公开(公告)号：US07674847B2

公开(公告)日：2010-03-09

申请号：US10782547

申请日：2004-02-19

申请人： Larry F. Rhodes ,  Dennis A. Barnes ,  Andrew Bell ,  Brian K. Bennet ,  Chung Chang ,  John-Henry Lipian ,  Xiaoming Wu

发明人： Larry F. Rhodes ,  Dennis A. Barnes ,  Andrew Bell ,  Brian K. Bennet ,  Chung Chang ,  John-Henry Lipian ,  Xiaoming Wu

IPC分类号： C08F4/44

CPC分类号： C08F2/38 ,  C08F232/00 ,  C08F232/08 ,  Y10S526/905

摘要： A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.

摘要翻译： 聚合聚（环状）烯烃单体的方法包括（a）将含有聚（环状）烯烃单体，非烯烃链转移剂和活化剂化合物的单体组合物混合以形成混合物; （b）加热混合物; 和（c）加入含有Ni和/或Pd的聚合催化剂。 非烯烃链转移剂包括一种或多种选自H 2，烷基硅烷，烷基烷氧基硅烷，烷基锗烷，烷基烷氧基锗烷，烷基锡烷和烷基烷氧基烷烃的化合物。 活化剂的特征在于具有pKa至少为5的活性氢。所得聚（环状）烯烃聚合物可用于光致抗蚀剂组合物中。

公开(公告)号：US07612146B2

公开(公告)日：2009-11-03

申请号：US11220814

申请日：2005-09-07

申请人： Larry F. Rhodes ,  Richard Vicari ,  Leah J. Langsdorf ,  Andrew A. Sobek ,  Edwin P. Boyd ,  Brian Bennett

发明人： Larry F. Rhodes ,  Richard Vicari ,  Leah J. Langsdorf ,  Andrew A. Sobek ,  Edwin P. Boyd ,  Brian Bennett

IPC分类号： C08F8/42

CPC分类号： C08G61/06 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397

摘要： The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.

摘要翻译： 本发明涉及多环聚合物，多环聚合物的制备方法及其在制造集成电路中用作光致抗蚀剂的方法。 在一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体的聚合形成的光致抗蚀剂组合物。 在另一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体与至少一种非卤化多环单体的共聚合形成的光致抗蚀剂组合物。

公开(公告)号：US20090270247A1

公开(公告)日：2009-10-29

申请号：US12428936

申请日：2009-04-23

申请人： Larry F. Rhodes ,  Luis Francisco Martin ,  Andrew Bell

发明人： Larry F. Rhodes ,  Luis Francisco Martin ,  Andrew Bell

IPC分类号： B01J31/12

CPC分类号： C08F4/70 ,  C08F4/7037 ,  C08F232/08 ,  C08F2410/03

摘要： Embodiments in accordance with the present invention encompass methods of forming in situ olefin polymerization catalyst systems, catalysts encompassed by such systems and polymers made using such systems. For such in situ olefin polymerization catalyst systems, a hydrocarbyl magnesium halide is generally contacted with a halohydrocarbyl compound to form a halohydrocarbyl Grignard and such Grignard is generally contacted with a Group 10 metal compound to form an olefin polymerization catalyst which is contacted with one or more olefin monomers to form a polymer therefrom.

摘要翻译： 根据本发明的实施方案包括形成原位烯烃聚合催化剂体系，由这种体系包含的催化剂和使用这种体系制备的聚合物的方法。 对于这样的原位烯烃聚合催化剂体系，烃基卤化镁通常与卤代烃基化合物接触以形成卤代烃基格氏，并且这种格利雅特通常与第10族金属化合物接触以形成烯烃聚合催化剂，其与一种或多种 烯烃单体从其形成聚合物。

公开(公告)号：US06949609B2

公开(公告)日：2005-09-27

申请号：US10317366

申请日：2002-12-12

申请人： Larry F. Rhodes ,  Richard Vicari ,  Leah J. Langsdorf ,  Andrew A. Sobek ,  Edwin P. Boyd ,  Brian Bennett

发明人： Larry F. Rhodes ,  Richard Vicari ,  Leah J. Langsdorf ,  Andrew A. Sobek ,  Edwin P. Boyd ,  Brian Bennett

IPC分类号： C08F32/00 ,  C08F8/00 ,  C08F114/18 ,  C08G61/06 ,  G03F7/004 ,  G03F7/039

CPC分类号： C08G61/06 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397

摘要： The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer. Additionally, the present invention relates to methods by which to post-treat such photoresist compositions in order to obtain one or more of: (1) a reduction in optical density of the polymer composition; and (2) a reduction in the amount of residual metal and/or monomer in the polymer composition. Also disclosed are catalyst systems for use in producing the photoresist compositions of the present invention which permit molecular weight control of the photoresist products.

