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121 条记录 (耗时 0.04 秒)

    Filter window manufacturing method
    51.
    发明授权
    Filter window manufacturing method 有权
    过滤窗制造方法

    公开(公告)号：US07776390B2

    公开(公告)日：2010-08-17

    申请号：US11878989

    申请日：2007-07-30

    申请人： Ralph Kurt ,  Levinus Pieter Bakker

    发明人： Ralph Kurt ,  Levinus Pieter Bakker

    IPC分类号： B05D5/06

    CPC分类号： G03F1/62 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G21K1/10

    摘要： A filter window manufacturing method includes fabricating a structure of wires on a substrate, depositing a lacquer over the wires and the substrate, depositing a first layer that includes a material selected from the group consisting of AlN, Ru, Ir, Au, SiN, Rh, C and combinations thereof, removing the lacquer, removing the substrate, and baking the first layer.

    摘要翻译： 一种滤光器窗口制造方法，包括在基板上制造导线的结构，在导线和基板上沉积漆，沉积第一层，该第一层包括选自由AlN，Ru，Ir，Au，SiN，Rh ，C及其组合，除去漆，除去基材，并烘烤第一层。

    Illumination system and filter system
    52.
    发明申请
    Illumination system and filter system 失效
    照明系统和过滤系统

    公开(公告)号：US20090115980A1

    公开(公告)日：2009-05-07

    申请号：US12318291

    申请日：2008-12-24

    申请人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

    发明人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

    IPC分类号： G03B27/52 ,  G01J3/10 ,  G03B27/72

    CPC分类号： G03F7/70916

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。

    Method of, System For, and Medical Image Acquisition System For Imaging an Interior of a Turbid Medium Taking Into Account the Geometry of the Turbid Medium
    53.
    发明申请
    Method of, System For, and Medical Image Acquisition System For Imaging an Interior of a Turbid Medium Taking Into Account the Geometry of the Turbid Medium 审中-公开

    公开(公告)号：US20080309940A1

    公开(公告)日：2008-12-18

    申请号：US12094698

    申请日：2006-11-20

    申请人： Martinus Bernardus Van Der Mark ,  Michael Cornelis Van Beek ,  Levinus Pieter Bakker

    发明人： Martinus Bernardus Van Der Mark ,  Michael Cornelis Van Beek ,  Levinus Pieter Bakker

    IPC分类号： G01N21/00

    CPC分类号： G01N21/4795 ,  G01N2021/1787 ,  G01N2021/4766 ,  G01N2021/6439

    摘要： The invention relates to a method of imaging an interior of a turbid medium (45) comprising the following steps: accommodation of the turbid medium (45) inside a receiving volume (20); coupling transmission input light (65) from a transmission light source into the receiving volume (12), with said transmission input light (65) being chosen such that it is capable of propagating through the turbid medium (45) and with at least a part of said transmission input light (65) passing through a matching medium (50) in the receiving volume (12), said matching medium (50) being chosen to reduce optical boundary effects at an interface between the turbid medium (45) and its surroundings; detection of transmission output light emanating from the receiving volume as a result of coupling transmission input light (65) from the transmission light source into the receiving volume (12) through use of a transmission photodetector unit. The invention also relates to a system for imaging an interior of a turbid medium (45) and a medical image acquisition system both using the method. According to the invention, the method, system for imaging an interior of a turbid medium (45), and medical image acquisition system are adapted such that data relating to the exterior of the turbid medium (45) can be obtained. This object is realized in that the method further comprises the following additional steps: coupling geometry input light (70, 75, 80) from a geometry light source into the receiving volume (12), with the receiving volume comprising the turbid medium (45), with the receiving volume (12) further comprising a geometry medium (60) for surrounding the turbid medium (45) during coupling of geometry input light (70, 75, 80) into the receiving volume (12), and with the combination of the geometry input light (70, 75, 80), the geometry medium (60), and the interface being chosen for creating a contrast between the turbid medium and its surroundings; —detection of the contrast between the turbid medium (45) and its surroundings; reconstructing an image of an interior of the turbid medium (45) using the detected contrast.

    Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system
    54.
    发明授权
    Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system 失效
    用于提供可操作的滤波器系统的方法，用于从辐射束，滤波器系统，装置和包括滤波器系统的光刻设备中过滤颗粒

    公开(公告)号：US07414251B2

    公开(公告)日：2008-08-19

    申请号：US11317240

    申请日：2005-12-27

    申请人： Levinus Pieter Bakker

    发明人： Levinus Pieter Bakker

    IPC分类号： H05G2/00

    CPC分类号： H05G2/001 ,  G03F7/70916

    摘要： A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography is disclosed. The method includes providing a slack foil or wire for intercepting the particles, mounting at least a first point or side of the foil or wire to a first position of a mounting assembly, and substantially stretching the slack foil or wire at least within the beam of radiation, substantially parallel to a direction in which the radiation propagates.

