公开(公告)号：US20210209457A1

公开(公告)日：2021-07-08

申请号：US16830733

申请日：2020-03-26

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  STEVEN LEMKE ,  VIPIN TIWARI ,  NHAN DO ,  MARK REITEN

IPC: G06N3/063 ,  G06F11/16 ,  G11C29/44 ,  G11C13/00

Abstract: Numerous embodiments are provided for compensating for drift error in non-volatile memory cells within a VMM array in an analog neuromorphic memory system. For example, in one embodiment, a circuit is provided for compensating for drift error during a read operation, the circuit comprising a data drift monitoring circuit coupled to the array for generating an output indicative of data drift; and a bitline compensation circuit for generating a compensation current in response to the output from the data drift monitoring circuit and injecting the compensation current into one or more bitlines of the array.

公开(公告)号：US20210193671A1

公开(公告)日：2021-06-24

申请号：US16724010

申请日：2019-12-20

Applicant: Silicon Storage Technology, Inc.

Inventor： Serguei Jourba ,  Catherine Decobert ,  Feng Zhou ,  Jinho Kim ,  Xian Liu ,  Nhan Do

IPC: H01L27/11517 ,  H01L29/423 ,  H01L29/66 ,  H01L29/788 ,  H01L29/78

Abstract: A method of forming a device on a substrate with recessed first/third areas relative to a second area by forming a fin in the second area, forming first source/drain regions (with first channel region therebetween) by first/second implantations, forming second source/drain regions in the third area (defining second channel region therebetween) by the second implantation, forming third source/drain regions in the fin (defining third channel region therebetween) by third implantation, forming a floating gate over a first portion of the first channel region by first polysilicon deposition, forming a control gate over the floating gate by second polysilicon deposition, forming an erase gate over the first source region and a device gate over the second channel region by third polysilicon deposition, and forming a word line gate over a second portion of the first channel region and a logic gate over the third channel region by metal deposition.

公开(公告)号：US11038495B1

公开(公告)日：2021-06-15

申请号：US16838847

申请日：2020-04-02

Applicant: Silicon Storage Technology, Inc.

Inventor： Ryan Mei ,  Xiaozhou Qian ,  Hieu Van Tran ,  Claire Zhu

IPC: H03K3/356 ,  H03K19/185 ,  H03K19/003 ,  H03K19/0185

Abstract: An improved level shifter is disclosed. The level shifter is able to achieve a switching time below 1 ns using a relatively low voltage for VDDL, such as 0.75 V. The improved level shifter comprises a coupling stage and a level-switching stage. A related method of level shifting is also disclosed.

公开(公告)号：US20210175240A1

公开(公告)日：2021-06-10

申请号：US17178520

申请日：2021-02-18

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Hung Quoc Nguyen ,  Nhan Do

IPC: H01L27/11526 ,  H01L27/11519 ,  H01L27/11521 ,  G11C16/04 ,  G11C16/14 ,  G11C16/26 ,  H01L29/423 ,  H01L29/788

Abstract: A memory device with memory cell pairs each having a single continuous channel region, first and second floating gates over first and second portions of the channel region, an erase gate over a third portion of the channel region between the first and second channel region portions, and first and second control gates over the first and second floating gates. For each of the pairs of memory cells, the first region is electrically connected to the second region of an adjacent pair of memory cells in the same active region, and the second region is electrically connected to the first region of an adjacent pair of the memory cells in the same active region.

公开(公告)号：US20210174185A1

公开(公告)日：2021-06-10

申请号：US17181656

申请日：2021-02-22

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Vipin Tiwari ,  Mark Reiten ,  Nhan Do

IPC: G06N3/063 ,  G06N3/08 ,  G06F3/06 ,  G06F17/16

Abstract: Numerous output circuits are disclosed for an analog neural memory system for a deep learning neural network. In one embodiment, an adaptable neuron circuit receives output current from a neuron and converts it into a voltage. In another embodiment, a current sample and hold circuit samples an input current and generates an output current. In another embodiment, a voltage sample and hold circuit samples an input voltage and generates an output voltage.

公开(公告)号：US10998325B2

公开(公告)日：2021-05-04

申请号：US16208297

申请日：2018-12-03

Applicant: Silicon Storage Technology, Inc.

