摘要:
A non-copper-plated solid wire for CO2 gas shielded arc welding. The non-copper-plated solid wire for CO2 gas shielded arc welding with excellent feedability ensures a reduced amount of generated spatters when welded at a relatively low current area, resulting from controlling the ten point average roughness (Rz) of the wire surface to 0.10 to 9.00 μm and the Vickers micro-hardness of the wire surface (Hv(1g)) to 125 to 310. Therefore, the welding operation can be carried out with a high efficiency to produce a weld of good quality.
摘要:
Disclosed herein is a semiconductor manufacturing apparatus. The apparatus comprises a transfer module, first and second process modules equipped to adjacent first and second faces of the transfer module while defining an acute angle to the first and second faces of the transfer module, respectively, and a load-lock chamber connected to a third face of the transfer module. The adjacent process modules are disposed parallel to each other. As such, the process modules are close to or in contact with each other on the transfer module, thereby reducing an area occupied by the apparatus without reducing manufacturing efficiency. A source supply unit can be enlarged towards an adjacent face of the adjacent process modules, so that various source materials for forming semiconductor chips can be effectively supplied to the semiconductor manufacturing apparatus through the enlarged source supply unit.
摘要:
Disclosed herein is a device for driving a LED for a flash of a camera, such as a digital camera or a camera of a mobile phone, which is capable of driving the LED in two modes to reduce power consumption. The LED drive device comprises the LED, a continuous low current driver for continuously supplying current which is lower than or equal to rated current of the LED to the LED, a high-current pulse driver for supplying current which is higher than the rated current of the LED to the LED for a predetermined period of time, and a mode selector for selecting one of the continuous low current driver and the high-current pulse driver to drive the LED. According to the present invention, it is possible to prevent unnecessary power consumption and deterioration of reliability of the LED, and obtain an image of brighter picture quality.
摘要:
The present invention provides a nitride semiconductor light-emitting device comprising a first conductive nitride semiconductor layer; an active layer formed on the first conductive nitride semiconductor layer, and having at least one quantum well layer and at least one quantum barrier layer alternatively laminated; and a second conductive nitride semiconductor layer formed on the active layer, wherein at least one of the quantum well layer and quantum barrier layer in the active layer is doped with elemental Al in a concentration of less than 1%.
摘要:
A thin film transistor array substrate includes a first conductive pattern group including a gate electrode of a thin film transistor and a gate line connected to the gate electrode; a semiconductor pattern defining a channel of the thin film transistor; a second conductive pattern group including source and drain electrodes of the thin film transistor and a data line crossing the gate line, a pixel area being defined by the data line crossing the gate line; a third conductive pattern group having a pixel electrode connected to the thin film transistor; and at least one dummy pattern disposed between at least one of the first to third conductive pattern groups and an adjacent one of the semiconductor patterns.
摘要:
Disclosed herein is a polishing slurry for chemical mechanical polishing. The polishing slurry comprises polishing particles, which have a particle size distribution including separated fine and large polishing particle peaks. The polishing slurry also comprises polishing particles, which have a median size of 50-150 nm. The present invention provides the slurry having an optimum polishing particle size, in which the polishing particle size is controlled and which is useful to produce semiconductors having fine design rules by changing the production conditions of the slurry. The present invention also provides the polishing slurry and a method of producing the same, in which a desirable CMP removal rate is assured and scratches are suppressed by controlling a polishing particle size distribution, and a method of polishing a substrate.
摘要:
A chain monitoring device is provided with a base, guiding posts fixed to the base, a member movable along the guiding posts, a chain sprocket rotatable with a chain with its teeth being engaged into the chain, springs for resiliently urging the member for the engagement of the teeth into the chain, and a sensor detecting a change in position of the member. The chain sprocket is rotatably mounted to the member.
摘要:
An apparatus and a method for controlling an operation of a compressor capable of preventing an under stroke or an overstroke of a compressor, occurring due to a variation value of a power voltage applied to a motor of the compressor includes a control unit outputting a selection signal according to a variation value of a power voltage applied to the motor of the compressor; capacitors connected to the motor; and a switching unit selectively varying capacitance of the capacitors based on the selection signal.
摘要:
Provided is a method for planarizing a polysilicon surface grown by means of a sequential lateral solidification method, which comprises the steps of: crystallizing an amorphous silicon having a predetermined thickness formed on a substrate into the polysilicon layer by means of the sequential lateral solidification method; and planarizing the polysilicon layer by means of a laser having an energy density for converting partially melted polysilicon into fully melted polysilicon, so that electrical characteristics of element may be improved when the polysilicon thin film transistor is fabricated using the planarization process.
摘要:
Provided is a method of crystallizing/activating a polysilicon layer and a method of fabricating a thin film transistor having the same polysilicon layer, in which when a gate material is patterned to form a gate electrode and define source/drain regions, the gate material on source/drain regions partially remains, so that crystallizing and activating processes are performed at the same time.