    摘要翻译： 公开了一种提供用于在光刻中从辐射束中过滤颗粒的可操作的过滤系统的方法。 该方法包括提供用于拦截颗粒的松弛箔或线，将箔或线的至少第一点或一侧安装到安装组件的第一位置，并且至少在松弛的箔或线的束 辐射，基本上平行于辐射传播的方向。

    Mirror, lithographic apparatus, device manufacturing method, and device manufactured thereby
    56.
    发明授权
    Mirror, lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
    镜面，光刻设备，器件制造方法以及由此制造的器件

    公开(公告)号：US07382436B2

    公开(公告)日：2008-06-03

    申请号：US10887306

    申请日：2004-07-09

    申请人： Levinus Pieter Bakker

    发明人： Levinus Pieter Bakker

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B17/00

    CPC分类号： G03F7/70958 ,  G02B5/09 ,  G02B5/1861 ,  G21K1/06

    摘要： A mirror has a mirror surface, wherein the mirror surface includes a protrusion including a material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, or a first protrusion including a first material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, and a second protrusion including a second material selected from at least one of Be, B, C, Si, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, and the first and second materials are not the same. A lithographic projection apparatus includes such a mirror. A device manufacturing method includes reflecting a beam of radiation by use of such a mirror. A device is manufactured according to the method.

    摘要翻译： 反射镜具有镜面，其中镜面包括包括选自Be，B，C，P，S，K，Ca，Sc，Br，Rb，Sr，Y，Zr，Nb中的至少一种的材料的突起 Mo，Ba，La，Ce，Pr，Pa和U，或包含选自Be，B，C，P，S，K，Ca，Sc，Br，Rb，Sr中的至少一种的第一材料的第一突起 ，Y，Zr，Nb，Mo，Ba，La，Ce，Pr，Pa和U，以及第二突起，其包括选自Be，B，C，Si，P，S，K，Ca中的至少一种的第二材料 ，Sc，Br，Rb，Sr，Y，Zr，Nb，Mo，Ba，La，Ce，Pr，Pa和U，第一和第二材料不相同。 光刻投影装置包括这样的反射镜。 一种器件制造方法包括通过使用这种反射镜来反射辐射束。 根据该方法制造装置。

    Lithographic apparatus, device manufacturing method and radiation system
    57.
    发明授权
    Lithographic apparatus, device manufacturing method and radiation system 有权
    光刻设备，设备制造方法和辐射系统

    公开(公告)号：US07309869B2

    公开(公告)日：2007-12-18

    申请号：US11127312

    申请日：2005-05-12

    申请人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

    发明人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

    IPC分类号： G03B27/52

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K1/06

    摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

    摘要翻译： 光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持衬底的衬底台和被配置为将所述图案化的辐射束投射到所述衬底的目标部分上的投影系统，其中所述照明系统具有辐射源和至少一个配置成增强所述源的输出的反射镜 。 照明系统可以包括第二辐射源和位于辐射源之间的至少一个反射镜，以将第二源的输出成像到第一源上，从而增强源的输出。 辐射源可以可操作地发射EUV波长范围内的辐射。

    Lithographic projection apparatus and reflector assembly for use therein
    59.
    发明授权
    Lithographic projection apparatus and reflector assembly for use therein 有权
    平版印刷设备和用于其中的反射器组件

    公开(公告)号：US07233009B2

    公开(公告)日：2007-06-19

    申请号：US10647120

    申请日：2003-08-25

    申请人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

    发明人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

    IPC分类号： G03F7/20

    CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70958

    摘要： A lithographic projection apparatus includes a grazing incidence collector. The grazing incidence collector is made up of several reflectors. In order to reduce the amount of heat on the collector, the reflectors are coated. The reflector at the exterior of the collector has an infrared radiating layer on the outside. The inner reflectors are coated with an EUV reflective layer on the outside.

    摘要翻译： 光刻投影装置包括掠入射收集器。 放射入射收集器由多个反射器组成。 为了减少收集器上的热量，反射器被涂覆。 收集器外部的反射器在外部具有红外辐射层。 内部反射器在外部涂有EUV反射层。