公开(公告)号：US20070235345A1

公开(公告)日：2007-10-11

申请号：US11400454

申请日：2006-04-07

申请人： Tianbao Du ,  Feng Liu ,  May Yu ,  Alan Duboust ,  Wei-Yung Hsu

发明人： Tianbao Du ,  Feng Liu ,  May Yu ,  Alan Duboust ,  Wei-Yung Hsu

IPC分类号： B23H5/08

CPC分类号： B23H5/08 ,  B24B37/04 ,  C25F3/02 ,  H01L21/321 ,  H01L21/32125 ,  H01L21/7684

摘要： An ECMP method that suppresses hillock formation on a substrate includes the step of buffing a substrate before a two-step electrochemical mechanical polishing process. The buffing step prevents hillocks from forming around the features of the substrate and does not interfere with the protrusion formation. The buffing step includes contacting the substrate with a polishing pad and rotating the substrate and the polishing pad in opposite directions.

摘要翻译： 抑制基板上的小丘形成的ECMP方法包括在两步电化学机械抛光工艺之前抛光基板的步骤。 抛光步骤防止小丘围绕衬底的特征形成，并且不会妨碍突起形成。 抛光步骤包括使基板与抛光垫接触，并以相反的方向旋转基板和抛光垫。

公开(公告)号：US20070034506A1

公开(公告)日：2007-02-15

申请号：US11458356

申请日：2006-07-18

申请人： Yongqi Hu ,  Stan Tsai ,  Yan Wang ,  Feng Liu ,  Shou-Sung Chang ,  Liang-Yuh Chen

发明人： Yongqi Hu ,  Stan Tsai ,  Yan Wang ,  Feng Liu ,  Shou-Sung Chang ,  Liang-Yuh Chen

IPC分类号： C25B11/03

CPC分类号： B24B37/26 ,  B23H5/06 ,  B23H5/08 ,  B23H5/10 ,  B24B37/042 ,  B24B37/046 ,  B24B37/22 ,  B24B37/24 ,  B24B49/16 ,  B24B53/017 ,  C25D17/14 ,  H01L21/32125

摘要： Embodiments of a processing pad assembly for processing a substrate are provided. The processing pad assembly includes an upper layer having a processing surface and an electrode having a top side coupled to the upper layer and a bottom side opposite the top side. A first set of holes is formed through the upper layer for exposing the electrode to the processing surface. At least one aperture is formed through the upper layer and the electrode.

摘要翻译： 提供了用于处理衬底的处理衬垫组件的实施例。 处理垫组件包括具有处理表面的上层和具有联接到上层的顶侧和与顶侧相对的底侧的电极。 通过上层形成第一组孔，用于将电极暴露于处理表面。 通过上层和电极形成至少一个孔。

公开(公告)号：US20070033963A1

公开(公告)日：2007-02-15

申请号：US11202559

申请日：2005-08-12

申请人： Feng Liu

发明人： Feng Liu

IPC分类号： F25D3/08

CPC分类号： F25D3/08 ,  B67D3/0009 ,  F25D2303/081 ,  F25D2331/811

摘要： A beverage-cooling device includes a refrigeration unit, a position unit and a switch unit. The refrigeration unit has a housing with a cavity formed therein and a tube disposed inside the cavity. The tube has an inlet and an outlet both secured to the housing, and the inlet is higher than the outlet. The position unit has a base member connecting to the refrigeration unit, a control member pivoted to the base member, and a securing member adjustably assembled onto the control member. The base member has a passage formed therein to communicate with the inlet of the tube. The control member has a through hole communicating with the passage. The securing member orientates a bottle mouth of a bottle to the control member, wherein the bottle mouth communicates with the through hole. The switch unit is secured to the refrigeration unit and connected with the outlet of the tube.

