Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
    51.
    发明授权
    Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same 有权
    表现出增强的湿条带率的底部抗反射涂层,用于形成底部抗反射涂层的底部抗反射涂料组合物及其制造方法

    公开(公告)号:US07955782B2

    公开(公告)日:2011-06-07

    申请号:US12234849

    申请日:2008-09-22

    IPC分类号: G03F7/11

    摘要: Bottom antireflective coating (BARC) that exhibit enhanced wet strip rates, BARC compositions for fabricating such BARCs, and methods for manufacturing such BARC compositions are provided. According to one exemplary embodiment, a bottom antireflective coating (BARC) composition comprises an inorganic-based compound, an absorbing material, and a wet strip-rate modifier combination. The wet strip-rate modifier composition comprises a combination of a short chain linear alcohol and dipropylene glycol (DPG), a combination of the short chain linear alcohol and tetraethylene glycol (TEG), a combination of DPG and TEG, or a combination of the short chain linear alcohol, DPG, and TEG.

    摘要翻译: 提供了表现出增强的湿条带速率的底部抗反射涂层(BARC),用于制造这种BARC的BARC组合物以及用于制造这种BARC组合物的方法。 根据一个示例性实施方案,底部抗反射涂层(BARC)组合物包含无机基化合物,吸收材料和湿剥离率调节剂组合。 湿剥离率调节剂组合物包括短链线性醇和二丙二醇(DPG)的组合,短链线性醇和四甘醇(TEG)的组合,DPG和TEG的组合,或组合的 短链线性醇,DPG和TEG。

    PROCESSABLE INORGANIC AND ORGANIC POLYMER FORMULATIONS, METHODS OF PRODUCTION AND USES THEREOF
    52.
    发明申请
    PROCESSABLE INORGANIC AND ORGANIC POLYMER FORMULATIONS, METHODS OF PRODUCTION AND USES THEREOF 有权
    可加工的无机和有机聚合物配方,生产方法及其用途

    公开(公告)号:US20110054119A1

    公开(公告)日:2011-03-03

    申请号:US12866568

    申请日:2009-02-20

    摘要: Polymer formulations are disclosed and described herein that comprise: at least one polymer comprising at least one hydroxy functional group, at least one acid source, and at least one acid-activated crosslinker that reacts with the polymer. In contemplated embodiments, these polymer formulations are curable at relatively low temperatures, as compared to those polymer formulations not comprising contemplated crosslinkers. Transparent films formed from these contemplated formulations are also disclosed. Organic transparent film compositions are also disclosed that comprise: at least one at least one phenol-based polymer, at least one solvent; at least one acid-activated crosslinker; and at least one acid source. Methods of forming organic transparent films with improved transmittance by depositing on a substrate the formulations disclosed herein and curing the formulations or compositions at a temperature of less than about 200° C. Inorganic transparent film compositions are disclosed that include: at least one silanol-based polymer, at least one solvent; at least one acid-activated crosslinker; and at least one acid source. Methods of forming inorganic transparent films are disclosed by depositing on a substrate the formulations disclosed herein and curing the formulations or compositions at a temperature of 200° C. or less.

    摘要翻译: 本文公开和描述的聚合物制剂包含:至少一种包含至少一种羟基官能团的聚合物,至少一种酸源和至少一种与聚合物反应的酸活化的交联剂。 在预期的实施方案中,与不包含预期的交联剂的那些聚合物配方相比,这些聚合物制剂在相对低的温度下是可固化的。 还公开了由这些预期制剂形成的透明膜。 还公开了有机透明膜组合物,其包含:至少一种至少一种苯酚基聚合物,至少一种溶剂; 至少一种酸活化交联剂; 和至少一种酸源。 通过在基底上沉积本文公开的制剂并形成在约200℃的温度下固化该制剂或组合物来形成有机透明薄膜的方法。公开了无机透明薄膜组合物,其包括:至少一种基于硅烷醇的 聚合物,至少一种溶剂; 至少一种酸活化的交联剂; 和至少一种酸源。 通过在基底上沉积本文公开的制剂并在200℃或更低的温度下固化该制剂或组合物来公开形成无机透明膜的方法。

    Coating composition optimization for via fill and photolithography applications and methods of preparation thereof
    53.
    发明授权
    Coating composition optimization for via fill and photolithography applications and methods of preparation thereof 有权
    通孔填充和光刻应用的涂料组合物优化及其制备方法

    公开(公告)号:US07867331B2

    公开(公告)日:2011-01-11

    申请号:US10567420

    申请日:2004-08-04

    IPC分类号: C04B41/50

    摘要: A sacrificial coating material includes: at least one inorganic compound, and at least one material modification agent, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry. A method of producing a sacrificial coating material includes: providing at least one inorganic compound, providing at least one material modification agent, combining the at least one inorganic compound with the at least one material modification agent to form the sacrificial coating material, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry, but not organic casting solvents commonly used in organic BARC materials.

