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    Method and apparatus for specimen fabrication
    1.
    发明授权
    Method and apparatus for specimen fabrication 有权
    用于样品制造的方法和装置

    公开(公告)号：US08796651B2

    公开(公告)日：2014-08-05

    申请号：US12929396

    申请日：2011-01-20

    申请人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

    发明人： Hiroyasu Shichi ,  Tohru Ishitani ,  Hidemi Koike ,  Kaoru Umemura ,  Eiichi Seya ,  Mitsuo Tokuda ,  Satoshi Tomimatsu ,  Hideo Kashima ,  Muneyuki Fukuda

    IPC分类号： G21G5/00

    CPC分类号： G01N23/20 ,  B23K15/0006 ,  B23K15/0013 ,  G01N1/286 ,  H01J2237/3114 ,  H01J2237/31745

    摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

    摘要翻译： 相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段 垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。 一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品 通过转动样品台来控制切片。

    Charged particle beam device and sample observation method using a rotating detector
    2.
    发明授权
    Charged particle beam device and sample observation method using a rotating detector 有权
    使用旋转探测器的带电粒子束装置和样品观察方法

    公开(公告)号：US08791413B2

    公开(公告)日：2014-07-29

    申请号：US13817644

    申请日：2011-08-02

    申请人： Shinya Kitayama ,  Wataru Suzuki ,  Satoshi Tomimatsu

    发明人： Shinya Kitayama ,  Wataru Suzuki ,  Satoshi Tomimatsu

    IPC分类号： G01N23/00

    CPC分类号： H01J37/261 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/024 ,  H01J2237/184 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： Provided is a charged particle beam device that outputs both an ion beam and an electron beam at a sample, has a common detector for both the ion beam and the electron beam in the charged particle beam device that processes and observes the sample, and is able to provide a detection unit to an appropriate position corresponding to the process details and observation technique of the sample. Provided are an electron beam optical column in which an electron beam for observing the observation surface of a sample is generated, an ion beam optical column in which an ion beam that processes the sample is generated, a detection device that detects a secondary signal generated from the sample or transmitted electrons, and a sample stage that is capable of mounting the detection device thereon; is rotatable in a horizontal plane that includes the optical axis of the electron beam and the optical axis of the ion beam about a cross point where both optical axes intersect; and is able to change the distance between the observation surface of the sample and the cross point.

    摘要翻译： 提供了一种在样品输出离子束和电子束的带电粒子束装置，在处理和观察样品的带电粒子束装置中具有用于离子束和电子束两者的公共检测器，并且能够 以将检测单元提供到对应于样品的处理细节和观察技术的适当位置。 提供了一种电子束光学柱，其中产生用于观察样品观察表面的电子束，产生处理样品的离子束的离子束光学柱，检测装置，其检测从 样品或透射电子，以及能够在其上安装检测装置的样品台; 可以在包括电子束的光轴和离子束的光轴的水平面中绕两个光轴相交的交叉点旋转; 并且能够改变样品的观察表面与交叉点之间的距离。

    ELECTRON BEAM DEVICE AND ELECTRON BEAM APPLICATION DEVICE USING THE SAME
    4.
    发明申请
    ELECTRON BEAM DEVICE AND ELECTRON BEAM APPLICATION DEVICE USING THE SAME 有权
    电子束装置和使用其的电子束应用装置

    公开(公告)号：US20110240855A1

    公开(公告)日：2011-10-06

    申请号：US13133947

    申请日：2009-12-04

    申请人： Takashi Ohshima ,  Satoshi Tomimatsu

    发明人： Takashi Ohshima ,  Satoshi Tomimatsu

    IPC分类号： H01J9/02 ,  H01J19/02 ,  H01J37/073

    CPC分类号： H01J37/28 ,  H01J37/065 ,  H01J37/075 ,  H01J37/256 ,  H01J2237/06316

    摘要： To obtain a SEM capable of both providing high resolution at low acceleration voltage and allowing high-speed elemental distribution measurement, a SE electron source including Zr—O as a diffusion source is shaped so that the radius r of curvature of the tip is more than 0.5 μm and less than 1 μm, and the cone angle α of a conical portion at a portion in the vicinity of the tip at a distance of 3r to 8r from the tip, is more than 5° and less than (8/r)°. Another SE electron source uses Ba—O and includes a barium diffusion supply means composed of a sintered metal and a barium diffusion source containing barium oxide.

