ORGANIC INTERPOSERS FOR INTEGRATED CIRCUIT PACKAGES

    公开(公告)号:US20210082822A1

    公开(公告)日:2021-03-18

    申请号:US16573943

    申请日:2019-09-17

    Abstract: An electronic interposer may be formed comprising an upper section, a lower section and a middle section. The upper section and the lower section may each have between two and four layers, wherein each layer comprises an organic material layer and at least one conductive route comprising at least one conductive trace and at least one conductive via. The middle section may be formed between the upper section and the lower section, wherein the middle section comprises up to eight layers, wherein each layer comprises an organic material and at least one conductive route comprising at least one conductive trace and at least one conductive via, and wherein a thickness of each layer of the middle section is thinner than a thickness of any of the layers of the upper section and thinner than a thickness of any of the layers of the lower section.

    REDUCED DISPERSION DIELECTRIC WAVEGUIDES
    44.
    发明申请

    公开(公告)号:US20190356033A1

    公开(公告)日:2019-11-21

    申请号:US16014036

    申请日:2018-06-21

    Abstract: Disclosed herein are various designs for dielectric waveguides, as well as methods of manufacturing such waveguides. One type of dielectric waveguides described herein includes waveguides with one or more cavities in the dielectric waveguide material. Another type of dielectric waveguides described herein includes waveguides with a conductive ridge in the dielectric waveguide material. Dielectric waveguides described herein may be dispersion reduced dielectric waveguides, compared to conventional dielectric waveguides, and may be designed to adjust the difference in the group delay between the lower frequencies and the higher frequencies of a chosen bandwidth.

    Zero-misalignment via-pad structures

    公开(公告)号:US10187998B2

    公开(公告)日:2019-01-22

    申请号:US15621403

    申请日:2017-06-13

    Abstract: A photoresist is deposited on a seed layer on a substrate. A first region of the photoresist is removed to expose a first portion of the seed layer to form a via-pad structure. A first conductive layer is deposited onto the first portion of the seed layer. A second region of the photoresist adjacent to the first region is removed to expose a second portion of the seed layer to form a line. A second conductive layer is deposited onto the first conductive layer and the second portion of the seed layer.

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