FERROELECTRIC TRANSISTORS TO STORE MULTIPLE STATES OF RESISTANCES FOR MEMORY CELLS

    公开(公告)号:US20200212224A1

    公开(公告)日:2020-07-02

    申请号:US16232615

    申请日:2018-12-26

    申请人: Intel Corporation

    摘要: Embodiments herein describe techniques for a semiconductor device including a gate stack with a ferroelectric-oxide layer above a channel layer and in contact with the channel layer, and a top electrode above the ferroelectric-oxide layer. The ferroelectric-oxide layer includes a domain wall between an area under a nucleation point of the top electrode and above a separation line of the channel layer between an ON state portion and an OFF state portion of the channel layer. A resistance between a source electrode and a drain electrode is modulated in a range between a first resistance value and a second resistance value, dependent on a position of the domain wall within the ferroelectric-oxide layer, a position of the ON state portion of the channel layer, and a position of the OFF state portion of the channel layer. Other embodiments may be described and/or claimed.

    POLARIZATION GATE STACK SRAM
    46.
    发明申请

    公开(公告)号:US20200118616A1

    公开(公告)日:2020-04-16

    申请号:US16732951

    申请日:2020-01-02

    申请人: Intel Corporation

    摘要: One embodiment provides an apparatus. The apparatus includes a first inverter comprising a first pull up transistor and a first pull down transistor; a second inverter cross coupled to the first inverter, the second inverter comprising a second pull up transistor and a second pull down transistor; a first access transistor coupled to the first inverter; and a second access transistor coupled to the second inverter. A gate electrode of one transistor of each inverter comprises a polarization layer.