Multi-finger z-actuator
    42.
    发明授权
    Multi-finger z-actuator 有权
    多指z致动器

    公开(公告)号:US07504757B2

    公开(公告)日:2009-03-17

    申请号:US11375860

    申请日:2006-03-15

    CPC classification number: B81C1/00626 B81B2201/033 H01L21/3086

    Abstract: Multi-level structures are formed in a semiconductor substrate by first forming a pattern of lines or structures of different widths. Width information on the pattern is decoded by processing steps into level information to form a MEMS structure. The pattern is etched to form structures having a first floor. The structures are oxidized until structures of thinner width are substantially fully oxidized. A portion of the oxide is then etched to expose the first floor. The first floor is then etched to form a second floor. The oxide is then optionally removed, leaving a multi-level structure. In one embodiment, high aspect ratio comb actuators are formed using the multi-level structure process.

    Abstract translation: 通过首先形成不同宽度的线或结构的图案,在半导体衬底中形成多层结构。 图案上的宽度信息通过处理步骤被解码成级信息以形成MEMS结构。 蚀刻图案以形成具有一层的结构。 结构被氧化,直到较薄宽度的结构基本上被完全氧化。 然后蚀刻一部分氧化物以露出第一层。 然后蚀刻第一层以形成二楼。 然后任选地除去氧化物,留下多层结构。 在一个实施例中,使用多层结构工艺形成高纵横比梳状致动器。

    Single crystal silicon micromirror and array
    43.
    发明授权
    Single crystal silicon micromirror and array 有权
    单晶硅微镜和阵列

    公开(公告)号:US06794217B2

    公开(公告)日:2004-09-21

    申请号:US10403098

    申请日:2003-04-01

    CPC classification number: G02B26/0841

    Abstract: A micromirror is fabricated in a substrate by defining a mirror platform on a first side of the substrate, defining an actuator structure corrected to the platform on a second side of the substrate, and then releasing the mirror platform for motion with the actuator. The actuator may be a comb drive structure having interdigitated movable finger electrodes connected to the mirror platform and stationary finger electrodes mounted on the substrate. The movable and stationary finger electrodes preferably are asymmetrical, and when activated, controllably move the mirror platform either horizontally or vertically with respect to the surface of the substrate. The comb drive structure may be connected at one of its ends to a torsional support beam secured to the substrate, for torsional motion of the mirror platform with respect to the substrate. Alternatively, the comb drive may be connected at both ends to spaced torsional support beams for vertical motion of the platform with respect to the substrate. In the latter case, the actuator preferably includes spaced hinges to allow expansion of the actuator length.

    Abstract translation: 通过在衬底的第一侧上限定一个反射镜平台,在衬底的第二面上限定一个校准到该平台的致动器结构,然后释放用于与该致动器一起运动的反射镜平台,从而将微镜制造在衬底中。 致动器可以是梳状驱动结构,其具有连接到镜台的交错可动指状电极和安装在基板上的固定指状电极。 可移动和固定的手指电极优选地是不对称的,并且当被激活时,相对于衬底的表面可水平地或垂直地可控地移动镜面平台。梳状驱动结构可以在其一端连接到固定的扭转支撑梁 到基板,用于反射镜平台相对于基板的扭转运动。 或者,梳状驱动器可以在两端连接到间隔的扭转支撑梁,用于平台相对于基板的垂直运动。 在后一种情况下,致动器优选地包括间隔开的铰链以允许致动器长度的膨胀。

    Single crystal silicon micromirror and array
    44.
    发明授权
    Single crystal silicon micromirror and array 有权
    单晶硅微镜和阵列

    公开(公告)号:US06541831B2

    公开(公告)日:2003-04-01

    申请号:US09761860

    申请日:2001-01-18

    CPC classification number: G02B26/0841

    Abstract: A micromirror is fabricated in a substrate by defining a mirror platform on a first side of the substrate, defining an actuator structure corrected to the platform on a second side of the substrate, and then releasing the mirror platform for motion with the actuator. The actuator may be a comb drive structure having interdigitated movable finger electrodes connected to the mirror platform and stationary finger electrodes mounted on the substrate. The movable and stationary finger electrodes preferably are asymmetrical, and when activated, controllably move the mirror platform either horizontally or vertically with respect to the surface of the substrate. The comb drive structure may be connected at one of its ends to a torsional support beam secured to the substrate, for torsional motion of the mirror platform with respect to the substrate. Alternatively, the comb drive may be connected at both ends to spaced torsional support beams for vertical motion of the platform with respect to the substrate. In the latter case, the actuator preferably includes spaced hinges to allow expansion of the actuator length.

    Abstract translation: 通过在衬底的第一侧上限定一个反射镜平台,在衬底的第二面上限定一个校准到该平台的致动器结构,然后释放用于与该致动器一起运动的反射镜平台,从而将微镜制造在衬底中。 致动器可以是梳状驱动结构,其具有连接到镜台的交错可动指状电极和安装在基板上的固定指状电极。 可移动和固定的手指电极优选地是不对称的,并且当被激活时,相对于衬底的表面可水平地或垂直地可控地移动镜面平台。梳状驱动结构可以在其一端连接到固定的扭转支撑梁 到基板,用于反射镜平台相对于基板的扭转运动。 或者,梳状驱动器可以在两端连接到间隔的扭转支撑梁,用于平台相对于基板的垂直运动。 在后一种情况下,致动器优选地包括间隔开的铰链以允许致动器长度的膨胀。

