公开(公告)号：US20050194548A1

公开(公告)日：2005-09-08

申请号：US10792053

申请日：2004-03-02

Applicant: David Quach ,  Jun Zhao

Inventor： David Quach ,  Jun Zhao

IPC: H01J37/30

CPC classification number: H01J37/317 ,  H01J37/20 ,  H01J2237/2001 ,  H01J2237/316 ,  H01J2237/3165 ,  H01L21/67115

Abstract: One embodiment of the present invention is an electron beam treatment apparatus that includes: (a) an array of lamps that output radiation; (b) a support mechanism adapted to support a substrate at a treatment position above the lamps; and (c) a lamp heat shield, disposed above the array, having a radiation absorption portion adapted to absorb radiation from at least a portion of the array, and a radiation reflection portion adapted to reflect radiation from at least a portion of the array towards the substrate when disposed at the treatment position.

Abstract translation: 本发明的一个实施例是一种电子束处理装置，其包括：（a）输出辐射的灯阵列; （b）适于在灯上方的处理位置处支撑衬底的支撑机构; 和（c）设置在阵列上方的灯泡屏蔽罩，具有适于吸收来自该阵列的至少一部分的辐射的辐射吸收部分，以及适于将来自阵列的至少一部分的辐射反射到 该基板设置在处理位置时。

公开(公告)号：US06937591B2

公开(公告)日：2005-08-30

申请号：US10377451

申请日：2003-02-27

Applicant: Zihua Guo ,  Wenwu Zhu ,  Qian Zhang ,  Jun Zhao

Inventor： Zihua Guo ,  Wenwu Zhu ,  Qian Zhang ,  Jun Zhao

IPC: H04L12/28 ,  H04L12/56 ,  H04W28/18 ,  H04W28/24 ,  H04W74/00 ,  H04W74/08 ,  H04Q7/24

CPC classification number: H04W74/0816 ,  H04W28/18 ,  H04W28/24 ,  H04W74/006 ,  H04W74/0833

Abstract: A method provides differentiated quality of service (QoS) by providing adaptive updates to media access control (MAC) layer parameters on a distributed basis. The method includes calculating a failure probability for a transmission over the network, determining a target value for determining a contention window according to a mapped function of the failure probability, and altering the contention window according to a scaling function of the target value. The mapped function and the scaling can provide QoS differentiation. A wireless device ensures fairness in a wireless time slotted network and includes a network interface card (NIC), a network driver interface, a network monitor, a statistics engine, and an adaptive parameter engine for determining a target value for determining a contention window according to a mapped function of the one or more probabilities to enable an alteration of the contention window and provide new parameters for the MAC layer.

Abstract translation: 一种方法通过在分布式的基础上提供媒体访问控制（MAC）层参数的适应性更新来提供差异化​​的服务质量（QoS）。 该方法包括：计算网络传输的故障概率，根据故障概率的映射函数确定确定竞争窗口的目标值，并根据目标值的缩放函数改变争用窗口。 映射函数和缩放可以提供QoS差异化。 无线设备确保在无线时隙网络中的公平性，并且包括网络接口卡（NIC），网络驱动器接口，网络监视器，统计引擎和用于确定用于确定争用窗口的目标值的自适应参数引擎， 涉及一个或多个概率的映射函数，以便能够改变争用窗口并为MAC层提供新的参数。

公开(公告)号：US20050128476A1

公开(公告)日：2005-06-16

申请号：US10737459

申请日：2003-12-16

Applicant: Jun Zhao

Inventor： Jun Zhao

IPC: G01J3/44 ,  G01N21/65

CPC classification number: G01N21/65 ,  G01J3/0291 ,  G01J3/44 ,  G01N2021/656

Abstract: A compact spectroscope is sufficiently lightweight for use in combination with a microscope for analyzing samples using Raman analytical techniques. The Raman spectroscope includes a housing detachably mountable to the microscope. The housing contains at least one source of radiation. One or more filters are positioned at desired angles across the beam path provided by the source of radiation. The spectroscope includes a variety of components operatively connected to source of radiation capable of providing one or more Raman beams, as well as a variety of components for processing beam constituents for microscope analysis. A fiber optic probe is provided for examining large samples or samples at remote sites. A computer or other electronic reader may also be attached to the Raman spectroscope for viewing analytical data.

