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    CHARGED PARTICLE BEAM DEVICE
    41.
    发明申请
    CHARGED PARTICLE BEAM DEVICE 失效
    充电颗粒光束装置

    公开(公告)号：US20090218507A1

    公开(公告)日：2009-09-03

    申请号：US12389838

    申请日：2009-02-20

    Applicant: Akiko Fujisawa ,  Hiroyuki Kobayashi ,  Eiko Nakazawa

    Inventor： Akiko Fujisawa ,  Hiroyuki Kobayashi ,  Eiko Nakazawa

    IPC: H01J3/14

    CPC classification number: H01J37/1471 ,  H01J37/26 ,  H01J2237/024 ,  H01J2237/065 ,  H01J2237/1501 ,  H01J2237/2802

    Abstract: The present invention provides a charged particle beam device which can effectively restrain misalignment of an optical axis even if a position of an anode is changed. The present invention is a charged particle beam device comprising a cathode provided with a charged particle source which emits a charged particle, an anode which applies an electric field to the emitted charged particle, a charged particle beam deflector which deflects an orbit of a charged particle beam having passed the anode, and a charged particle beam detector which detects the charged particle beam from a sample to which the charged particle is irradiated, wherein a distance changing mechanism which changes a distance between the cathode and the anode, corresponding to a charged particle amount emitted from the charged particle source and a deflection amount control mechanism which detects a condition of the deflector under which the charged particle dose detected from the sample scanned by deflecting the charged particle beam in the changed distance becomes a desired size and controls deflection of the deflector at sample measurement on the basis of the condition are provided.

    Abstract translation: 本发明提供一种带电粒子束装置，即使改变阳极的位置，也能够有效地抑制光轴的未对准。 本发明是一种带电粒子束装置，它包括一个阴极，该阴极设有带电粒子源，该粒子源发射一个带电粒子，一个向发射的带电粒子施加电场的阳极，一个带电粒子束偏转器，它使带电粒子的轨道偏转 通过阳极的光束和从被照射带电粒子的样品检测带电粒子束的带电粒子束检测器，其中改变对应于带电粒子的阴极和阳极之间的距离的距离改变机构 从所述带电粒子源发射的量;以及偏转量控制机构，其检测所述偏转器的状态，在所述偏转量条件下，通过使所述带电粒子束在变化的距离偏转而被扫描的样本中检测到的带电粒子剂量成为期望的尺寸， 提供了基于条件的样品测量的偏转器。

    Electron emitter, manufacturing method thereof, display, and electronic apparatus
    42.
    发明申请
    Electron emitter, manufacturing method thereof, display, and electronic apparatus 失效
    电子发射器，其制造方法，显示器和电子设备

    公开(公告)号：US20060217026A1

    公开(公告)日：2006-09-28

    申请号：US11351497

    申请日：2006-02-10

    Applicant: Makoto Yoshida

    Inventor： Makoto Yoshida

    IPC: B05D5/12 ,  H01J9/04

    CPC classification number: H01J9/025 ,  H01J31/127 ,  H01J2201/3165 ,  H01J2237/06341 ,  H01J2237/065 ,  H01J2237/2614

    Abstract: As a method of manufacturing an electron emitter having a pair of element electrodes formed on a substrate, a conductive film connected to both of the element electrodes, and an electron emission section formed in part of the conductive film, the method includes discharging a droplet of a function liquid containing a material for forming the conductive film onto a discharge surface of the substrate by a droplet device to adhere a liquid-state object to at least part of an area in which the conductive film is to be formed, drying the liquid-state object so as to make the liquid-state object become the conductive film, and forming an electron emission section in the conductive film by applying an current between the pair of element electrodes, wherein if accompanied by the drying to form the conduct film, the discharging the liquid-state object in a shape having a constricted part for forming a latent image section that has a relatively thin film thickness in a portion for forming the electron emitter.

    Abstract translation: 作为制造具有形成在基板上的一对元件电极的电子发射体的方法，连接到两个元件电极的导电膜和形成在导电膜的一部分中的电子发射部分，该方法包括： 该功能液含有通过液滴装置将导电膜形成在基板的排出表面上的材料，以将液态物体粘附到要形成导电膜的区域的至少一部分上， 以使液态物体成为导电膜，并且通过在一对元件电极之间施加电流而在导电膜中形成电子发射部分，其中如果伴随干燥以形成导电膜，则 在具有用于形成具有相对薄的膜厚度的潜像部分的形成有用于形成el的部分中的具有缩颈部分的形状中排出液态物体 ectron发射器。

    Electron beam source, electron optical apparatus using such beam source and method of operating and electron beam source
    43.
    发明授权
    Electron beam source, electron optical apparatus using such beam source and method of operating and electron beam source 有权
    电子束源，使用这种光束源的电子光学装置和操作电子束源的方法。

    公开(公告)号：US06828565B2

    公开(公告)日：2004-12-07

    申请号：US10670556

    申请日：2003-09-26

    Applicant: Michael Steigerwald

    Inventor： Michael Steigerwald

    IPC: H01J2700

    CPC classification number: H01J37/075 ,  H01J37/073 ,  H01J37/243 ,  H01J2237/06316 ,  H01J2237/065

    Abstract: An electron beam source comprises a source surface illuminated with a photon beam of adjustable intensity. The photon beam assists emission of electrons from the source surface due to a photo effect. An electric extraction field further assists in electron emission. Further, a heater is provided for further assisting in electron emission by a thermionic effect. An electron beam current is measured, and the intensity of the photon beam is adjusted based on the measured electron beam current.