    Motion amplification based sensors
    45.
    发明授权
    Motion amplification based sensors 有权
    基于运动放大的传感器

    公开(公告)号:US06183097B2

    公开(公告)日:2001-02-06

    申请号:US09348321

    申请日:1999-07-08

    Abstract: A micromechanical micromotion amplifier has an integrated structure formed primarily of silicon and comprises a plurality of long slender flexible beams which are connected in a predetermined manner. The beams are released from a silicon substrate for movement with respect to fixed points of reference upon the substrate. Each beam thereby has a fixed end and a relatively moveable free end. Compressive axial force induced by axial movement, applied to the moveable end of a beam, will cause that beam to deform or buckle. Buckling occurs transversely in-plane due to a high aspect ratio profile of each beam. The amount of lateral or transverse movement of a beam due to buckling is relatively large in relation to the applied axial force or axial movement which causes it. By arranging these beams in cooperating perpendicular pairs as micromotion amplifier stages, an input axial force/movement applied to the moveable free end of a first beam generates a transverse motion or buckling movement of that beam.

    Abstract translation: 微机电微动力放大器具有主要由硅形成的整体结构,并且包括以预定方式连接的多个长细长柔性梁。 光束从硅衬底释放,以相对于衬底上的固定参考点移动。 因此,每个梁具有固定端和相对可移动的自由端。 由轴向运动引起的压缩轴向力,施加到梁的可移动端,将导致梁变形或弯曲。 由于每个光束的高纵横比轮廓,因此弯曲发生在平面内。 由于屈曲而导致的梁的横向或横向运动的量相对于所引起的所施加的轴向力或轴向运动相对较大。 通过将这些光束配置为协作的垂直对作为微型放大器级,施加到第一光束的可移动自由端的输入轴向力/运动产生该光束的横向运动或屈曲运动。

    Capacitance based tunable micromechanical resonators
    48.
    发明授权
    Capacitance based tunable micromechanical resonators 失效
    基于电容的可调谐微机械谐振器

    公开(公告)号:US5640133A

    公开(公告)日:1997-06-17

    申请号:US494024

    申请日:1995-06-23

    Abstract: A tunable electromicromechanical resonator structure incorporates an electrostatic actuator which permits reduction or enhancement of the resonant frequency of the structure. The actuator consists of two sets of opposed electrode fingers, each set having a multiplicity of spaced, parallel fingers. One set is mounted on a movable portion of the resonator structure and one set is mounted on an adjacent fixed base on substrate, with the fingers in opposed relationship and their adjacent ends spaced apart by a gap. An adjustable bias voltage across the sets of electrodes adjusts the resonant frequency of the movable structure.

    Abstract translation: 可调电动机械谐振器结构包括静电致动器,其允许减小或增强结构的谐振频率。 致动器由两组相对的电极指组成,每组具有多个间隔开的平行指状物。 一组安装在谐振器结构的可移动部分上,一组安装在基板上的相邻的固定基座上,指状物处于相对关系,并且其相邻端部间隔开间隙。 两组电极之间的可调偏压调节可移动结构的谐振频率。

    Vacuum microelectronic devices with multiple planar electrodes
    49.
    发明授权
    Vacuum microelectronic devices with multiple planar electrodes 失效
    具有多个平面电极的真空微电子器件

    公开(公告)号:US5637539A

    公开(公告)日:1997-06-10

    申请号:US586057

    申请日:1996-01-16

    CPC classification number: H01J9/025 H01J21/105

    Abstract: A fabrication process for vacuum microelectronic devices having multiple electrode levels includes production of a first-level electrode mask on a substrate. The mask pattern is transferred to the substrate to produce a trench surrounding an emitter which is formed by thermal oxidation. The trench is filled with tungsten to form a gate electrode surrounding the emitter, and the resulting wafer is planarized. A second-level electrode is formed on the top surface of the wafer, and is planarized. Additional levels are similarly produced, and thereafter the electrodes are released.

    Abstract translation: 具有多个电极层的真空微电子器件的制造方法包括在衬底上制造第一级电极掩模。 掩模图案被转移到衬底以产生围绕通过热氧化形成的发射极的沟槽。 用钨填充沟槽以形成围绕发射极的栅电极,并将得到的晶片平坦化。 第二级电极形成在晶片的顶表面上,并被平坦化。 附加水平类似地产生,此后电极被释放。

    Microstructures and high temperature isolation process for fabrication
thereof
    50.
    发明授权
    Microstructures and high temperature isolation process for fabrication thereof 失效
    微结构和高温隔离制程

    公开(公告)号:US5426070A

    公开(公告)日:1995-06-20

    申请号:US67089

    申请日:1993-05-26

    CPC classification number: B81C1/0015 G01P15/0802

    Abstract: A method of fabricating released microelectromechanical and microoptomechanical structures having electrically isolating segments from single crystal silicon includes thermal oxidation steps. The structures are defined using a single mask patterning process, and the structure is partially thermally oxidized. This is followed by a second masking step which is used to define segments to be completely thermally oxidized, and a second oxidation step completes the fabrication of the isolating segment. Thereafter the structure is released from the underlying substrate.

    Abstract translation: 制造具有与单晶硅电隔离段的释放的微机电和微机电结构的方法包括热氧化步骤。 使用单个掩模图案化工艺限定结构,并且该结构被部分热氧化。 之后是第二掩蔽步骤,其用于限定待完全热氧化的段,第二氧化步骤完成隔离段的制造。 此后,结构从下面的基底释放。

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