公开(公告)号：US20060260951A1

公开(公告)日：2006-11-23

申请号：US11425682

申请日：2006-06-21

申请人： Feng Liu ,  Liang-Yuh Chen ,  Stan Tsai ,  Yongqi Hu

发明人： Feng Liu ,  Liang-Yuh Chen ,  Stan Tsai ,  Yongqi Hu

IPC分类号： B23H3/02

CPC分类号： B23H5/08 ,  C25F7/00

摘要： A method and apparatus for electrochemically processing metal and barrier materials is provided. In one embodiment, a method for electrochemically processing a substrate includes the steps of establishing an electrically-conductive path through an electrolyte between an exposed layer of barrier material on the substrate and an electrode, pressing the substrate against a processing pad assembly, providing motion between the substrate and pad assembly in contact therewith and electrochemically removing a portion of the exposed layer during a first electrochemical processing step in a barrier processing station.

摘要翻译： 提供了一种用于电化学处理金属和阻隔材料的方法和装置。 在一个实施例中，用于电化学处理衬底的方法包括以下步骤：在衬底上的暴露的阻挡材料层与电极之间建立通过电解质的导电路径，将衬底压在处理衬垫组件上， 所述衬底和焊盘组件与其接触并且在屏障处理站中的第一电化学处理步骤期间电化学去除所述暴露层的一部分。

公开(公告)号：US20060255805A1

公开(公告)日：2006-11-16

申请号：US11390913

申请日：2006-03-28

申请人： Stuart Crozier ,  Feng Liu

发明人： Stuart Crozier ,  Feng Liu

IPC分类号： G01V3/00

CPC分类号： G01R33/3815 ,  G01R33/381 ,  G01R33/421

摘要： Magnetic resonance systems are provided which employ a shielded, asymmetric magnet to produce an offset dsv. The magnets include at least a first coil C1, which carries current in a first direction, and two coils C2 and C3, which are located at least in part within the internal envelope EC1 defined by the first coil and which carry current in an opposite direction to the first coil. The magnets are shielded by a shielding coil C4, which carries current in a direction opposite to that of the first coil, and/or a ferromagnetic structure (FS). The magnets can include additional coils, such as a fifth coil C5 at the magnet's distal end. The magnets can be used in, for example, orthopedic imaging.

摘要翻译： 提供了使用屏蔽的不对称磁体产生偏移dsv的磁共振系统。 磁体包括至少第一线圈C 1，其沿第一方向承载电流，以及两个线圈C 2和C 3 3，其中 至少部分地位于由第一线圈限定的内部包络E C1 C1中，并且沿与第一线圈相反的方向承载电流。 这些磁体由与第一线圈相反的方向的电流和/或铁磁结构（FS）的屏蔽线圈C 4屏蔽。 磁体可以包括附加的线圈，例如磁体远端处的第五线圈C 5。 磁体可用于例如矫形成像。

公开(公告)号：US07129073B2

公开(公告)日：2006-10-31

申请号：US10175190

申请日：2002-06-18

申请人： Feng Liu ,  Angus C. Nairn ,  Paul Greengard

发明人： Feng Liu ,  Angus C. Nairn ,  Paul Greengard

IPC分类号： C12N9/12

CPC分类号： C12Q1/485 ,  G01N2500/00 ,  G01N2500/04 ,  G01N2500/10

摘要： The present invention provides methods and compositions for modulating the activities of metabotropic glutamate receptor intracellular signaling molecules. The present invention provides methods and compositions for modulating the activities of casein kinase I and/or cyclin-dependent kinase 5 in cells or tissues. The present invention provides methods of modulating the function of calcium channels in cells or tissues. The present invention provides methods of treating calcium channel dysfunction. The present invention provides methods of identifying agents that modulate the activities of the metabotropic glutamate receptor intracellular signaling molecules casein kinase I and/or cyclin-dependent kinase 5 for use in such treatments.

