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    Micromirrors with mechanisms for enhancing coupling of the micromirrors with electrostatic fields
    41.
    发明授权
    Micromirrors with mechanisms for enhancing coupling of the micromirrors with electrostatic fields 有权

    公开(公告)号：US06974713B2

    公开(公告)日：2005-12-13

    申请号：US11067562

    申请日：2005-02-25

    Applicant: Sataydev Patel ,  Andrew Huibers

    Inventor： Sataydev Patel ,  Andrew Huibers

    IPC: G02B26/00 ,  G02B26/08 ,  H01L20060101 ,  H01L21/00

    CPC classification number: G02B26/0841

    Abstract: A micromirror device is disclosed, along with a method of making such a micromirror device that comprises a mirror plate, a hinge and an extension plate. The extension plate is formed on the mirror plate and between the mirror plate and the electrode associated with the mirror plate for rotating the mirror plate. The extension plate can be metallic or dielectric. Also disclosed is a method of making such a micromirror device. In particular, the extension plate is formed after the formation of the mirror plate. Moreover, also disclosed is a projection system that comprises a spatial light modulator having an array of such micromirrors, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

    High angle micro-mirrors and processes
    42.
    发明授权
    High angle micro-mirrors and processes 有权
    大角度微镜和工艺

    公开(公告)号：US06970280B2

    公开(公告)日：2005-11-29

    申请号：US10990835

    申请日：2004-11-16

    Applicant: Satyadev R. Patel ,  Andrew G. Huibers ,  Peter J. Heureux

    Inventor： Satyadev R. Patel ,  Andrew G. Huibers ,  Peter J. Heureux

    IPC: G02B26/08 ,  G02B26/00 ,  G02F1/00

    CPC classification number: G02B26/0841

    Abstract: A micro-mirror that comprises a substrate, a hinge structure formed on the substrate and a mirror plate attached to the hinge structure is provided for use in display systems. The mirror plate is capable of rotating from a non-deflected resting state to a state that is at least 14° degrees. In operation, the micro-mirror switches between an “ON”-state and “OFF”-state, which are defined in accordance with a rotational position of the mirror plate. The OFF state can be a non-deflected position of the micro-mirror (generally parallel to the substrate), the same angle (though opposite direction) as the ON state, or an angle less than the ON state (though in the opposite direction). Reflected light from the “ON” and “OFF” states are thus separated and the contrast ratio is improved.

    Abstract translation: 提供了一种微镜，其包括基底，形成在基底上的铰链结构和附接到铰链结构的镜板，用于显示系统。 镜板能够从非偏转的静止状态旋转到至少14度的状态。 在操作中，微反射镜在根据镜板的旋转位置限定的“ON”状态和“OFF”状态之间切换。 关闭状态可以是微反射镜（大体上平行于基板）的非偏转位置，与ON状态相同的角度（尽管相反的方向），或者小于ON状态的角度（尽管在相反方向 ）。 因此，从“ON”和“OFF”状态的反射光被分离，并且对比度提高。

    High angle micro-mirrors and processes
    44.
    发明授权
    High angle micro-mirrors and processes 有权
    大角度微镜和工艺

    公开(公告)号：US06885494B2

    公开(公告)日：2005-04-26

    申请号：US10366296

    申请日：2003-02-12

    Applicant: Satyadev R. Patel ,  Andrew G. Huibers ,  Peter J. Heureux

    Inventor： Satyadev R. Patel ,  Andrew G. Huibers ,  Peter J. Heureux

    IPC: G02B26/08 ,  G02B26/00 ,  G02F1/29

    CPC classification number: G02B26/0841

    Abstract: A micro-mirror that comprises a substrate, a hinge structure formed on the substrate and a mirror plate attached to the hinge structure is provided for use in display systems. The mirror plate is capable of rotating from a non-deflected resting state to a state that is at least 14°, and preferably from 15° to 27° from the non-deflected resting state. In operation, the micro-mirror switches between an “ON”-state and “OFF”-state, which are defined in accordance with a rotational position of the mirror plate. The OFF state can be a non-deflected position of the micro-mirror (generally parallel to the substrate), the same angle (though opposite direction) as the ON state, or an angle less than the ON state (though in the opposite direction). Reflected light from the “ON” and “OFF” states are thus separated and the contrast ratio is improved.

