公开(公告)号：US4107385A

公开(公告)日：1978-08-15

申请号：US579471

申请日：1975-05-21

申请人： Shigetaka Higuchi ,  Masaatsu Iwasaki ,  Shigeo Kimura

发明人： Shigetaka Higuchi ,  Masaatsu Iwasaki ,  Shigeo Kimura

IPC分类号： G11B5/71 ,  H01F10/02

CPC分类号： G11B5/71 ,  Y10S428/90 ,  Y10T428/31507 ,  Y10T428/31511 ,  Y10T428/31565 ,  Y10T428/31587 ,  Y10T428/31591 ,  Y10T428/31609

摘要： A magnetic recording medium comprising a base, for example, of a non-magnetic plastic resin, and a magnetic layer coated on the base and composed of a binder with a magnetic powder dispersed therein, is provided with a friction-reducing additive in the magnetic layer constituted by a boron compound obtained by the esterification of boric acid with a polyhydric alcohol having vicinal hydroxyl groups, such as, glycerin. The amount of such boron compound is from 1 to 15, and preferably, from 4 to 10 parts by weight for each 100 parts by weight of the binder. The preferred boron compounds are those including mono- or di-esters of a fatty acid with or without ethylene oxide.

摘要翻译： 包括例如非磁性塑料树脂的基底和涂覆在基底上并由其中分散有磁性粉末的粘合剂组成的磁性层的磁记录介质在磁性材料中设置有减摩添加剂 由硼酸与具有相邻羟基的多元醇如甘油酯化得到的硼化合物构成的层。 这种硼化合物的量相对于100重量份的粘合剂为1〜15，优选为4〜10重量份。 优选的硼化合物是包括具有或不具有环氧乙烷的脂肪酸的单酯或二酯的硼化合物。

公开(公告)号：US20130216956A1

公开(公告)日：2013-08-22

申请号：US13879125

申请日：2011-10-07

申请人： Takahiro Kishioka ,  Daisuke Sakuma ,  Shigeo Kimura ,  Hirokazu Nishimaki ,  Tomoya Ohashi ,  Yuki Usui

发明人： Takahiro Kishioka ,  Daisuke Sakuma ,  Shigeo Kimura ,  Hirokazu Nishimaki ,  Tomoya Ohashi ,  Yuki Usui

IPC分类号： G03F7/075 ,  G03F7/20

CPC分类号： G03F7/0752 ,  C07F7/1804 ,  C08G77/28 ,  C09D183/08 ,  G03F7/0751 ,  G03F7/165 ,  G03F7/20 ,  G03F7/30

摘要： There is provided a composition for forming a monolayer or a multilayer on the substrate. A composition for forming a monolayer or a multilayer containing a silane compound of Formula (1A) or Formula (1B): [where R1s are independently a methyl group or an ethyl group; Xs are independently a C1-10 linking group; and Zs are independently a C1-10 alkyl group or a phenyl group optionally having a substituent, where X optionally contains at least one oxygen atom or sulfur atom in the main chain thereof, and when Z is an alkyl group, at least one hydrogen atom of the alkyl group is optionally substituted with a fluorine atom] and an organic solvent.

摘要翻译： 提供了在基材上形成单层或多层的组合物。 用于形成单层的组合物或含有式（1A）或式（1B）的硅烷化合物的多层：[其中R 1独立地是甲基或乙基; X独立地为C1-10连接基团; 并且Z独立地为C1-10烷基或任选具有取代基的苯基，其中X任选地在其主链中含有至少一个氧原子或硫原子，当Z为烷基时，至少一个氢原子 的烷基任选被氟原子取代]和有机溶剂。

公开(公告)号：US20110311915A1

公开(公告)日：2011-12-22

申请号：US12817648

申请日：2010-06-17

申请人： Shigeo Kimura ,  Hirokazu Nishimaki ,  Tomoya Ohashi ,  Yuki Usui ,  Takahiro Kishioka

发明人： Shigeo Kimura ,  Hirokazu Nishimaki ,  Tomoya Ohashi ,  Yuki Usui ,  Takahiro Kishioka

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/091 ,  G03F7/095

摘要： A resist underlayer film forming composition used in a lithography process includes: a polymer (A) containing a unit structure having a hydroxy group, a unit structure having a carboxy group, or combination thereof; a crosslinkable compound (B) having at least two vinyl ether groups; a photoacid generator (C); a C4-20 fluoroalkylcarboxylic acid or a salt of the fluoroalkylcarboxylic acid (D); and a solvent (E). The polymer (A) includes a unit structure selected from unit structures of Formula (1), Formula (2), and Formula (3);

摘要翻译： 在光刻工艺中使用的抗蚀剂下层膜成膜组合物包括：含有具有羟基的单元结构的聚合物（A），具有羧基的单元结构或其组合; 具有至少两个乙烯基醚基团的交联性化合物（B） 光致酸发生器（C）; C4-20氟代烷基羧酸或氟烷基羧酸（D）的盐; 和溶剂（E）。 聚合物（A）包括选自式（1），式（2）和式（3）的单元结构的单元结构;

