Abstract:
A method and device of nanostructured titania that is crack free. A method in accordance with the present invention comprises depositing a Ti film on a surface, depositing a masking layer on the Ti film, etching said masking layer to expose a limited region of the Ti film, the limited region being of an area less than a threshold area, oxidizing the exposed limited region of the Th.ucsbi film, and annealing the exposed limited region of the Ti film.
Abstract:
Multi-level structures are formed in a semiconductor substrate by first forming a pattern of lines or structures of different widths. Width information on the pattern is decoded by processing steps into level information to form a MEMS structure. The pattern is etched to form structures having a first floor. The structures are oxidized until structures of thinner width are substantially fully oxidized. A portion of the oxide is then etched to expose the first floor. The first floor is then etched to form a second floor. The oxide is then optionally removed, leaving a multi-level structure. In one embodiment, high aspect ratio comb actuators are formed using the multi-level structure process.
Abstract:
A micromirror is fabricated in a substrate by defining a mirror platform on a first side of the substrate, defining an actuator structure corrected to the platform on a second side of the substrate, and then releasing the mirror platform for motion with the actuator. The actuator may be a comb drive structure having interdigitated movable finger electrodes connected to the mirror platform and stationary finger electrodes mounted on the substrate. The movable and stationary finger electrodes preferably are asymmetrical, and when activated, controllably move the mirror platform either horizontally or vertically with respect to the surface of the substrate. The comb drive structure may be connected at one of its ends to a torsional support beam secured to the substrate, for torsional motion of the mirror platform with respect to the substrate. Alternatively, the comb drive may be connected at both ends to spaced torsional support beams for vertical motion of the platform with respect to the substrate. In the latter case, the actuator preferably includes spaced hinges to allow expansion of the actuator length.
Abstract:
A micromirror is fabricated in a substrate by defining a mirror platform on a first side of the substrate, defining an actuator structure corrected to the platform on a second side of the substrate, and then releasing the mirror platform for motion with the actuator. The actuator may be a comb drive structure having interdigitated movable finger electrodes connected to the mirror platform and stationary finger electrodes mounted on the substrate. The movable and stationary finger electrodes preferably are asymmetrical, and when activated, controllably move the mirror platform either horizontally or vertically with respect to the surface of the substrate. The comb drive structure may be connected at one of its ends to a torsional support beam secured to the substrate, for torsional motion of the mirror platform with respect to the substrate. Alternatively, the comb drive may be connected at both ends to spaced torsional support beams for vertical motion of the platform with respect to the substrate. In the latter case, the actuator preferably includes spaced hinges to allow expansion of the actuator length.
Abstract:
A micromechanical micromotion amplifier has an integrated structure formed primarily of silicon and comprises a plurality of long slender flexible beams which are connected in a predetermined manner. The beams are released from a silicon substrate for movement with respect to fixed points of reference upon the substrate. Each beam thereby has a fixed end and a relatively moveable free end. Compressive axial force induced by axial movement, applied to the moveable end of a beam, will cause that beam to deform or buckle. Buckling occurs transversely in-plane due to a high aspect ratio profile of each beam. The amount of lateral or transverse movement of a beam due to buckling is relatively large in relation to the applied axial force or axial movement which causes it. By arranging these beams in cooperating perpendicular pairs as micromotion amplifier stages, an input axial force/movement applied to the moveable free end of a first beam generates a transverse motion or buckling movement of that beam.
Abstract:
A microelectromechanical micromotion amplifier generates a controlled lateral motion in response to a small deformation in the axial direction of a MEM beam or body. Lateral motion is produced by buckling of one or more long slender beams, the buckling motion being relatively large with respect to the axial motion which causes such lateral motion. The beams may be designed with a slight asymmetry to achieve gradual buckling in a desired direction. The device is capable of amplifying a driving motion in the range of 1-5 micrometers to produce a transverse motion in the range of 50-200 micrometers.
Abstract:
A microelectromechanical compound stage microactuator assembly capable of motion along x, y, and z axes for positioning and scanning integrated electromechanical sensors and actuators is fabricated from submicron suspended single crystal silicon beams. The microactuator incorporates an interconnect system for mechanically supporting a central stage and for providing electrical connections to componants of the microactuator and to devices carried thereby. The microactuator is fabricated using a modified single crystal reactive etching and metallization process which incorporates an isolation process utilizing thermal oxidation of selected regions of the device to provide insulating segments which define conductive paths from external circuitry to the actuator components and to microelectronic devices such as gated field emitters carried by the actuator.
Abstract:
A tunable electromicromechanical resonator structure incorporates an electrostatic actuator which permits reduction or enhancement of the resonant frequency of the structure. The actuator consists of two sets of opposed electrode fingers, each set having a multiplicity of spaced, parallel fingers. One set is mounted on a movable portion of the resonator structure and one set is mounted on an adjacent fixed base on substrate, with the fingers in opposed relationship and their adjacent ends spaced apart by a gap. An adjustable bias voltage across the sets of electrodes adjusts the resonant frequency of the movable structure.
Abstract:
A fabrication process for vacuum microelectronic devices having multiple electrode levels includes production of a first-level electrode mask on a substrate. The mask pattern is transferred to the substrate to produce a trench surrounding an emitter which is formed by thermal oxidation. The trench is filled with tungsten to form a gate electrode surrounding the emitter, and the resulting wafer is planarized. A second-level electrode is formed on the top surface of the wafer, and is planarized. Additional levels are similarly produced, and thereafter the electrodes are released.
Abstract:
A method of fabricating released microelectromechanical and microoptomechanical structures having electrically isolating segments from single crystal silicon includes thermal oxidation steps. The structures are defined using a single mask patterning process, and the structure is partially thermally oxidized. This is followed by a second masking step which is used to define segments to be completely thermally oxidized, and a second oxidation step completes the fabrication of the isolating segment. Thereafter the structure is released from the underlying substrate.