公开(公告)号：US20230098594A1

公开(公告)日：2023-03-30

申请号：US17484949

申请日：2021-09-24

Applicant: Intel Corporation

Inventor： Chia-Ching LIN ,  Kaan OGUZ ,  Sou-Chi CHANG ,  Arnab SEN GUPTA ,  I-Cheng TUNG ,  Ian A. YOUNG ,  Matthew V. METZ ,  Uygar E. AVCI ,  Sudarat LEE

IPC: H01G4/30 ,  H01L49/02 ,  H01G4/08 ,  H01G4/35

Abstract: Embodiments described herein may be related to apparatuses, processes, and techniques related MIM capacitors that have a multiple trench structure to increase a charge density, where a dielectric of the MIM capacitor includes a perovskite-based material. In embodiments, a first electrically conductive layer may be coupled with a top metal layer of the MIM, and/or a second conductive layer may be coupled with a bottom metal layer of the MIM to reduce RC effects. Other embodiments may be described and/or claimed.

公开(公告)号：US20230090093A1

公开(公告)日：2023-03-23

申请号：US17479769

申请日：2021-09-20

Applicant: Intel Corporation

Inventor： Ashish Verma PENUMATCHA ,  Uygar E. AVCI ,  Chelsey DOROW ,  Tanay GOSAVI ,  Chia-Ching LIN ,  Carl NAYLOR ,  Nazila HARATIPOUR ,  Kevin P. O'BRIEN ,  Seung Hoon SUNG ,  Ian A. YOUNG ,  Urusa ALAAN

IPC: H01L29/423 ,  H01L29/10 ,  H01L29/08

Abstract: Thin film transistors having semiconductor structures integrated with two-dimensional (2D) channel materials are described. In an example, an integrated circuit structure includes a two-dimensional (2D) material layer above a substrate. A gate stack is above the 2D material layer, the gate stack having a first side opposite a second side. A semiconductor structure including germanium is included, the semiconductor structure laterally adjacent to and in contact with the 2D material layer adjacent the first side of the gate stack. A first conductive structure is adjacent the first side of the second gate stack, the first conductive structure over and in direct electrical contact with the semiconductor structure. The semiconductor structure is intervening between the first conductive structure and the 2D material layer. A second conductive structure is adjacent the second side of the second gate stack, the second conductive structure over and in direct electrical contact with the 2D material layer.

公开(公告)号：US20220199519A1

公开(公告)日：2022-06-23

申请号：US17129854

申请日：2020-12-21

Applicant: Intel Corporation

Inventor： Chia-Ching LIN ,  Sou-Chi CHANG ,  Kaan OGUZ ,  I-Cheng TUNG ,  Arnab SEN GUPTA ,  Ian A. YOUNG ,  Uygar E. AVCI ,  Matthew V. METZ ,  Ashish Verma PENUMATCHA ,  Anandi ROY

IPC: H01L23/522 ,  H01L49/02

Abstract: Metal insulator metal capacitors are described. In an example, a metal-insulator-metal (MIM) capacitor includes a first electrode plate, and a first capacitor dielectric on the first electrode plate. The first capacitor dielectric is or includes a perovskite high-k dielectric material. A second electrode plate is on the first capacitor dielectric and has a portion over and parallel with the first electrode plate, and a second capacitor dielectric is on the second electrode plate. A third electrode plate is on the second capacitor dielectric and has a portion over and parallel with the second electrode plate.

公开(公告)号：US20200321446A1

公开(公告)日：2020-10-08

申请号：US16635739

申请日：2017-09-28

Applicant: Intel Corporation

Inventor： Seiyon KIM ,  Uygar E. AVCI ,  Joshua M. HOWARD ,  Ian A. YOUNG ,  Daniel H. MORRIS

IPC: H01L29/66 ,  H01L29/51

Abstract: Field effect transistors having a ferroelectric or antiferroelectric gate dielectric structure are described. In an example, an integrated circuit structure includes a semiconductor channel structure includes a monocrystalline material. A gate dielectric is over the semiconductor channel structure. The gate dielectric includes a ferroelectric or antiferroelectric polycrystalline material layer. A gate electrode has a conductive layer on the ferroelectric or antiferroelectric polycrystalline material layer, the conductive layer including a metal. A first source or drain structure is at a first side of the gate electrode. A second source or drain structure is at a second side

公开(公告)号：US20200312971A1

公开(公告)日：2020-10-01

申请号：US16369517

申请日：2019-03-29

Applicant: Intel Corporation

Inventor： Ashish PENUMATCHA ,  Seung Hoon SUNG ,  Scott CLENDENNING ,  Uygar AVCI ,  Ian A. YOUNG ,  Jack T. KAVALIEROS

IPC: H01L29/423 ,  H01L29/78 ,  H01L29/66

Abstract: Embodiments herein describe techniques for a semiconductor device including a substrate and a FinFET transistor on the substrate. The FinFET transistor includes a fin structure having a channel area, a source area, and a drain area. The FinFET transistor further includes a gate dielectric area between spacers above the channel area of the fin structure and below a top surface of the spacers; spacers above the fin structure and around the gate dielectric area; and a metal gate conformally covering and in direct contact with sidewalls of the spacers. The gate dielectric area has a curved surface. The metal gate is in direct contact with the curved surface of the gate dielectric area. Other embodiments may be described and/or claimed.