公开(公告)号：US20100215281A1

公开(公告)日：2010-08-26

申请号：US12772507

申请日：2010-05-03

申请人： Kamen Kanev ,  Shigeo Kimura

发明人： Kamen Kanev ,  Shigeo Kimura

IPC分类号： G06K9/62

CPC分类号： G06T1/005 ,  G06K19/06037 ,  G06T2201/0051 ,  G06T2201/0065 ,  H04N19/17 ,  H04N19/20

摘要： Clustering-definition-based encoding schemes printed as a computer-oriented digital layer onto a physical surface whereby the surface functions as an interface enabling, via a simple image-acquisition device scanning a minimal field required to establish the clustering definition, the provision, to a suitable data processing and human-oriented display means, of feedback on the orientation of the image-acquisition device relative to the digital layer overall.

摘要翻译： 基于聚类定义的编码方案被打印为面向计算机的数字层到物理表面上，由此表面用作接口，使得能够经由简单的图像采集设备扫描建立聚类定义所需的最小场， 合适的数据处理和面向人的显示装置，对于整个图像采集装置相对于数字层的取向的反馈。

公开(公告)号：US20080138744A1

公开(公告)日：2008-06-12

申请号：US11596391

申请日：2005-05-11

申请人： Tadashi Hatanaka ,  Shigeo Kimura ,  Tomoyuki Enomoto

发明人： Tadashi Hatanaka ,  Shigeo Kimura ,  Tomoyuki Enomoto

IPC分类号： G03F7/26 ,  G03F7/00

CPC分类号： G03F7/0392 ,  G03F7/091 ,  G03F7/095 ,  G03F7/11 ,  G03F7/168

摘要： There is provided an anti-reflective coating forming composition for use in a lithography of the manufacture of semiconductor devices and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. The anti-reflective coating forming composition comprises a compound having at least two vinyl ether groups, an alkali-soluble compound having at least two phenolic hydroxy groups or carboxyl groups, a photoacid generator, and a solvent.

摘要翻译： 提供了一种用于制造半导体器件的光刻中的抗反射涂层形成组合物和用于形成可用用于光致抗蚀剂的碱性显影剂显影的抗反射涂层，以及通过使用 抗反射涂层形成组合物。 抗反射涂层形成组合物包含具有至少两个乙烯基醚基团的化合物，具有至少两个酚羟基或羧基的碱溶性化合物，光致酸产生剂和溶剂。

公开(公告)号：US20080003524A1

公开(公告)日：2008-01-03

申请号：US11666080

申请日：2005-10-25

申请人： Takahiro Kishioka ,  Tadashi Hatanaka ,  Shigeo Kimura

发明人： Takahiro Kishioka ,  Tadashi Hatanaka ,  Shigeo Kimura

IPC分类号： G03F7/11 ,  C08G59/14 ,  H01L21/027

CPC分类号： G03F7/091 ,  C08G59/1433 ,  C08G59/1483 ,  C08G59/26 ,  C08G59/28 ,  Y10S438/952

摘要： There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.

摘要翻译： 提供了一种用于光刻的抗反射涂层形成组合物，其包含高分子化合物，交联化合物，交联催化剂，磺酸盐化合物和溶剂。 由组合物得到的抗反射涂层对反射光具有很高的防止效果，不会与光致抗蚀剂混合，与光致抗蚀剂相比具有更高的干蚀刻速率，可以形成在下部没有基脚的光致抗蚀剂图案，并且可以用于 通过使用诸如ArF准分子激光束和F2准分子激光束等光的光刻工艺

公开(公告)号：US20070004228A1

公开(公告)日：2007-01-04

申请号：US10569471

申请日：2004-08-27

申请人： Tadashi Hatanaka ,  Tomoyuki Enomoto ,  Shigeo Kimura

发明人： Tadashi Hatanaka ,  Tomoyuki Enomoto ,  Shigeo Kimura

IPC分类号： H01L21/31

CPC分类号： G03F7/091 ,  Y10S438/952

摘要： There is provided an anti-reflective coating forming composition for use in a lithography and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. Concretely, the composition comprises a polyamic acid produced from a tetracarboxylic dianhydride compound and a diamine compound having at least one carboxyl group, a compound having at least two epoxy groups, and a solvent.

