公开(公告)号：US6093240A

公开(公告)日：2000-07-25

申请号：US896175

申请日：1997-07-17

申请人： Kazuyuki Matsumura ,  Masanao Kamei ,  Mitsuo Asai ,  Masaaki Yamaya ,  Fujio Yagihashi

发明人： Kazuyuki Matsumura ,  Masanao Kamei ,  Mitsuo Asai ,  Masaaki Yamaya ,  Fujio Yagihashi

IPC分类号： C08L83/08 ,  C08G77/26 ,  C08G77/28 ,  C08L83/04 ,  C09D183/04 ,  C09D183/08

CPC分类号： C09D183/08 ,  C08G77/26

摘要： An organic silicon compound is obtained by hydrolyzing (A) a hydrolyzable silane containing an alkoxy or acyloxy group and a nitrogenous organic group: and (B) a hydrolyzable silane containing an alkoxy or acyloxy group. The hydrolyzate or organic licon compound is available as an aqueous solution which is ready for use as a binder composition. An aqueous coating composition comprising the binder composition and optionally, a UV screen compound is also provided. The binder composition and the coating composition are shelf stable and impart water resistance, heat resistance and weatherability.

摘要翻译： 通过水解（A）含有烷氧基或酰氧基和含氮有机基团的水解性硅烷得到有机硅化合物：（B）含有烷氧基或酰氧基的可水解硅烷。 水解产物或有机icon化合物可作为水溶液使用，其可用作粘合剂组合物。 还提供了包含粘合剂组合物和任选的UV屏蔽化合物的水性涂料组合物。 粘合剂组合物和涂料组合物是稳定的并具有耐水性，耐热性和耐候性。

公开(公告)号：US5935311A

公开(公告)日：1999-08-10

申请号：US15919

申请日：1998-01-30

申请人： Kazuyuki Matsumura ,  Masanao Kamei ,  Fujio Yagihashi ,  Koji Kawashima

发明人： Kazuyuki Matsumura ,  Masanao Kamei ,  Fujio Yagihashi ,  Koji Kawashima

IPC分类号： C09D11/00 ,  C09D11/16 ,  C09D11/02

CPC分类号： C09D11/30 ,  C09D11/16

摘要： A water-resistant ink composition comprising:(I) 10 parts by weight of a water-soluble dye compound and/or organic pigment compound;(II) 2 to 60 parts by weight of an organosilicon compound which is obtained from a mixture of components (A) and (B) shown below by hydrolysis in water or in an organic solvent containing more water than necessary for hydrolysis,(A) 100 parts by weight of a hydrolyzable silane having a nitrogen-containing organic group represented by the following formula (1):YR.sup.1.sub.m SiR.sup.2.sub.3-m (1) wherein R.sup.1 is a C.sub.1-8 unsubstituted or substituted monovalent hydrocarbon group containing no nitrogen atom, R.sup.2 is a C.sub.1-4 alkoxyl group or acyloxy group, Y is a nitrogen-containing organic group, and m is 0 or 1, or a partial hydrolyzate thereof and(B) 5 to 200 parts by weight of a hydrolyzable silane represented by the following formula (2):R.sup.3.sub.n SiR.sup.4.sub.4-n (2) wherein R.sup.3 is a C.sub.1-8 unsubstituted or substituted monovalent hydrocarbon group containing no nitrogen atom, R.sup.4 is a C.sub.1-4 alkoxyl group or acyloxy group, and n is 0, 1, or 2, or a partial hydrolyzate thereof, and(III) 30 to 10,000 parts by weight of water.

摘要翻译： 一种防水油墨组合物，其包含：（I）10重量份的水溶性染料化合物和/或有机颜料化合物; （II）通过在水中或含水多于水解所需的水的有机溶剂中水解得到的有机硅化合物2〜60重量份由下述成分（A）和（B）的混合物得到，（A） 100重量份具有由下式（1）表示的含氮有机基团的可水解硅烷：YR1mSiR23-m（1）其中R1是不含氮原子的C1-8未取代或取代的一价烃基，R2是 C 1-4烷氧基或酰氧基，Y为含氮有机基团，m为0或1，或其部分水解产物和（B）5至200重量份由下式表示的可水解硅烷 （2）：R3nSiR44-n（2）其中R3是不含氮原子的C1-8未取代或取代的单价烃基，R4是C1-4烷氧基或酰氧基，n是0,1或2， 或其部分水解产物，和（III）30至10,000重量份的水。