    Abstract translation: 提供了一种微镜，其包括基底，形成在基底上的铰链结构和附接到铰链结构的镜板，用于显示系统。 镜板能够从非偏转静止状态旋转到从非偏转静止状态至少为14°，优选为15°至27°的状态。 在操作中，微反射镜在根据镜板的旋转位置限定的“ON”状态和“OFF”状态之间切换。 关闭状态可以是微反射镜（大体上平行于基板）的非偏转位置，与ON状态相同的角度（尽管相反的方向），或者小于ON状态的角度（尽管在相反方向 ）。 因此，从“ON”和“OFF”状态的反射光被分离，并且对比度提高。

    Micromirrors with asymmetric stopping mechanisms
    45.
    发明授权
    Micromirrors with asymmetric stopping mechanisms 有权
    具有不对称停止机制的微镜

    公开(公告)号：US06876485B1

    公开(公告)日：2005-04-05

    申请号：US10703678

    申请日：2003-11-07

    Applicant: Jim Dunphy

    Inventor： Jim Dunphy

    IPC: B81B3/00 ,  G02B26/00 ,  G02B26/08

    CPC classification number: B81B3/001 ,  B81B2201/042 ,  G02B26/0841 ,  Y10S359/904

    Abstract: A micromirror device comprises a plurality of stopping mechanisms that sequentially stop the mirror plate of the micromirror device when the micromirror device is rotating towards a state, such as an ON or OFF state. The mirror plate sequentially separates from the stopping mechanisms when the mirror plate is rotating towards another state, such as the OFF or ON state.

    Abstract translation: 微反射镜装置包括多个停止机构，当微镜装置朝向诸如ON或OFF状态的状态转动时，顺序地停止微镜装置的镜板。 当镜板朝向另一状态（例如OFF或ON状态）旋转时，镜板依次与停止机构分离。

    Micromirrors with mechanisms for enhancing coupling of the micromirrors with electrostatic fields
    46.
    发明授权
    Micromirrors with mechanisms for enhancing coupling of the micromirrors with electrostatic fields 有权

    公开(公告)号：US06873450B2

    公开(公告)日：2005-03-29

    申请号：US10613379

    申请日：2003-07-03

    Applicant: Satyadev R. Patel ,  Andrew G. Huibers

    Inventor： Satyadev R. Patel ,  Andrew G. Huibers

    IPC: G02B26/00 ,  G02B26/08 ,  H01L20060101 ,  H01L21/00

    CPC classification number: G02B26/0841

    Abstract: A micromirror device is disclosed, along with a method of making such a micromirror device that comprises a mirror plate, a hinge and an extension plate. The extension plate is formed on the mirror plate and between the mirror plate and the electrode associated with the mirror plate for rotating the mirror plate. The extension plate can be metallic or dielectric. Also disclosed is a method of making such a micromirror device. In particular, the extension plate is formed after the formation of the mirror plate. Moreover, also disclosed is a projection system that comprises a spatial light modulator having an array of such micromirrors, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

    Spatial light modulators with light absorbing areas
    48.
    发明授权
    Spatial light modulators with light absorbing areas 有权
    具有光吸收区域的空间光调制器

    公开(公告)号：US06844959B2

    公开(公告)日：2005-01-18

    申请号：US10305509

    申请日：2002-11-26

    Applicant: Andrew G. Huibers ,  Satyadev R. Patel ,  Robert M. Duboc, Jr.

    Inventor： Andrew G. Huibers ,  Satyadev R. Patel ,  Robert M. Duboc, Jr.

    IPC: B81B3/00 ,  B81B7/04 ,  G02B26/08 ,  G02B26/00 ,  B32B9/00 ,  G09G3/34

    CPC classification number: G02B26/0841 ,  B82Y30/00 ,  Y10T428/30

    Abstract: A projection system, a spatial light modulator, and a method for forming micromirrors are disclosed. A substrate comprises circuitry and electrodes for electrostatically deflecting micromirror elements that are disposed within an array of such elements forming the spatial light modulator. In one embodiment, the substrate is a silicon substrate having circuitry and electrodes thereon for electrostatically actuating adjacent micromirror elements, and the substrate is fully or selectively covered with a light absorbing material.

    Abstract translation: 公开了投影系统，空间光调制器和用于形成微镜的方法。 衬底包括用于静电偏转微镜元件的电路和电极，微镜元件设置在形成空间光调制器的这种元件的阵列内。 在一个实施例中，衬底是具有电路和电极的硅衬底，用于静电地驱动相邻的微镜元件，并且衬底被完全或选择性地覆盖有光吸收材料。

    Apparatus and method for detecting an endpoint in a vapor phase etch
    50.
    发明申请
    Apparatus and method for detecting an endpoint in a vapor phase etch 有权
    用于检测气相蚀刻中的端点的装置和方法

    公开(公告)号：US20040069747A1

    公开(公告)日：2004-04-15

    申请号：US10269149

    申请日：2002-10-11

    Applicant: REFLECTIVITY, INC., a California corporation

    Inventor： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Niles K. MacDonald ,  Hongqin Shi

    IPC: G01L021/30 ,  G01R031/00

    CPC classification number: H01J37/32963 ,  B81C1/00476 ,  B81C1/00587 ,  B81C99/0065 ,  B81C2201/0132 ,  B81C2201/0138 ,  H01J37/32449 ,  H01J37/32935

    Abstract: Processes for the removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the ability to accurately determine the endpoint of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the endpoint of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber

    Abstract translation: 通过与制造微结构中的工艺气体接触从工件材料去除层或区域的工艺通过精确地确定去除步骤的终点的能力增强。 气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。 通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物，并且可以确定去除过程的终点。 气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室

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