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72 条记录 (耗时 0.037 秒)

    Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same
    44.
    发明申请
    Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same 有权
    含氟磺酸盐，光酸发生剂和抗蚀剂组合物和图案形成方法

    公开(公告)号：US20130209938A1

    公开(公告)日：2013-08-15

    申请号：US13879989

    申请日：2011-10-14

    申请人： Ryozo Takihana ,  Satoru Narizuka

    发明人： Ryozo Takihana ,  Satoru Narizuka

    IPC分类号： G03F7/027

    CPC分类号： G03F7/027 ,  C07C303/32 ,  C07C309/06 ,  C07C309/10 ,  C07C309/12 ,  C07C309/16 ,  C07C309/19 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

    摘要： A resist composition according to the present invention includes at least a base resin, a photoacid generator and a solvent, wherein the photoacid generator comprises a fluorine-containing sulfonic acid salt of the following general formula (4). In the formula, X independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 6; R1 represents a hydrogen atom, or an alkyl, alkenyl, oxoalkyl, aryl or aralkyl group; any of hydrogen atoms on carbons in R1 may be substituted with a substituent; R2 represents RAO or RBRCN; and A represents a divalent group. This fluorine-containing sulfonic acid salt can serve as a photoacid generator having high solubility in a resist solvent and thus can suitably be used for a resist composition such that the resist composition shows high resolution, wide DOF, small LER and high sensitivity to form a good pattern shape in lithographic processes.

    摘要翻译： 根据本发明的抗蚀剂组合物至少包括基础树脂，光致酸产生剂和溶剂，其中光酸产生剂包含以下通式（4）的含氟磺酸盐。 在该式中，X独立地表示氢原子或氟原子; n表示1〜6的整数， R1表示氢原子，或烷基，烯基，氧代烷基，芳基或芳烷基; R1中碳上的任何氢原子可以被取代基取代; R2代表RAO或RBRCN; A表示二价基团。 该含氟磺酸盐可以用作在抗蚀剂溶剂中具有高溶解度的光致酸产生剂，因此可以适当地用于抗蚀剂组合物，使得抗蚀剂组合物显示出高分辨率，宽DOF，小LER和高灵敏度以形成 光刻工艺中的良好图案形状。

    Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same
    45.
    发明授权
    Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same 有权
    含氟化合物，含氟聚合物，负型抗蚀剂组合物和使用它们的图案化工艺

    公开(公告)号：US08187787B2

    公开(公告)日：2012-05-29

    申请号：US12146889

    申请日：2008-06-26

    申请人： Yoshimi Isono ,  Jonathan Joachim Jodry ,  Satoru Narizuka ,  Kazuhiro Yamanaka

    发明人： Yoshimi Isono ,  Jonathan Joachim Jodry ,  Satoru Narizuka ,  Kazuhiro Yamanaka

    IPC分类号： G03C1/00 ,  C08F16/24

    CPC分类号： C07C69/653 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0382 ,  Y10S430/108 ,  Y10S430/115 ,  Y10S430/143 ,  Y10S430/167 ,  Y10T428/24802

    摘要： Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

    摘要翻译： 公开了式（1）表示的含氟不饱和羧酸，其中R1表示可聚合双键的基团，R3表示氟原子或含氟烷基，W表示二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，并且含有式（2）所示的重复单元，其中R 3和W如上定义，各自为R 4，R 5和R 6 独立地表示氢原子，氟原子或一价有机基团，R4，R5和R6中的至少两个可以组合形成环。 该高分子化合物可以提供对KrF或ArF准分子激光透明的化学放大抗蚀剂组合物，并且具有高分辨率，并且能够形成具有无膨胀的矩形截面的图案。

    Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same
    49.
    发明申请
    Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same 有权
    含氟化合物，含氟聚合物，负型抗蚀剂组合物和使用其的图案化方法

    公开(公告)号：US20090011199A1

    公开(公告)日：2009-01-08

    申请号：US12146889

    申请日：2008-06-26

    申请人： Yoshimi Isono ,  Jonathan Joachim Jodry ,  Satoru Narizuka ,  Kazuhiro Yamanaka

    发明人： Yoshimi Isono ,  Jonathan Joachim Jodry ,  Satoru Narizuka ,  Kazuhiro Yamanaka

    IPC分类号： B32B3/10 ,  C08F214/18 ,  C08F220/22 ,  C07C69/52 ,  G03F7/004 ,  G03F7/20

    CPC分类号： C07C69/653 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0382 ,  Y10S430/108 ,  Y10S430/115 ,  Y10S430/143 ,  Y10S430/167 ,  Y10T428/24802

    摘要： Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

    摘要翻译： 公开了式（1）表示的含氟不饱和羧酸，其中R1表示可聚合双键的基团，R3表示氟原子或含氟烷基，W表示二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，并且含有式（2）所示的重复单元，其中R 3和W如上定义，各自为R 4，R 5和R 6 独立地表示氢原子，氟原子或一价有机基团，R4，R5和R6中的至少两个可以组合形成环。 该高分子化合物可以提供对KrF或ArF准分子激光透明的化学放大抗蚀剂组合物，并且具有高分辨率，并且能够形成具有无膨胀的矩形截面的图案。

    Process for producing brominated trifluoromethylbenzenes
    50.
    发明授权
    Process for producing brominated trifluoromethylbenzenes 失效
    溴化三氟甲基苯的制备方法

    公开(公告)号：US06506951B1

    公开(公告)日：2003-01-14

    申请号：US09551912

    申请日：2000-04-19

    申请人： Eri Tsukada ,  Mikio Ujiie ,  Shozo Kaneda ,  Satoru Narizuka ,  Takashi Kume

    发明人： Eri Tsukada ,  Mikio Ujiie ,  Shozo Kaneda ,  Satoru Narizuka ,  Takashi Kume

    IPC分类号： C07C2200

    CPC分类号： B01J27/135 ,  B01J27/10 ,  B01J27/128 ,  C07C17/12 ,  C07C25/13

    摘要： The invention relates to a process for producing a brominated trifluoromethylbenzene represented by the general formula (1). This process includes brominating in a liquid or gas phase a trifluoromethylbenzene, represented by the general formula (2), by bromine in the presence of a catalyst under a condition that the bromine is coexistent with chlorine, where n is an integer of 1-2, and m is an integer of 1-3 where n is an integer of 1-2. The catalyst is preferably iron chloride in the case of the bromination in a liquid phase. It is preferably activated carbon carrying thereon iron chloride in the case of the bromination in a gas phase. The trifluoromethylbenzene is turned to the brominated trifluoromethylbenzene with high reactivity and high yield.

    摘要翻译： 本发明涉及由通式（1）表示的溴代三氟甲基苯的制备方法。 该方法包括在液相或气相中溴在溴中与氯共存的条件下，在溴存在下，用溴在通式（2）表示的三氟甲基苯中溴化，其中n为1-2的整数 ，m为1-3的整数，其中n为1-2的整数。 在液相中溴化的情况下，催化剂优选为氯化铁。 在气相溴化的情况下，优选载有氯化铁的活性炭。 三氟甲基苯转化为溴化三氟甲基苯，反应性高，产率高。