公开(公告)号：US20100040895A1

公开(公告)日：2010-02-18

申请号：US12541594

申请日：2009-08-14

申请人： Yoshitaka Hamada ,  Fujio Yagihashi ,  Takeshi Asano

发明人： Yoshitaka Hamada ,  Fujio Yagihashi ,  Takeshi Asano

IPC分类号： B32B27/28 ,  C08L83/04 ,  B32B37/12

CPC分类号： C09J183/14 ,  C08G77/50 ,  C08G77/52 ,  C08G77/54 ,  H01L21/187 ,  H01L23/296 ,  H01L24/29 ,  H01L24/83 ,  H01L25/50 ,  H01L2224/29191 ,  H01L2224/2929 ,  H01L2224/29298 ,  H01L2224/83801 ,  H01L2224/83855 ,  H01L2225/06513 ,  H01L2924/00013 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/0101 ,  H01L2924/01011 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01016 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01056 ,  H01L2924/01082 ,  H01L2924/07802 ,  H01L2924/10253 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/19042 ,  H01L2924/351 ,  H01L2924/0715 ,  H01L2924/3512 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2224/29099 ,  H01L2224/29199 ,  H01L2224/29299

摘要： A high-temperature bonding composition comprising a silicon base polymer as a thermosetting binder is provided. The silicon base polymer is obtained from dehydrolytic condensation of a condensate precursor comprising a silane compound having at least one pair of silicon atoms tied by a crosslink composed of an aliphatic hydrocarbon, heterocyclic or aromatic hydrocarbon group, and having at least three hydroxyl and/or hydrolyzable groups. Those silicon atoms having a direct bond to the crosslink composed of the aliphatic hydrocarbon, heterocyclic or aromatic hydrocarbon group are present in a proportion of at least 90 mol % relative to all silicon atoms in the polymer.

摘要翻译： 提供包含硅基聚合物作为热固性粘合剂的高温粘合组合物。 硅基聚合物是由包含具有至少一对硅原子的硅烷化合物的缩合物前体的脱水缩合得到的，所述硅原子被由脂族烃，杂环或芳族烃基组成的交联键合，并具有至少三个羟基和/或 可水解基团。 与由脂族烃，杂环或芳族烃基组成的交联直接键合的那些硅原子相对于聚合物中的全部硅原子的比例至少为90摩尔％。

公开(公告)号：US07651829B2

公开(公告)日：2010-01-26

申请号：US10854568

申请日：2004-05-26

申请人： Yoshitaka Hamada ,  Fujio Yagihashi ,  Mutsuo Nakashima ,  Kazumi Noda ,  Katsuya Takemura

发明人： Yoshitaka Hamada ,  Fujio Yagihashi ,  Mutsuo Nakashima ,  Kazumi Noda ,  Katsuya Takemura

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/36 ,  G03F7/38

CPC分类号： G03F7/0045 ,  G03F7/0757 ,  Y10S430/143

摘要： Provided is a positive resist material, particularly a chemically amplified positive resist material having higher sensitivity, higher resolution, a higher exposure latitude and better process adaptability than conventional positive resist materials, and providing a good pattern profile after exposure, particularly having lessened line edge roughness and exhibiting excellent etching resistance. These materials may contain, preferably an organic solvent and acid generator, more preferably a dissolution inhibitor or a basic compound and/or a surfactant. Provided is a positive resist material comprising a polymer comprising at least one monomer unit selected from a group consisting of a monomer unit (A), a monomer unit (B) and a monomer unit (C) represented by the following formula (1); and having a glass transition temperature (Tg) of 100° C. or greater.

