 ,  G03F1/70 ,  G03F7/0002 ,  G03F7/0005

Abstract: Aspects of the present disclosure describe cylindrical molds that may be used to produce cylindrical masks for use in lithography. A structured porous layer may be deposited on an interior surface of a cylinder. A radiation-sensitive material may be deposited over the porous layer in order to fill pores formed in the layer. The radiation-sensitive material in the pores may be cured by exposing the cylinder with a light source. The uncured resist and porous layer may be removed, leaving behind posts on the cylinder's interior surface. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

公开(公告)号：US09725805B2

公开(公告)日：2017-08-08

申请号：US11445706

申请日：2006-06-02

Applicant: Boris Kobrin ,  Romuald Nowak ,  Richard C. Yi ,  Jeffrey D. Chinn

Inventor： Boris Kobrin ,  Romuald Nowak ,  Richard C. Yi ,  Jeffrey D. Chinn

IPC: C23C16/448 ,  C23C16/455 ,  B05D1/00 ,  B82Y30/00 ,  B05D3/14

CPC classification number: C23C16/45557 ,  B05D1/60 ,  B05D3/142 ,  B82Y30/00 ,  C23C16/4485 ,  C23C16/45561

Abstract: A vapor phase deposition method and apparatus for the application of thin layers and coatings on substrates. The method and apparatus are useful in the fabrication of electronic devices, micro-electromechanical systems (MEMS), Bio-MEMS devices, micro and nano imprinting lithography, and microfluidic devices. The apparatus used to carry out the method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. The apparatus provides for precise addition of quantities of different combinations of reactants during a single step or when there are a number of different individual steps in the coating formation process. The precise addition of each of the reactants in vapor form is metered into a predetermined set volume at a specified temperature to a specified pressure, to provide a highly accurate amount of reactant.

公开(公告)号：US20170028594A1

公开(公告)日：2017-02-02

申请号：US15236240

申请日：2016-08-12

Applicant: Boris Kobrin ,  Oliver Seitz ,  Bruce Richardson ,  Ian McMackin ,  Mukti Aryal ,  Bryant Grigsby

Inventor： Boris Kobrin ,  Oliver Seitz ,  Bruce Richardson ,  Ian McMackin ,  Mukti Aryal ,  Bryant Grigsby

IPC: B29C39/10 ,  B29C33/42 ,  G03F1/72 ,  B29C53/34 ,  B29C35/02 ,  B29C33/38 ,  B29C39/02

CPC classification number: B29C39/10 ,  B29C33/3857 ,  B29C33/424 ,  B29C35/02 ,  B29C39/026 ,  B29C39/148 ,  B29C53/34 ,  B29K2083/00 ,  B29L2031/757 ,  G03F1/72 ,  G03F7/0002 ,  Y10T428/24802

Abstract: A cylindrical mask may be fabricated using a hollow casting cylinder and a mask cylinder. The casting cylinder has an inner diameter that is larger than the outer diameter of the mask cylinder. The casting and mask cylinders are coaxially assembled and a liquid polymer inserted in a space surrounding the mask cylinder between the inner surface of the casting cylinder and the outer surface of the mask cylinder. After curing the liquid polymer, the casting cylinder is removed. A surface of the cured polymer can be patterned. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 可以使用中空铸造圆筒和掩模筒来制造圆柱形掩模。 铸造圆筒的内径大于荫罩圆筒的外径。 铸造和掩模气缸同轴组装，并且液体聚合物插入在铸塑缸的内表面和掩模缸的外表面之间围绕掩模缸的空间中。 在固化液体聚合物之后，移去铸造圆筒。 固化的聚合物的表面可以被图案化。 要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

公开(公告)号：US20140212536A1

公开(公告)日：2014-07-31

申请号：US13756370

申请日：2013-01-31

Applicant: Boris Kobrin ,  Ian McMackin

Inventor： Boris Kobrin ,  Ian McMackin

IPC: B29C33/44 ,  B29C39/02 ,  B29C43/46 ,  B29C33/50

CPC classification number: B29C33/448 ,  B29C33/424 ,  B29C33/505 ,  B29C39/026 ,  B29C39/36 ,  B29C43/46 ,  G03F7/0002 ,  G03F7/24