Abstract translation: 紧凑的分光镜足够轻便，与显微镜组合使用，用于使用拉曼分析技术分析样品。 拉曼光谱仪包括可拆卸地安装到显微镜的壳体。 外壳至少包含一个辐射源。 一个或多个过滤器以由辐射源提供的光束路径的期望角度定位。 分光镜包括可操作地连接到能够提供一个或多个拉曼光束的辐射源的各种部件，以及用于处理用于显微镜分析的光束成分的各种部件。 提供光纤探头，用于检查远端位置的大样本或样本。 计算机或其他电子阅读器也可以连接到拉曼光谱仪上，以便观察分析数据。

公开(公告)号：US06586656B2

公开(公告)日：2003-07-01

申请号：US09838556

申请日：2001-04-18

Applicant: Lisa McLonlogue ,  Jun Zhao ,  Sukanto Sinha

Inventor： Lisa McLonlogue ,  Jun Zhao ,  Sukanto Sinha

IPC: G01N3300

CPC classification number: C12N15/8509 ,  A01K67/0275 ,  A01K67/0278 ,  A01K2207/15 ,  A01K2217/00 ,  A01K2217/05 ,  A01K2217/075 ,  A01K2227/105 ,  A01K2267/0312 ,  A01K2267/0318 ,  A01K2267/0356 ,  A01K2267/0393 ,  C07K14/4711 ,  C07K16/18 ,  C12N2830/008 ,  G01N2800/2821

Abstract: The invention provides transgenic non-human animals and transgenic non-human mammalian cells harboring a transgene encoding an APP polypeptide comprising the Swedish mutation.

Abstract translation: 本发明提供了转基因非人动物和含有编码包含瑞典突变的APP多肽的转基因的转基因非人哺乳动物细胞。

公开(公告)号：US06518981B2

公开(公告)日：2003-02-11

申请号：US08969058

申请日：1997-11-12

Applicant: Jun Zhao ,  Timothy L. Kohler ,  Jonathan Hui

Inventor： Jun Zhao ,  Timothy L. Kohler ,  Jonathan Hui

IPC: G09G500

CPC classification number: H04N1/644

Abstract: To generate a color palette having m colors (such as 28=256 colors) from a color image described in a color space, pixel image data corresponding to the color image is first obtained. A frequency of occurrence for each color in the pixel image data is then determined. Each color in the pixel image data is assigned to one of a predetermined number of cells into which the color space has been partitioned, the predetermined number being not greater than m. The most commonly occurring color is selected in each cell in which a color exists, so as to obtain n palette colors. A vote value is calculated for each unselected color, the vote value being based at least in part on the frequency of occurrence of the color in the pixel image and a weighting factor based on a rank of the color in its corresponding cell, the unselected colors being the colors not selected in the first selecting step. Thereafter, m-n colors are selected as the unselected colors with the highest vote values. Also, input colors in a color image described in a color space are mapped to a reduced palette of m colors derived by partitioning the color space into a predetermined number of cells, there being at least one palette color in each cell that includes an input color. The mapping is performed by determining in which cell each input color lies, and mapping each input color to the closest palette color from among all palette colors in the cell identified for that input color.

Abstract translation: 为了从颜色空间中描述的彩色图像生成具有m种颜色（诸如28 = 256色）的调色板，首先获得与彩色图像对应的像素图像数据。 然后确定像素图像数据中的每种颜色的出现频率。 像素图像数据中的每种颜色被分配给已经划分色彩空间的预定数量的单元中的一个，预定数量不大于m。 在存在颜色的每个单元格中选择最常见的颜色，以获得n个调色板颜色。 对于每个未选择的颜色计算投票值，投票值至少部分地基于像素图像中的颜色的出现频率和基于其对应单元格中的颜色的等级的加权因子，未选择的颜色 是在第一选择步骤中未选择的颜色。 此后，选择m-n种颜色作为具有最高投票值的未选择的颜色。 此外，在颜色空间中描述的彩色图像中的输入颜色被映射到通过将颜色空间分割成预定数量的单元而导出的m种颜色的调色板，每个单元中至少有一个调色板颜色，其包括输入颜色 。 通过确定每个输入颜色位于哪个单元中，并且将每个输入颜色映射到针对该输入颜色标识的单元格中的所有调色板颜色中，来执行该映射。

公开(公告)号：US06464782B1

公开(公告)日：2002-10-15

申请号：US08652194

申请日：1996-05-23

Applicant: Visweswaren Sivaramakrishnam ,  Hiroshi Nishizato ,  Jun Zhao ,  Ichiro Yokoyama

Inventor： Visweswaren Sivaramakrishnam ,  Hiroshi Nishizato ,  Jun Zhao ,  Ichiro Yokoyama

IPC: C30B2516

CPC classification number: C23C16/401 ,  C23C16/448 ,  Y10S438/935 ,  Y10T117/1008

Abstract: A process and apparatus is described for the processing of thin films on semiconductor substrates using one or more liquid precursor sources wherein the liquid precursor source with the highest vapor pressure is first vaporized and then introduced as a vapor into a common manifold connected to a processing chamber, with the point of introduction being spaced away from the processing chamber. A second liquid precursor source, having a vapor pressure lower than the first liquid precursor source, is then introduced in vaporized form into the manifold at a point closer to the processing chamber. This is repeated for each liquid precursor source, with each succeeding liquid precursor source having the next lower vapor pressure being introduced in vaporized form into the manifold at a point closer to the processing chamber than the previous liquid precursor source. A temperature gradient may then be maintained along the manifold with the temperature gradually increased in a direction toward the processing chamber while still mitigating premature boiling of the liquid precursor sources prior to vaporization, or condensation of already vaporized liquid precursor sources or components.