摘要翻译： 提供了用于光刻和用于形成可用用于光致抗蚀剂的碱性显影剂显影的抗反射涂层的抗反射涂层形成组合物，以及通过使用抗反射涂层形成法形成光刻胶图案的方法 组成。 具体地，该组合物包含由四羧酸二酐化合物制得的聚酰胺酸和具有至少一个羧基的二胺化合物，具有至少两个环氧基的化合物和溶剂。

公开(公告)号：US06838765B2

公开(公告)日：2005-01-04

申请号：US09963839

申请日：2001-09-26

申请人： Haruo Hyodo ,  Shigeo Kimura ,  Yasuhiro Takano

发明人： Haruo Hyodo ,  Shigeo Kimura ,  Yasuhiro Takano

IPC分类号： H01L23/02 ,  H01L23/055 ,  H01L23/10 ,  H01L23/62 ,  H01L23/12

CPC分类号： H01L24/97 ,  H01L23/055 ,  H01L23/10 ,  H01L23/62 ,  H01L24/45 ,  H01L24/48 ,  H01L2224/32225 ,  H01L2224/45015 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/48247 ,  H01L2224/48257 ,  H01L2224/73265 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/09701 ,  H01L2924/12032 ,  H01L2924/12041 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/16195 ,  H01L2924/19043 ,  H01L2224/85 ,  H01L2224/83 ,  H01L2924/00 ,  H01L2924/20753

摘要： The present invention comprises a first main face (22a) on a surface side of a substrate (21a). An island portion (26) is formed on the first main face (22a) and a semiconductor chip (29), etc. are adhered thereto. The semiconductor chip (29), etc. are sealed in the hollow portion that is constructed by a column portion (23) and a transparent glass plate (36). Then, the column portion (23) and the transparent glass plate (36) are adhered by epoxy resin, or the like.

摘要翻译： 本发明包括在基板（21a）的表面侧上的第一主面（22a）。 岛部（26）形成在第一主面（22a）上，并且半导体芯片（29）等粘接在其上。 半导体芯片（29）等密封在由柱部（23）和透明玻璃板（36）构成的中空部中。 然后，柱部（23）和透明玻璃板（36）用环氧树脂等粘接。

公开(公告)号：US06665502B2

公开(公告)日：2003-12-16

申请号：US09873292

申请日：2001-06-05

申请人： Fumitake Hirobe ,  Shigeo Kimura

发明人： Fumitake Hirobe ,  Shigeo Kimura

IPC分类号： G03G1500

CPC分类号： G03G15/5041 ,  G03G15/5037 ,  G03G2215/00042 ,  G03G2215/00054

摘要： The present invention concerns controlling a potential used to form an electrostatic image for image formation. According to the invention, an electrostatic latent image is formed on an image bearing member using, for example, a potential stored in a memory. The potential of the latent image is detected, and if the potential is not within a specified range, the potential is controlled (i.e., changed) to form another latent image with the changed potential. The latent image is then developed and the density of the developed image detected. In one embodiment, the amount of developer to be replenished is then controlled based upon the detected density and a target potential value, where the target potential value is determined and set based on the detected density and the potential used in the potential controlling step. In a related embodiment, when a result of the potential obtained after termination of a normal image formation process is out of a designated range, potential control is performed after termination of a next normal image formation process.

摘要翻译： 本发明涉及控制用于形成用于图像形成的静电图像的电位。 根据本发明，使用例如存储在存储器中的电位，在图像承载部件上形成静电潜像。 检测潜像的电位，如果电位不在规定范围内，则电位被控制（即改变），形成具有变化的电位的另一潜像。 然后显影潜像，并检测显影图像的浓度。 在一个实施例中，然后基于检测到的密度和目标电位值来控制要补充的显影剂的量，其中基于检测到的浓度和在电势控制步骤中使用的电位来确定和设定目标电势值。 在相关实施例中，当在正常图像形成处理结束之后获得的电位的结果超出指定范围时，在下一个正常图像形成处理结束之后执行电位控制。

公开(公告)号：US06459862B1

公开(公告)日：2002-10-01

申请号：US09688110

申请日：2000-10-16

申请人： Yuji Sakemi ,  Shigeo Kimura ,  Fumitake Hirobe

发明人： Yuji Sakemi ,  Shigeo Kimura ,  Fumitake Hirobe

IPC分类号： G03G1500

CPC分类号： G03G15/065

摘要： A developing apparatus has a developer carrying body provided to face an image bearing body. The developer carrying body carries and conveys a developer having toner and carrier to a developing region. A bias applying device applies a developing bias to the developer carrying body, wherein the bias applying device applies to the developer carrying body the developing bias having periodically a voltage portion having alternately a first voltage to generate an electric field to direct toner from the developer carrying body to the image bearing body and a second voltage to generate an electric field to direct the toner from the image bearing body to the developer carrying body and a pause portion to pause applying the alternate voltage, wherein T1 and T2 have a relationship of T1>T2, where T1 is as an applying time period of the first voltage and T2 is an applying time period of the second voltage.

摘要翻译： 显影装置具有设置成面对图像承载体的显影剂承载体。 显影剂携带体携带并将具有调色剂和载体的显影剂输送到显影区域。 偏置施加装置将显影偏压施加到显影剂承载体上，其中偏压施加装置将显影偏压周期性地施加到显影剂承载体上，所述显影偏压周期性地具有交替地具有第一电压的电压部分，以产生电场，以将调色剂从显影剂携带 并且第二电压产生电场以将调色剂从图像承载体引导到显影剂携带体和暂停部分以暂停施加交替电压，其中T1和T2的关系为T1> T2，其中T1作为第一电压的施加时间段，T2是第二电压的施加时间段。