公开(公告)号：US06733838B2

公开(公告)日：2004-05-11

申请号：US10396392

申请日：2003-03-26

Applicant: Robert F. Brady, Jr.

Inventor： Robert F. Brady, Jr.

IPC: B05D306

CPC classification number: C09D175/04 ,  C08G18/10 ,  C08G18/5015 ,  C09D5/1637 ,  C09D5/1662 ,  Y10T428/31551 ,  C08G18/50

Abstract: The invention herein pertains to a method for reducing adhesion of marine organisms to a substrate and an article that is a substrate having thereon a solid coating of a fluorinated polyurethane elastomer. The elastomer is tough and has antifouling and release properties in reference to marine organisms. The method includes the steps of providing a liquid mixture of the fluorinated polyurethane elastomer, applying the elastomer mixture to said substrate, and curing the elastomer mixture to a solid coating of the fluorinated polyurethane elastomer, the elastomer having surface energy (which is a function of fluorine content) of 15-30 milli J/m2, Young's modulus of elasticity of 2-15 MPa, and fluorine content of 3-25%.

Abstract translation: 本发明涉及一种降低海洋生物体与基材的附着力的方法和作为其上具有含氟聚氨酯弹性体的固体涂层的基材的制品。 弹性体是坚韧的并且具有关于海洋生物的防污和释放性质。 该方法包括以下步骤：提供氟化聚氨酯弹性体的液体混合物，将弹性体混合物施加到所述基底，并将弹性体混合物固化成氟化聚氨酯弹性体的固体涂层，弹性体具有表面能（其为 氟含量）为15-30毫J / m 2，杨氏弹性模量为2-15MPa，氟含量为3-25％。

公开(公告)号：US06699530B2

公开(公告)日：2004-03-02

申请号：US08808246

申请日：1997-02-28

Applicant: Michal Danek ,  Marvin Liao ,  Eric Englhardt ,  Mei Chang ,  Yeh-Jen Kao ,  Dale R. DuBois ,  Alan F. Morrison

Inventor： Michal Danek ,  Marvin Liao ,  Eric Englhardt ,  Mei Chang ,  Yeh-Jen Kao ,  Dale R. DuBois ,  Alan F. Morrison

IPC: B05D306

CPC classification number: C23C16/45565 ,  C23C16/34 ,  C23C16/4408 ,  C23C16/4581 ,  C23C16/4586 ,  C23C16/481 ,  C23C16/5096 ,  C23C16/56 ,  H01J37/32174 ,  H01J2237/2001 ,  H01J2237/336 ,  H01L21/28512 ,  H01L21/28556 ,  H01L21/76843 ,  H01L21/76856 ,  H01L21/76862 ,  H01L21/76864

Abstract: The construction of a film on a wafer, which is placed in a processing chamber, may be carried out through the following steps. A layer of material is deposited on the wafer. Next, the layer of material is annealed. Once the annealing is completed, the material may be oxidized. Alternatively, the material may be exposed to a silicon gas once the annealing is completed. The deposition, annealing, and either oxidation or silicon gas exposure may all be carried out in the same chamber, without need for removing the wafer from the chamber until all three steps are completed. A semiconductor wafer processing chamber for carrying out such an in-situ construction may include a processing chamber, a showerhead, a wafer support and a rf signal means. The showerhead supplies gases into the processing chamber, while the wafer support supports a wafer in the processing chamber. The rf signal means is coupled to the showerhead and the wafer support for providing a first rf signal to the showerhead and a second rf signal to the wafer support.

Abstract translation: 放置在处理室中的晶片上的膜的构造可以通过以下步骤进行。 在晶片上沉积一层材料。 接下来，将材料层退火。 一旦退火完成，材料可能被氧化。 或者，一旦退火完成，材料可能暴露于硅气体。 沉积，退火和氧化或硅气体暴露都可以在相同的室中进行，而不需要从腔室中移除晶片，直到完成所有三个步骤。 用于进行这种原位结构的半导体晶片处理室可以包括处理室，喷头，晶片支架和射频信号装置。 淋浴头将气体供应到处理室中，而晶片支撑件在处理室中支撑晶片。 rf信号装置耦合到喷头和晶片支架，用于向喷头提供第一rf信号，并将第二rf信号耦合到晶片支架。

公开(公告)号：US06652922B1

公开(公告)日：2003-11-25

申请号：US08652893

申请日：1996-05-23

Applicant: Lynn Forester ,  Neil H. Hendricks ,  Dong-Kyu Choi

Inventor： Lynn Forester ,  Neil H. Hendricks ,  Dong-Kyu Choi

IPC: B05D306

CPC classification number: H01L21/02126 ,  H01L21/02216 ,  H01L21/02271 ,  H01L21/02282 ,  H01L21/02351 ,  H01L21/3105 ,  H01L21/3122

Abstract: An improved method for producing substrates coated with dielectric films for use in microelectronic applications wherein the films are processed by exposing the coated substrate surfaces to a flux of electron beam. Substrates cured via electron beam exposure possess superior dielectric properties, density, uniformity, thermal stability, and oxygen stability.

