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    TCOs for High-Efficiency Crystalline Si Heterojunction Solar Cells
    51.
    发明申请
    TCOs for High-Efficiency Crystalline Si Heterojunction Solar Cells 审中-公开
    高效率晶体Si异质结太阳能电池的TCOs

    公开(公告)号：US20140170806A1

    公开(公告)日：2014-06-19

    申请号：US13719105

    申请日：2012-12-18

    Applicant: INTERMOLECULAR, INC.

    Inventor： Jeroen Van Duren ,  Minh Huu Le

    IPC: H01L31/0224

    CPC classification number: H01L31/022466 ,  H01L31/022483 ,  H01L31/03762 ,  H01L31/075 ,  H01L31/1884 ,  Y02E10/548

    Abstract: Methods are used to develop and evaluate new processes for cleaning and texturing substrates and layers used in HJCS solar cells. In some embodiments, methods are used to develop and evaluate new processes for the deposition of resistive metal oxide interface layers that are formed between the TCO layers and the a-Si:H layers. The resistive metal oxide interface layers form good ohmic contact to the a-Si:H layers. In some embodiments, methods are used to develop and evaluate new processes for the deposition of amorphous TCO layers. The amorphous TCO layers allow improved control over the layer thickness and morphology. In some embodiments, methods are used to develop and evaluate new processes for the deposition of anti-reflection coating materials. The anti-reflection coating materials are selected to decrease the reflectivity of the solar cell and maintain the high conductivity of the TCO materials.

    Abstract translation: 方法用于开发和评估用于HJCS太阳能电池中使用的衬底和层的清洁和纹理化的新工艺。 在一些实施例中，使用方法来开发和评估在TCO层和a-Si：H层之间形成的电阻金属氧化物界面层的沉积的新工艺。 电阻金属氧化物界面层与a-Si：H层形成良好的欧姆接触。 在一些实施例中，使用方法来开发和评估沉积无定形TCO层的新工艺。 无定形TCO层允许改善对层厚度和形态的控制。 在一些实施例中，使用方法来开发和评估用于沉积抗反射涂层材料的新工艺。 选择防反射涂层材料以降低太阳能电池的反射率并保持TCO材料的高导电性。

    Low emissivity coating with optimal base layer material and layer stack
    52.
    发明申请
    Low emissivity coating with optimal base layer material and layer stack 审中-公开
    低发射率涂层，具有最佳的基层材料和层叠

    公开(公告)号：US20140170422A1

    公开(公告)日：2014-06-19

    申请号：US13715588

    申请日：2012-12-14

    Applicant: INTERMOLECULAR INC.

    Inventor： Yu Wang ,  Brent Boyce ,  Guowen Ding ,  Mohd Fadzli Anwar Hassan ,  Minh Huu Le ,  Haifan Liang ,  Zhi-Wen Wen Sun

    IPC: G02B1/10

    CPC classification number: G02B1/10 ,  C03C17/3644 ,  C03C17/366 ,  C03C2217/94 ,  G02B1/116 ,  G02B5/282

    Abstract: A method for making low emissivity panels, including forming a base layer to promote a seed layer for a conductive silver layer. The base layer can be an amorphous layer or a nanocrystalline layer, which can facilitate zinc oxide seed layer growth, together with smoother surface and improved thermal stability. The base layer can include doped tin oxide, for example, tin oxide doped with Al, Ga, In, Mg, Ca, Sr, Sb, Bi, Ti, V, Y, Zr, Nb, Hf, Ta, or any combination thereof. The doped tin oxide base layer can influence the growth of (002) crystallographic orientation in zinc oxide, which in turn serves as a seed layer template for silver (111).

    Abstract translation: 一种制造低发射率面板的方法，包括形成基底层以促进导电银层的种子层。 基层可以是非晶层或纳米晶层，其可以促进氧化锌种子层生长，以及更平滑的表面和改善的热稳定性。 基底层可以包括掺杂的氧化锡，例如掺杂有Al，Ga，In，Mg，Ca，Sr，Sb，Bi，Ti，V，Y，Zr，Nb，Hf，Ta或其任何组合的氧化锡 。 掺杂的氧化锡基层可以影响氧化锌中（002）晶体取向的生长，其又用作银（111）的种子层模板。

    pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating
    54.
    发明申请
    pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating 审中-公开
    pvd室和过涂层的过程，以提高低辐射率涂层的发射率

    公开(公告)号：US20140170338A1

    公开(公告)日：2014-06-19

    申请号：US13714797

    申请日：2012-12-14

    Applicant: INTERMOLECULAR INC.

