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公开(公告)号：US06680107B2
公开(公告)日：2004-01-20
申请号：US10045160
申请日：2002-01-15
IPC分类号： B32B326
CPC分类号： C08J5/18 , C08J2383/04 , C08L43/04 , C08L83/04 , C09D183/04 , Y10T428/249953 , Y10T428/31663 , C08L2666/14 , C08L2666/04
摘要： A composition comprising (A) a silanol group-bearing silicone resin comprising 30-100 mol % of T units: R1—SiZ3 and among the entire T units, 30-80 mol % of T-2 units containing only one silanol group: R1—Si(OH)Z′2 wherein R1 is a monovalent hydrocarbon group, Z is OH, hydrolyzable group or siloxane residue, at least one Z being a siloxane residue, and Z′ is a siloxane residue, and having a number average molecular weight of at least 100, and (B) a polymer resulting from an acrylate and/or methacrylate monomer is applied to a substrate and heated above the decomposition temperature of polymer (B) to form a porous film. The porous film is flat and uniform despite porosity, and has a low permittivity and high mechanical strength. It is best suited as an interlayer insulating layer when used in semiconductor device fabrication.
摘要翻译： 一种组合物，其包含（A）含有硅烷醇基的硅氧烷树脂，其包含30-100摩尔％的T单元：R 1 -SiZ 3，在整个T单元中，30-80摩尔％的仅含有一个硅烷醇的T-2单元 基团：R 1 -Si（OH）Z'2其中R 1是一价烃基，Z是OH，可水解基团或硅氧烷残基，至少一个Z是硅氧烷残基，Z'是硅氧烷 残基，数均分子量为100以上，（B）将由丙烯酸酯和/或甲基丙烯酸酯单体得到的聚合物加到基材上并加热到高于聚合物（B）的分解温度以形成多孔膜 。 多孔膜尽管孔隙度是平坦的和均匀的，并且具有低介电常数和高机械强度。 当用于半导体器件制造时，它最适合作为层间绝缘层。
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公开(公告)号：US6093240A
公开(公告)日：2000-07-25
申请号：US896175
申请日：1997-07-17
IPC分类号： C08L83/08 , C08G77/26 , C08G77/28 , C08L83/04 , C09D183/04 , C09D183/08
CPC分类号： C09D183/08 , C08G77/26
摘要： An organic silicon compound is obtained by hydrolyzing (A) a hydrolyzable silane containing an alkoxy or acyloxy group and a nitrogenous organic group: and (B) a hydrolyzable silane containing an alkoxy or acyloxy group. The hydrolyzate or organic licon compound is available as an aqueous solution which is ready for use as a binder composition. An aqueous coating composition comprising the binder composition and optionally, a UV screen compound is also provided. The binder composition and the coating composition are shelf stable and impart water resistance, heat resistance and weatherability.
摘要翻译： 通过水解（A）含有烷氧基或酰氧基和含氮有机基团的水解性硅烷得到有机硅化合物：（B）含有烷氧基或酰氧基的可水解硅烷。 水解产物或有机icon化合物可作为水溶液使用，其可用作粘合剂组合物。 还提供了包含粘合剂组合物和任选的UV屏蔽化合物的水性涂料组合物。 粘合剂组合物和涂料组合物是稳定的并具有耐水性，耐热性和耐候性。
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公开(公告)号：US6001422A
公开(公告)日：1999-12-14
申请号：US58162
申请日：1998-04-10
申请人： Motohiko Hirai , Fujio Yagihashi
发明人： Motohiko Hirai , Fujio Yagihashi
IPC分类号： C07F7/08 , C07F7/18 , C08L83/08 , D06M15/643 , D06M101/00 , D06M101/02 , D06M101/06 , D06M101/08 , B05D3/02
CPC分类号： D06M15/6436 , D06M2101/06 , D06M2101/08 , D06M2101/12 , D06M2101/26 , D06M2101/32 , D06M2101/34 , D06M2101/38 , D06M2200/25 , D06M2200/50
摘要： Proposed is a method for the finishing treatment of various kinds of fabric materials with an aminoalkyl-modified dimethylpolysiloxane to impart the fabric material with excellent softness and smoothness with less disadvantages of yellowing of the treated fabric material than in the prior art using similar aminoalkyl-modified dimethylpolysiloxanes. In the inventive method, the aminoalkyl-modified dimethylpolysiloxane is represented by the general formulaA--SiR.sub.2 --O--(--SiR.sub.2 --O--).sub.p --(--SiRQ--O--).sub.q --SiR.sub.2 --A,in which R is a monovalent hydrocarbon group having 1 to 20 carbon atoms, Q is an aminoalkyl group expressed by the general formula--R.sup.1 --(--NH--CH.sub.2 --CH.sub.2 --).sub.n --NH.sub.2,R.sup.1 being a divalent hydrocarbon group having 1 to 8 carbon atoms and the subscript n being 2 or 3, A is a hydroxyl group, R, OR or Q, the subscript p is an average number in the range from 5 to 2000 and the subscript q is 0 or an average number not exceeding 100 with the proviso that q is not 0 when the groups denoted by A in a molecule are each a hydroxyl group, R or OR, and having an amine equivalent in the range from 5000 to 100,000 g/mole.