Abstract translation: 一种用于生产用于微电子应用中的用介电膜涂覆的衬底的改进方法，其中通过将涂覆的衬底表面暴露于电子束通量来处理膜。 通过电子束曝光固化的基板具有优异的介电性能，密度，均匀性，热稳定性和氧稳定性。

公开(公告)号：US06649915B2

公开(公告)日：2003-11-18

申请号：US10325995

申请日：2002-12-19

Applicant: Gomez W. Wright ,  Ralph B. James ,  Arnold Burger ,  Douglas A. Chinn

Inventor： Gomez W. Wright ,  Ralph B. James ,  Arnold Burger ,  Douglas A. Chinn

IPC: B05D306

CPC classification number: H01L31/02966 ,  G01T1/2002 ,  H01L31/1032 ,  H01L31/1832

Abstract: A CdZnTe (CZT) crystal provided with a native CdO dielectric coating to reduce surface leakage currents and thereby, improve the resolution of instruments incorporating detectors using CZT crystals is disclosed. A two step process is provided for forming the dielectric coating which includes etching the surface of a CZT crystal with a solution of the conventional bromine/methanol etch treatment, and passivating the CZT crystal surface with a solution of 10 w/o NH4F and 10 w/o H2O2 in water after attaching electrical contacts to the crystal surface.

Abstract translation: 公开了一种CdZnTe（CZT）晶体，其具有天然CdO介电涂层以减少表面漏电流，从而提高使用CZT晶体的检测器的分辨率。 提供用于形成电介质涂层的两步法，其包括用常规溴/甲醇蚀刻处理的溶液蚀刻CZT晶体的表面，并用10w / o NH4F和10w的溶液钝化CZT晶体表面 / o H2O2在水中，将电触点连接到晶体表面。

公开(公告)号：US06649216B2

公开(公告)日：2003-11-18

申请号：US09946718

申请日：2001-09-05

Applicant: Steven J. Gust ,  Patrick M. Smith ,  Jan C. Westermeier

Inventor： Steven J. Gust ,  Patrick M. Smith ,  Jan C. Westermeier

IPC: B05D306

CPC classification number: B05D7/04 ,  B05D3/067 ,  B05D3/12

Abstract: The present invention relates to a method of coating polymer film that includes the steps of extruding a cast sheet; stretching the sheet in a machine direction; applying a UV-curable coating to the sheet in-line; stretching the sheet in a transverse direction in a tenter; and exposing the coated sheet to UV radiation in-line.

公开(公告)号：US06506460B2

公开(公告)日：2003-01-14

申请号：US09842430

申请日：2001-04-26

Applicant: Patrick Luigi Paglia ,  Christian Ruepping

Inventor： Patrick Luigi Paglia ,  Christian Ruepping

IPC: B05D306

CPC classification number: C08F265/06 ,  C08F255/02 ,  C08F259/08 ,  C08F263/04 ,  C08F265/04 ,  C08F279/02 ,  C08F291/02 ,  C08L33/08 ,  C09K3/10 ,  C09K2003/1068 ,  C09K2200/0612 ,  C09K2200/062 ,  C09K2200/0625 ,  C08F222/1006 ,  C08F222/10 ,  C08F2/02 ,  C08L2666/28

Abstract: Ethylene copolymer elastomer compositions, acrylate rubber compositions, nitrile rubber compositions, fluoroelastomer compositions, and chlorinated elastomer compositions are provided which are curable by exposure to UV radiation. The compositions are particularly suited for production of elastomeric seals using hot melt equipment and a gasketing in place technique.

公开(公告)号：US06500499B1

公开(公告)日：2002-12-31

申请号：US09522634

申请日：2000-03-10

Applicant: Yoshihide Senzaki ,  Arthur Kenneth Hochberg ,  David Allen Roberts ,  John Anthony Thomas Norman ,  Glenn Baldwin Alers ,  Robert McLemore Fleming

Inventor： Yoshihide Senzaki ,  Arthur Kenneth Hochberg ,  David Allen Roberts ,  John Anthony Thomas Norman ,  Glenn Baldwin Alers ,  Robert McLemore Fleming

IPC: B05D306

CPC classification number: C23C16/4481 ,  C23C16/40

Abstract: Complex mixed metal containing thin films can be deposited by CVD from liquid mixtures of metal complexes without solvent by direct liquid injection and by other precursor dispersing method such as aerosol delivery with subsequent annealing to improve electrical properties of the deposited films. This process has potential for commercial success in microelectronics device fabrication of dielectrics, ferroelectrics, barrier metals/electrodes, superconductors, catalysts, and protective coatings. Application of this process, particularly the CVD of ZrSnTiOx (zirconium tin titanate, or ZTT) and HfSnTiOx (hafnium tin titanate, or HTT) thin films has been studied successfully.

