公开(公告)号：US07088424B2

公开(公告)日：2006-08-08

申请号：US11034260

申请日：2005-01-13

申请人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

发明人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

IPC分类号： G03B27/42

CPC分类号： B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

摘要： A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam of radiation provides the beam of radiation with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

摘要翻译： 光刻投影设备包括被配置成由辐射源发射的辐射形成辐射束的辐射系统，以及被配置为保持图案形成装置的支撑件，当图案形成装置被辐射束照射时，辐射束具有 模式。 衬底台被配置为保持衬底，并且投影系统被配置为将图案形成装置的照射部分成像到衬底的目标部分上。 辐射系统还包括距离光轴一定距离处的孔，当从源观察时，放置在孔后面的反射器和放置在孔后面的低辐射密集区域中的结构。

公开(公告)号：US20050264775A1

公开(公告)日：2005-12-01

申请号：US11127312

申请日：2005-05-12

申请人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Pieter Schuurmans ,  Jan Evert Der Werf

发明人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Pieter Schuurmans ,  Jan Evert Der Werf

IPC分类号： G03B27/52 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K1/06

摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

公开(公告)号：US06906788B2

公开(公告)日：2005-06-14

申请号：US10717929

申请日：2003-11-21

申请人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G21K3/00 ,  G03F7/20 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027 ,  H05G2/00 ,  G03B27/72 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70941 ,  G03F7/70916 ,  G03F7/70983

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system to transmit a beam of radiation emitted from a radiation source, and a support structure constructed to hold a patterning structure to be irradiated by the beam. A substrate holder is constructed to hold a substrate, and a projection system is constructed and arranged to project an irradiated portion of the patterning structure onto a target portion of the substrate. A first screen is positioned in a path of the beam between the radiation system and an optical element and a positive voltage is applied to the first screen to repel positively charged particles away from the optical element. A second screen is positioned in the path of the beam on at least one side of the first screen, and a negative voltage is applied to the second screen to repel negative particles away from the first screen.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于传输从辐射源发射的辐射束的辐射系统，以及构造成保持由光束照射的图案形成结构的支撑结构。 衬底保持器被构造成保持衬底，并且构造和布置投影系统以将图案形成结构的照射部分投影到衬底的目标部分上。 第一屏幕位于辐射系统和光学元件之间的光束的路径中，并且正电压被施加到第一屏幕以将带正电的粒子排斥离开光学元件。 第二屏幕位于第一屏幕的至少一侧上的光束路径中，并且将负电压施加到第二屏幕以排除离开第一屏幕的负面颗粒。

公开(公告)号：US06791665B2

公开(公告)日：2004-09-14

申请号：US10686813

申请日：2003-10-17

申请人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03B2742

CPC分类号： G03F7/70983 ,  G03F7/702 ,  G03F7/70233

摘要： A lithographic projection apparatus is provided wherein an object situated in a pulsed beam of radiation has an electrode in its vicinity and a voltage source connected either to the electrode or to the object. This configuration can provide a negative voltage pulse to the object relative to the electrode. The beam of radiation and the voltage pulse from the voltage source are provided in phase or out of phase. In this way, the object is shielded against secondary electrons generated by radiation beam illumination.

公开(公告)号：US09097993B2

公开(公告)日：2015-08-04

申请号：US13372093

申请日：2012-02-13

申请人： Levinus Pieter Bakker

发明人： Levinus Pieter Bakker

IPC分类号： G02B5/18 ,  G03F7/20

CPC分类号： G03F7/70958 ,  G03F7/70575 ,  G03F7/70983

摘要： An optical element includes a surface including a tilted profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, and a transmissive layer that covers the cavities and the elevations of the optical element. A first height of the transmissive layer in the cavities is substantially equal or larger than the predetermined maximum height difference and the transmissive layer has a second height on the elevations and the second height is about 10-500 nm. The transmissive layer is enabled to optically filter incident radiation, and the optical element is a grating.

摘要翻译： 光学元件包括包括具有高度差的倾斜轮廓的表面，从而提供具有预定最大高度差的空腔和高度，以及覆盖光学元件的腔和高度的透射层。 空腔中的透射层的第一高度基本上等于或大于预定的最大高度差，并且透射层在高度上具有第二高度，第二高度为约10-500nm。 透射层能够光学滤除入射的辐射，并且光学元件是光栅。

公开(公告)号：US20120074848A1

公开(公告)日：2012-03-29

申请号：US13376223

申请日：2010-06-02

申请人： Xiaoyan Zhu ,  Georg Greuel ,  Levinus Pieter Bakker ,  Cornelis Reinder Ronda ,  Thomas Juestel

发明人： Xiaoyan Zhu ,  Georg Greuel ,  Levinus Pieter Bakker ,  Cornelis Reinder Ronda ,  Thomas Juestel

IPC分类号： H01J7/00 ,  H01J63/04

CPC分类号： H05B41/2813 ,  Y02B20/22

摘要： The present invention provides a method of monitoring performance of a discharge lamp. The discharge lamp includes electrodes and a discharge vessel filled with gas and equipped with a luminescent layer, wherein the gas is intended to emit a first ultraviolet light in a first spectral range when the gas is excited by an electric field produced by the electrodes, and at least part of the first ultraviolet light is intended to be changed into a second ultraviolet light in a second spectral range of longer wavelength than the first spectral range by the luminescent layer. The method comprises the steps of finding the value of a first intensity of the first ultraviolet light; finding the value of a second intensity of the second ultraviolet light; and determining the conversion efficiency of the luminescent layer for converting the first ultraviolet light into the second ultraviolet light on the basis of the ratio of the value of the second intensity to the value of the first intensity.

