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    Film coating system and isolating device thereof
    51.
    发明授权
    Film coating system and isolating device thereof 有权
    薄膜涂布系统及其隔离装置

    公开(公告)号：US08316796B2

    公开(公告)日：2012-11-27

    申请号：US11954843

    申请日：2007-12-12

    Applicant: Chi-Hung Liu ,  Chih-Ming Chen ,  Chun-Hsien Su ,  Chih-Wei Chen ,  Wen-Tung Hsu ,  Chun-Hung Lin

    Inventor： Chi-Hung Liu ,  Chih-Ming Chen ,  Chun-Hsien Su ,  Chih-Wei Chen ,  Wen-Tung Hsu ,  Chun-Hung Lin

    IPC: C23C16/00

    CPC classification number: H01J37/32568 ,  H01J37/3244 ,  H01J37/32825 ,  H01J2237/20214

    Abstract: A film coating system for coating an object includes a working station and an isolating device. The object is disposed on the working station, and the isolating device is utilized to isolate the object. The isolating device includes a body generating a first power, a first working fluid, a second working fluid, a first guiding portion and a second guiding portion. The first guiding portion guides the first working fluid to pass through the body, thereby forming a first working region to coat the object thereon. The second guiding portion guides the second working fluid excited by the first power of the body to pass through the body, thereby forming a second working region to separate the first working region from the object.

    Abstract translation: 用于涂覆物体的涂膜系统包括加工台和隔离装置。 物体设置在工作站上，隔离装置用于隔离物体。 隔离装置包括产生第一功率的主体，第一工作流体，第二工作流体，第一引导部分和第二引导部分。 第一引导部引导第一工作流体穿过主体，从而形成第一工作区域以在其上涂覆物体。 第二引导部分引导由身体的第一功率激发的第二工作流体穿过主体，从而形成第二工作区域以将第一工作区域与物体分开。

    Plasma deposition apparatus and deposition method utilizing same
    52.
    发明授权
    Plasma deposition apparatus and deposition method utilizing same 有权
    等离子体沉积设备及其沉积方法

    公开(公告)号：US08281741B2

    公开(公告)日：2012-10-09

    申请号：US13019269

    申请日：2011-02-01

    Applicant: Chia-Chiang Chang ,  Chin-Jyi Wu ,  Shin-Chih Liaw ,  Chun-Hung Lin

    Inventor： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Shin-Chih Liaw ,  Chun-Hung Lin

    IPC: C23C16/455 ,  C23C16/452 ,  C23C16/50 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

    CPC classification number: C23C16/402 ,  C23C16/345 ,  C23C16/45563 ,  C23C16/45595 ,  C23C16/513

    Abstract: A plasma deposition apparatus is provided. The plasma deposition apparatus comprises a chamber. A pedestal is placed in the chamber. A plasma generator is placed in the chamber and over the pedestal. The plasma generator comprises a plasma jet for plasma thin film deposition having a discharge direction angle θ1 larger than 0° and less than 90° between a normal direction of the pedestal and the discharge direction of the plasma jet. A gas-extracting pipe extends into the chamber and over the pedestal. The gas-extracting pipe provides a pumping path for particles and side-products having a pumping direction angle θ2 larger than 0° and less than 90° between the normal direction of the pedestal and the pumping direction of the gas-extracting pipe. The chamber is kept at an ambient atmospheric pressure.

    Abstract translation: 提供了一种等离子体沉积装置。 等离子体沉积设备包括一个室。 底座放置在腔室中。 等离子体发生器放置在腔室中并在基座上方。 等离子体发生器包括用于等离子体薄膜沉积的等离子体射流，其具有放电方向角度θ;在基座的法线方向与等离子体射流的排出方向之间大于0°且小于90°的1。 气体提取管延伸到腔室中并且在基座上。 气体提取管为具有泵送方向角度的颗粒和副产物提供泵送路径; 2在基座的法线方向与气体提取管的泵送方向之间大于0°且小于90°。 室保持在环境大气压力。

    Surface treating device and surface treating method
    53.
    发明授权
    Surface treating device and surface treating method 有权
    表面处理装置及表面处理方法

    公开(公告)号：US08277616B2

    公开(公告)日：2012-10-02

    申请号：US11892853

    申请日：2007-08-28

    Applicant: Chi-Hung Liu ,  Chun-Hung Lin ,  Chun-Hsien Su ,  Wen-Tung Hsu

    Inventor： Chi-Hung Liu ,  Chun-Hung Lin ,  Chun-Hsien Su ,  Wen-Tung Hsu

    IPC: B01J19/08

    CPC classification number: A61B18/042 ,  A61C5/00 ,  A61C19/066

    Abstract: A surface treating method for treating a tooth surface and a surface treating device thereof are provided. First, a working gas is filled into a tube. Next, a voltage is provided to the working gas for exciting the working gas into plasma. After that, the plasma is discharged through an opening of the tube for contacting the tooth surface.

