Transistor plasma charging evaluator

    公开(公告)号:US09996654B2

    公开(公告)日:2018-06-12

    申请号:US14856578

    申请日:2015-09-17

    申请人: Wallace W Lin

    发明人: Wallace W Lin

    IPC分类号: G06F17/50 H01L27/06 H01L27/02

    摘要: A computer-implemented method capable of evaluating a plasma-induced charging effect to a transistor in a plasma-based process for a dielectric layer performed above the transistor on which a metal layer is formed is provided. The method may include receiving parameters relating to the transistor, receiving parameters relating to an interconnection, receiving parameters relating to the plasma-based process, assigning first potentials to terminals of the transistor, calculating second potentials at the terminals of the transistor, and determining a degradation state of the transistor according to the second potentials at the terminals of the transistor.

    Method and apparatus for integrated circuit layout

    公开(公告)号:US09995998B2

    公开(公告)日:2018-06-12

    申请号:US15188753

    申请日:2016-06-21

    IPC分类号: G03F1/36 G06F17/50

    摘要: A method includes receiving a layout of an integrated circuit (IC) device, the layout having an outer boundary and an inner boundary thereby defining a first region between the outer boundary and the inner boundary and placing a first plurality of dummy patterns in the first region, wherein the first plurality of dummy patterns is lithographically printable. The method further includes performing an Optical Proximity Correction (OPC) process, the first plurality of dummy patterns being position within the first region in such a way that prevents sub-resolution assist features from being inserted into the first region by the OPC process.

    Integrated circuit design
    50.
    发明授权

    公开(公告)号:US09984194B2

    公开(公告)日:2018-05-29

    申请号:US14854247

    申请日:2015-09-15

    申请人: ARM LIMITED

    摘要: A computer-implemented method of integrated circuit design comprises: using a computer, producing an integrated circuit layout for multiple instances of a circuitry element, wherein interface components in one instance of said circuitry element communicate with complementary interface components in an adjacent instance of said circuitry element, said interface components being identical between said multiple instances; said producing step comprising: for one instance of said circuitry element, generating an integrated circuit layout for said one instance of said circuitry element on the basis of timing parameters of said complementary interface components with which said one instance communicates in use; detecting timing characteristics of said interface components of said one instance of said circuitry element; applying said detected timing characteristics as said timing parameters of said complementary interface components; and repeating said generating step.