    Inventor： Guowen Ding ,  Brent Boyce ,  Mohd Fadzli Anwar Hassan ,  Minh Huu Le ,  Zhi-Wen Wen Sun ,  Yu Wang

    IPC: C23C14/34

    CPC classification number: C23C14/3492 ,  C23C14/024 ,  C23C14/185

    Abstract: A method for making low emissivity panels, including control the ion characteristics, such as ion energy, ion density and ion to neutral ratio, in a sputter deposition process of a layer deposited on a thin conductive silver layer. The ion control can prevent or minimize degrading the quality of the conductive silver layer, which can lead to better transmittance in visible regime, block more heat transfer from the low emissivity panels, and potentially can reduce the requirements for other layers, so that the overall performance, such as durability, could be improved.

    Abstract translation: 在沉积在薄导电银层上的层的溅射沉积工艺中，制备低辐射率面板的方法，包括控制离子特性，例如离子能量，离子密度和离子与中性比。 离子控制可以防止或最小化降低导电银层的质量，这可以导致在可见状态下更好的透射率，阻止来自低辐射面板的更多的热传递，并且潜在地可以减少对其它层的要求，使得整体 可以提高性能，如耐久性。

    Silver barrier materials for low-emissivity applications
    57.
    发明授权
    Silver barrier materials for low-emissivity applications 有权
    用于低发射率应用的银屏障材料

    公开(公告)号：US09448345B2

    公开(公告)日：2016-09-20

    申请号：US13725126

    申请日：2012-12-21

    Applicant: Intermolecular Inc. ,  Guardian Industries Corp.

    Inventor： Mohd Fadzli Anwar Hassan ,  Brent Boyce ,  Guowen Ding ,  Minh Huu Le ,  Zhi-Wen Wen Sun ,  Yu Wang ,  Yongli Xu

    IPC: G02B5/28 ,  F21V9/00 ,  G02B5/20 ,  C03C17/36

    CPC classification number: G02B5/208 ,  C03C17/36 ,  C03C17/3644 ,  C03C17/3649 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/40 ,  G02B5/282

    Abstract: A method for making low emissivity panels, including control the composition of a barrier layer formed on a thin conductive silver layer. The barrier structure can include an alloy of a first element having high oxygen affinity with a second element having low oxygen affinity. The first element can include Ta, Nb, Zr, Hf, Mn, Y, Si, and Ti, and the second element can include Ru, Ni, Co, Mo, and W, which can have low oxygen affinity property. The alloy barrier layer can reduce optical absorption in the visible range, can provide color-neutral product, and can improve adhesion to the silver layer.

    Abstract translation: 一种制造低发射率面板的方法，包括控制形成在薄导电银层上的阻挡层的组成。 阻挡结构可以包括具有高氧亲和力的第一元素与具有低氧亲合力的第二元素的合金。 第一元素可以包括Ta，Nb，Zr，Hf，Mn，Y，Si和Ti，第二元素可以包括可以具有低氧亲和性的Ru，Ni，Co，Mo和W。 合金阻挡层可以减少可见光范围内的光吸收，可以提供颜色中性的产品，并可以提高对银层的粘附性。

    Antireflective coatings with gradation and methods for forming the same
    60.
    发明授权
    Antireflective coatings with gradation and methods for forming the same 有权
    具有渐变的抗反射涂层及其形成方法

    公开(公告)号：US09341751B2

    公开(公告)日：2016-05-17

    申请号：US13713899

    申请日：2012-12-13

    Applicant: Intermolecular Inc.

    Inventor： Nikhil Kalyankar ,  Richard Blacker ,  Minh Huu Le ,  Mark Lewis ,  Liang Liang

    IPC: B05D5/06 ,  G02B1/115

    CPC classification number: G02B1/115

    Abstract: Embodiments provided herein describe antireflective coatings and methods for forming antireflective coatings. A substrate is provided. A first antireflective layer is formed over the substrate. The first antireflective layer has a first refractive index. A second antireflective layer is formed on the first antireflective layer. The second antireflective layer has a second refractive index. The first antireflective layer and the second antireflective layer jointly form an antireflective coating. The antireflective coating is graded such that the antireflective coating comprises at least three sub-layers, each of the at least three sub-layers having a unique refractive index.

    Abstract translation: 本文提供的实施方案描述了用于形成抗反射涂层的抗反射涂层和方法。 提供基板。 在衬底上形成第一抗反射层。 第一抗反射层具有第一折射率。 在第一抗反射层上形成第二抗反射层。 第二抗反射层具有第二折射率。 第一抗反射层和第二抗反射层共同形成抗反射涂层。 抗反射涂层被分级，使得抗反射涂层包含至少三个子层，所述至少三个子层中的每一个具有独特的折射率。

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