公开(公告)号：US07745314B2

公开(公告)日：2010-06-29

申请号：US11692236

申请日：2007-03-28

申请人： Kyung-bae Park ,  Jong-man Kim ,  Jang-yeon Kwon ,  Ji-sim Jung

发明人： Kyung-bae Park ,  Jong-man Kim ,  Jang-yeon Kwon ,  Ji-sim Jung

IPC分类号： H01L21/20

CPC分类号： H01L21/3221 ,  H01L21/0237 ,  H01L21/02532 ,  H01L21/02667

摘要： A method of degassing a thin layer and a method of manufacturing a silicon thin film includes applying microwaves to a silicon thin film deposited on a substrate to induce a resonance of impurities of H2, Ar, He, Xe, O2, and the like present in the silicon thin film so as to remove the impurities from the silicon thin film. A wavelength of the microwaves is equal to a natural frequency of an element of an object to be removed. According to a resonance of impurities induced by microwaves, the impurities can be very effectively removed from the silicon thin film so as to obtain a high quality silicon thin film. In particular, the microwaves are very suitable to be used in the manufacture of silicon thin films at low temperature.

摘要翻译： 对薄层进行脱气的方法和制造硅薄膜的方法包括将微波施加到沉积在基板上的硅薄膜，以引起存在于其中的H 2，Ar，He，Xe，O 2等杂质的共振 硅薄膜，以从硅薄膜中除去杂质。 微波的波长等于要去除的物体的元素的固有频率。 根据由微波引起的杂质的共振，可以非常有效地从硅薄膜除去杂质，从而获得高质量的硅薄膜。 特别地，微波非常适用于在低温下制造硅薄膜。

公开(公告)号：US07700954B2

公开(公告)日：2010-04-20

申请号：US11621627

申请日：2007-01-10

申请人： Takashi Noguchi ,  Jong-man Kim ,  Jang-yeon Kwon ,  Kyung-bae Park ,  Ji-sim Jung ,  Hyuck Lim

发明人： Takashi Noguchi ,  Jong-man Kim ,  Jang-yeon Kwon ,  Kyung-bae Park ,  Ji-sim Jung ,  Hyuck Lim

IPC分类号： H01L27/15 ,  H01L29/26 ,  H01L31/12 ,  H01L33/00

CPC分类号： H01L29/78645 ,  H01L27/1288 ,  H01L27/3244 ,  H01L29/78624 ,  H01L29/78696

摘要： A transistor includes; at least two polycrystalline silicon layers disposed substantially parallel to each other, each polycrystalline silicon layer including a channel region and at least two high conductivity regions disposed at opposing sides of the channel region; a gate which corresponds to the channel region of the two polycrystalline silicon layers and which crosses the two polycrystalline silicon layers, and a gate insulating layer interposed between the gate and the two polycrystalline silicon layers, wherein low conductivity regions are disposed adjacent to one edge of the gate and are formed between the channel region and one high conductivity region of each polycrystalline silicon layer.

摘要翻译： 晶体管包括： 至少两个多晶硅层基本上彼此平行地布置，每个多晶硅层包括沟道区和至少两个设置在沟道区相对侧的高导电性区; 对应于两个多晶硅层的沟道区并与两个多晶硅层交叉的栅极和介于栅极和两个多晶硅层之间的栅极绝缘层，其中低导电性区域邻近 并且形成在每个多晶硅层的沟道区域和一个高导电率区域之间。

公开(公告)号：US07648866B2

公开(公告)日：2010-01-19

申请号：US11958719

申请日：2007-12-18

申请人： Ji-sim Jung ,  Jung-seok Hahn ,  Sang-yoon Lee ,  Jong-man Kim ,  Jang-yeon Kwon ,  Kyung-bae Park

发明人： Ji-sim Jung ,  Jung-seok Hahn ,  Sang-yoon Lee ,  Jong-man Kim ,  Jang-yeon Kwon ,  Kyung-bae Park

IPC分类号： H01L21/00

CPC分类号： H01L21/02672 ,  H01L21/02532 ,  H01L21/02595 ,  H01L27/1229 ,  H01L27/1277 ,  H01L27/3262

摘要： Provided is a method of manufacturing a driving-device for a unit pixel of an organic light emitting display having an improved manufacturing process in which the driving device can be manufactured with a smaller number of processes and in simpler processes. The method includes: forming an amorphous silicon layer including a first amorphous region and a second amorphous region disposed on the same plane of a substrate; forming an SAM (self-assembled monolayer) having a hydrophobic property on the first amorphous region; coating an aqueous solution in which nickel particles are dispersed, on the second amorphous region and the SAM, wherein a larger amount of nickel particles than on the SAM are dispersed on the second amorphous region using a hydrophilicity difference between the second amorphous region and the SAM; vaporizing the SAM through an annealing process and simultaneously performing metal induced crystallization in which the nanoparticles are used as a medium, to crystallize the first and second amorphous regions and to form first and second crystallization regions; patterning the first and second crystallization regions to form first and second channel regions; and forming first and second electrodes on the first and second channel regions.