摘要翻译： 提出了使用氨基烷基改性的二甲基聚硅氧烷对各种织物进行精加工处理的方法，以使得织物材料具有优异的柔软性和光滑度，而与已有技术相似的氨基烷基改性的处理过的织物材料变黄的缺点较少 二甲基聚硅氧烷。 在本发明的方法中，氨基烷基改性的二甲基聚硅氧烷由通式A-SiR2-O-（-SiR2-O-）p - （ - SiRQ-O-）q-SiR2-A表示，其中R是一价 Q为由通式-R1 - （ - NH-CH2-CH2-）n-NH2表示的氨基烷基，R1为碳原子数为1〜8的二价烃基，下标为 n为2或3，A为羟基，R，OR或Q，下标p为5至2000的平均数，下标q为0或平均数不超过100，条件是q 分子中由A表示的基团各自为羟基，R或OR，胺当量为5000〜100,000g / mol时，不为0。
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公开(公告)号：US5314931A
公开(公告)日：1994-05-24
申请号：US889370
申请日：1992-05-28
IPC分类号： C08F12/00 , C08F12/22 , G03F7/004 , G03F7/029 , G03F7/038 , G03F7/039 , H01L21/027 , C08J3/28 , C08F8/00 , C08F120/10 , C08L33/06
摘要： A resist based on a living polymer is provided. Living anionic polymerization of p-alkoxycarbonylstyrene monomers results in polymers having a molecular weight distribution (Mw/Mn) of from 1 to 1.4.
摘要翻译： 提供了基于活性聚合物的抗蚀剂。 对 - 烷氧基羰基苯乙烯单体的活性阴离子聚合导致分子量分布（Mw / Mn）为1至1.4的聚合物。
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45.发明授权Composition for forming resist underlayer film and patterning process using the same 有权用于形成抗蚀剂下层膜的组合物和使用其的图案化方法公开(公告)号：US08951917B2
公开(公告)日：2015-02-10
申请号：US13524669
申请日：2012-06-15
IPC分类号： C09D183/00 , C09D183/06 , C08L83/06 , H01L21/312 , G03F7/075 , G03F7/09 , C08G77/14 , C08G77/18 , C08G77/56 , C08G77/58
CPC分类号： C09D183/06 , C08G77/14 , C08G77/18 , C08G77/56 , C08G77/58 , C08L83/06 , G03F7/0751 , G03F7/0752 , G03F7/094
摘要： The invention provides a composition for forming a silicon-containing resist underlayer film comprising: (A) a silicon-containing compound obtained by a hydrolysis-condensation reaction of a mixture containing, at least, one or more hydrolysable silicon compound shown by the following general formula (1) and one or more hydrolysable compound shown by the following general formula (2), and (B) a silicon-containing compound obtained by a hydrolysis-condensation reaction of a mixture containing, at least, one or more hydrolysable silicon compound shown by the following general formula (3) and one or more hydrolysable silicon compound shown by the following general formula (4). There can be provided a composition for forming a resist underlayer film applicable not only to a resist pattern obtained in a negative development but also to a resist pattern obtained in a conventional positive development, and a patterning process using this composition R1m1R2m2R3m3Si(OR)(4-m1-m2-m3) (1) U(OR4)m4(OR5)m5 (2) R6m6R7m7R8m8Si(OR9)(4-m6-m7-m8) (3) Si(OR10)4 (4).
