公开(公告)号：US20070096566A1

公开(公告)日：2007-05-03

申请号：US11262962

申请日：2005-11-01

Applicant: Sven Hol ,  Erik Loopstra

Inventor： Sven Hol ,  Erik Loopstra

IPC: H02K41/00

CPC classification number: H02K41/03 ,  G03F7/70758 ,  G03F7/70858 ,  H01J2329/00 ,  H02K9/00

Abstract: A lithographic apparatus has a patterning support constructed to support a patterning device and a substrate support constructed to support a substrate. At least one of the patterning support and the substrate support is moved by an electromagnetic actuator. The actuator has a first part and a second part that are movable relative to each other. The first part has a coil structure, and the second part including a plurality of permanent magnets interacting with the coil structure. The second part is provided with a cooling structure arranged adjacent the permanent magnets. Cooling ducts are arranged between adjacent permanent magnets, or on a side of the permanent magnets facing the coil structure.

Abstract translation: 光刻设备具有构造成支撑图案形成装置和构造成支撑衬底的衬底支撑件的图形化支撑件。 图案形成支撑件和基板支撑件中的至少一个由电磁致动器移动。 致动器具有可相对于彼此移动的第一部分和第二部分。 第一部分具有线圈结构，并且第二部分包括与线圈结构相互作用的多个永磁体。 第二部分设置有与永磁体相邻布置的冷却结构。 冷却管道布置在相邻的永磁体之间，或者在面向线圈结构的永磁体的一侧。

公开(公告)号：US20050061626A1

公开(公告)日：2005-03-24

申请号：US10855962

申请日：2004-05-28

Applicant: Sven Hol ,  Johan Compter ,  Erik Loopstra ,  Patricia Vreugdewater

Inventor： Sven Hol ,  Johan Compter ,  Erik Loopstra ,  Patricia Vreugdewater

IPC: H01L21/027 ,  H02K7/09 ,  H02K41/025 ,  H02N15/02 ,  H02P25/06 ,  G03F7/20

CPC classification number: H02K7/09 ,  H02K41/025 ,  H02K2201/18 ,  H02N15/02 ,  Y10S414/135

Abstract: A displacement apparatus comprising a first part and a second part, which can be displaced relative to each other in first and second different directions. The apparatus being suitable for use in a lithographic apparatus for positioning the mask holder with respect to the projection beam and for positioning the wafer substrate table with respect to the patterned beam. The first part comprises a first and second coil system in which an alternating current is provided by a power supply. The second part comprises a conductive platen which is disposed in a zone in which a magnetic field is induced when power is supplied to the coil systems. The coil system and platen are arranged with respect to each other so that when currents are passed through the coils, a magnetic field induced in the platen causes displacement between the platen and the coils in the first and second different directions.

Abstract translation: 一种位移设备，包括可在第一和第二不同方向上相对于彼此移位的第一部分和第二部分。 该设备适用于光刻设备中，用于相对于投影光束定位掩模保持器并且相对于图案化的光束定位晶片衬底台。 第一部分包括第一和第二线圈系统，其中交流电由电源提供。 第二部分包括导电台板，该导电台板设置在向线圈系统供电时引起磁场的区域。 线圈系统和压板相对于彼此布置，使得当电流通过线圈时，在压板中感应的磁场引起压板和线圈在第一和第二不同方向上的位移。

公开(公告)号：US20070108848A1

公开(公告)日：2007-05-17

申请号：US11273634

申请日：2005-11-15

Applicant: Sven Hol ,  Angelo De Klerk ,  Erik Loopstra ,  Fransicus Jacobs ,  Mark Scholten ,  Arjan Bakker

Inventor： Sven Hol ,  Angelo De Klerk ,  Erik Loopstra ,  Fransicus Jacobs ,  Mark Scholten ,  Arjan Bakker

IPC: H02K41/00 ,  G03B27/42

CPC classification number: H02K41/03 ,  G03F7/70758 ,  H02K2201/18

Abstract: A motor includes a magnet assembly to generate a magnetic field. The field includes along the first direction parts which are alternately orientated in the first and the second direction. The parts extend in a third direction which is perpendicular to the first and the second direction. The motor further includes a first coil winding to carry a first current. The first coil winding to extend in the first direction between parts of the magnetic field orientated in the second direction, to generate the force in the first direction. The motor also includes a second coil winding to carry a second current. The second coil winding to extend in the first direction between parts of the magnetic field substantially orientated in the first direction, to generate the force in the second direction.