摘要翻译： 本发明提供一种监视放电灯性能的方法。 放电灯包括电极和填充有气体并具有发光层的放电容器，其中当气体被电极产生的电场激发时，气体旨在在第一光谱范围内发射第一紫外光，以及 第一紫外光的至少一部分旨在通过发光层在比第一光谱范围更长波长的第二光谱范围内变成第二紫外光。 该方法包括以下步骤：找到第一紫外光的第一强度的值; 找到第二紫外光的第二强度的值; 并根据第二强度的值与第一强度的值确定用于将第一紫外光转换成第二紫外光的发光层的转换效率。

公开(公告)号：US08137869B2

公开(公告)日：2012-03-20

申请号：US10936716

申请日：2004-09-09

申请人： Levinus Pieter Bakker

发明人： Levinus Pieter Bakker

IPC分类号： G02B27/44 ,  G02B5/18

CPC分类号： G03F7/70958 ,  G03F7/70575 ,  G03F7/70983

摘要： A method for manufacturing and/or protecting an optical element, wherein the optical element has at least one surface comprising a profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, includes providing a transmissive layer in the cavities and on the elevations of the optical elements, the transmissive layer having a first height in the cavities that is larger than the predetermined maximum height difference, and surfacing the transmissive layer after providing the transmissive layer such that the transmissive layer has a second height on the elevations that is substantially zero or larger, thereby providing a transmissive layer with a substantially planar surface.

摘要翻译： 一种用于制造和/或保护光学元件的方法，其中所述光学元件具有包括具有高度差的轮廓的至少一个表面，从而提供具有预定最大高度差的空腔和高度，包括在所述空腔中和在所述腔 光学元件的高度，透射层在空腔中具有大于预定最大高度差的第一高度，并且在提供透射层之后，使透射层铺展，使得透射层在高度上具有第二高度， 基本上为零或更大，由此提供具有基本平坦表面的透射层。

公开(公告)号：US08129702B2

公开(公告)日：2012-03-06

申请号：US12771466

申请日：2010-04-30

申请人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

发明人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

IPC分类号： G21F1/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

摘要翻译： 辐射系统包括被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎片的污染屏障。 污染屏障包括多个薄片。 薄片的表面包括材料。 辐射系统还包括被配置成收集来自污染屏障的辐射的收集器。 收集器的光学表面包括与薄片表面的材料相同的材料。

公开(公告)号：US20110121665A1

公开(公告)日：2011-05-26

申请号：US13054552

申请日：2009-07-13

申请人： Chenyang Liu ,  Hendrikus Albertus Adrianus Maria de Ruijter ,  Levinus Pieter Bakker

发明人： Chenyang Liu ,  Hendrikus Albertus Adrianus Maria de Ruijter ,  Levinus Pieter Bakker

IPC分类号： H02J9/00

CPC分类号： H02J7/00

摘要： To solve or mitigate the problem of lacking the “last mile” connection to a power grid, the invention provides a power supply apparatus for supplying electric energy to a plurality of devices. The apparatus comprises a power dock (130) configured to electrically couple to a power pack (110), wherein the power pack is configured to store electric energy; and a plurality of connectors each being configured to supply electric energy from the power dock to one of the plurality of devices (132, 134, 136). By utilizing the power pack, particularly a removable super capacitor (112), accessing power becomes easier for those people living away from power grids or suffering from an unstable power supply.

摘要翻译： 为了解决或减轻与电网的“最后一英里”连接缺乏的问题，本发明提供一种用于向多个设备提供电能的电源装置。 该装置包括被配置为电耦合到电源组（110）的功率坞（130），其中所述电源组被配置为存储电能; 以及多个连接器，每个连接器被配置为将电能从功率基座提供给多个设备（132,134,136）中的一个。 通过利用动力组件，特别是可移除的超级电容器（112），对于远离电网或遭受不稳定电源的人来说，接入电力变得更容易。

公开(公告)号：US20100238311A1

公开(公告)日：2010-09-23

申请号：US12161187

申请日：2007-01-16

申请人： Aleksey Kolesnychenko ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Aleksey Kolesnychenko ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： H04N5/228

CPC分类号： G02B27/46 ,  G02B27/58 ,  G06E3/00

摘要： An imaging device for forming an image of a sample object includes an optical device and a processing unit. The optical device captures a Fourier spectrum of an object. The processing unit is arranged for processing the Fourier spectrum from the optical device and is adapted for determining the image of the sample object from the intensity of the Fourier spectrum of the sample object and the intensity of the Fourier spectrum of a combination of the sample object and a reference object.

摘要翻译： 用于形成样本物体的图像的成像装置包括光学装置和处理单元。 光学器件捕获对象的傅里叶谱。 处理单元被布置用于从光学装置处理傅立叶频谱，并且适于根据样本对象的傅立叶频谱的强度和样本对象的组合的傅里叶谱的强度来确定样本对象的图像 和参考对象。