摘要翻译： 本发明提供一种用于形成含硅抗蚀剂下层膜的组合物，其包含：（A）通过水解 - 缩合反应获得的含硅化合物，所述含硅化合物含有至少一种或多种可水解的硅化合物， 式（1）和一种或多种下述通式（2）所示的可水解化合物，和（B）通过水解缩合反应获得的含硅化合物，所述含硅化合物含有至少一种或多种可水解硅化合物 由以下通式（3）表示，和一种或多种下述通式（4）表示的可水解硅化合物。 可以提供一种用于形成抗蚀剂下层膜的组合物，其不仅可用于以负显影获得的抗蚀图案，而且可应用于以常规阳极显影获得的抗蚀剂图案，以及使用该组合物R1m1R2m2R3m3Si（OR）（4） -m1-m2-m3）（1）U（OR4）m4（OR5）m5（2）R6m6R7m7R8m8Si（OR9）（4-m6-m7-m8）（3）Si（OR10）4（4）。
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公开(公告)号：US5935311A
公开(公告)日：1999-08-10
申请号：US15919
申请日：1998-01-30
摘要： A water-resistant ink composition comprising:(I) 10 parts by weight of a water-soluble dye compound and/or organic pigment compound;(II) 2 to 60 parts by weight of an organosilicon compound which is obtained from a mixture of components (A) and (B) shown below by hydrolysis in water or in an organic solvent containing more water than necessary for hydrolysis,(A) 100 parts by weight of a hydrolyzable silane having a nitrogen-containing organic group represented by the following formula (1):YR.sup.1.sub.m SiR.sup.2.sub.3-m (1) wherein R.sup.1 is a C.sub.1-8 unsubstituted or substituted monovalent hydrocarbon group containing no nitrogen atom, R.sup.2 is a C.sub.1-4 alkoxyl group or acyloxy group, Y is a nitrogen-containing organic group, and m is 0 or 1, or a partial hydrolyzate thereof and(B) 5 to 200 parts by weight of a hydrolyzable silane represented by the following formula (2):R.sup.3.sub.n SiR.sup.4.sub.4-n (2) wherein R.sup.3 is a C.sub.1-8 unsubstituted or substituted monovalent hydrocarbon group containing no nitrogen atom, R.sup.4 is a C.sub.1-4 alkoxyl group or acyloxy group, and n is 0, 1, or 2, or a partial hydrolyzate thereof, and(III) 30 to 10,000 parts by weight of water.
摘要翻译： 一种防水油墨组合物，其包含：（I）10重量份的水溶性染料化合物和/或有机颜料化合物; （II）通过在水中或含水多于水解所需的水的有机溶剂中水解得到的有机硅化合物2〜60重量份由下述成分（A）和（B）的混合物得到，（A） 100重量份具有由下式（1）表示的含氮有机基团的可水解硅烷：YR1mSiR23-m（1）其中R1是不含氮原子的C1-8未取代或取代的一价烃基，R2是 C 1-4烷氧基或酰氧基，Y为含氮有机基团，m为0或1，或其部分水解产物和（B）5至200重量份由下式表示的可水解硅烷 （2）：R3nSiR44-n（2）其中R3是不含氮原子的C1-8未取代或取代的单价烃基，R4是C1-4烷氧基或酰氧基，n是0,1或2， 或其部分水解产物，和（III）30至10,000重量份的水。
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公开(公告)号：US5691112A
公开(公告)日：1997-11-25
申请号：US762861
申请日：1996-12-10
申请人： Satoshi Watanabe , Youichi Ohsawa , Toshinobu Ishihara , Kazumasa Maruyama , Yoshihumi Takeda , Junji Shimada , Fujio Yagihashi , Katsuya Takemura
发明人： Satoshi Watanabe , Youichi Ohsawa , Toshinobu Ishihara , Kazumasa Maruyama , Yoshihumi Takeda , Junji Shimada , Fujio Yagihashi , Katsuya Takemura
IPC分类号： C07C317/22 , C07C381/12 , G03F7/004
CPC分类号： G03F7/0045 , C07C317/22 , C07C381/12
摘要： Trifluoromethanesulfonic and p-toluenesulfonic acid bis- or tris(p-tert-butoxyphenyl)sulfonium salts are novel. They are prepared from bis(p-tert-butoxyphenyl)sulfoxide which is also novel. A chemically amplified positive resist composition which contains the sulfonium salt as a photo-acid generator is highly sensitive to deep-UV rays, electron beams and X-rays, can be developed with alkaline aqueous solution to form a pattern, and is thus suitable for use in a fine patterning technique.
