公开(公告)号：US20050018155A1

公开(公告)日：2005-01-27

申请号：US10873647

申请日：2004-06-23

Applicant: Henrikus Herman Cox ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Helmar Santen

Inventor： Henrikus Herman Cox ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Helmar Santen

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F7/709 ,  G03F7/70341

Abstract: A lithographic projection apparatus wherein a liquid supply system provides a space between a projection system and a substrate with liquid. The liquid supply system comprises a member. A liquid seal is formed between the member and the substrate by a flow of liquid. In an embodiment, the liquid seal is formed by a flow of liquid from an inlet to an outlet of the member.

Abstract translation: 一种光刻投影装置，其中液体供应系统在投影系统和具有液体的基板之间提供空间。 液体供应系统包括一个构件。 通过液体流在构件和基板之间形成液体密封。 在一个实施例中，液体密封由液体从构件的入口到出口形成。

公开(公告)号：US20050018154A1

公开(公告)日：2005-01-27

申请号：US10844570

申请日：2004-05-13

Applicant: Wilhelmus Box ,  Antonius Van Dijsseldonk ,  Dominicus Jacobus Franken ,  Martinus Leenders ,  Erik Loopstra ,  Josephus Smits ,  Marc Van Der Wijst

Inventor： Wilhelmus Box ,  Antonius Van Dijsseldonk ,  Dominicus Jacobus Franken ,  Martinus Leenders ,  Erik Loopstra ,  Josephus Smits ,  Marc Van Der Wijst

IPC: G21K1/06 ,  G02B7/182 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G21K5/00

CPC classification number: G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70991

Abstract: A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.

Abstract translation: 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。

公开(公告)号：US09354529B2

公开(公告)日：2016-05-31

申请号：US13561502

申请日：2012-07-30

Applicant: Dirk Heinrich Ehm ,  Maarten van Kampen ,  Stefan-Wolfgang Schmidt ,  Vadim Yevgenyevich Banine ,  Erik Loopstra

Inventor： Dirk Heinrich Ehm ,  Maarten van Kampen ,  Stefan-Wolfgang Schmidt ,  Vadim Yevgenyevich Banine ,  Erik Loopstra

IPC: G03B27/52 ,  G03B27/54 ,  G03F7/20 ,  G01J1/58 ,  G02B5/08

CPC classification number: G03F7/70891 ,  G01J1/58 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70558 ,  G03F7/7085 ,  G03F7/70958

Abstract: An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).

Abstract translation: 用于微光刻的投影曝光工具（100）中的布置包括反射光学元件（10; 110）和辐射检测器（30; 32; 130）。 反射光学元件（10; 110）包括保证光学元件（10; 110）的机械强度的载体元件（12）和设置在载体元件（12）上的反射涂层（18），用于反射使用辐射 20a）。 载体元件（12）由与使用辐射（20a）相互作用发射其波长与使用辐射（20a）的波长不同的次级辐射（24）和辐射检测器（30）的材料制成 ; 32; 130）被配置为检测所述次级辐射（24）。

公开(公告)号：US20070188723A1

公开(公告)日：2007-08-16

申请号：US11353232

申请日：2006-02-14

Applicant: Bernardus Luttikhuis ,  Erik Loopstra ,  Harmen Schoot ,  Fransicus Jacobs

Inventor： Bernardus Luttikhuis ,  Erik Loopstra ,  Harmen Schoot ,  Fransicus Jacobs

IPC: G03B27/42

CPC classification number: G03B27/42 ,  G03F7/707 ,  G03F7/70783

Abstract: The mask in a lithographic apparatus is clamped on a first side using a first clamping device and on a second side, different from the first side, using a second clamping device. The clamping forces are preferably applied using thin membranes. The first clamp clamps the substrate in directions parallel to the plane of the patterning device, perpendicular to the plane of the patterning device and rotationally. The second clamping device clamps the patterning device only in directions parallel to the plane of the substrate.

Abstract translation: 光刻设备中的掩模使用第一夹紧装置夹紧在第一侧上，并使用第二夹紧装置夹紧在不同于第一侧的第二侧上。 夹紧力优选使用薄膜施加。 第一夹具将基板平行于图案形成装置的平面垂直于图案形成装置的平面并旋转夹紧基板。 第二夹紧装置仅在平行于基板的平面的方向上夹持图案形成装置。

公开(公告)号：US20070146664A1

公开(公告)日：2007-06-28

申请号：US11314157

申请日：2005-12-22

Applicant: Koen Jacobus Zaal ,  Johannes Jacobs ,  Erik Loopstra ,  Joost Ottens ,  Frederik De Jong

Inventor： Koen Jacobus Zaal ,  Johannes Jacobs ,  Erik Loopstra ,  Joost Ottens ,  Frederik De Jong

IPC: G03B27/42

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: An immersion lithographic apparatus has a plurality of substrate holders arranged to hold substrates, each substrate holder having a conduit therein for passing a temperature control fluid. The thermal responses of the different substrate holders are calibrated and flow rates calculated and used so that all the holders return to a predetermined temperature in the same time.