Abstract translation: 描述了一种用于使用一种或多种液体前体源在半导体衬底上处理薄膜的工艺和装置，其中首先蒸发具有最高蒸气压的液体前体源，然后作为蒸汽引入连接到处理室的公共歧管 导入点与处理室间隔开。 然后，具有低于第一液体前体源的蒸气压的第二液体前驱体源在更靠近处理室的点处以蒸发形式引入歧管。 对于每个液体前体源重复这一操作，其中每个随后的液体前体源具有下一个更低的蒸气压，以比先前的液体前体源更接近处理室的点以蒸发形式引入歧管。 然后可以沿着歧管保持温度梯度，其中温度在朝向处理室的方向上逐渐增加，同时在蒸发之前仍然减轻液体前体源的过早沸腾，或已经蒸发的液体前体源或组分的冷凝。

公开(公告)号：US06179924B2

公开(公告)日：2001-01-30

申请号：US09067618

申请日：1998-04-28

Applicant: Jun Zhao ,  Talex Sajoto ,  Leonid Selyutin

Inventor： Jun Zhao ,  Talex Sajoto ,  Leonid Selyutin

IPC: C23C1646

CPC classification number: C23C16/45521 ,  C23C16/14 ,  C23C16/4586 ,  C23C16/46 ,  C23C16/52 ,  H01L21/67109

Abstract: The present invention provides a simplified heater design that is scaleable for equipment processing different diameter substrates and that can efficiently and economically process substrates to meet stringent film requirements such as film uniformity for fabricating high integration devices. The present invention is particularly useful for economically and efficiently producing integrated devices using increasingly larger diameter substrates, such as 12-inch (or 300-mm) diameter and even larger substrates. According to one embodiment, the present invention provides a heater assembly for use in a substrate processing apparatus. The heater assembly includes a metal pedestal including a surface for supporting a substrate, and a resistive heating element disposed in the metal pedestal. The heater assembly also includes a purge gas channel system disposed in the metal pedestal. The purge gas channel system includes a central purge gas inlet located substantially at a center of the metal pedestal. The central purge gas inlet is for providing a purge gas. The purge gas channel system also includes multiple radial purge gas channels radiating from the central purge gas inlet out toward a perimeter of the metal pedestal, and an annular purge gas channel formed in the metal pedestal at the perimeter. The purge gas channels form a substantially symmetric pattern, and each of the purge gas channels are substantially the same length. In a specific embodiment, the assembly includes an annular purge gas channel coupled to the surface via multiple holes near the perimeter to provide a purge guide ring integral to the metal pedestal. Other embodiments of the present invention are also provided.

Abstract translation: 本发明提供了一种简化的加热器设计，其可用于设备处理不同直径的基底并且可以有效地和经济地处理基底以满足严格的膜要求，例如用于制造高集成器件的膜均匀性。 本发明对于经济地和有效地生产使用越来越大直径的基底（例如12英寸（或300mm）直径和甚至更大的基底）的集成装置特别有用。 根据一个实施例，本发明提供一种用于基板处理装置的加热器组件。 加热器组件包括金属基座，其包括用于支撑基板的表面和设置在金属基座中的电阻加热元件。 加热器组件还包括设置在金属基座中的吹扫气体通道系统。 吹扫气体通道系统包括基本上位于金属基座的中心处的中央吹扫气体入口。 中央吹扫气体入口用于提供净化气体。 吹扫气体通道系统还包括从中央吹扫气体入口向金属基座的周边辐射的多个径向吹扫气体通道，以及形成在金属基座周边的环形吹扫气体通道。 吹扫气体通道形成基本上对称的图案，并且每个吹扫气体通道基本上是相同的长度。 在具体实施例中，组件包括通过靠近周边的多个孔耦合到表面的环形吹扫气体通道，以提供与金属基座一体的清洗引导环。 还提供了本发明的其它实施例。

