Method of manufacturing optical device
    50.
    发明授权
    Method of manufacturing optical device 有权
    光学器件的制造方法

    公开(公告)号:US09579858B2

    公开(公告)日:2017-02-28

    申请号:US14223651

    申请日:2014-03-24

    CPC classification number: B29D11/0073 B29D11/00634 Y10T156/1052

    Abstract: A method uses a first mask which is comprised of an X-shaped arm, a pattern portion which is a crossed part of the X-shape and is formed in a polygon shape or a circle shape, and a frame member which is connected to the pattern portion, and a second mask which is comprised of a cross-shaped arm, a pattern portion which is a crossed part of the cross shape and is formed in a polygon shape or a circle shape, and a frame member which is connected to the pattern portion; and includes a first transparent member wafer metal film-forming step of superimposing the first mask on one transparent member wafer between two transparent member wafers and forming a metal film between the pattern portions and the frame members, a second transparent member wafer metal film-forming step of superimposing the second mask on the other transparent member wafer.

    Abstract translation: 一种方法使用第一掩模,其包括X形臂,X形交叉部分的图案部分,并且形成为多边形或圆形,以及框架部件,其连接到 图案部分和第二掩模,所述第二掩模由十字形臂,十字形交叉部分形成并形成多边形或圆形的图案部分和与所述多个形状或圆形形状连接的框架部件 图案部分; 并且包括第一透明构件晶片金属膜形成步骤,其将第一掩模叠加在两个透明构件晶片之间的一个透明构件晶片上,并且在图案部分和框架构件之间形成金属膜,第二透明构件晶片金属成膜 将第二掩模叠加在另一透明构件晶片上的步骤。

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