摘要翻译： 本发明提供了正电阻材料，特别是具有比常规正性抗蚀剂材料更高的灵敏度，更高分辨率，更高的曝光宽容度和更好的工艺适应性的化学放大的正性抗蚀剂材料，并且在曝光之后提供良好的图案轮廓，特别是具有减小的线边缘粗糙度 并具有优异的耐蚀刻性。 这些材料可以优选含有有机溶剂和酸产生剂，更优选含有溶解抑制剂或碱性化合物和/或表面活性剂。 提供一种正性抗蚀剂材料，其包含包含选自由下式（1）表示的单体单元（A），单体单元（B）和单体单元（C））组成的组中的至少一种单体单元的聚合物; 玻璃化转变温度（Tg）为100℃以上。

公开(公告)号：US07402621B2

公开(公告)日：2008-07-22

申请号：US11041780

申请日：2005-01-24

申请人： Tsutomu Ogihara ,  Fujio Yagihashi ,  Yoshitaka Hamada ,  Takeshi Anaso ,  Motoaki Iwabuchi ,  Masaru Sasago ,  Hideo Nakagawa

发明人： Tsutomu Ogihara ,  Fujio Yagihashi ,  Yoshitaka Hamada ,  Takeshi Anaso ,  Motoaki Iwabuchi ,  Masaru Sasago ,  Hideo Nakagawa

IPC分类号： C08G77/06

CPC分类号： H01L21/02126 ,  C08G77/06 ,  C08G77/08 ,  C09D183/02 ,  C09D183/04 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695

摘要： The invention provides a coating solution for forming a porous film having excellent mechanical strength and dielectric properties and for easily forming a film with a freely controlled film thickness in an ordinarily employed method in semiconductor process. More specifically, provided are a method for preparing a porous-film-forming composition comprising steps of preparing polysiloxane, silica or zeolite particles (Component A), imparting crosslinkability to Component A, and temporarily terminating the crosslinkability; and a porous-film-forming composition obtainable in this method. In addition, provided is a method of forming a porous film comprising steps of preparing a porous-film-forming composition by preparing Component A, imparting crosslinkability to Component A and adding a crosslinkability inhibitor to temporarily terminate the crosslinkability; applying the porous-film-forming composition onto a substrate to form a film, drying the film, crosslinking the particles along with removing the crosslinkability inhibitor by heating the dried film.

摘要翻译： 本发明提供一种用于形成具有优异的机械强度和介电性能的多孔膜的涂布溶液，并且在半导体工艺中通常采用的方法容易地形成具有自由控制的膜厚度的膜。 更具体地说，提供了制备多孔膜形成组合物的方法，其包括制备聚硅氧烷，二氧化硅或沸石颗粒（组分A）的步骤，赋予组分A交联性，并暂时终止交联性; 和通过该方法得到的多孔膜形成组合物。 此外，提供了形成多孔膜的方法，其包括通过制备组分A制备多孔膜形成组合物，赋予组分A交联性并加入交联性抑制剂以暂时终止交联性; 将多孔膜形成组合物施加到基材上以形成膜，干燥膜，使颗粒交联，同时通过加热干燥膜除去交联性抑制剂。

公开(公告)号：US07309722B2

公开(公告)日：2007-12-18

申请号：US10703374

申请日：2003-11-07

申请人： Tsutomu Ogihara ,  Fujio Yagihashi ,  Hideo Nakagawa ,  Masaru Sasago

发明人： Tsutomu Ogihara ,  Fujio Yagihashi ,  Hideo Nakagawa ,  Masaru Sasago

IPC分类号： C09D183/04 ,  C08K3/22

CPC分类号： H01L23/5222 ,  C08K3/34 ,  C08L83/02 ,  C09D183/04 ,  H01L23/53228 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/12044 ,  Y10T428/249953 ,  Y10T428/31663 ,  H01L2924/00

摘要： The present invention provides a composition for film formation which can form a porous film that excels in dielectric properties, adhesion, film consistency and mechanical strength, and that is easily thinned; a porous film and a method for forming the same, and a high-performing and highly reliable semiconductor device which contains the porous film inside. More specifically, the composition for forming a porous film comprises a solution containing an amorphous polymer which is obtained by hydrolyzing and condensing at least one silane compound expressed by the general formula (R1)nSi(OR2)4−n, and a zeolite sol which is formed by using a quaternary ammonium hydroxide. The method for forming a porous film comprises a coating step for coating the composition for forming a porous film; a subsequent drying step; and a porousness forming step.