Abstract translation: 浸没式光刻设备具有布置成保持基板的多个基板保持器，每个基板保持器具有用于使温度控制流体通过的导管。 对不同衬底保持器的热响应进行校准，并计算和使用流量，以便所有保持器在同一时间内恢复到预定温度。

公开(公告)号：US20070096566A1

公开(公告)日：2007-05-03

申请号：US11262962

申请日：2005-11-01

Applicant: Sven Hol ,  Erik Loopstra

Inventor： Sven Hol ,  Erik Loopstra

IPC: H02K41/00

CPC classification number: H02K41/03 ,  G03F7/70758 ,  G03F7/70858 ,  H01J2329/00 ,  H02K9/00

Abstract: A lithographic apparatus has a patterning support constructed to support a patterning device and a substrate support constructed to support a substrate. At least one of the patterning support and the substrate support is moved by an electromagnetic actuator. The actuator has a first part and a second part that are movable relative to each other. The first part has a coil structure, and the second part including a plurality of permanent magnets interacting with the coil structure. The second part is provided with a cooling structure arranged adjacent the permanent magnets. Cooling ducts are arranged between adjacent permanent magnets, or on a side of the permanent magnets facing the coil structure.

Abstract translation: 光刻设备具有构造成支撑图案形成装置和构造成支撑衬底的衬底支撑件的图形化支撑件。 图案形成支撑件和基板支撑件中的至少一个由电磁致动器移动。 致动器具有可相对于彼此移动的第一部分和第二部分。 第一部分具有线圈结构，并且第二部分包括与线圈结构相互作用的多个永磁体。 第二部分设置有与永磁体相邻布置的冷却结构。 冷却管道布置在相邻的永磁体之间，或者在面向线圈结构的永磁体的一侧。

公开(公告)号：US20070058172A1

公开(公告)日：2007-03-15

申请号：US11226460

申请日：2005-09-15

Applicant: Engelbertus Antonius Van Der Pasch ,  Erik Loopstra

Inventor： Engelbertus Antonius Van Der Pasch ,  Erik Loopstra

IPC: G01B9/02

CPC classification number: G01B9/02051 ,  G01B9/02029 ,  G01B2290/70 ,  G03F7/70775

Abstract: A measurement unit to determine a position in a first and second dimension includes a diffraction type encoder and an interferometer. The diffraction type encoder determines by means of a diffraction on a first and a second diffraction grating the position in the first dimension of the second grating with respect to the first grating, The interferometer determines the position in the second dimension of a mirror. The measurement unit includes a combined optical unit to transfer an encoder measurement beam as well as an interferometer measurement beam. Further, the measurement unit may include a combined light source for the encoder as well as the interferometer. One of the first and second diffraction gratings may further show some degree of zero order reflection to provide the mirror of the interferometer.

Abstract translation: 用于确定第一和第二维度中的位置的测量单元包括衍射型编码器和干涉仪。 衍射型编码器通过第一和第二衍射光栅上的衍射来确定第二光栅相对于第一光栅的第一维度中的位置。干涉仪确定反射镜的第二维度中的位置。 测量单元包括用于传送编码器测量光束以及干涉仪测量光束的组合光学单元。 此外，测量单元可以包括用于编码器的组合光源以及干涉仪。 第一和第二衍射光栅中的一个可进一步示出一些零级反射以提供干涉仪的反射镜。

公开(公告)号：US20070013885A1

公开(公告)日：2007-01-18

申请号：US11486378

申请日：2006-07-14

Applicant: Erik Loopstra ,  Arno Bleeker ,  Heine Mulder ,  Oscar Franciscus Noordman ,  Timotheus Sengers ,  Laurentius Jorritsma ,  Mark Trentelman ,  Gerrit Streutker

Inventor： Erik Loopstra ,  Arno Bleeker ,  Heine Mulder ,  Oscar Franciscus Noordman ,  Timotheus Sengers ,  Laurentius Jorritsma ,  Mark Trentelman ,  Gerrit Streutker

IPC: G03B27/42

CPC classification number: G03F7/70733 ,  G03F7/70208 ,  G03F7/70283 ,  G03F7/70466

Abstract: In order to improve the productivity of a lithographic apparatus, a stage apparatus to hold two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.

Abstract translation: 为了提高光刻设备的生产率，描述了用于保持两个图案形成装置的平台装置。 图案形成装置被布置成使得扫描方向上的图案之间的距离对应于图案在扫描方向上的长度。 通过这样做，可以通过用第一图案曝光第一模具，跳过与第一模具相邻的第二模具，以及使用第二图案露出与第二模具相邻的第三模具来执行改进的曝光顺序。

公开(公告)号：US20060268250A1

公开(公告)日：2006-11-30

申请号：US11499780

申请日：2006-08-07

Applicant: Antonius Maria Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Johannes Mulkens ,  Hans Jansen ,  Jacobus Johannus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

Inventor： Antonius Maria Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Johannes Mulkens ,  Hans Jansen ,  Jacobus Johannus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

IPC: G03B27/42

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US20060238721A1

公开(公告)日：2006-10-26

申请号：US11403196

申请日：2006-04-13

Applicant: Nicolaas Kate ,  Erik Loopstra ,  Aleksandr Khmelichek ,  Louis Markoya ,  Harry Sewell

Inventor： Nicolaas Kate ,  Erik Loopstra ,  Aleksandr Khmelichek ,  Louis Markoya ,  Harry Sewell

IPC: G03B21/18

CPC classification number: G03F7/70341

Abstract: A liquid immersion lithography system includes projection optics and a showerhead. The projection optics are configured to expose a substrate with a patterned beam. The showerhead includes a first nozzle and a second nozzle that are configured to be at different distances from a surface of the substrate during an exposure operation.

Abstract translation: 液浸光刻系统包括投影光学元件和喷头。 投影光学器件被配置为用图案化的光束曝光衬底。 喷头包括第一喷嘴和第二喷嘴，其被配置为在曝光操作期间与基板的表面不同的距离。