摘要翻译： 三氟甲磺酸和对甲苯磺酸双或三（对叔丁氧基苯基）锍盐是新颖的。 它们由双（对叔丁氧基苯基）亚砜制备，也是新的。 含有锍盐作为光酸发生剂的化学增幅正性抗蚀剂组合物对深紫外线，电子束和X射线高度敏感，可以用碱性水溶液显影形成图案，因此适用于 使用精细图案化技术。
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公开(公告)号：US5633409A
公开(公告)日：1997-05-27
申请号：US379986
申请日：1995-01-27
申请人： Satoshi Watanabe , Youichi Ohsawa , Toshinobu Ishihara , Kazumasa Maruyama , Yoshihumi Takeda , Junji Shimada , Fujio Yagihashi , Katsuya Takemura
发明人： Satoshi Watanabe , Youichi Ohsawa , Toshinobu Ishihara , Kazumasa Maruyama , Yoshihumi Takeda , Junji Shimada , Fujio Yagihashi , Katsuya Takemura
IPC分类号： C07C317/22 , C07C381/12 , G03F7/004 , C07C319/00
CPC分类号： G03F7/0045 , C07C317/22 , C07C381/12
摘要： Trifluoromethanesulfonic and p-toluenesulfonic acid bis- or tris(p-tert-butoxyphenyl)sulfonium salts are novel. They are prepared from bis(p-tert-butoxyphenyl)sulfoxide which is also novel. A chemically amplified positive resist composition which contains the sulfonium salt as a photo-acid generator is highly sensitive to deep-UV rays, electron beams and X-rays, can be developed with alkaline aqueous solution to form a pattern, and is thus suitable for use in a fine patterning technique.
摘要翻译： 三氟甲磺酸和对甲苯磺酸双或三（对叔丁氧基苯基）锍盐是新颖的。 它们由双（对叔丁氧基苯基）亚砜制备，也是新的。 含有锍盐作为光酸发生剂的化学增幅正性抗蚀剂组合物对深紫外线，电子束和X射线高度敏感，可以用碱性水溶液显影形成图案，因此适用于 使用精细图案化技术。
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49.发明授权Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same 失效叔丁基4,4-双（4'-羟基苯基）戊酸酯衍生物和含有它们的正性抗蚀剂材料公开(公告)号：US06667415B1
公开(公告)日：2003-12-23
申请号：US08300245
申请日：1994-09-02
申请人： Fujio Yagihashi , Jun Watanabe , Minoru Takamizawa , Akinobu Tanaka , Yoshio Kawai , Tadahito Matsuda
发明人： Fujio Yagihashi , Jun Watanabe , Minoru Takamizawa , Akinobu Tanaka , Yoshio Kawai , Tadahito Matsuda
IPC分类号： C07C6976
CPC分类号： C07C69/734 , C07D309/12 , C07F7/1804 , G03F7/0045 , Y02P20/55
摘要： Disclosed are novel tert-butyl 4,4-bis(4′-hydroxyphenyl)pentanoate derivatives represented by the following general formula (I); wherein R1 represents a protective group which can be readily eliminated under an acidic condition, and R2 represents a hydrogen atom, a lower alkyl group or a lower alkoxy group: and high energy radiation-responsive positive resist materials using said novel derivatives as dissolution inhibitors.
摘要翻译： 公开了由以下通式（I）表示的新颖的4,4-双（4'-羟基苯基）戊酸叔丁酯衍生物：其中R 1表示在酸性条件下易于除去的保护基，R 代表氢原子，低级烷基或低级烷氧基;以及使用所述新衍生物作为溶解抑制剂的高能辐射响应正抗蚀材料。
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公开(公告)号：US5523370A
公开(公告)日：1996-06-04
申请号：US420798
申请日：1995-04-12
CPC分类号： C08F12/22
摘要： Provided is a poly(para-t-butoxycarbonyloxystyrene) having recurring units of the formula: ##STR1## which is prepared by anionic polymerization of para-t-butoxycarbonyloxystyrene. The polymer is of a controlled molecular weight and a narrow molecular weight distribution and has a high degree of resolution and development, meeting the requirements of resist materials. The method allows for simple preparation of such polymers.
摘要翻译： 提供具有下式的重复单元的聚（对叔丁氧基羰氧基苯乙烯）：其通过对叔丁氧羰基氧基苯乙烯的阴离子聚合制备。 该聚合物具有受控的分子量和窄的分子量分布，并且具有高分辨率和显影性，满足抗蚀剂材料的要求。 该方法允许简单制备这种聚合物。
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