摘要翻译： 本发明提供一种成膜用组合物，其可以形成介电性，粘合性，膜稠度和机械强度优异且容易变薄的多孔膜; 多孔膜及其形成方法，以及内部含有多孔膜的高性能和高可靠性的半导体器件。 更具体地，用于形成多孔膜的组合物包括含有无定形聚合物的溶液，其通过水解和缩合由通式（R 1）2表示的至少一种硅烷化合物而获得， （OR 2）4-n N，以及通过使用氢氧化季铵形成的沸石溶胶。 形成多孔膜的方法包括用于涂覆用于形成多孔膜的组合物的涂布步骤; 随后的干燥步骤; 和多孔性形成步骤。

公开(公告)号：US07205338B2

公开(公告)日：2007-04-17

申请号：US10796170

申请日：2004-03-09

申请人： Tsutomu Ogihara ,  Fujio Yagihashi ,  Hideo Nakagawa ,  Masaru Sasago

发明人： Tsutomu Ogihara ,  Fujio Yagihashi ,  Hideo Nakagawa ,  Masaru Sasago

IPC分类号： C08G77/50 ,  C08L83/14 ,  C01B33/113

CPC分类号： C08G77/50 ,  C08J5/18 ,  C08J2383/04 ,  C09D183/14 ,  Y10T428/31663

摘要： Provided is a coating liquid for forming a porous film having desirably controlled thickness and having excellent dielectric and mechanical properties, using the conventional semiconductor process. Specifically, provided is a composition for forming a porous film comprising a condensation product and an organic solvent wherein the condensation product is obtained by hydrolysis and condensation, at presence of a basic catalyst, ofone or more silane compounds represented by formula (1): R1kSi(OR2)4-k,and one or more crosslinking agents represented by formula (2): {Xj(Y)3-jSi-(L)m-}nMZ4-n.Moreover, a method for manufacturing a porous film comprising steps of applying said composition so as to form a film, drying the film and heating the dried film so as to hardent the film, and others are provided.

摘要翻译： 提供一种用于形成具有期望的控制厚度并且具有优异的介电和机械性能的多孔膜的涂布液，使用常规的半导体工艺。 具体地，提供了一种用于形成多孔膜的组合物，其包含缩合产物和有机溶剂，其中缩合产物通过水解和缩合在碱性催化剂存在下获得

公开(公告)号：US06841334B2

公开(公告)日：2005-01-11

申请号：US10683107

申请日：2003-10-10

申请人： Fujio Yagihashi ,  Tomoyoshi Furihata ,  Jun Watanabe ,  Akinobu Tanaka ,  Yoshio Kawai ,  Tadahito Matsuda

发明人： Fujio Yagihashi ,  Tomoyoshi Furihata ,  Jun Watanabe ,  Akinobu Tanaka ,  Yoshio Kawai ,  Tadahito Matsuda

IPC分类号： C07C381/12 ,  C08K5/36 ,  C08L25/00 ,  C08L25/18 ,  G03F7/004 ,  G03F7/029 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30 ,  G03F7/038

CPC分类号： G03F7/039 ,  C07C381/12 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/115

摘要： Disclosed are novel onium salts represented by general formula (R)3S+M, wherein three R's may be the same or different, each being an aryl group, provided that at least one of R's is a t-alkoxy substituted phenyl group, and M is an anion capable of forming the sulfonium salts; and high energy radiation-responsive positive resist materials using said novel onium salts as acid generator.

摘要翻译： 公开了由通式（R）3S + M表示的新型鎓盐，其中三个R可以相同或不同，各自为芳基，条件是R的至少一个为叔烷氧基取代的苯基， M是能形成锍盐的阴离子; 和使用所述新型鎓盐作为酸发生剂的高能辐射响应正抗蚀材料。

公开(公告)号：US06680107B2

公开(公告)日：2004-01-20

申请号：US10045160

申请日：2002-01-15

申请人： Fujio Yagihashi ,  Motoaki Iwabuchi ,  Akira Yamamoto

发明人： Fujio Yagihashi ,  Motoaki Iwabuchi ,  Akira Yamamoto

IPC分类号： B32B326

CPC分类号： C08J5/18 ,  C08J2383/04 ,  C08L43/04 ,  C08L83/04 ,  C09D183/04 ,  Y10T428/249953 ,  Y10T428/31663 ,  C08L2666/14 ,  C08L2666/04