摘要翻译： 本发明涉及多环聚合物，多环聚合物的制备方法及其在制造集成电路中用作光致抗蚀剂的方法。 在一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体的聚合形成的光致抗蚀剂组合物。 在另一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体与至少一种非卤化多环单体的共聚合形成的光致抗蚀剂组合物。 另外，本发明涉及用于后处理这种光致抗蚀剂组合物以便获得以下一种或多种的方法：（1）聚合物组合物的光密度的降低; 和（2）聚合物组合物中残余金属和/或单体的量的减少。 还公开了用于制备本发明的光致抗蚀剂组合物的催化剂体系，其允许光致抗蚀剂产品的分子量控制。

公开(公告)号：US09583713B2

公开(公告)日：2017-02-28

申请号：US13223784

申请日：2011-09-01

申请人： David Christoph Mueller ,  Pawel Miskiewicz ,  Toby Cull ,  Piotr Wierzchowiec ,  Andrew Bell ,  Edmund Elce ,  Larry F. Rhodes ,  Kazuyoshi Fujita ,  Hendra Ng ,  Pramod Kandanarachchi ,  Steven Smith

发明人： David Christoph Mueller ,  Pawel Miskiewicz ,  Toby Cull ,  Piotr Wierzchowiec ,  Andrew Bell ,  Edmund Elce ,  Larry F. Rhodes ,  Kazuyoshi Fujita ,  Hendra Ng ,  Pramod Kandanarachchi ,  Steven Smith

IPC分类号： B32B27/32 ,  C08F132/08 ,  H01L51/00 ,  C08L65/00 ,  C08F232/00 ,  H01L51/05

CPC分类号： H01L51/0043 ,  C08F232/00 ,  C08L65/00 ,  C08L2203/20 ,  H01L51/0035 ,  H01L51/0529 ,  H01L51/0541 ,  H01L51/0545 ,  Y10T428/31938

摘要： Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as interlayers applied to fluoropolymer layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin interlayers and processes for preparing such polycycloolefin interlayers and electronic devices.

摘要翻译： 根据本发明的实施方案提供了聚环烯烃在电子器件中的用途，更具体地说，涉及使用这种聚环烯烃作为中间层，其用于制备电子器件的氟聚合物层，包含这种聚环烯夹层的电子器件和 制备这种聚环烯夹层和电子器件。

公开(公告)号：US08609574B2

公开(公告)日：2013-12-17

申请号：US12428936

申请日：2009-04-23

申请人： Larry F. Rhodes ,  Luis Francisco Martin ,  Andrew Bell

发明人： Larry F. Rhodes ,  Luis Francisco Martin ,  Andrew Bell

IPC分类号： C08F4/80

CPC分类号： C08F4/70 ,  C08F4/7037 ,  C08F232/08 ,  C08F2410/03

摘要： Embodiments in accordance with the present invention encompass methods of forming in situ olefin polymerization catalyst systems, catalysts encompassed by such systems and polymers made using such systems. For such in situ olefin polymerization catalyst systems, a hydrocarbyl magnesium halide is generally contacted with a halohydrocarbyl compound to form a halohydrocarbyl Grignard and such Grignard is generally contacted with a Group 10 metal compound to form an olefin polymerization catalyst which is contacted with one or more olefin monomers to form a polymer therefrom.

摘要翻译： 根据本发明的实施方案包括形成原位烯烃聚合催化剂体系，由这种体系包含的催化剂和使用这种体系制备的聚合物的方法。 对于这样的原位烯烃聚合催化剂体系，烃基卤化镁通常与卤代烃基化合物接触以形成卤代烃基格氏，并且这种格利雅特通常与第10族金属化合物接触以形成烯烃聚合催化剂，其与一种或多种 烯烃单体从其形成聚合物。

公开(公告)号：US08541523B2

公开(公告)日：2013-09-24

申请号：US13079240

申请日：2011-04-04

申请人： Pramod Kandanarachchi ,  Kazuyoshi Fujita ,  Steven Smith ,  Larry F. Rhodes

发明人： Pramod Kandanarachchi ,  Kazuyoshi Fujita ,  Steven Smith ,  Larry F. Rhodes

IPC分类号： C08F4/46 ,  C08K5/06

CPC分类号： G03F7/11 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/2041

摘要： Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.

摘要翻译： 根据本发明的实施方案提供了可用于浸渍式光刻工艺的非自成像降冰片烯型聚合物，制备这种聚合物的方法，使用这种聚合物的组合物和使用这种组合物的浸渍光刻工艺。 更具体地说，本发明的实施方案涉及可用于在浸没式光刻工艺中形成覆盖光致抗蚀剂层的顶涂层的降冰片烯型聚合物及其工艺。

公开(公告)号：US20120129101A1

公开(公告)日：2012-05-24

申请号：US13303423

申请日：2011-11-23

申请人： Osamu Onishi ,  Haruo Ikeda ,  Larry F. Rhodes ,  Pramod Kandanarachchi

发明人： Osamu Onishi ,  Haruo Ikeda ,  Larry F. Rhodes ,  Pramod Kandanarachchi

IPC分类号： G03F7/20 ,  G03F7/075 ,  G03F7/027 ,  G03F7/004

CPC分类号： G03F7/0382 ,  C08F222/06 ,  C08F232/08 ,  G03F7/0233 ,  G03F7/0395

摘要： Polymers and compositions for forming self-imageable films encompassing such polymers that encompass norbornene-type repeating unit having at least one phenolic functionality and maleic anhydride-type repeating unit, which can be formulated to be either positive tone imaging or negative tone imaging. The films formed thereby are useful as self-imageable layers in the manufacture of microelectronic, such as semiconductor, and optoelectronic devices.