Inventor： Catherine Decobert ,  Hieu Van Tran ,  Nhan Do

IPC: G11C16/16 ,  H01L27/11521 ,  G11C16/26 ,  H01L29/08 ,  H01L29/10 ,  H01L29/423

Abstract: A memory device that includes source and drain regions formed in a semiconductor substrate, with a first channel region of the substrate extending there between. A floating gate is disposed over and insulated from the channel region, wherein the conductivity of the channel region is solely controlled by the floating gate. A control gate is disposed over and insulated from the floating gate. An erase gate is disposed over and insulated from the source region, wherein the erase gate includes a notch that faces and is insulated from an edge of the floating gate. Logic devices are formed on the same substrate. Each logic device has source and drain regions with a channel region extending there between, and a logic gate disposed over and controlling the logic device's channel region.

公开(公告)号：US10991433B2

公开(公告)日：2021-04-27

申请号：US16803418

申请日：2020-02-27

Applicant: Silicon Storage Technology, Inc.

Inventor： Viktor Markov ,  Alexander Kotov

IPC: G11C16/16 ,  G11C16/26

Abstract: A memory device having non-volatile memory cells and a controller. In response to a first command for erasing and programming a first group of the memory cells, the controller determines the first group can be programmed within substantially 10 seconds of their erasure, erases the first group, and programs the first group within substantially 10 seconds of their erasure. In response to a second command for erasing and programming a second group of the memory cells, the controller determines that the second group cannot be programmed within substantially 10 seconds of their erasure, divides the second group into subgroups of the memory cells each of which can be programmed within substantially 10 seconds of their erasure, and for each of the subgroups, erase the subgroup and program the subgroup within substantially 10 seconds of their erasure.

公开(公告)号：US20210118894A1

公开(公告)日：2021-04-22

申请号：US17133395

申请日：2020-12-23

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Thuan Vu ,  Stephen Trinh ,  Stanley Hong ,  Toan Le ,  Nghia Le ,  Hien Pham

IPC: H01L27/11531 ,  G06N3/08 ,  G11C16/04 ,  H01L29/788

Abstract: Numerous embodiments for reading or verifying a value stored in a selected memory cell in a vector-by-matrix multiplication (VMM) array in an artificial neural network are disclosed. In one embodiment, an input comprises a set of input bits that result in a series of input signals applied to a terminal of the selected memory cell, further resulting in a series of output signals that are digitized, shifted based on the bit location of the corresponding input bit in the set of input bits, and added to yield an output indicating a value stored in the selected memory cell.

公开(公告)号：US20210065837A1

公开(公告)日：2021-03-04

申请号：US16828206

申请日：2020-03-24

Applicant: Silicon Storage Technology, Inc.

Inventor： Viktor MARKOV ,  Alexander KOTOV

IPC: G11C29/50 ,  G11C16/28 ,  G11C16/16

Abstract: A memory device that includes a plurality of non-volatile memory cells and a controller. The controller is configured to erase the plurality of memory cells, program each of the memory cells, and for each of the memory cells, measure a threshold voltage applied to the memory cell corresponding to a target current through the memory cell in a first read operation, re-measure a threshold voltage applied to the memory cell corresponding to the target current through the memory cell in a second read operation, and identify the memory cell as defective if a difference between the measured threshold voltage and the re-measured threshold voltage exceeds a predetermined amount.

公开(公告)号：US10937794B2

公开(公告)日：2021-03-02

申请号：US16208150

申请日：2018-12-03

Applicant: Silicon Storage Technology, Inc.

Inventor： Feng Zhou ,  Jinho Kim ,  Xian Liu ,  Serguei Jourba ,  Catherine Decobert ,  Nhan Do

IPC: H01L27/11521 ,  H01L21/28 ,  H01L27/11526 ,  H01L27/11531 ,  H01L29/10 ,  H01L29/423 ,  H01L29/66 ,  H01L29/78 ,  H01L29/788

Abstract: A memory device having plurality of upwardly extending semiconductor substrate fins, a memory cell formed on a first fin and a logic device formed on a second fin. The memory cell includes source and drain regions in the first fin with a channel region therebetween, a polysilicon floating gate extending along a first portion of the channel region including the side and top surfaces of the first fin, a metal select gate extending along a second portion of the channel region including the side and top surfaces of the first fin, a polysilicon control gate extending along the floating gate, and a polysilicon erase gate extending along the source region. The logic device includes source and drain regions in the second fin with a second channel region therebetween, and a metal logic gate extending along the second channel region including the side and top surfaces of the second fin.