摘要翻译： 本发明提供调节代谢型谷氨酸受体细胞内信号传导分子活性的方法和组合物。 本发明提供用于调节细胞或组织中酪蛋白激酶I和/或细胞周期蛋白依赖性激酶5的活性的方法和组合物。 本发明提供调节细胞或组织中钙通道功能的方法。 本发明提供治疗钙通道功能障碍的方法。 本发明提供了鉴定调节代谢型谷氨酸受体细胞内信号传导分子酪蛋白激酶I和/或细胞周期蛋白依赖性激酶5在这种治疗中的活性的方法。

公开(公告)号：US20060219663A1

公开(公告)日：2006-10-05

申请号：US11338146

申请日：2006-01-23

申请人： Shi-Ping Wang ,  Martin Wohlert ,  Alain Duboust ,  Renhe Jia ,  Feng Liu ,  Yuan Tian ,  Liang-Yuh Chen ,  Stan Tsai ,  Wei-Yung Hsu

发明人： Shi-Ping Wang ,  Martin Wohlert ,  Alain Duboust ,  Renhe Jia ,  Feng Liu ,  Yuan Tian ,  Liang-Yuh Chen ,  Stan Tsai ,  Wei-Yung Hsu

IPC分类号： C03C15/00 ,  H01L21/302 ,  B44C1/22 ,  H01L21/461

CPC分类号： H01L21/3212 ,  C09G1/02 ,  C23F3/04 ,  C23F3/06 ,  H01L21/32125 ,  H01L21/7684

摘要： Polishing compositions and methods for removing conductive materials and barrier materials from a substrate surface are provided. In one aspect, a full sequence electrochemical mechanical planarization technique is provided. In another aspect, a hybrid planarization technique using combination of at least one chemical mechanical polishing process and at least one electrochemical mechanical polishing process is provided. In addition, a multi-step polishing process for polishing a substrate surface using at least two oxidizers in one or more polishing composition is described. The polishing composition may be used in the full sequence or the hybrid planarization technique. The polishing compositions and methods described herein improve the effective removal rate of materials from the substrate surface with a reduction in planarization defects.

摘要翻译： 提供了抛光组合物和从衬底表面去除导电材料和阻挡材料的方法。 一方面，提供了全序列电化学机械平面化技术。 在另一方面，提供了使用至少一种化学机械抛光工艺和至少一种电化学机械抛光工艺的组合的混合平面化技术。 此外，描述了在一种或多种研磨组合物中使用至少两种氧化剂来研磨衬底表面的多步抛光方法。 抛光组合物可以以全序或混合平面化技术使用。 本文所述的抛光组合物和方法改善了材料从衬底表面的有效去除速率，同时减小了平坦化缺陷。

公开(公告)号：US07056672B2

公开(公告)日：2006-06-06

申请号：US10766102

申请日：2004-01-27

申请人： Patrick S. Schnable ,  Feng Liu ,  Yan Fu

发明人： Patrick S. Schnable ,  Feng Liu ,  Yan Fu

IPC分类号： C12Q1/68 ,  C12P21/00 ,  C12P21/02

CPC分类号： C12N15/1086 ,  C07K2319/21 ,  C12N15/1065 ,  C12N15/62

摘要： Compositions and methods for identifying nucleotide fragments that contain an open reading frame are provided. Compositions comprise a nucleotide sequence that encodes, in each of the three possible reading frames, an ATG start codon and a histidine tag, and vectors comprising such a nucleotide sequence. The vectors may be provided with cloning sites for insertion of nucleotide sequences of interest 5′ or 3′ to the 3-frame His-tag DNA sequence. Vectors also are provided with cloning sites for inserting nucleotide sequences of interest 3′ of the ATG start codon and 5′ of the 3-frame His-tag DNA sequence.

