Abstract:
A circuit can provide an approximately constant resistance value that is virtually independent of process and temperature variations. A current control circuit may use a device that tracks the changes in a corresponding device over process and temperature variations. As a result, the behavior of device may be used to help determine the control information provided to device in order to maintain an approximately constant resistance Rm over process and temperature variations. The approximately constant resistance Rm may be used to provide an approximately constant current ILED. A wide variety of applications, not just LED drivers, may benefit from the use of an approximately constant resistance and/or current.
Abstract:
A distributed collaborative computer system is provided that comprises a plurality of server computers interconnected via a high-speed link. Client computers can connect to any available server computer and start or join a conference hosted on either the server computer to which the client computer is connected or any other server in the system. As a result, the system and method of the present invention is easily scalable to support an arbitrary number of participants to a conference by merely adding the appropriate number of server computers to the system. In addition, by replicating the conference information on more than one server computer, the single point of failure limitation is eliminated. In fact, if a server hosting or participating in a conference malfunctions, the failure is detected by other server computers and the client computer is able to reconnect to the conference through a new server computer.
Abstract:
An interleaver has an input polarization beam displacer, a birefringent filter assembly in optical communication with the input polarization beam displacer, a first output polarization beam displacer in optical communication with the birefringent filter assembly and a second output polarization beam displacer optical communication with the first output polarization beam displacer. The birefringent filter assembly preferably comprises at least one birefringent filter stage, wherein each birefringent filter stage comprises a first filter polarization beam displacer, a second filter polarization beam displacer and at least one reflector configured so as to direct light from first filter polarization beam displacer to the second filter of polarization beam displacer.
Abstract:
Interconnects in sub-micron and sub-half-micron integrated circuit devices are fabricated using a dual damascene process incorporating a low-k dielectric. A dual-damascene structure can be implemented without the necessity of building a single damascene base, and without CMP of the low-k dielectric. This structure simplifies the manufacturing process, reduces cost, and effectively reduces intra-level and inter-level capacitance, resistivity, and noise related to substrate coupling. In accordance with a further aspect of the present invention, a modified silicon oxide material such as silsesquioxane is used for the low-k dielectric in conjunction with silicon dioxide cap layers, allowing an improved process window and simplifying the etching process.
Abstract:
An improved dielectric material having pores formed therein and a method for forming the material are disclosed. The material is formed of a polymer. Pores within the polymer are formed by forming solid organic particles within the polymer and eventually vaporizing the particles to form pores within the polymer.
Abstract:
A semiconductor process and structure is provided for use in single or dual damascene metallization processes. A thin metal layer which serves as an etch stop and masking layer is deposited upon a first dielectric layer. Then, a second dielectric layer is deposited upon the thin metallization masking layer. The thin metallization masking layer provides an etch stop to form the bottom of the in-laid conductor grooves. In a dual damascene process, the thin metallization masking layer leaves open the via regions. Thus, the conductor grooves above the metallization masking layer and the via regions may be etched in the first and second dielectrics in one step. In a single damascene process, the thin metallization etch masking layer may cover the via regions. The etch stop and masking layer can be formed from any conductive or non-conductive materials whose chemical, mechanical, thermal and electrical properties are compatible with the process and circuit performance.
Abstract:
Systems and methods for improving quality of a call over network (CON) are provided. Call quality may be improved via buffer length modulation based upon the call scenario type. Scenario detection may be based upon who speaks, and the duration of the speaking, as well as contextual analysis. Further, the call over network quality may further be improved by deploying modules over the network. The modules are intermediary vehicles between each communicator and backend servers. The modules intercept audio packets from the communicator to detect packet loss, and perform recovery of lost packets, thereby accelerating real-time audio conversations.
Abstract:
The present disclosure disclose a diaphragm dome, the diaphragm dome includes a first carbon fiber layer and a second carbon fiber layer which are alternatively arranged by stacking, the first carbon fiber layer and the second carbon fiber layer are respectively a single-layer structure formed by an one-way extended carbon fiber bundle, an extending direction of the carbon fiber bundle of the first carbon fiber layer is perpendicular to an extending direction of the carbon fiber bundle of the second carbon fiber layer, and a thickness difference exists between the first carbon fiber layer and the second carbon fiber layer. In the diaphragm dome provided by the present disclosure, the material has larger specific strength, thus can reduce the thickness of the diaphragm dome, the carbon fiber layers of the diaphragm dome are well adhered, which is not readily layered, and has good water resistance.
Abstract:
Execution traces are collected from multiple execution instances that exhibit performance issues such as slow execution. Call stacks are extracted from the execution traces, and the call stacks are mined to identify frequently occurring function call patterns. The call patterns are then clustered, and used to identify groups of execution instances whose performance issues may be caused by common problematic program execution patterns.
Abstract:
A PWM generation module generates a PWM data signal used to control a light emitting diode (LED) driver for one or more strings of LEDs of a display device. The PWM data signal is synchronized with the frame boundaries of the video content being displayed. The PWM generation module can configure the PWM data signal such that a new PWM cycle is initiated at the start of each successive frame, and further whereby those PWM cycles that would be prematurely terminated at frame boundaries are instead driven at a constant reference level until the frame boundary. With this configuration, a substantially linear average light intensity can be achieved across frames, thereby reducing or eliminating display distortion that is often present in other PWM cycle synchronization techniques. The PWM generation module can use a self-learning process to make adjustments to the expected number of completeable PWM cycles per frame in response to dynamic changes in the frame rate, PWM frequency, or other related display parameters.