    Abstract translation: 电子束源包括用可调强度的光子束照射的源表面。 由于光照效应，光子束有助于来自源表面的电子的发射。 电提取场进一步有助于电子发射。 此外，提供加热器以进一步辅助电子发射通过热离子效应。 测量电子束电流，并且基于测量的电子束电流来调整光子束的强度。

    ULTRA BROAD BAND CONTINUOUSLY TUNABLE ELECTRON BEAM PULSER
    46.
    发明申请
    ULTRA BROAD BAND CONTINUOUSLY TUNABLE ELECTRON BEAM PULSER 审中-公开

    公开(公告)号：US20170162361A1

    公开(公告)日：2017-06-08

    申请号：US15368051

    申请日：2016-12-02

    Applicant: Euclid TechLabs, LLC

    Inventor： Chunguang Jing ,  Jiaqi Qiu ,  Sergey V. Baryshev ,  June W. Lau ,  Yimei Zhu

    IPC: H01J37/065 ,  H01J37/04

    CPC classification number: H01J37/045 ,  H01J37/3178 ,  H01J2237/0432 ,  H01J2237/065 ,  H01J2237/2802

    Abstract: An ElectroMagnetic-Mechanical Pulser (“EMMP”) generates electron pulses at a continuously tunable rate between 100 MHz and 20-50 GHz, with energies up to 0.5 MeV, duty cycles up to 20%, and pulse widths between 100 fs and 10 ps. A dielectric-filled Traveling Wave Transmission Stripline (“TWTS”) that is terminated by an impedance-matching load such as a 50 ohm load imposes a transverse modulation on a continuous electron beam. The dielectric is configured such that the phase velocity of RF propagated through the TWTS matches a desired electron energy, which can be between 100 and 500 keV, thereby transferring electromagnetic energy to the electrons. The beam is then chopped into pulses by an adjustable aperture. Pulse dispersion arising from the modulation is minimized by a suppressing section that includes a mirror demodulating TWTS, so that the spatial and temporal coherence of the pulses is substantially identical to the input beam.

    Ion beam manipulator
    48.
    发明授权
    Ion beam manipulator 有权
    离子束操纵器

    公开(公告)号：US09214314B1

    公开(公告)日：2015-12-15

    申请号：US14643666

    申请日：2015-03-10

    Applicant: Varian Semiconductor Equipment Associates, Inc.

    Inventor： Jordan B. Tye ,  Jeffrey D. Susser ,  Sergio Alonso Gonzalez-Palavicini

    IPC: H01J37/317 ,  H01J37/147

    CPC classification number: H01J37/147 ,  H01J27/024 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/032 ,  H01J2237/065 ,  H01J2237/1502

    Abstract: An ion beam manipulator including a suppression electrode, a ground electrode connected to the suppression electrode in a parallel, spaced-apart relationship therewith by three electrically insulating connectors, the connectors being spaced 120 degrees apart from one another around a circumference of the suppression electrode and the ground electrode, a plurality of linkages extending from the electrically insulating connectors, at least one of the linkages including a pair of parallel support arms connected at a first end to a corresponding one of the electrically insulating connecters by a first pair of universal joints and connected at a second end to a bracket by a second pair of universal joints, and a drive shaft extending from the bracket, the drive shaft coupled to an actuator configured to extend and retract the drive shaft along a longitudinal axis of the drive shaft.

    Abstract translation: 一种离子束操纵器，包括抑制电极，接地电极，通过三个电绝缘连接器以平行的间隔关系连接到所述抑制电极，所述连接器围绕所述抑制电极的圆周彼此间隔开120度， 所述接地电极，从所述电绝缘连接器延伸的多个连接器，所述连杆中的至少一个包括一对平行的支撑臂，所述平行支撑臂通过第一对万向接头在第一端连接到相应的一个所述电绝缘连接器， 在第二端通过第二对万向接头连接到支架，以及驱动轴，其从支架延伸，所述驱动轴联接到致动器，所述致动器构造成沿着驱动轴的纵向轴线延伸和缩回驱动轴。

    Determination of emission parameters from field emission sources
    49.
    发明授权
    Determination of emission parameters from field emission sources 有权
    确定场排放源的排放参数

    公开(公告)号：US08779376B2

    公开(公告)日：2014-07-15

    申请号：US13648887

    申请日：2012-10-10

    Applicant: FEI Company

    Inventor： Lynwood W. Swanson ,  Gregory A. Schwind ,  Sean Kellogg ,  Kun Liu

    IPC: G01T1/29 ,  H01J37/00 ,  H01J37/02

    CPC classification number: H01J37/00 ,  G01T1/29 ,  H01J37/02 ,  H01J37/073 ,  H01J2237/06316 ,  H01J2237/06341 ,  H01J2237/065

    Abstract: The state of an emitter can be determined by measurements of how the current changes with the extraction voltage. A field factor β function is determined by series of relatively simple measurements of charged particles emitted at different conditions. The field factor can then be used to determine derived characteristics of the emission that, in the prior art, were difficult to determine without removing the source from the focusing column and mounting it in a specialized apparatus. The relations are determined by the source configuration and have been found to be independent of the emitter shape, and so emission character can be determined as the emitter shape changes over time, without having to determine the emitter shape and without having to redefine the relation between the field factor and the series of relatively simple measurements, and the relationships between the field factor and other emission parameters.

    Abstract translation: 发射极的状态可以通过测量电流如何随提取电压而变化来确定。 场因子 功能通过在不同条件下发射的带电粒子的一系列相对简单的测量来确定。 然后可以使用场因子来确定发射的导出特性，在现有技术中难以确定，而不需要从聚焦柱移除源并将其安装在专门的装置中。 关系由源配置确定，并且已经被发现与发射体形状无关，因此发射体形状随着时间的推移而被确定，而不必确定发射体形状，而不必重新定义发射体形状之间的关系 场因子和一系列相对简单的测量，以及场因子与其他发射参数之间的关系。

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