摘要： A composition comprising (A) a silanol group-bearing silicone resin comprising 30-100 mol % of T units: R1—SiZ3 and among the entire T units, 30-80 mol % of T-2 units containing only one silanol group: R1—Si(OH)Z′2 wherein R1 is a monovalent hydrocarbon group, Z is OH, hydrolyzable group or siloxane residue, at least one Z being a siloxane residue, and Z′ is a siloxane residue, and having a number average molecular weight of at least 100, and (B) a polymer resulting from an acrylate and/or methacrylate monomer is applied to a substrate and heated above the decomposition temperature of polymer (B) to form a porous film. The porous film is flat and uniform despite porosity, and has a low permittivity and high mechanical strength. It is best suited as an interlayer insulating layer when used in semiconductor device fabrication.

摘要翻译： 一种组合物，其包含（A）含有硅烷醇基的硅氧烷树脂，其包含30-100摩尔％的T单元：R 1 -SiZ 3，在整个T单元中，30-80摩尔％的仅含有一个硅烷醇的T-2单元 基团：R 1 -Si（OH）Z'2其中R 1是一价烃基，Z是OH，可水解基团或硅氧烷残基，至少一个Z是硅氧烷残基，Z'是硅氧烷 残基，数均分子量为100以上，（B）将由丙烯酸酯和/或甲基丙烯酸酯单体得到的聚合物加到基材上并加热到高于聚合物（B）的分解温度以形成多孔膜 。 多孔膜尽管孔隙度是平坦的和均匀的，并且具有低介电常数和高机械强度。 当用于半导体器件制造时，它最适合作为层间绝缘层。

公开(公告)号：US08277600B2

公开(公告)日：2012-10-02

申请号：US12541594

申请日：2009-08-14

申请人： Yoshitaka Hamada ,  Fujio Yagihashi ,  Takeshi Asano

发明人： Yoshitaka Hamada ,  Fujio Yagihashi ,  Takeshi Asano

IPC分类号： C09J7/02 ,  B32B9/04 ,  C08L83/00 ,  C08L83/04

CPC分类号： C09J183/14 ,  C08G77/50 ,  C08G77/52 ,  C08G77/54 ,  H01L21/187 ,  H01L23/296 ,  H01L24/29 ,  H01L24/83 ,  H01L25/50 ,  H01L2224/29191 ,  H01L2224/2929 ,  H01L2224/29298 ,  H01L2224/83801 ,  H01L2224/83855 ,  H01L2225/06513 ,  H01L2924/00013 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/0101 ,  H01L2924/01011 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01016 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01056 ,  H01L2924/01082 ,  H01L2924/07802 ,  H01L2924/10253 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/19042 ,  H01L2924/351 ,  H01L2924/0715 ,  H01L2924/3512 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2224/29099 ,  H01L2224/29199 ,  H01L2224/29299

摘要： A high-temperature bonding composition comprising a silicon base polymer as a thermosetting binder is provided. The silicon base polymer is obtained from dehydrolytic condensation of a condensate precursor comprising a silane compound having at least one pair of silicon atoms tied by a crosslink composed of an aliphatic hydrocarbon, heterocyclic or aromatic hydrocarbon group, and having at least three hydroxyl and/or hydrolyzable groups. Those silicon atoms having a direct bond to the crosslink composed of the aliphatic hydrocarbon, heterocyclic or aromatic hydrocarbon group are present in a proportion of at least 90 mol % relative to all silicon atoms in the polymer.

摘要翻译： 提供包含硅基聚合物作为热固性粘合剂的高温粘合组合物。 硅基聚合物是由包含具有至少一对硅原子的硅烷化合物的缩合物前体的脱水缩合得到的，所述硅原子被由脂族烃，杂环或芳族烃基组成的交联键合，并具有至少三个羟基和/或 可水解基团。 与由脂族烃，杂环或芳族烃基组成的交联直接键合的那些硅原子相对于聚合物中的全部硅原子的比例至少为90摩尔％。