Abstract translation: 电动机包括用于产生磁场的磁体组件。 该场包括沿着第一方向的部分，其沿第一方向和第二方向交替取向。 这些部件在垂直于第一和第二方向的第三方向上延伸。 电动机还包括用于承载第一电流的第一线圈绕组。 所述第一线圈绕组在所述磁场的部分之间沿所述第一方向在所述第二方向上定向，以在所述第一方向上产生力。 电动机还包括用于承载第二电流的第二线圈绕组。 所述第二线圈绕组在所述磁场的各部分之间沿所述第一方向沿所述第一方向大致取向，以在所述第二方向上产生所述力。

公开(公告)号：US20070263201A1

公开(公告)日：2007-11-15

申请号：US11433767

申请日：2006-05-15

Applicant: Erik Loopstra ,  Joost Ottens

Inventor： Erik Loopstra ,  Joost Ottens

IPC: G03B27/58

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/707

Abstract: An article support constructed to support an article for lithographic processing purposes is disclosed. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also disclosed.

Abstract translation: 公开了一种用于支撑用于光刻处理目的的物品的物品支撑。 物品支撑件包括布置成引导物品支撑件中的热稳定剂介质以向物品提供热稳定性的通道配置，其中通道配置包括输入通道结构和输出通道结构，输入和输出通道结构布置成嵌套 配置并且通过设置在物品支撑件的表面处或附近的细格栅结构彼此连接。 还公开了并入物品支撑件的光刻设备和设备制造。

公开(公告)号：US20070247605A1

公开(公告)日：2007-10-25

申请号：US11410282

申请日：2006-04-25

Applicant: Erik Loopstra ,  Paul Graupner ,  Johannes Mulkens

Inventor： Erik Loopstra ,  Paul Graupner ,  Johannes Mulkens

IPC: G03B27/52

CPC classification number: G03B27/52 ,  G02B27/0068 ,  G03F7/70266

Abstract: An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.

Abstract translation: 用于校正光学装置中的像差的光学元件具有壳体。 壳体充满液体并具有支撑层和设计成使预定波长范围的光通过的覆盖层。 外壳容纳几个执行器。 每个致动器具有支撑覆盖层的第一端和支撑支撑层的第二端。 每个致动器能够局部地改变支撑层和覆盖层之间的局部距离，以通过提供局部相移来校正指向光学元件的光束中的局部像差。 光学元件可以用在光刻设备中。

公开(公告)号：US20070216881A1

公开(公告)日：2007-09-20

申请号：US11377636

申请日：2006-03-17

Applicant: Harmen Van Der Schoot ,  Erik Loopstra ,  Fransicus Jacobs ,  Godfried Franciscus Geelen

Inventor： Harmen Van Der Schoot ,  Erik Loopstra ,  Fransicus Jacobs ,  Godfried Franciscus Geelen

IPC: G03B27/42

CPC classification number: G03B27/42 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70733

Abstract: A moveable member is provided which extends the top surface of a substrate table, in plan, beyond a bumper which protects the substrate table during collision. The moveable member may be retracted to a retracted position in which it no longer extends beyond the bumper. In this way it is possible to move two substrate tables together and to allow the retractable member to pass under a liquid supply system which normally provides liquid between the projection system and a substrate without turning off of the liquid supply system.