    摘要翻译: 牺牲涂层材料包括:至少一种无机化合物和至少一种材料改性剂,其中牺牲涂层材料可溶于碱性化学或氟基化学。 制造牺牲涂料的方法包括:提供至少一种无机化合物,提供至少一种材料改性剂,将至少一种无机化合物与至少一种材料改性剂组合以形成牺牲涂料,其中牺牲 涂料可溶于碱性化学物质或氟基化学物质,但不溶于有机BARC材料中通常使用的有机浇铸溶剂。

    BOTTOM ANTIREFLECTIVE COATINGS EXHIBITING ENHANCED WET STRIP RATES, BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR FORMING BOTTOM ANTIREFLECTIVE COATINGS, AND METHODS FOR FABRICATING THE SAME
    54.
    发明申请
    BOTTOM ANTIREFLECTIVE COATINGS EXHIBITING ENHANCED WET STRIP RATES, BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR FORMING BOTTOM ANTIREFLECTIVE COATINGS, AND METHODS FOR FABRICATING THE SAME 有权
    底部抗反射涂层展示增强的湿度条纹率,底部抗反射涂层组合物,用于形成底部抗反射涂层及其制造方法

    公开(公告)号:US20100075248A1

    公开(公告)日:2010-03-25

    申请号:US12234849

    申请日:2008-09-22

    IPC分类号: G03F7/00

    摘要: Bottom antireflective coating (BARC) that exhibit enhanced wet strip rates, BARC compositions for fabricating such BARCs, and methods for manufacturing such BARC compositions are provided. According to one exemplary embodiment, a bottom antireflective coating (BARC) composition comprises an inorganic-based compound, an absorbing material, and a wet strip-rate modifier combination. The wet strip-rate modifier composition comprises a combination of a short chain linear alcohol and dipropylene glycol (DPG), a combination of the short chain linear alcohol and tetraethylene glycol (TEG), a combination of DPG and TEG, or a combination of the short chain linear alcohol, DPG, and TEG.

    摘要翻译: 提供了表现出增强的湿条带速率的底部抗反射涂层(BARC),用于制造这种BARC的BARC组合物以及用于制造这种BARC组合物的方法。 根据一个示例性实施方案,底部抗反射涂层(BARC)组合物包含无机基化合物,吸收材料和湿剥离率调节剂组合。 湿剥离率调节剂组合物包括短链线性醇和二丙二醇(DPG)的组合,短链线性醇和四甘醇(TEG)的组合,DPG和TEG的组合,或组合的 短链线性醇,DPG和TEG。

    System and method of operation for network overlay geolocation system with repeaters using am golay hadamard signatures
    55.
    发明申请
    System and method of operation for network overlay geolocation system with repeaters using am golay hadamard signatures 失效
    具有中继器的网络覆盖地理位置系统的系统和操作方法,使用golay hadamard签名

    公开(公告)号:US20070087689A1

    公开(公告)日:2007-04-19

    申请号:US10566589

    申请日:2004-09-24

    IPC分类号: H04B7/15 H04B7/14

    摘要: A novel system and method for a network overlay geolocation system operating in a host wireless communication system with repeaters is disclosed. Embodiments of the novel system and method enable a wireless communication system to determine if signals being received by system receivers arrive directly from a target mobile appliance or if the signals are passing through or via a repeater. In an embodiment, the system's repeaters use a co-channel AM Golay Hadamard sequence multiplied by an uplink signal to watermark the repeated signal. The system uses the known AM Golay Hadamard sequences of the repeaters and the waveform of the received uplink signal to detect whether a repeater has operated on the signal and which repeater operated on the uplink signal. Embodiments of the novel system and method provide system management data and can be used to provide more accurate geolocation of mobiles served by repeater stations.

