Shadow mask deposition of materials using reconfigurable shadow masks
    41.
    发明授权
    Shadow mask deposition of materials using reconfigurable shadow masks 有权
    使用可重构阴影掩模的材料的阴影掩模沉积

    公开(公告)号:US07645708B2

    公开(公告)日:2010-01-12

    申请号:US11820406

    申请日:2007-06-19

    申请人: Thomas P. Brody

    发明人: Thomas P. Brody

    IPC分类号: H01L21/31 H01L21/469

    摘要: A shadow mask deposition system includes a plurality of identical shadow masks arranged in a number of stacks to form a like number of compound shadow masks, each of which is disposed in a deposition vacuum vessel along with a material deposition source. Materials from the material deposition sources are deposited on the substrate via openings in corresponding compound shadow masks, each opening being formed by the whole or partial alignment of apertures in the shadow masks forming the compound shadow mask, to form an array of electronic elements on the substrate.

    摘要翻译: 阴影掩模沉积系统包括多个相同的阴影掩模,其布置在多个堆叠中以形成相同数量的复合荫罩,每个复合荫罩与材料沉积源一起设置在沉积真空容器中。 来自材料沉积源的材料通过相应的复合阴影掩模中的开口沉积在基板上,每个开口由形成复合荫罩的阴影掩模中的孔的整体或部分对准形成,以形成电子元件阵列 基质。

    Vt Stabilization of TFT's In OLED Backplanes
    42.
    发明申请
    Vt Stabilization of TFT's In OLED Backplanes 审中-公开
    TFT在OLED背板中的稳定化

    公开(公告)号:US20080315942A1

    公开(公告)日:2008-12-25

    申请号:US12043174

    申请日:2008-03-06

    IPC分类号: G05F3/16

    摘要: In a method of reducing or undoing progressive threshold shift in a thin-film-transistor (TFT) circuit, first and second voltages applied to source and gate terminals of a first transistor cause the first transistor to conduct and apply the first voltage to the gate terminal of the second transistor. The first voltage applied to the gate terminal of the second transistor coacts with a reference voltage coupled to the source terminal of the second transistor via an LED element to cause the second transistor to not conduct whereupon the LED element does not receive electrical power. After a first predetermined period of time sufficient to reduce or undo a progressive threshold shift in the second transistor, the application of the first voltage to the gate terminal of the second transistor is terminated.

    摘要翻译: 在减薄或消除薄膜晶体管(TFT)电路中逐行阈值偏移的方法中,施加到第一晶体管的源极和栅极端子的第一和第二电压使得第一晶体管导通并将第一电压施加到栅极 端子。 施加到第二晶体管的栅极端子的第一电压与经由LED元件耦合到第二晶体管的源极端子的参考电压共同作用,以使第二晶体管不导通,于是LED元件不接收电力。 在足以减少或消除第二晶体管中的逐行阈值偏移的第一预定时间段之后,将第一电压施加到第二晶体管的栅极端子。

    Electronic circuit with repetitive patterns formed by shadow mask vapor deposition and a method of manufacturing an electronic circuit element
    43.
    发明申请
    Electronic circuit with repetitive patterns formed by shadow mask vapor deposition and a method of manufacturing an electronic circuit element 有权
    具有通过荫罩气相沉积形成的重复图案的电子电路和制造电子电路元件的方法

    公开(公告)号:US20070246706A1

    公开(公告)日:2007-10-25

    申请号:US11820659

    申请日:2007-06-20

    申请人: Thomas Brody

    发明人: Thomas Brody

    IPC分类号: H01L29/06 H01L21/06 H01L33/00

    摘要: An electronic circuit with repetitive patterns formed by shadow mask vapor deposition includes a repetitive pattern of electronic circuit elements formed on a substrate. Each electronic circuit element includes the following elements in the desired order of deposition: a first semiconductor segment, a second semiconductor segment, a first metal segment, a second metal segment, a third metal segment, a fourth metal segment, a fifth metal segment, a sixth metal segment, a first insulator segment, a second insulator segment, a third insulator segment, a seventh metal segment, an eighth metal segment, a ninth metal segment and a tenth metal segment. All of the above segments may be deposited via a shadow mask deposition process. The electronic circuit element may be an element of an array of like electronic circuit elements.

