公开(公告)号：US20110309245A1

公开(公告)日：2011-12-22

申请号：US13203807

申请日：2009-10-23

申请人： Yuichi Madokoro ,  Tsuyoshi Onishi ,  Megumi Aizawa ,  Yukio Yoshizawa

发明人： Yuichi Madokoro ,  Tsuyoshi Onishi ,  Megumi Aizawa ,  Yukio Yoshizawa

IPC分类号： G21K5/10 ,  G01N23/02

CPC分类号： G01N1/286

摘要： Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means for transferring the excised specimen and a specimen holder capable of holding the excised specimen, and the relative movement of the excised specimen and the specimen, and the like are recognized with high accuracy by image recognition. In the sampling of a minute specimen using a focused ion beam, the detection of an end point of processing for separation of the excised specimen from the specimen, and the like are automatically performed. Thus, for example, unmanned specimen excision becomes possible, and preparation of a lot of specimens becomes possible.

摘要翻译： 自动进行切片样品与试样的分离等。 在成为试样和除了所述区域以外的区域的切除试样的区域中，或者在用于转移切除的试样的转移装置和能够保持切除的试样的试样保持器的区域中提供用于提高图像识别精度的标记， 通过图像识别以高精度识别切除的样本和样本的相对运动等。 在使用聚焦离子束对分钟标本的取样中，自动执行用于将切出的样品与试样分离的处理终点的检测等。 因此，例如，无人标本切除成为可能，并且可以制备大量标本。

公开(公告)号：US20110297826A1

公开(公告)日：2011-12-08

申请号：US13202498

申请日：2009-10-23

申请人： Yuichi Madokoro ,  Megumi Aizawa ,  Yukio Yoshizawa

发明人： Yuichi Madokoro ,  Megumi Aizawa ,  Yukio Yoshizawa

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J37/153 ,  H01J37/3005 ,  H01J37/3045 ,  H01J37/3056 ,  H01J2237/15 ,  H01J2237/1536 ,  H01J2237/20207 ,  H01J2237/221 ,  H01J2237/30483 ,  H01J2237/31745

摘要： An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.

摘要翻译： 本发明的目的是消除图像中的变形，即使在带电粒子束的偏转方向与试样的倾斜轴之间存在角度差，也能够精确地观察和处理试样。 当带电粒子束的偏转方向与试样的倾斜轴不平行时，确定与带电粒子束的观察方向的偏转旋转角度，改变偏转图案。 从而校正图像中的失真。 偏转图案变为平行四边形。 即使样品倾斜，也能获得无变形的图像，能够高精度地观察和加工样品。 这允许在校正位置关系之后自动识别位置校正标记以执行观察和处理。

公开(公告)号：US20090008578A1

公开(公告)日：2009-01-08

申请号：US12168241

申请日：2008-07-07

申请人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

发明人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

IPC分类号： H01J37/08

CPC分类号： G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A specimen fabrication apparatus, including: an ion beam irradiating optical system to irradiate a sample placed in a chamber, with an ion beam; a specimen holder to mount a specimen separated by the irradiation with the ion beam; a holder cassette to hold the specimen holder; a sample stage to hold the sample and the holder cassette; and a probe to move the specimen to the specimen holder, wherein the holder cassette is transferred to outside of the chamber in a condition of holding the specimen holder with the specimen mounted.

摘要翻译： 一种标本制造装置，包括：离子束照射光学系统，用离子束照射放置在室中的样品; 用于安装通过用离子束照射分离的样本的样本保持器; 用于保持样品架的保持器盒; 用于保持样品和保持器盒的样品台; 以及用于将样本移动到样本保持器的探针，其中，在保持样本保持器的状态下，保持器盒被转移到腔室的外部。

公开(公告)号：US20080296497A1

公开(公告)日：2008-12-04

申请号：US12168232

申请日：2008-07-07

申请人： Satoshi TOMIMATSU ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

发明人： Satoshi TOMIMATSU ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

IPC分类号： G01N23/00

CPC分类号： G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A system for analyzing a semiconductor device, including: a first ion beam apparatus including: a sample stage to mount a sample substrate; a vacuum chamber in which the sample stage is placed; an ion beam irradiating optical system to irradiate the sample substrate; a specimen holder that accommodates a plurality of specimens separated from the sample substrate by the irradiation of the ion beam; and a probe to extract the separated specimen from the sample substrate, and to transfer the separated specimen to the specimen holder; a second ion beam apparatus that carries out a finishing process to the specimen; and an analyzer to analyze the finished specimen, wherein the first ion beam apparatus separates the specimen and the probe in a vacuum condition.