Abstract translation: 提供了可移动构件，其以平面方式延伸衬底台的顶表面超过在碰撞期间保护衬底台的保险杠。 可移动构件可以缩回到缩回位置，在缩回位置，其不再延伸超过保险杠。 以这种方式，可以将两个基板台移动到一起，并允许可伸缩构件在液体供应系统之下通过，该液体供应系统通常在投影系统和基板之间提供液体而不关闭液体供应系统。

公开(公告)号：US20070159616A1

公开(公告)日：2007-07-12

申请号：US10894367

申请日：2004-07-20

Applicant: Bastiaan Lambertus Van De Ven ,  Gert-Jan Heerens ,  Robert Lansbergen ,  Martinus Leenders ,  Erik Loopstra

Inventor： Bastiaan Lambertus Van De Ven ,  Gert-Jan Heerens ,  Robert Lansbergen ,  Martinus Leenders ,  Erik Loopstra

IPC: G03B27/62

CPC classification number: G03F7/707 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/70783 ,  G03F7/70825 ,  G03F7/709

Abstract: The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.

Abstract translation: 本发明涉及一种光刻设备，其包括用于相对于标线片台定位图案形成装置（例如掩模版）的对接系统。 光刻投影设备具有包括投影相的操作周期，其中标线片载物台承载图案形成装置和交换相，其中图案形成装置被更换，并且对接系统相对于掩模版台定位图案形成装置。 对接系统被配置为在投影阶段与图案形成装置间隔开，以便确保获得更高的投影图像精度。

公开(公告)号：US20070139629A1

公开(公告)日：2007-06-21

申请号：US11312660

申请日：2005-12-21

Applicant: Timotheus Sengers ,  Nicolaas Johannes Van Asten ,  Wilhelmus Box ,  Tjarko Van Empel ,  Leon Levasier ,  Erik Loopstra ,  Marcel Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

Inventor： Timotheus Sengers ,  Nicolaas Johannes Van Asten ,  Wilhelmus Box ,  Tjarko Van Empel ,  Leon Levasier ,  Erik Loopstra ,  Marcel Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

IPC: G03B27/42

CPC classification number: G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

Abstract translation: 公开了一种光刻设备。 该装置包括构造成保持基板的基板台。 衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。 测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。 投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径 测量系统的测量光束和/或场来调节路径的一部分。

公开(公告)号：US20060280829A1

公开(公告)日：2006-12-14

申请号：US11150465

申请日：2005-06-13

Applicant: Yvonne Kruijt-Stegeman ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Johan Dijksman ,  Helmar Santen ,  Sander Wuister

Inventor： Yvonne Kruijt-Stegeman ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Johan Dijksman ,  Helmar Santen ,  Sander Wuister

IPC: B28B11/08

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.

Abstract translation: 公开了一种光刻设备，其具有构造成保持压印模板的压印模板或模板保持器，以及布置成接收衬底的衬底台，该设备还包括与衬底台和压印模板或模板保持器一起的壁 被构造成形成从周围区域基本密封的封闭空间。

公开(公告)号：US20060266244A1

公开(公告)日：2006-11-30

申请号：US11139991

申请日：2005-05-31

Applicant: Yvonne Kruijt-Stegeman ,  Aleksey Kolensnychenko ,  Helmar Santen ,  Erik Loopstra

Inventor： Yvonne Kruijt-Stegeman ,  Aleksey Kolensnychenko ,  Helmar Santen ,  Erik Loopstra

IPC: B41F1/34

CPC classification number: B41F1/34 ,  B41F1/18 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/00 ,  G03F9/7042 ,  G03F9/7084 ,  H05K1/0269 ,  H05K3/0008 ,  H05K2201/09918 ,  H05K2203/0108

Abstract: An imprint lithography apparatus is disclosed that has a substrate table configured to hold a substrate, a template holder configured to hold an imprint template, the imprint template or the template holder having a template alignment mark configured to be imprinted onto the substrate table or onto a substrate to form an imprinted alignment mark, the imprint template having a functional pattern, and the template alignment mark and the functional pattern having a known spatial relationship, and an alignment sensor configured to determine the location of the imprinted alignment mark.

Abstract translation: 公开了一种压印光刻设备，其具有被配置为保持基板的基板台，配置成保持压印模板的模板保持器，压印模板或模板保持器，其具有被配置为印刷到基板台上的模板对准标记 基板以形成压印的对准标记，所述印模模板具有功能图案，并且所述模板对准标记和所述功能图案具有已知的空间关系，以及对准传感器，其被配置为确定所述打印的对准标记的位置。