    摘要翻译: 具有通过荫罩气相沉积形成的重复图案的电子电路包括形成在基板上的电子电路元件的重复图案。 每个电子电路元件以期望的沉积顺序包括以下元件:第一半导体段,第二半导体段,第一金属段,第二金属段,第三金属段,第四金属段,第五金属段, 第六金属段,第一绝缘体段,第二绝缘体段,第三绝缘体段,第七金属段,第八金属段,第九金属段和第十金属段。 所有上述段可以通过荫罩沉积工艺沉积。 电子电路元件可以是类似电子电路元件的阵列的元件。

    Shadow mask deposition of materials using reconfigurable shadow masks
    44.
    发明申请
    Shadow mask deposition of materials using reconfigurable shadow masks 有权
    使用可重构阴影掩模的材料的阴影掩模沉积

    公开(公告)号:US20070243719A1

    公开(公告)日:2007-10-18

    申请号:US11820406

    申请日:2007-06-19

    申请人: Thomas Brody

    发明人: Thomas Brody

    摘要: A shadow mask deposition system includes a plurality of identical shadow masks arranged in a number of stacks to form a like number of compound shadow masks, each of which is disposed in a deposition vacuum vessel along with a material deposition source. Materials from the material deposition sources are deposited on the substrate via openings in corresponding compound shadow masks, each opening being formed by the whole or partial alignment of apertures in the shadow masks forming the compound shadow mask, to form an array of electronic elements on the substrate.

    摘要翻译: 阴影掩模沉积系统包括多个相同的阴影掩模,其布置在多个堆叠中以形成相同数量的复合荫罩,每个复合荫罩与材料沉积源一起设置在沉积真空容器中。 来自材料沉积源的材料通过相应的复合阴影掩模中的开口沉积在基板上,每个开口由形成复合荫罩的阴影掩模中的孔的整体或部分对准形成,以形成电子元件阵列 基质。

    System and method for active array temperature sensing and cooling
    45.
    发明授权
    System and method for active array temperature sensing and cooling 有权
    有源阵列温度检测和冷却的系统和方法

    公开(公告)号:US07232694B2

    公开(公告)日:2007-06-19

    申请号:US10950646

    申请日:2004-09-28

    IPC分类号: H01L21/00 G01R31/26

    摘要: A system and method for active array temperature sensing and cooling. The system includes an active temperature sensing layer, a thermoelectric cooling layer and a heatsink layer. The temperature sensing layer is formed of temperature sensing elements that sense the temperature gradient across an unevenly heated region of the active array substrate. The thermoelectric cooling layer controls the temperature gradient sensed by the temperature sensing layer. The heatsink layer includes a plurality of cooling channels for absorbing thermal energy from the unevenly heated region. The system is under the control of a process control computer.

    摘要翻译: 一种用于有源阵列温度感测和冷却的系统和方法。 该系统包括有源温度感测层,热电冷却层和散热层。 温度感测层由感测有源阵列基板的不均匀加热区域温度梯度的温度感测元件形成。 热电冷却层控制由感温层感测的温度梯度。 散热层包括用于从不均匀加热的区域吸收热能的多个冷却通道。 该系统由过程控制计算机控制。

    Shadow mask deposition system for and method of forming a high resolution active matrix liquid crystal display (LCD) and pixel structures formed therewith

    公开(公告)号:US20060152641A1

    公开(公告)日:2006-07-13

    申请号:US11032416

    申请日:2005-01-10

    申请人: Thomas Brody

    发明人: Thomas Brody

    IPC分类号: G02F1/1343

    摘要: An LCD pixel includes a first conductive segment connected to a first bus, a first insulator segment on the first conductive segment, a second conductive segment on the first insulator segment, a liquid crystal material on the second conductive segment, a third conductive segment on the liquid crystal material, and a thin film transistor having a control terminal, a first power terminal and second power terminal connected to a second bus, a third bus and the second conductive segment, respectively. In response to application of a suitable signal on the second bus when reference voltages are present on the first bus and on the third conductive segment, and a voltage is applied to the third bus, the thin film transistor is operative for charging a capacitor formed by the first conductive segment, the first insulator segment and the second conductive segment and for activating the liquid crystal material.

    System for and method of forming via holes by use of selective plasma etching in a continuous inline shadow mask deposition process
    47.
    发明申请
    System for and method of forming via holes by use of selective plasma etching in a continuous inline shadow mask deposition process 有权
    在连续的在线荫罩沉积工艺中通过使用选择性等离子体蚀刻来形成通孔的系统和方法

    公开(公告)号:US20060148241A1

    公开(公告)日:2006-07-06

    申请号:US11026365

    申请日:2004-12-30

    IPC分类号: H01L21/4763 C23C16/00

    摘要: In a shadow mask vapor deposition system, a first conductor is vapor deposited on a substrate and an insulator is vapor deposited on the first conductor. A second conductor is then vapor deposited on at least the insulator. The insulator layer is plasma etched either before or after the vapor deposition of the second conductor to define in the insulator layer a via hole through which at least a portion of the first conductor is exposed. An electrical connection is established between the first and second conductors by way of the via hole.

