TUNNEL MAGNETORESISTIVE EFFECT ELEMENT AND MAGNETIC MEMORY

    公开(公告)号:US20190333819A1

    公开(公告)日:2019-10-31

    申请号:US16080788

    申请日:2017-09-06

    Inventor: Tomoyuki SASAKI

    Abstract: A TMR element includes a reference layer, a magnetization free layer, a tunnel barrier layer between the reference layer and the magnetization free layer, and a perpendicular magnetization inducing layer and a leakage layer stacked on a side of the magnetization free layer opposite to the tunnel barrier layer side. A magnetization direction of the reference layer is fixed along a stack direction. The perpendicular magnetization inducing layer imparts magnetic anisotropy along the stack direction to the magnetization free layer. The leakage layer is disposed on an end portion region in an in-plane direction of the magnetization free layer. The perpendicular magnetization inducing layer is disposed on at least a central region in the in-plane direction of the magnetization free layer. A resistance value of the leakage layer along the stack direction per unit area in plane is less than that of the perpendicular magnetization inducing layer.

    TUNNEL MAGNETORESISTIVE EFFECT ELEMENT, MAGNETIC MEMORY, BUILT-IN MEMORY, AND METHOD OF MANUFACTURING TUNNEL MAGNETORESISTIVE EFFECT ELEMENT

    公开(公告)号:US20190180900A1

    公开(公告)日:2019-06-13

    申请号:US16081022

    申请日:2017-10-16

    Inventor: Tomoyuki SASAKI

    Abstract: A TMR element includes a magnetic tunnel junction element unit and a side wall portion that includes an insulation material and is disposed on a side surface of the magnetic tunnel junction element unit. The magnetic tunnel junction element unit includes a reference layer, a magnetization free layer, a tunnel barrier layer that is stacked in a stack direction between the reference layer and the magnetization free layer, and a cap layer is stacked on the side of the magnetization free layer opposite to the tunnel barrier layer side. The side wall portion includes a first region that includes the insulation material and covers a side surface of at least one of the reference layer, the tunnel barrier layer, the magnetization free layer, or the cap layer of the magnetic tunnel junction element unit. The first region includes, as a contained chemical element, at least one of chemical elements (except oxygen) that constitute the at least one of the reference layer, the tunnel barrier layer, the magnetization free layer, or the cap layer of the magnetic tunnel junction element unit.

    TUNNEL MAGNETORESISTIVE EFFECT ELEMENT, MAGNETIC MEMORY, AND BUILT-IN MEMORY

    公开(公告)号:US20190178956A1

    公开(公告)日:2019-06-13

    申请号:US16080910

    申请日:2017-10-16

    Inventor: Tomoyuki SASAKI

    Abstract: A TMR element includes a reference layer, a tunnel barrier layer, a perpendicular magnetization inducing layer, and a magnetization free layer stacked along a stack direction between the tunnel barrier layer and the perpendicular magnetization inducing layer. The perpendicular magnetization inducing layer imparts magnetic anisotropy along the stack direction to the magnetization free layer. The width of the magnetization free layer is smaller than any of the width of the tunnel barrier layer or the width of the perpendicular magnetization inducing layer.

    FERROMAGNETIC MULTILAYER FILM, MAGNETORESISTANCE EFFECT ELEMENT, AND METHOD FOR MANUFACTURING FERROMAGNETIC MULTILAYER FILM

    公开(公告)号:US20190154767A1

    公开(公告)日:2019-05-23

    申请号:US16099628

    申请日:2018-02-27

    Abstract: A ferromagnetic multilayer film includes first and second magnetization fixed layers, first and second interposed layers, and a magnetic coupling layer. The magnetization fixed layers are antiferromagnetically coupled by exchange coupling via the interposed layers and the magnetic coupling layer. A main element of the magnetic coupling layer is Ru, Rh, or Ir. A main element of the first interposed layer is the same as that of the magnetic coupling layer. A main element of the second interposed layer is different from that of the magnetic coupling layer. A thickness of the first interposed layer is greater than or equal to 1.5 times and less than or equal to 3.2 times an atomic radius of the main element of the first interposed layer. A thickness of the second interposed layer is less than or equal to 1.5 times an atomic radius of the main element of the second interposed layer.

    MAGNETORESISTANCE EFFECT ELEMENT, MAGNETIC SENSOR AND MAGNETIC MEMORY

    公开(公告)号:US20190137576A1

    公开(公告)日:2019-05-09

    申请号:US16099756

    申请日:2017-09-01

    Inventor: Tomoyuki SASAKI

    Abstract: The present invention provides a magnetoresistance effect element that has a first ferromagnetic metal layer, a second ferromagnetic metal layer, and a tunnel barrier layer provided between the first ferromagnetic metal layer and the second ferromagnetic metal layer. The tunnel barrier layer has a cubic crystal structure, and the first ferromagnetic metal layer or the second ferromagnetic metal layer is formed of a material having a cubic crystal structure represented by Fe2CoSi. A crystal surface for crystals constituting the tunnel barrier layer and a crystal surface for crystals constituting the first ferromagnetic metal layer or the second ferromagnetic metal layer are matched to be inclined at 0° or 45° in at least a part of a crystal interface between the tunnel barrier layer and the first ferromagnetic metal layer or the second ferromagnetic metal layer.

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