摘要翻译： 提供一种制造有机发光显示器的单位像素的驱动装置的方法，该有机发光显示器具有改进的制造工艺，其中驱动装置可以以较少的工艺和更简单的工艺制造。 该方法包括：形成包括设置在基板的同一平面上的第一非晶区和第二非晶区的非晶硅层; 在第一非晶区上形成具有疏水性的SAM（自组装单层）; 在所述第二非晶区域和所述SAM上涂覆其中分散有镍颗粒的水溶液，其中比所述SAM上更大量的所述镍颗粒分散在所述第二非晶区域上，使用所述第二非晶区域和所述SAM之间的亲水性差异 ; 通过退火工艺蒸发SAM，同时进行金属诱导结晶，其中纳米颗粒用作介质，使第一和第二非晶区域结晶并形成第一和第二结晶区域; 图案化第一和第二结晶区域以形成第一和第二通道区域; 以及在所述第一和第二通道区域上形成第一和第二电极。

公开(公告)号：US20090298268A1

公开(公告)日：2009-12-03

申请号：US12457586

申请日：2009-06-16

申请人： Jang-yeon Kwon ,  Min-koo Han ,  Se-young Cho ,  Kyung-bae Park ,  Do-young Kim ,  Min-cheol Lee ,  Sang-myeon Han ,  Takashi Noguchi ,  Young-soo Park ,  Ji-sim Jung

发明人： Jang-yeon Kwon ,  Min-koo Han ,  Se-young Cho ,  Kyung-bae Park ,  Do-young Kim ,  Min-cheol Lee ,  Sang-myeon Han ,  Takashi Noguchi ,  Young-soo Park ,  Ji-sim Jung

IPC分类号： H01L21/336 ,  H01L21/205

CPC分类号： H01L21/02532 ,  H01L21/02164 ,  H01L21/02274 ,  H01L21/02354 ,  H01L21/02595 ,  H01L21/0262 ,  H01L21/02686 ,  H01L21/2026 ,  H01L21/31608 ,  H01L29/4908 ,  H01L29/66757 ,  H01L29/78675

摘要： A method of fabricating a poly-Si thin film and a method of fabricating a poly-Si TFT using the same are provided. The poly-Si thin film is formed at a low temperature using ICP-CVD. After the ICP-CVD, ELA is performed while increasing energy by predetermined steps. A poly-Si active layer and a Si02 gate insulating layer are deposited at a temperature of about 150° C. using ICP-CVD. The poly-Si has a large grain size of about 3000 A or more. An interface trap density of the Si02 can be as high as lo∥/cm2. A transistor having good electrical characteristics can be fabricated at a low temperature and thus can be formed on a heat tolerant plastic substrate.

摘要翻译： 提供一种制造多晶硅薄膜的方法和使用其制造多晶硅TFT的方法。 使用ICP-CVD在低温下形成多晶硅薄膜。 在ICP-CVD之后，在通过预定步骤增加能量的同时执行ELA。 使用ICP-CVD在约150℃的温度下沉积多晶硅有源层和SiO 2栅极绝缘层。 多晶硅具有约3000A以上的大晶粒尺寸。 SiO 2的界面陷阱密度可以高达lo // / cm2。 具有良好电特性的晶体管可以在低温下制造，因此可以形成在耐热塑料基板上。

公开(公告)号：US20080067515A1

公开(公告)日：2008-03-20

申请号：US11852774

申请日：2007-09-10

申请人： Kyung-bae Park ,  Kyung-yeup Kim ,  Jong-man Kim ,  Jang-yeon Kwon ,  Ji-sim Jung

发明人： Kyung-bae Park ,  Kyung-yeup Kim ,  Jong-man Kim ,  Jang-yeon Kwon ,  Ji-sim Jung

IPC分类号： H01L21/428 ,  H01L21/84 ,  H01L27/12

CPC分类号： H01L21/268 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02691 ,  H01L27/1285

