公开(公告)号：US10649342B2

公开(公告)日：2020-05-12

申请号：US16308835

申请日：2017-06-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Léon Maria Albertus Van Der Logt ,  Bart Peter Bert Segers ,  Simon Hendrik Celine Van Gorp ,  Carlo Cornelis Maria Luijten ,  Frank Staals

IPC: G03F7/20

Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus should be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, the reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.

公开(公告)号：US10607873B2

公开(公告)日：2020-03-31

申请号：US16086367

申请日：2017-03-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Eric Anthony Janda ,  Cayetano Sánchez-Fabrés Cobaleda ,  Bernd Peter Geh ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F9/00 ,  H01L21/67 ,  H01L21/68 ,  G03F7/20

Abstract: A method including directing, by an optical system, an illumination beam to a surface of a substrate, providing relative motion between the directed illumination beam and the substrate until the directed illumination beam is illuminated on a grating underneath an edge or a notch of the substrate, diffracting, by the grating, at least a portion of the illumination beam, and detecting, by the detector, the diffracted illumination.

公开(公告)号：US10606180B2

公开(公告)日：2020-03-31

申请号：US15453884

申请日：2017-03-08

Applicant: ASML Netherlands, B.V.

Inventor： Marc Guy Langlois

IPC: G03F7/20 ,  H05G2/00

Abstract: Methods and apparatus for in-situ incline cleaning an element disposed in a EUV generating chamber are disclosed. A capillary-based hydrogen radical generator is employed to form hydrogen radicals from hydrogen gas. The capillary-based hydrogen radical generator is resistively heated during operation and is oriented such that hydrogen radicals catalytically generated from the hydrogen gas are directed to a surface of the element to clean the surface.

公开(公告)号：US20200096882A1

公开(公告)日：2020-03-26

申请号：US16687535

申请日：2019-11-18

Applicant: ASML Netherlands B.V.

Inventor： Frits VAN DER MEULEN ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Ronald Harm Gunther KRAMER ,  Matthias KRUIZINGA ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Erik Roelof LOOPSTRA ,  Gerrit VAN DEN BOSCH ,  Jérôme François Sylvain Virgile VAN LOO ,  Beatrijs Louise Marie-Joseph Katrien VERBRUGGE ,  Angelo Cesar Peter DE KLERK ,  Jacobus Maria DINGS ,  Maurice Leonardus Johannes JANSSEN ,  Roland Jacobus Johannes KERSTENS ,  Martinus Jozef Maria KESTERS ,  Michel LOOS ,  Geert MIDDEL ,  Silvester Matheus REIJNDERS ,  Frank Johannes Christiaan THEUERZEIT ,  Anne Johannes Wilhelmus VAN LIEVENOOGEN

IPC: G03F7/20 ,  G03F1/22 ,  G03F1/64

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US10599054B2

公开(公告)日：2020-03-24

申请号：US16438765

申请日：2019-06-12

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

IPC: G03F7/20

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20200089135A1

公开(公告)日：2020-03-19

申请号：US16470905

申请日：2017-11-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Sebastianus Adrianus GOORDEN ,  Nitesh PANDEY ,  Duygu AKBULUT ,  Alessandro POLO ,  Simon Reinald HUISMAN

IPC: G03F9/00 ,  G03F7/20

Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.

公开(公告)号：US20200081340A1

公开(公告)日：2020-03-12

申请号：US16556709

申请日：2019-08-30

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY

IPC: G03F7/00 ,  G03F7/20

Abstract: Disclosed is a method and associated inspection apparatus for measuring a characteristic of interest relating to a structure on a substrate. The inspection apparatus uses measurement radiation comprising a plurality of wavelengths. The method comprises performing a plurality of measurement acquisitions of said structure, each measurement acquisition being performed using measurement radiation comprising a different subset of the plurality of wavelengths, to obtain a plurality of multiplexed measurement signals. The plurality of multiplexed measurement signals are subsequently de-multiplexed into signal components according to each of said plurality of wavelengths, to obtain a plurality of de-multiplexed measurement signals which are separated according to wavelength.

公开(公告)号：US10586681B2

公开(公告)日：2020-03-10

申请号：US14830062

申请日：2015-08-19

Applicant: ASML Netherlands B.V.

Inventor： Zhongwei Chen ,  Jack Jau ,  Weiming Ren

IPC: H01J37/28 ,  H01J37/26 ,  H01J37/244 ,  H01J37/10 ,  H01J37/14 ,  H01J37/20 ,  H01J37/22 ,  H01J37/02 ,  H01J37/285 ,  H01J37/29

Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.

公开(公告)号：US10586625B2

公开(公告)日：2020-03-10

申请号：US15493159

申请日：2017-04-21

Applicant: ASML Netherlands B.V.

Inventor： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC: H01J37/153 ,  G21K5/04 ,  H01J37/30 ,  G21K1/02 ,  H01J37/317 ,  H01J37/16 ,  H01J37/12

Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

公开(公告)号：US20200075287A1

公开(公告)日：2020-03-05

申请号：US16552991

申请日：2019-08-27

Applicant: ASML Netherlands B.V.

Inventor： Chih-Yu Jen ,  Long Ma ,  Yongjun Wang ,  Jun Jiang

IPC: H01J37/147 ,  H01J37/26 ,  H01J37/30

Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus for detecting a thin device structure defect is disclosed. An improved charged particle beam inspection apparatus may include a charged particle beam source to direct charged particles to a location of a wafer under inspection over a time sequence. The improved charged particle beam apparatus may further include a controller configured to sample multiple images of the area of the wafer at difference times over the time sequence. The multiple images may be compared to detect a voltage contrast difference or changes to identify a thin device structure defect.