公开(公告)号：US20200233923A1

公开(公告)日：2020-07-23

申请号：US16839013

申请日：2020-04-02

Applicant: Intel Corporation

Inventor： Phil KNAG ,  Gregory K. CHEN ,  Raghavan KUMAR ,  Huseyin Ekin SUMBUL ,  Abhishek SHARMA ,  Sasikanth MANIPATRUNI ,  Amrita MATHURIYA ,  Ram KRISHNAMURTHY ,  Ian A. YOUNG

IPC: G06F17/16 ,  G06N3/063 ,  G11C8/08 ,  G11C7/12 ,  G11C7/10 ,  G06F9/30 ,  G11C11/56 ,  G11C11/418 ,  G11C11/419

Abstract: A binary CIM circuit enables all memory cells in a memory array to be effectively accessible simultaneously for computation using fixed pulse widths on the wordlines and equal capacitance on the bitlines. The fixed pulse widths and equal capacitance ensure that a minimum voltage drop in the bitline represents one least significant bit (LSB) so that the bitline voltage swing remains safely within the maximum allowable range. The binary CIM circuit maximizes the effective memory bandwidth of a memory array for a given maximum voltage range of bitline voltage.

公开(公告)号：US20200098826A1

公开(公告)日：2020-03-26

申请号：US16141025

申请日：2018-09-25

Applicant: Intel Corporation

Inventor： Abhishek SHARMA ,  Gregory CHEN ,  Phil KNAG ,  Ram KRISHNAMURTHY ,  Raghavan KUMAR ,  Sasikanth MANIPATRUNI ,  Amrita MATHURIYA ,  Huseyin SUMBUL ,  Ian A. YOUNG

IPC: H01L27/24 ,  H01L29/78 ,  H01L45/00 ,  H01L29/66

Abstract: Embodiments herein describe techniques for a semiconductor device including a RRAM memory cell. The RRAM memory cell includes a FinFET transistor and a RRAM storage cell. The FinFET transistor includes a fin structure on a substrate, where the fin structure includes a channel region, a source region, and a drain region. An epitaxial layer is around the source region or the drain region. A RRAM storage stack is wrapped around a surface of the epitaxial layer. The RRAM storage stack includes a resistive switching material layer in contact and wrapped around the surface of the epitaxial layer, and a contact electrode in contact and wrapped around a surface of the resistive switching material layer. The epitaxial layer, the resistive switching material layer, and the contact electrode form a RRAM storage cell. Other embodiments may be described and/or claimed.

公开(公告)号：US20200006651A1

公开(公告)日：2020-01-02

申请号：US16022685

申请日：2018-06-28

Applicant: Intel Corporation

Inventor： Daniel H. MORRIS ,  Uygar E. AVCI ,  Ian A. YOUNG

IPC: H01L45/00 ,  H01L23/528 ,  H03K19/0175 ,  H01L27/24

Abstract: A routing structure is disclosed. A first wiring line coupled to a programming access device and a routing block driver and receiver enabling device and a second wiring line coupled to a programming access device and a routing block driver and receiver enabling device. An insulator-metal-transistor device that includes a top electrode, a middle electrode and a bottom electrode, coupled at the intersection of the first wiring line and the second wiring line.

公开(公告)号：US20190259935A1

公开(公告)日：2019-08-22

申请号：US16346872

申请日：2016-12-23

Applicant: Intel Corporation

Inventor： Jasmeet S. CHAWLA ,  Sasikanth MANIPATRUNI ,  Robert L. BRISTOL ,  Chia-Ching LIN ,  Dmitri E. NIKONOV ,  Ian A. YOUNG

IPC: H01L43/02 ,  H01L43/10 ,  H01L43/12

Abstract: Magneto-electric spin orbital (MESO) structures having functional oxide vias, and method of fabricating magneto-electric spin orbital (MESO) structures having functional oxide vias, are described. In an example, a magneto-electric spin orbital (MESO) device includes a source region and a drain region in or above a substrate. A first via contact is on the source region. A second via contact is on the drain region, the second via contact laterally adjacent to the first via contact. A plurality of alternating ferromagnetic material lines and non-ferromagnetic conductive lines is above the first and second via contacts. A first of the ferromagnetic material lines is on the first via contact, and a second of the ferromagnetic material lines is on the second via contact. A spin orbit coupling (SOC) via is on the first of the ferromagnetic material lines. A functional oxide via is on the second of the ferromagnetic material lines.

公开(公告)号：US20190042928A1

公开(公告)日：2019-02-07

申请号：US16147109

申请日：2018-09-28

Applicant: Intel Corporation

Inventor： Ian A. YOUNG ,  Ram KRISHNAMURTHY ,  Sasikanth MANIPATRUNI ,  Gregory K. CHEN ,  Amrita MATHURIYA ,  Abhishek SHARMA ,  Raghavan KUMAR ,  Phil KNAG ,  Huseyin Ekin SUMBUL

IPC: G06N3/063 ,  H03M7/30 ,  G11C5/06 ,  G11C11/419

Abstract: An apparatus is described. The apparatus includes a compute in memory circuit. The compute in memory circuit includes a memory circuit and an encoder. The memory circuit is to provide 2m voltage levels on a read data line where m is greater than 1. The memory circuit includes storage cells sufficient to store a number of bits n where n is greater than m. The encoder is to receive an m bit input and convert the m bit input into an n bit word that is to be stored in the memory circuit, where, the m bit to n bit encoding performed by the encoder creates greater separation between those of the voltage levels that demonstrate wider voltage distributions on the read data line than others of the voltage levels.