    摘要翻译: 公开了一种在具有中继器的主机无线通信系统中操作的网络覆盖地理位置系统的新型系统和方法。 新颖的系统和方法的实施例使得无线通信系统能够确定系统接收器正在接收的信号是否直接从目标移动设备到达,或者信号是否经过中继器。 在一个实施例中,系统的中继器使用与上行链路信号相乘的同频道AM Golay Hadamard序列来水印重复的信号。 该系统使用中继器的已知AM Golay Hadamard序列和接收的上行链路信号的波形来检测中继器是否对信号进行操作,哪个中继器在上行链路信号上操作。 新颖的系统和方法的实施例提供系统管理数据,并且可以用于提供由中继站服务的移动台的更准确的地理位置。

    Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
    58.
    发明申请
    Antireflective coatings for via fill and photolithography applications and methods of preparation thereof 有权
    用于通孔填充和光刻应用的抗反射涂层及其制备方法

    公开(公告)号:US20050171277A1

    公开(公告)日:2005-08-04

    申请号:US10717028

    申请日:2003-11-18

    摘要: An absorbing composition is described herein that includes at least one inorganic-based compound, at least one absorbing compound, and at least one material modification agent. In addition, methods of making an absorbing composition are also described that includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, an acid/water mixture, and one or more solvents to form a reaction mixture; and b) allowing the reaction mixture to form the absorbing composition at room temperature. Another method of making an absorbing composition includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, an acid/water mixture, and one or more solvents to form a reaction mixture; and b) heating the reaction mixture to form the absorbing composition. Yet another method of making an absorbing composition is described that includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, and one or more solvents to form a reaction mixture, wherein the at least one material modification agent comprises at least one acid and water; and b) heating the reaction mixture to form an absorbing material, a coating or a film. In other methods of making an absorbing composition described herein, those methods include: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, and one or more solvents to form a reaction mixture, wherein the at least one material modification agent comprises at least one acid and water; and b) allowing the reaction mixture to form an absorbing material, a coating or a film.

    摘要翻译: 本文描述的吸收组合物包括至少一种无机基化合物,至少一种吸收化合物和至少一种材料改性剂。 此外,还描述了制备吸收组合物的方法,其包括:a)将至少一种无机基化合物,至少一种吸收化合物,至少一种材料改性剂,酸/水混合物和一种或多种溶剂 形成反应混合物; 和b)使反应混合物在室温下形成吸收组合物。 制备吸收组合物的另一种方法包括:a)将至少一种无机基化合物,至少一种吸收化合物,至少一种材料改性剂,酸/水混合物和一种或多种溶剂组合以形成反应混合物; 和b)加热反应混合物以形成吸收组合物。 描述了制备吸收组合物的另一种方法,其包括:a)将至少一种无机基化合物,至少一种吸收化合物,至少一种材料改性剂和一种或多种溶剂组合以形成反应混合物,其中 至少一种材料改性剂包含至少一种酸和水; 和b)加热反应混合物以形成吸收材料,涂层或膜。 在制备本文所述的吸收组合物的其它方法中,这些方法包括:a)将至少一种无机基化合物,至少一种吸收化合物,至少一种材料改性剂和一种或多种溶剂组合以形成反应混合物, 其中所述至少一种材料改性剂包含至少一种酸和水; 和b)使反应混合物形成吸收材料,涂层或膜。

    Memory system segmented power supply and control
    59.
    发明申请
    Memory system segmented power supply and control 失效
    内存系统分段供电和控制

    公开(公告)号:US20050146919A1

    公开(公告)日:2005-07-07

    申请号:US10748460

    申请日:2003-12-29

    摘要: A memory device having memory cells supplied with a separate higher voltage power than the separate power supplied to memory logic, and a lower power state that entails removing power from at least some of the logic such that refresh operations to preserve the contents of the memory cells continue to take place, but at least some of the interface to the memory device is powered down to reduce power consumption.

    摘要翻译: 具有被提供有比提供给存储器逻辑的单独功率分开的更高电压功率的存储单元的存储器件,以及需要从逻辑中的至少一些去除功率的较低功率状态,使得刷新操作以保持存储器单元的内容 继续发生,但至少有一些到存储器件的接口掉电以降低功耗。

    E-OTD augmentation to U-TDOA location system
    60.
    发明申请
    E-OTD augmentation to U-TDOA location system 失效
    U-TDOA定位系统的E-OTD扩充

    公开(公告)号:US20050136945A1

    公开(公告)日:2005-06-23

    申请号:US11015788

    申请日:2004-12-20

    IPC分类号: H04W64/00 H04Q7/20

    CPC分类号: H04W64/00

    摘要: A method for use in a wireless communication system with a network overlay geolocation system having a sparse deployment network in which base stations of the wireless communication system may or may not have a co-located wireless location sensor (WLS). The method uses U-TDOA measurements on the uplink (reverse) signal and E-OTD measurements on the downlink (forward) signals to estimate a location for a mobile appliance.

    摘要翻译: 一种用于具有网络覆盖地理位置系统的无线通信系统的方法,所述网络覆盖地理位置系统具有稀疏部署网络,其中所述无线通信系统的基站可以具有或可以不具有同位置的无线位置传感器(WLS)。 该方法在下行链路(前向)信号上的上行链路(反向)信号和E-OTD测量中使用U-TDOA测量来估计移动设备的位置。