Abstract: Aspects of the present disclosure include a cylindrical master mold assembly having a cylindrical patterned component with a first diameter and a sacrificial casting component with a second diameter. The component with the smaller radius may be co-axially inserted into the interior of the component with the larger radius. Patterned features may be formed on the interior surface of the cylindrical patterned component that faces the sacrificial casting component. The sacrificial casting component may be removed once a cast polymer has been cured to allow the polymer to be released. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 本公开的方面包括具有第一直径的圆柱形图案化部件和具有第二直径的牺牲铸造部件的圆柱形主模组件。 具有较小半径的部件可以以更大的半径同轴地插入部件的内部。 图案化的特征可以形成在面向牺牲铸造部件的圆柱形图案化部件的内表面上。 一旦铸塑聚合物已经固化以允许聚合物被释放，就可以去除牺牲浇铸组分。 要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

公开(公告)号：US20140202986A1

公开(公告)日：2014-07-24

申请号：US13749376

申请日：2013-01-24

Applicant: Alfred Renaldo ,  Boris Kobrin

Inventor： Alfred Renaldo ,  Boris Kobrin

IPC: G03F7/00

CPC classification number: G03F7/24 ,  G03F7/2035

Abstract: Rolling mask lithography may be performed to expose selected portions of a radiation sensitive layer to a radiation pattern that leaves selected portions of a top surface of the radiation sensitive layer resistant to development by a developer and non-selected portions susceptible to development by the developer. A structure of the selected portions is then rendered resistant to an etch process. The radiation sensitive layer is then flood exposed to a second radiation that leaves the radiation sensitive layer resistant to development by the developer. The radiation sensitive layer is then selectively etched using the etch-resistant selected portions as an etch mask.

Abstract translation: 可以执行滚动掩模光刻以将辐射敏感层的选定部分暴露于辐射图案，该辐射图案使由辐射敏感层的顶表面的选定部分抵抗由显影剂显影而易受显影影响的显影剂和非选择部分。 所选择的部分的结构然后变得对蚀刻工艺具有抵抗力。 然后将辐射敏感层暴露于第二辐射，离开辐射敏感层对显影剂的显影有抵抗力。 然后使用耐蚀刻选择部分作为蚀刻掩模来选择性地蚀刻辐射敏感层。

公开(公告)号：US20140037920A1

公开(公告)日：2014-02-06

申请号：US13564637

申请日：2012-08-01

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: B44C1/22 ,  B32B3/10 ,  C03C25/68

CPC classification number: C03C17/23 ,  C03C2217/212 ,  C03C2217/213 ,  C03C2218/33 ,  C03C2218/34 ,  Y10T428/24802 ,  Y10T428/24926

Abstract: A hard-to-dry-etch material may be patterned by forming a layer of dry-etchable material on a surface of the hard-to-dry etch substrate, and dry etching the dry-etchable material. The hard-to-dry etch substrate produces substantial quantities of non-volatile etch byproducts that redeposit when subject to the dry etching. The dry-etchable material has similar material properties to the hard-to-dry-etch substrate material is formed. The dry-etchable material is one that does not produce substantial quantities of non-volatile etch byproducts that redeposit when the dry-etchable material is subject to the dry etching. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 可以通过在硬干蚀刻基板的表面上形成一层可干蚀刻的材料来对难以干蚀刻的材料进行图案化，并干法蚀刻可干蚀刻的材料。 难以干蚀刻的衬底产生大量的非挥发性蚀刻副产物，当经受干蚀刻时，它们会重新沉积。 干蚀刻材料具有与难以干蚀刻的基底材料相似的材料特性。 可干蚀刻材料是不产生大量非挥发性蚀刻副产物的材料，当干蚀刻材料进行干法蚀刻时，其可再沉积。 要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。