摘要翻译： 提供了用于鉴定包含开放阅读框架的核苷酸片段的组合物和方法。 组合物包含在三个可能的阅读框中的每一个中编码ATG起始密码子和组氨酸标签的核苷酸序列，以及包含这种核苷酸序列的载体。 可以向载体提供用于将感兴趣的5'或3'的核苷酸序列插入3框架His标签DNA序列的克隆位点。 载体还提供有用于插入ATG起始密码子的3'和3框His标签DNA序列的5'的感兴趣的核苷酸序列的克隆位点。

公开(公告)号：US20060046623A1

公开(公告)日：2006-03-02

申请号：US11209167

申请日：2005-08-22

申请人： Yan Wang ,  Stan Tsai ,  Yongqi Hu ,  Feng Liu ,  Liang-Yuh Chen ,  Daxin Mao ,  Huyen Tran ,  Martin Wohlert ,  Renhe Jia ,  Yuan Tian

发明人： Yan Wang ,  Stan Tsai ,  Yongqi Hu ,  Feng Liu ,  Liang-Yuh Chen ,  Daxin Mao ,  Huyen Tran ,  Martin Wohlert ,  Renhe Jia ,  Yuan Tian

IPC分类号： B24B1/00

CPC分类号： B24B53/017 ,  B23H5/08

摘要： Embodiments of a conditioning head for in-situ conditioning and/or cleaning a processing pad of a CMP, ECMP, or other processing system are provided. In one embodiment, the conditioning head includes a brush disposed in a central cavity. A cleaning fluid is provided through the central cavity of the conditioning head to a processing pad. The brush spins and moves laterally across the surface of the processing pad. The cleaning solution dispensed through the conditioning head dissolves by-products of the processing operation while the brush gently wipes the processing pad. A lip of the conditioning head retains the cleaning fluid and cleaning waste, thereby minimizing contamination of the area outside of the conditioning head. The cleaning waste is removed from the processing pad via passages formed near the outer periphery of the conditioning head.

摘要翻译： 提供了用于原位调理和/或清洁CMP，ECMP或其它处理系统的处理垫的调节头的实施例。 在一个实施例中，调节头包括设置在中心腔中的刷子。 清洁流体通过调节头的中心空腔设置到处理垫。 刷子旋转并横向移动到处理垫的表面上。 通过调节头分配的清洁溶液溶解处理操作的副产物，同时刷子轻轻地擦拭处理垫。 调节头的唇缘保持清洁流体和清洁废物，从而最小化调节头外部区域的污染。 清洁废物通过在调节头的外周附近形成的通道从处理垫移除。

公开(公告)号：US20050233578A1

公开(公告)日：2005-10-20

申请号：US11130032

申请日：2005-05-16

申请人： Renhe Jia ,  Feng Liu ,  Stan Tsai ,  Liang-Yuh Chen

发明人： Renhe Jia ,  Feng Liu ,  Stan Tsai ,  Liang-Yuh Chen

IPC分类号： B23H5/08 ,  C09G1/02 ,  C09K13/00 ,  C11D3/14 ,  C11D3/39 ,  C11D11/00 ,  C25F3/02 ,  C25F3/08 ,  H01L21/321 ,  H01L21/44 ,  H01L21/4763 ,  H01L21/768

CPC分类号： B23H5/08 ,  C09G1/02 ,  C11D3/1213 ,  C11D3/124 ,  C11D3/14 ,  C11D3/3765 ,  C11D3/3947 ,  C11D11/0041 ,  C25F3/02 ,  C25F3/08 ,  H01L21/3212 ,  H01L21/32125 ,  H01L21/7684

摘要： Polishing compositions and methods for removing conductive materials and barrier materials from a substrate surface are provided. Polishing compositions are provided for removing at least a barrier material from a substrate surface by a chemical mechanical polishing process or by an electrochemical mechanical polishing process. The polishing compositions used in barrier removal may further be used after a process for electrochemical mechanical planarization process of a conductive material. The polishing compositions and methods described herein improve the effective removal rate of materials from the substrate surface with a reduction in planarization type defects.

摘要翻译： 提供了抛光组合物和从衬底表面去除导电材料和阻挡材料的方法。 提供抛光组合物用于通过化学机械抛光工艺或通过电化学机械抛光工艺从衬底表面去除至少一种阻挡材料。 用于屏障去除的抛光组合物可以在导电材料的电化学机械平面化工艺的过程之后进一步使用。 本文所述的抛光组合物和方法改善了材料从衬底表面的有效去除速率，同时降低了平面化型缺陷。