摘要翻译： 一种用于分析半导体器件的系统，包括：第一离子束装置，包括：样品台，用于安装样品基板; 其中放置样品台的真空室; 离子束照射光学系统照射样品基板; 样本保持器，其容纳通过离子束的照射与样品基板分离的多个样本; 以及从所述样品基材中提取分离出的试样并将分离的试样转移到所述试样保持器的探针。 对样品进行精加工的第二离子束装置; 以及用于分析成品样品的分析器，其中所述第一离子束装置在真空条件下分离所述样品和所述探针。

公开(公告)号：US20070152174A1

公开(公告)日：2007-07-05

申请号：US11714235

申请日：2007-03-06

申请人： Yuichi Madokoro ,  Shigeru Izawa ,  Kaoru Umemura ,  Hiroyasu Kaga

发明人： Yuichi Madokoro ,  Shigeru Izawa ,  Kaoru Umemura ,  Hiroyasu Kaga

IPC分类号： H01J37/08

CPC分类号： H01J37/09 ,  H01J2237/022 ,  H01J2237/0805 ,  H01J2237/3109

摘要： In an aperture for use in an ion beam optical system having its surface coated with a liquid metal, instability of an ion source attributable to sputtering and re-deposition of an aperture base material is prevented. A focused ion beam apparatus using a liquid metal ion source has an aperture for limiting an ion beam diameter. The aperture has a vessel formed with a recess having, at its surface lowermost point, an aperture hole through which the ion beam passes and a liquid metal mounted on the recess, the liquid metal being used for the liquid metal ion source. Preferably, the aperture may be minimized in area of aperture entrance hole inner surface which exposes the base material by tapering an aperture hole portion, by which the ion beam passes, on the downstream side.

公开(公告)号：US20070145302A1

公开(公告)日：2007-06-28

申请号：US11701415

申请日：2007-02-02

申请人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

发明人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

IPC分类号： H01J37/08

CPC分类号： G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A system for analyzing a semiconductor device, including: a first specimen fabricating apparatus including: a vacuum chamber in which a sample substrate is placed, an ion beam irradiating optical system for forming a specimen on the sample substrate, a specimen holder to mount the specimen, and a probe for removing the specimen from the sample substrate; a second specimen fabricating apparatus, and an analyzer to analyze the specimen, wherein said first specimen fabrication apparatus has a function to separate the specimen mounted on the specimen holder and the probe in a vacuum condition.

摘要翻译： 一种用于分析半导体器件的系统，包括：第一试样制造装置，包括：放置样品基板的真空室，用于在样品基板上形成试样的离子束照射光学系统，用于安装试样的试样保持器 以及用于从样品基板除去试样的探针; 第二试样制造装置和分析器，其中所述第一试样制造装置具有在真空条件下分离安装在试样架上的试样和探针的功能。

公开(公告)号：US20060054840A1

公开(公告)日：2006-03-16

申请号：US11205086

申请日：2005-08-17

申请人： Yuichi Madokoro ,  Shigeru Izawa ,  Kaoru Umemura ,  Hiroyasu Kaga

发明人： Yuichi Madokoro ,  Shigeru Izawa ,  Kaoru Umemura ,  Hiroyasu Kaga

IPC分类号： H01J37/08

CPC分类号： H01J37/09 ,  H01J2237/022 ,  H01J2237/0805 ,  H01J2237/3109

摘要： In an aperture for use in an ion beam optical system having its surface coated with a liquid metal, instability of an ion source attributable to sputtering and re-deposition of an aperture base material is prevented. A focused ion beam apparatus using a liquid metal ion source has an aperture for limiting an ion beam diameter. The aperture has a vessel formed with a recess having, at its surface lowermost point, an aperture hole through which the ion beam passes and a liquid metal mounted on the recess, the liquid metal being used for the liquid metal ion source. Preferably, the aperture may be minimized in area of aperture entrance hole inner surface which exposes the base material by tapering an aperture hole portion, by which the ion beam passes, on the downstream side.