    Abstract translation: 提供了一种用于处理牙齿表面的表面处理方法及其表面处理装置。 首先，将工作气体填充到管中。 接下来，向工作气体提供用于将工作气体激发成等离子体的电压。 之后，等离子体通过用于与齿面接触的管的开口排出。

    IMAGE TRANSFER PROCESS
    54.
    发明申请
    IMAGE TRANSFER PROCESS 有权
    图像传输过程

    公开(公告)号：US20120189958A1

    公开(公告)日：2012-07-26

    申请号：US13014285

    申请日：2011-01-26

    Applicant: Hsi-Wen Chang ,  Wei-Jen Lai ,  Pi-Ju Chiang ,  Chun-Hung Lin ,  Jung-Ya Hsieh

    Inventor： Hsi-Wen Chang ,  Wei-Jen Lai ,  Pi-Ju Chiang ,  Chun-Hung Lin ,  Jung-Ya Hsieh

    IPC: G03C5/16

    CPC classification number: G03C11/12 ,  D06P1/0012 ,  D06P5/2005

    Abstract: The present invention relates to an image transfer process. The process includes the steps of: a) providing an image carrying device including at least one photoluminescent surface; b) displaying a luminous image on a display surface of a light-emitting medium; and c) positioning the display surface of the light-emitting medium that is displaying the luminous image at a distance from the at least one photoluminescent surface of the image carrying device shorter than a predetermined effective distance, for a predetermined period of time.

    Abstract translation: 本发明涉及图像转印处理。 该方法包括以下步骤：a）提供包括至少一个光致发光表面的图像承载装置; b）在发光介质的显示表面上显示发光图像; 以及c）将显示所述发光图像的所述发光介质的显示表面定位在比所述图像承载装置的所述至少一个光致发光表面短一预定有效距离的预定时间段。

    Data cache architecture and cache algorithm used therein
    58.
    发明授权
    Data cache architecture and cache algorithm used therein 有权
    数据缓存体系结构和缓存算法

    公开(公告)号：US07814276B2

    公开(公告)日：2010-10-12

    申请号：US11943228

    申请日：2007-11-20

    Applicant: Yen-Chin Lin ,  Hsin-Chung Wang ,  Chun-Hung Lin

    Inventor： Yen-Chin Lin ,  Hsin-Chung Wang ,  Chun-Hung Lin

    IPC: G06F12/00

    CPC classification number: G06F12/0804 ,  G06F12/0886 ,  G06F2212/2022

    Abstract: The present invention provides a data cache architecture interposed between a host and a flash memory, the data cache architecture comprising: a buffer memory, receiving data from the host; a memory controller, deploying the data in the buffer memory; and a data cache memory, controlled by the memory controller according to a cache algorithm. The data cache architecture and the cache algorithm used in the data cache architecture can be used to minimize the program/erase count of the NAND type flash device.

    Abstract translation: 本发明提供一种插入在主机和闪速存储器之间的数据高速缓存架构，所述数据高速缓存架构包括：缓冲存储器，从所述主机接收数据; 存储器控制器，将数据部署在缓冲存储器中; 以及由存储器控制器根据高速缓存算法控制的数据高速缓冲存储器。 可以使用数据高速缓存架构中使用的数据高速缓存结构和缓存算法来最小化NAND型闪存设备的编程/擦除计数。

    Method and system for motion estimation using chrominance information
    59.
    发明授权
    Method and system for motion estimation using chrominance information 有权
    使用色度信息进行运动估计的方法和系统

    公开(公告)号：US07760807B2

    公开(公告)日：2010-07-20

    申请号：US11206137

    申请日：2005-08-18

    Applicant: Chun-Hung Lin

    Inventor： Chun-Hung Lin

    IPC: H04N7/12

    CPC classification number: H04N19/198 ,  H04N19/102 ,  H04N19/176 ,  H04N19/186 ,  H04N19/196 ,  H04N19/51

    Abstract: A method and system for motion estimation using chrominance information, which is based on each block of a current frame to find a corresponding block from a previous frame within a search area and accordingly determines a motion vector and includes first separately computing luminance differences and chrominance differences between luminance and chrominance of a target block in a current frame and luminance and chrominance of candidate blocks in a search range of a previous frame, next adjusting the luminance differences based on the first chrominance differences and the second chrominance differences and outputting adjusted luminance differences; and finally finding a minimum one among the adjusted luminance differences and accordingly determining the motion vector.

    Abstract translation: 一种使用色度信息的运动估计的方法和系统，其基于当前帧的每个块以从搜索区域内的先前帧中找到相应的块，并因此确定运动矢量，并且包括首先分别计算亮度差和色度差 在当前帧中的目标块的亮度和色度之间以及前一帧的搜索范围内的候选块的亮度和色度，接着基于第一色差和第二色度差来调整亮度差并输出调整的亮度差; 最后在调整后的亮度差中找到最小的亮度差，从而确定运动矢量。

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