    摘要翻译： 为了获得能够在低加速电压下提供高分辨率并允许高速元素分布测量的SEM，包括Zr-O作为扩散源的SE电子源被成形为使得尖端的曲率半径r大于 0.5μm以上且小于1μm，顶端附近的3r〜8r的尖部附近的圆锥部的锥角α大于5°且小于（8 / r） °。 另一个SE电子源使用Ba-O，并且包括由烧结金属和含有氧化钡的钡扩散源组成的钡扩散供给装置。

    Apparatus for ion beam fabrication
    6.
    发明授权
    Apparatus for ion beam fabrication 有权
    离子束制造装置

    公开(公告)号：US07696496B2

    公开(公告)日：2010-04-13

    申请号：US12003207

    申请日：2007-12-20

    申请人： Satoshi Tomimatsu ,  Hiroyasu Shichi ,  Noriyuki Kaneoka ,  Kaoru Umemura ,  Koji Ishiguro

    发明人： Satoshi Tomimatsu ,  Hiroyasu Shichi ,  Noriyuki Kaneoka ,  Kaoru Umemura ,  Koji Ishiguro

    IPC分类号： H01J37/317

    CPC分类号： H01J37/3056 ,  H01J37/045 ,  H01J37/244 ,  H01J37/304 ,  H01J2237/24405 ,  H01J2237/24507 ,  H01J2237/24535 ,  H01J2237/24542 ,  H01J2237/30472

    摘要： The apparatus for ion beam fabrication, which has been able to detect any anomalous condition of ion beams only by means of the current irradiated on the specimen, could not compensate the failure by investigating the cause and could not realize stable processing. To solve the problem described above, the present invention includes the first and second blankers and Faraday cups switches ON and OFF the first and second blankers and monitors beam current at two positions above and below the projection mask. By adopting this configuration, it will be possible to acquire the information on failure in ion beam, sort out the cause of the failure and to compensate the failure while limiting damages to the projection mask. As a result, it will be possible to realize stable processing by means of ion beam, and to use the ion beam fabricating device on a stable basis.

    摘要翻译： 离子束制造装置只能通过照射在样本上的电流来检测离子束的任何异常状态，不能通过调查原因补偿故障，无法实现稳定的处理。 为了解决上述问题，本发明包括第一和第二消隐器和法拉第杯开关第一和第二消隐器的接通和断开，并监视在投影面罩上方和下方的两个位置处的电流。 通过采用这种配置，可以获取关于离子束故障的信息，整理故障原因并补偿故障，同时限制对投影面罩的损害。 结果，可以通过离子束实现稳定的处理，并且可以稳定地使用离子束制造装置。

    METHOD AND APPARATUS FOR SPECIMEN FABRICATION
    9.
    发明申请
    METHOD AND APPARATUS FOR SPECIMEN FABRICATION 有权
    方法和装置用于样本制造

    公开(公告)号：US20080296497A1

    公开(公告)日：2008-12-04

    申请号：US12168232

    申请日：2008-07-07

    申请人： Satoshi TOMIMATSU ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

    发明人： Satoshi TOMIMATSU ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

    IPC分类号： G01N23/00

    CPC分类号： G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： A system for analyzing a semiconductor device, including: a first ion beam apparatus including: a sample stage to mount a sample substrate; a vacuum chamber in which the sample stage is placed; an ion beam irradiating optical system to irradiate the sample substrate; a specimen holder that accommodates a plurality of specimens separated from the sample substrate by the irradiation of the ion beam; and a probe to extract the separated specimen from the sample substrate, and to transfer the separated specimen to the specimen holder; a second ion beam apparatus that carries out a finishing process to the specimen; and an analyzer to analyze the finished specimen, wherein the first ion beam apparatus separates the specimen and the probe in a vacuum condition.

    摘要翻译： 一种用于分析半导体器件的系统，包括：第一离子束装置，包括：样品台，用于安装样品基板; 其中放置样品台的真空室; 离子束照射光学系统照射样品基板; 样本保持器，其容纳通过离子束的照射与样品基板分离的多个样本; 以及从所述样品基材中提取分离出的试样并将分离的试样转移到所述试样保持器的探针。 对样品进行精加工的第二离子束装置; 以及用于分析成品样品的分析器，其中所述第一离子束装置在真空条件下分离所述样品和所述探针。