Abstract translation: 通过CVD从金属络合物的液体混合物中通过直接液体注入和通过其它前体分散方法如气溶胶递送以及随后的退火以改善沉积膜的电性能，可以通过CVD沉积复杂的含金属的薄膜。 该方法在电介质，铁电体，阻挡金属/电极，超导体，催化剂和保护涂层的微电子器件制造中具有商业成功的潜力。 已经研究了该方法的应用，特别是ZrSnTiOx（锆钛酸锌或ZTT）和HfSnTiOx（钛酸铪钛酸盐或HTT）薄膜的CVD。

公开(公告)号：US06500287B1

公开(公告)日：2002-12-31

申请号：US09686747

申请日：2000-10-12

Applicant: Andris Azens ,  Claes Goran Granqvist ,  Lisen Kullman

Inventor： Andris Azens ,  Claes Goran Granqvist ,  Lisen Kullman

IPC: B05D306

CPC classification number: C04B35/495 ,  C04B35/42 ,  C04B2235/3239 ,  C04B2235/3279 ,  G02F1/1523

Abstract: The present invention discloses a color-modifying method, which comprises the provision of a metal oxide thin film (14) based on Ni and/or Cr. The method is characterized in that, when coloring the metal oxide film (14), exposing the metal oxide thin film to ozone, and when bleaching the metal oxide film, exposing the metal oxide film to UV radiation (18). A lamination process or a deposition of another thin film may follow the exposure. Preferably, exposing the metal oxide thin film (14) to ultraviolet radiation (18) in an oxygen-containing atmosphere (20) provides the ozone exposure and exposing the metal oxide thin film to ultraviolet radiation (18) in an oxygen-free atmosphere (20) provides the ultraviolet exposure.

Abstract translation: 本发明公开了一种颜色修正方法，其包括提供基于Ni和/或Cr的金属氧化物薄膜（14）。 该方法的特征在于，当着色金属氧化物膜（14）时，将金属氧化物薄膜暴露于臭氧，并且当漂白金属氧化物膜时，将金属氧化物膜暴露于UV辐射（18）。 曝光后可以进行层压工艺或另一薄膜的沉积。 优选地，在含氧气氛（20）中将金属氧化物薄膜（14）暴露于紫外线辐射（18）提供臭氧暴露并在无氧气氛中将金属氧化物薄膜暴露于紫外线辐射（18） 20）提供紫外线曝光。

公开(公告)号：US06495213B2

公开(公告)日：2002-12-17

申请号：US09842493

申请日：2001-04-26

Applicant: Christian Ruepping

Inventor： Christian Ruepping

IPC: B05D306

CPC classification number: C08F265/06 ,  C08F255/02 ,  C08F259/08 ,  C08F263/04 ,  C08F265/04 ,  C08F279/02 ,  C08F291/02 ,  C08L33/08 ,  C09K3/10 ,  C09K2003/1068 ,  C09K2200/0612 ,  C09K2200/062 ,  C09K2200/0625 ,  C08F222/1006 ,  C08F222/10 ,  C08F2/02 ,  C08L2666/28

Abstract: Ethylene copolymer elastomer compositions, acrylate rubber compositions, nitrile rubber compositions, fluoroelastomer compositions, and chlorinated elastomer compositions are provided which are curable by exposure to UV radiation. The compositions are particularly suited for production of elastomeric seals using hot melt equipment and a gasketing in place technique.

公开(公告)号：US06468601B1

公开(公告)日：2002-10-22

申请号：US09523538

申请日：2000-03-10

Applicant: Quanyuan Shang ,  Robert McCormick Robertson ,  Kam S. Law ,  Dan Maydan

Inventor： Quanyuan Shang ,  Robert McCormick Robertson ,  Kam S. Law ,  Dan Maydan

IPC: B05D306

CPC classification number: C23C16/4405

Abstract: An apparatus and method for reducing the production of white powder in a process chamber used for depositing silicon nitride. Steps of the method include heating at least a portion of a wall of the process chamber; providing a liner covering a substantial portion of a wall of the process chamber; providing a remote chamber connected to the interior of the process chamber; causing a plasma of cleaning gas in the remote chamber; and flowing a portion of the plasma of cleaning gas into the process chamber. The apparatus includes a deposition chamber having walls; means for heating the walls, the means thermally coupled to the walls; a liner covering a substantial portion of the walls; a remote chamber disposed outside of the chamber; an activation source adapted to deliver energy into the remote chamber; a first conduit for flowing a precursor gas from a remote gas supply into the remote chamber where it is activated by the activation source to form a reactive species; and a second conduit for flowing the reactive species from the remote chamber into the deposition chamber.

Abstract translation: 用于在用于沉积氮化硅的处理室中减少白色粉末的生产的装置和方法。 该方法的步骤包括加热处理室壁的至少一部分; 提供覆盖所述处理室的壁的主要部分的衬垫; 提供连接到处理室内部的远程室; 导致远程室中的清洁气体的等离子体; 并将清洁气体的等离子体的一部分流入处理室。 该装置包括具有壁的沉积室; 用于加热壁的装置，热耦合到壁的装置; 覆盖壁的大部分的衬垫; 设置在室外的远程室; 活化源，其适于将能量输送到所述远程室中; 用于将前体气体从远程气体供给流入远程室的第一导管，其中激活源被激活以形成反应性物质; 以及用于使反应物质从远程室流入沉积室的第二导管。