摘要翻译： 在用于其表面涂覆有液态金属的离子束光学系统的孔中，防止归因于溅射的离子源的不稳定性和孔基材的再沉积。 使用液体金属离子源的聚焦离子束装置具有用于限制离子束直径的孔。 孔具有形成有凹槽的容器，凹槽在其表面的最低点处具有离子束通过的孔眼和安装在凹部上的液态金属，液态金属用于液体金属离子源。 优选地，孔径可以在孔径入口孔内表面的面积中最小化，孔面内表面通过使下游侧的离子束通过的孔眼部分变细而露出基底材料。

公开(公告)号：US06828566B2

公开(公告)日：2004-12-07

申请号：US10395237

申请日：2003-03-25

申请人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

发明人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

IPC分类号： H01J3720

CPC分类号： G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A specimen fabrication apparatus including a movable sample stage on which a specimen substrate is mounted, a probe connector for firmly joining a tip of a probe to a portion of the specimen substrate in a vicinity of an area on the specimen substrate to be observed in an observation apparatus, a micro-specimen separator for separating from the specimen substrate a micro-specimen to which the tip of the probe is firmly joined, the micro-specimen including the area on the specimen substrate to be observed and the portion of the specimen substrate to which the tip of the probe is firmly joined, a micro-specimen fixer for fixing the micro-specimen separated from the specimen substrate to a specimen holder of the observation apparatus, and a probe separator for separating the tip of the probe from the micro-specimen fixed to the specimen holder.

摘要翻译： 一种试样制造装置，包括：安装有试样基板的可动试样台;探针连接器，用于将探针的前端牢固地接合到试样基板的一部分附近，以在待观察的样品基板上的区域 观察装置，用于从试样基板分离与探针的前端牢固接合的微型试样的微量试样分离体，包括待观察的试样基板上的区域的微量试样和试样基板的一部分 探针的尖端牢固地接合到其上的微型试样固定器，用于将从试样基板分离的微量样品固定到观察装置的试样支架上的探针分离器和用于将探针的尖端从微型 固定在样品架上。

公开(公告)号：US5910871A

公开(公告)日：1999-06-08

申请号：US837218

申请日：1997-04-22

申请人： Yoshimi Kawanami ,  Hisashi Takano ,  Kaoru Umemura ,  Yuichi Madokoro ,  Satoshi Tomimatsu

发明人： Yoshimi Kawanami ,  Hisashi Takano ,  Kaoru Umemura ,  Yuichi Madokoro ,  Satoshi Tomimatsu

IPC分类号： G11B5/187 ,  G11B5/31 ,  G11B5/39 ,  G11B5/40 ,  G11B5/127

CPC分类号： G11B5/3967 ,  G11B5/1871 ,  G11B5/3106 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/40 ,  Y10S977/949

摘要： The track width of a magnetic head is specified by the interval between a pair of grooves in the slider surface that are formed by a projection ion beam. Specifically, the grooves are processed by projecting a mask having the pattern of the pair of grooves with a projection ion beam with reduction to a magnification of 1/10, for example. Although the peripheral strain of the pattern thus formed is large and the current distortion is not uniform when the projection ion beam batch irradiation area is limited, the increase in depth of the grooves formed at the periphery of the grooves does not affect the track narrowing process at the center portion of the projection ion beam since the strain thereof is negligibly small. As a result, a narrow track width is processed with high precision.

摘要翻译： 磁头的磁道宽度由滑块表面中由突出离子束形成的一对凹槽之间的间隔来确定。 具体地说，例如，通过将具有一对凹槽的图案的掩模用投影离子束投射到+ E，fra 1/10 + EE的放大倍数来进行处理。 虽然如此形成的图案的周边应变大，并且当投影离子束批量照射区域受限时电流变形不均匀，但是形成在凹槽周边的凹槽的深度增加不影响轨道变窄处理 由于其应变可忽略不计，所以在投影离子束的中心部分。 结果，以高精度处理窄轨道宽度。