摘要翻译： 用于形成包含包含具有至少一个酚官能度的降冰片烯型重复单元和马来酸酐型重复单元的聚合物的聚合物和组合物，其可被配制为正色调成像或负色调成像。 由此形成的膜可用作微电子制造中的自可成像层，例如半导体和光电器件。

公开(公告)号：US20120056183A1

公开(公告)日：2012-03-08

申请号：US13223884

申请日：2011-09-01

申请人： David Christoph Mueller ,  Toby Cull ,  Pawel Miskiewicz ,  Miguel Carrasco-Orozco ,  Andrew Bell ,  Edmund Elce ,  Larry F. Rhodes ,  Kazuyoshi Fujita ,  Hendra Ng ,  Pramod Kandanarachchi ,  Steven Smith

发明人： David Christoph Mueller ,  Toby Cull ,  Pawel Miskiewicz ,  Miguel Carrasco-Orozco ,  Andrew Bell ,  Edmund Elce ,  Larry F. Rhodes ,  Kazuyoshi Fujita ,  Hendra Ng ,  Pramod Kandanarachchi ,  Steven Smith

IPC分类号： H01L29/786 ,  H01L21/336 ,  H01L29/04

CPC分类号： H01L51/052 ,  C08F32/04 ,  C08F232/00 ,  C08L45/00 ,  H01L51/0035 ,  H01L51/004 ,  H01L51/0043 ,  H01L51/0537 ,  H01L51/0541 ,  H01L51/0545 ,  H01L51/107

摘要： Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as gate insulator layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin gate insulator and processes for preparing such polycycloolefin gate insulator layers and electronic devices encompassing such layers.

摘要翻译： 根据本发明的实施方案提供了聚环烯烃在电子器件中的用途，更具体地说，涉及使用这种聚环烯烃作为用于制造电子器件的栅极绝缘体层，包括这种聚环烯烃栅极绝缘体的电子器件以及用于制备 这种多环烯烃栅极绝缘体层和包含这些层的电子器件。

公开(公告)号：US08053515B2

公开(公告)日：2011-11-08

申请号：US11949328

申请日：2007-12-03

申请人： Edmund Elce ,  Andrew Bell ,  Brian Knapp ,  Hendra Ng ,  Larry F. Rhodes ,  Robert Shick ,  Wei Zhang ,  William DiMenna ,  Saikumar Jayaraman ,  Jianyong Jin ,  Rajesh Raja Puthenkovilakom ,  Ramakrishna Ravikiran ,  Xiaoming Wu ,  Etsu Takeuchi

发明人： Edmund Elce ,  Andrew Bell ,  Brian Knapp ,  Hendra Ng ,  Larry F. Rhodes ,  Robert Shick ,  Wei Zhang ,  William DiMenna ,  Saikumar Jayaraman ,  Jianyong Jin ,  Rajesh Raja Puthenkovilakom ,  Ramakrishna Ravikiran ,  Xiaoming Wu ,  Etsu Takeuchi

IPC分类号： C08G63/60

CPC分类号： C08G61/04 ,  C08F232/08 ,  G03F7/0388

摘要： A polymer includes a first type of repeat unit represented by Formula I: where X is selected from —CH2—, —CH2—CH2—, or —O—; m is an integer from 0 to about 5; and where for the first type of repeat unit one of R1, R2, R3, and R4 is one of a maleimide containing group and for the second type of repeat unit one of R1, R2, R3, and R4 is a hindered aromatic group, a C8 or greater alkyl group, a C4 or greater halohydrocarbyl or perhalocarbyl group, a C7 or greater aralkyl group, or a heteroatom hydrocarbyl or halohydrocarbyl group.

摘要翻译： 聚合物包括由式I表示的第一类型的重复单元：其中X选自-CH 2 - ， - CH 2 -CH 2 - 或-O-; m是0至约5的整数; 并且对于第一类型的重复单元，R 1，R 2，R 3和R 4中的一个是含马来酰亚胺基团之一，并且对于第二类型的重复单元，R 1，R 2，R 3和R 4中的一个是受阻芳族基团， C8或更大的烷基，C4或更大的卤代烃基或全卤代羰基，C7或更高的芳烷基或杂原子烃基或卤代烃基。