摘要： Provided are a method of manufacturing a laterally crystallized semiconductor layer and a method of manufacturing a thin film transistor (TFT) using the method. The method of manufacturing the laterally crystallized semiconductor layer comprises: forming a semiconductor layer on a substrate; irradiating laser beams on the semiconductor layer; splitting the laser beams using a prism sheet comprising an array of a plurality of prisms, advancing the laser beams toward the semiconductor layer to alternately form first and second areas in the semiconductor layer so as to fully melt the first areas, wherein the laser beams are irradiated onto the first areas, and the laser beams are not irradiated onto the second areas; and inducing the first areas to be laterally crystallized using the second areas as seeds.

摘要翻译： 提供了制造横向结晶半导体层的方法和使用该方法制造薄膜晶体管（TFT）的方法。 制造横向结晶的半导体层的方法包括：在衬底上形成半导体层; 在半导体层上照射激光束; 使用包括多个棱镜的阵列的棱镜片分割激光束，将激光束朝向半导体层前进，以在半导体层中交替地形成第一和第二区域，以便使第一区域完全熔化，其中激光束 照射到第一区域上，激光束不照射到第二区域上; 并且使用第二区域作为种子诱导第一区域被横向结晶。

公开(公告)号：US20060008957A1

公开(公告)日：2006-01-12

申请号：US11003326

申请日：2004-12-06

申请人： Jang-yeon Kwon ,  Min-koo Han ,  Se-young Cho ,  Kyung-bae Park ,  Do-young Kim ,  Min-cheol Lee ,  Sang-myeon Han ,  Takashi Noguchi ,  Young-soo Park ,  Ji-sim Jung

发明人： Jang-yeon Kwon ,  Min-koo Han ,  Se-young Cho ,  Kyung-bae Park ,  Do-young Kim ,  Min-cheol Lee ,  Sang-myeon Han ,  Takashi Noguchi ,  Young-soo Park ,  Ji-sim Jung

IPC分类号： H01L21/205

CPC分类号： H01L21/02532 ,  H01L21/02164 ,  H01L21/02274 ,  H01L21/02354 ,  H01L21/02595 ,  H01L21/0262 ,  H01L21/02686 ,  H01L21/2026 ,  H01L21/31608 ,  H01L29/4908 ,  H01L29/66757 ,  H01L29/78675

摘要： A method of fabricating a poly-Si thin film and a method of fabricating a poly-Si TFT using the same are provided. The poly-Si thin film is formed at a low temperature using ICP-CVD. After the ICP-CVD, ELA is performed while increasing energy by predetermined steps. A poly-Si active layer and a SiO2 gate insulating layer are deposited at a temperature of about 150° C. using ICP-CVD. The poly-Si has a large grain size of about 3000 Å or more. An interface trap density of the SiO2 can be as high as 1011/cm2. A transistor having good electrical characteristics can be fabricated at a low temperature and thus can be formed on a heat tolerant plastic substrate.

摘要翻译： 提供一种制造多晶硅薄膜的方法和使用其制造多晶硅TFT的方法。 使用ICP-CVD在低温下形成多晶硅薄膜。 在ICP-CVD之后，在通过预定步骤增加能量的同时执行ELA。 使用ICP-CVD在约150℃的温度下沉积多晶硅有源层和SiO 2/2栅极绝缘层。 多晶硅的大晶粒尺寸约为3000或更大。 SiO 2 2的界面陷阱密度可以高达10-11 / cm 2。 具有良好电特性的晶体管可以在低温下制造，因此可以形成在耐热塑料基板上。

公开(公告)号：US08378342B2

公开(公告)日：2013-02-19

申请号：US12659837

申请日：2010-03-23

申请人： Tae-sang Kim ,  Sang-yoon Lee ,  Jang-yeon Kwon ,  Kyoung-seok Son ,  Ji-sim Jung ,  Kwang-hee Lee

发明人： Tae-sang Kim ,  Sang-yoon Lee ,  Jang-yeon Kwon ,  Kyoung-seok Son ,  Ji-sim Jung ,  Kwang-hee Lee

IPC分类号： H01L29/786

CPC分类号： H01L29/7869

摘要： Provided are an oxide semiconductor and an oxide thin film transistor including the oxide semiconductor. The oxide semiconductor may be formed of an indium (In)-zinc (Zn) oxide in which hafnium (Hf) is contained, wherein In, Zn, and Hf are contained in predetermined or given composition ratios.