    摘要翻译: 在荫罩气相沉积系统中,将第一导体气相沉积在衬底上,并且在第一导体上蒸镀绝缘体。 然后在至少绝缘体上气相沉积第二导体。 在第二导体的气相沉积之前或之后等离子体蚀刻绝缘体层,以在绝缘体层中限定通孔,第一导体的至少一部分通过该通孔露出。 通过通孔在第一和第二导体之间建立电连接。

    Substrate-to-mask alignment and securing system with temperature control for use in an automated shadow mask vacuum deposition process
    48.
    发明申请
    Substrate-to-mask alignment and securing system with temperature control for use in an automated shadow mask vacuum deposition process 审中-公开
    具有温度控制的基板到掩模对准和固定系统,用于自动阴影真空沉积工艺

    公开(公告)号:US20060086321A1

    公开(公告)日:2006-04-27

    申请号:US10971218

    申请日:2004-10-22

    IPC分类号: C23C16/00

    CPC分类号: C23C14/042

    摘要: The present invention is a substrate holder system for and method of providing a substrate-to-mask alignment mechanism, securing mechanism and temperature control mechanism. The substrate holder system is suitable for use in an automated shadow mask vacuum deposition process. The substrate holder system includes a system controller, and a substrate arranged between a magnetic chuck assembly and a mask holder assembly. The magnetic chuck assembly includes a magnetic chuck, a thermoelectric device, a plurality of thermal sensors and a plurality of light sources. The mask holder assembly includes a shadow mask, a mask holder, a motion control system and a plurality of cameras. The substrate holder system of the present invention provides close contact between the substrate and the shadow mask thereby avoiding the possibility of evaporant material entering into a gap therebetween.

    摘要翻译: 本发明是一种用于提供基板到掩模对准机构,固定机构和温度控制机构的基板保持器系统和方法。 衬底保持器系统适用于自动阴影真空沉积工艺。 衬底保持器系统包括系统控制器和布置在磁性吸盘组件和面罩保持器组件之间的衬底。 磁性卡盘组件包括磁卡盘,热电装置,多个热传感器和多个光源。 面罩支架组件包括荫罩,面罩座,运动控制系统和多个相机。 本发明的基板保持器系统提供了基板和荫罩之间的紧密接触,从而避免了蒸发材料进入其间的间隙的可能性。

    System for and method of manufacturing a large-area backplane by use of a small-area shadow mask
    49.
    发明申请
    System for and method of manufacturing a large-area backplane by use of a small-area shadow mask 有权
    使用小面积荫罩制造大面积背板的系统和方法

    公开(公告)号:US20050031783A1

    公开(公告)日:2005-02-10

    申请号:US10925726

    申请日:2004-08-25

    摘要: A vapor deposition shadow mask system includes a number of series connected vacuum vessels each having a material deposition source and shadow mask positioned therein. A substrate is translated along a path that has a longitudinal axis that extends through the vacuum vessels. Centers of shadow masks in first and second vacuum vessels are offset laterally on opposite sides of the longitudinal axis. The system is operative for deposition material on a second area of the substrate via the material deposition source and shadow mask in the second vacuum vessel in a manner that overlaps a portion of the material deposited on a first, adjacent area of the substrate via the material deposition source and shadow mask in the first vacuum vessel.

    摘要翻译: 气相沉积荫罩系统包括多个串联连接的真空容器,每个真空容器具有定位在其中的材料沉积源和荫罩。 基底沿着具有延伸穿过真空容器的纵向轴线的路径平移。 第一和第二真空容器中的荫罩中心在纵向轴线的相对侧横向偏移。 该系统通过材料沉积源和第二真空容器中的阴影掩模以与衬底的第一相邻区域上沉积的材料的一部分重叠的方式,通过材料 沉积源和荫罩在第一真空容器中。

    Small Feature Size Fabrication Using a Shadow Mask Deposition Process
    50.
    发明申请
    Small Feature Size Fabrication Using a Shadow Mask Deposition Process 审中-公开
    使用阴影掩模沉积工艺的小特征尺寸制造

    公开(公告)号:US20140342102A1

    公开(公告)日:2014-11-20

    申请号:US14282021

    申请日:2014-05-20

    摘要: In a system and method of depositing material on a substrate, a shadow mask, including one or more apertures therethrough, in intimate contact with the substrate is provided inside of a chamber or reactor. Material ejected from a solid target material is deposited on one or more portions of the substrate after passage through the one or more apertures of the shadow mask. Desirably, a target-to-substrate distance is within a mean free path length at a specified deposition pressure. Alternatively, an electric field acts on a process gas to create a plasma that includes ionized atoms or molecules of the material that are deposited on one or more portions of the substrate after passage through the one or more apertures of the shadow mask.

    摘要翻译: 在衬底上沉积材料的系统和方法中,在腔室或反应器的内部提供了与衬底紧密接触的包括通过其中的一个或多个孔的荫罩。 从固体目标材料喷出的材料在通过荫罩的一个或多个孔之后沉积在基底的一个或多个部分上。 期望的是,在指定的沉积压力下,目标对基板之间的距离在平均自由路径长度内。 或者,电场作用在处理气体上以产生等离子体,该等离子体包括在通过荫罩的一个或多个孔之后沉积在基板的一个或多个部分上的电离原子或分子。