公开(公告)号：US6141095A

公开(公告)日：2000-10-31

申请号：US313905

申请日：1999-05-18

Applicant: Fritz Schreyer Allen ,  Jun Zhao ,  Danny S. Butterfield

Inventor： Fritz Schreyer Allen ,  Jun Zhao ,  Danny S. Butterfield

IPC: G01J3/28 ,  G01J3/44 ,  G01N21/65

CPC classification number: G01J3/44 ,  G01J3/28 ,  G01N21/65

Abstract: An apparatus for measuring and applying instrumentation correction to produce a standard Raman spectrum of a sample to be analyzed. A source of incident radiation is included. Also included are means for providing from the incident radiation an incident beam and a monitor beam. The incident beam is directed at the sample. The invention includes means for generating from the sample a Raman beam. Spectral data may be collected directly from the monitor beam and the Raman beam. Spectral data may be collected substantially simultaneously from the monitor beam and the Raman beam, or sequentially. One or more integral transforms are applied to spectral data to produce the standard Raman spectrum of the sample.

Abstract translation: 一种用于测量和应用仪器校正以产生待分析样品的标准拉曼光谱的装置。 包括入射辐射源。 还包括用于从入射辐射提供入射光束和监视光束的装置。 入射光束指向样品。 本发明包括用于从样品生成拉曼光束的装置。 光谱数据可以直接从监视光束和拉曼光束中收集。 光谱数据可以从监视光束和拉曼光束基本上同时收集，或者顺序地收集。 将一个或多个积分变换应用于光谱数据以产生样品的标准拉曼光谱。

公开(公告)号：US06099651A

公开(公告)日：2000-08-08

申请号：US52765

申请日：1998-03-31

Applicant: Talex Sajoto ,  Jun Zhao ,  Charles Dornfest ,  Leonid Selyutin

Inventor： Talex Sajoto ,  Jun Zhao ,  Charles Dornfest ,  Leonid Selyutin

IPC: C23C16/52 ,  C23C16/44 ,  C23C16/448 ,  C23C16/455 ,  H01L21/00 ,  H01L21/31 ,  C23C16/00

CPC classification number: C23C16/4409 ,  C23C16/4401 ,  C23C16/4412 ,  C23C16/4481 ,  C23C16/45561 ,  C23C16/4557 ,  H01L21/67017 ,  H01L21/6715 ,  Y10S261/65

Abstract: The invention relates to an apparatus and process for the vaporization of liquid precursors and deposition of a film on a suitable substrate. Particularly contemplated is an apparatus and process for the deposition of a metal-oxide film, such as a barium, strontium, titanium oxide (BST) film, on a silicon wafer to make integrated circuit capacitors useful in high capacity dynamic memory modules.

Abstract translation: 本发明涉及一种用于蒸发液体前体并将膜沉积在合适基底上的装置和方法。 特别考虑的是用于在硅晶片上沉积诸如钡，锶，氧化钛（BST）膜的金属氧化物膜的装置和方法，以使集成电路电容器用于高容量动态存储器模块。

公开(公告)号：US6066209A

公开(公告)日：2000-05-23

申请号：US52743

申请日：1998-03-31

Applicant: Talex Sajoto ,  Jun Zhao ,  Vincent Ku ,  Charles Dornfest

Inventor： Talex Sajoto ,  Jun Zhao ,  Vincent Ku ,  Charles Dornfest

IPC: C23C16/52 ,  C23C16/44 ,  C23C16/448 ,  C23C16/455 ,  H01L21/00 ,  H01L21/31 ,  C23C16/00

CPC classification number: C23C16/4409 ,  C23C16/4401 ,  C23C16/4412 ,  C23C16/4481 ,  C23C16/45561 ,  C23C16/4557 ,  H01L21/67017 ,  H01L21/6715 ,  Y10S261/65

Abstract: The invention relates to an apparatus and process for filtering deposition gases in a substrate processing system. Particularly contemplated is an apparatus and process for the filtering deposition gases of a metal-oxide film deposited on a silicon wafer to make integrated circuits. In one embodiment, the invention provides an apparatus for filtering a fluid in a semiconductor processing system, comprising a housing and a filtering member disposable in the housing, the filtering member comprising a base portion and a filtering portion having an inlet and an outlet and a plurality of temperature controlled fluid passages formed between the inlet and the outlet, the passages having a length longer than a width across the passages.

Abstract translation: 本发明涉及一种用于在基板处理系统中过滤沉积气体的装置和方法。 特别考虑的是用于过滤沉积在硅晶片上的金属氧化物膜的沉积气体以制造集成电路的装置和方法。 在一个实施例中，本发明提供了一种用于对半导体处理系统中的流体进行过滤的装置，包括壳体和一次性在壳体中的过滤构件，过滤构件包括基部和具有入口和出口的过滤部分， 多个温度控制的流体通道形成在入口和出口之间，通道的长度大于通道两端的宽度。