摘要翻译： 提供了包括氧化物半导体的氧化物半导体和氧化物薄膜晶体管。 氧化物半导体可以由其中含有铪（Hf）的铟（In） - 锌（Zn）氧化物形成，其中以预定或给定的组成比包含In，Zn和Hf。

公开(公告)号：US20100276683A1

公开(公告)日：2010-11-04

申请号：US12659837

申请日：2010-03-23

申请人： Tae-sang Kim ,  Sang-yoon Lee ,  Jang-yeon Kwon ,  Kyoung-seok Son ,  Ji-sim Jung ,  Kwang-hee Lee

发明人： Tae-sang Kim ,  Sang-yoon Lee ,  Jang-yeon Kwon ,  Kyoung-seok Son ,  Ji-sim Jung ,  Kwang-hee Lee

IPC分类号： H01L29/786 ,  H01L29/22

CPC分类号： H01L29/7869

摘要： Provided are an oxide semiconductor and an oxide thin film transistor including the oxide semiconductor. The oxide semiconductor may be formed of an indium (In)-zinc (Zn) oxide in which hafnium (Hf) is contained, wherein In, Zn, and Hf are contained in predetermined or given composition ratios.

摘要翻译： 提供了包括氧化物半导体的氧化物半导体和氧化物薄膜晶体管。 氧化物半导体可以由其中含有铪（Hf）的铟（In） - 锌（Zn）氧化物形成，其中以预定或给定的组成比包含In，Zn和Hf。

公开(公告)号：US08866136B2

公开(公告)日：2014-10-21

申请号：US12805379

申请日：2010-07-28

申请人： Ji-sim Jung ,  Chang-seung Lee ,  Jae-cheol Lee ,  Sang-yoon Lee ,  Jang-yeon Kwon ,  Kwang-hee Lee ,  Kyoung-seok Son

发明人： Ji-sim Jung ,  Chang-seung Lee ,  Jae-cheol Lee ,  Sang-yoon Lee ,  Jang-yeon Kwon ,  Kwang-hee Lee ,  Kyoung-seok Son

IPC分类号： H01L29/10 ,  H01L29/786

CPC分类号： H01L29/7869 ,  H01L29/78606

摘要： Provided are a transistor, a method of manufacturing the transistor, and an electronic device including the transistor. The transistor may include a passivation layer on a channel layer, a source, a drain, and a gate, wherein the component of the passivation layer is varied in a height direction. The passivation layer may have a multi-layer structure including a silicon oxide layer, a silicon oxynitride layer, and a silicon nitride layer sequentially stacked. The channel layer may include an oxide semiconductor.

摘要翻译： 提供晶体管，晶体管的制造方法和包括该晶体管的电子器件。 晶体管可以包括沟道层上的钝化层，源极，漏极和栅极，其中钝化层的成分在高度方向上变化。 钝化层可以具有依次层叠的包括氧化硅层，氮氧化硅层和氮化硅层的多层结构。 沟道层可以包括氧化物半导体。

公开(公告)号：US08760597B2

公开(公告)日：2014-06-24

申请号：US12805382

申请日：2010-07-28

申请人： Kyoung-seok Son ,  Kwang-hee Lee ,  Jang-yeon Kwon ,  Ji-sim Jung

发明人： Kyoung-seok Son ,  Kwang-hee Lee ,  Jang-yeon Kwon ,  Ji-sim Jung

IPC分类号： G02F1/136

CPC分类号： H01L27/124 ,  G02F1/13624 ,  G09G3/3659 ,  G09G2300/0426 ,  G09G2310/067 ,  G09G2320/043 ,  H01L27/1225

摘要： Example embodiments are directed to a switching device of an active display device and a method of driving the switching device, such that electrical reliability of the active display device is improved. The switching device of the active display device includes a plurality of thin film transistors (TFTs) that are connected in series. Except for a refresh time duration during which the plurality of TFTs of the switching device are simultaneously turned ON, a positive voltage is applied to at least one of the plurality of TFTs of the switching device so that a reliability of the switching device may be improved.

摘要翻译： 示例性实施例涉及有源显示装置的开关装置和驱动开关装置的方法，使得主动显示装置的电可靠性得到改善。 有源显示装置的开关装置包括串联连接的多个薄膜晶体管（TFT）。 除了开关装置的多个TFT同时导通的刷新持续时间之外，对开关装置的多个TFT中的至少一个施加正电压，从而可以提高开关装置的可靠性 。