MAGNETIC WRITER HAVING MULTIPLE GAPS WITH MORE UNIFORM MAGNETIC FIELDS ACROSS THE GAPS
    51.
    发明申请
    MAGNETIC WRITER HAVING MULTIPLE GAPS WITH MORE UNIFORM MAGNETIC FIELDS ACROSS THE GAPS 有权
    具有更多均匀磁场的多个GAPS的磁性写作

    公开(公告)号:US20110102116A1

    公开(公告)日:2011-05-05

    申请号:US12611294

    申请日:2009-11-03

    Abstract: A magnetic device according to one embodiment includes a source of flux; a magnetic pole coupled to the source of flux, the magnetic pole having two or more gaps; and a low reluctance path positioned towards at least one of the gaps and not positioned towards at least one other of the gaps for affecting a magnetic field formed at the at least one of the gaps when the source of flux is generating flux. Other disclosed embodiments include devices having coil turns with a non-uniform placement in the magnetic yoke for altering a magnetic field formed at the at least one of the gaps during writing. In further embodiments, a geometry of the magnetic pole near or at one of the gaps is different than a geometry of the magnetic pole near or at another of the gaps to help equalize fields formed at the gaps when the source of flux is generating flux.

    Abstract translation: 根据一个实施例的磁性装置包括通量源; 耦合到磁通源的磁极,所述磁极具有两个或更多个间隙; 以及朝向所述间隙中的至少一个定位的低磁阻路径,并且朝向所述间隙中的至少另一个定位,以在所述通量源产生磁通时影响形成在所述至少一个间隙处的磁场。 其他公开的实施例包括具有在磁轭中具有不均匀布置的线圈匝的装置,用于在写入期间改变在至少一个间隙处形成的磁场。 在另外的实施例中,靠近或在其中一个间隙处的磁极的几何形状不同于磁极在靠近或另一个间隙处的几何形状,以帮助当磁通源产生磁通时在间隙处形成的场均衡。

    Through-wafer vias
    53.
    发明授权
    Through-wafer vias 有权
    通晶圆通孔

    公开(公告)号:US07741722B2

    公开(公告)日:2010-06-22

    申请号:US11690181

    申请日:2007-03-23

    Abstract: A through-wafer via structure and method for forming the same. The through-wafer via structure includes a wafer having an opening and a top wafer surface. The top wafer surface defines a first reference direction perpendicular to the top wafer surface. The through-wafer via structure further includes a through-wafer via in the opening. The through-wafer via has a shape of a rectangular plate. A height of the through-wafer via in the first reference direction essentially equals a thickness of the wafer in the first reference direction. A length of the through-wafer via in a second reference direction is at least ten times greater than a width of the through-wafer via in a third reference direction. The first, second, and third reference directions are perpendicular to each other.

    Abstract translation: 一种晶片通孔结构及其形成方法。 贯通晶片通孔结构包括具有开口和顶部晶片表面的晶片。 顶部晶片表面限定垂直于顶部晶片表面的第一参考方向。 贯通晶片通孔结构还包括在开口中的通晶片通孔。 贯通晶片通孔具有矩形板的形状。 贯通晶片通孔在第一参考方向上的高度基本上等于晶片在第一参考方向上的厚度。 贯穿晶片通孔在第二参考方向上的长度比通过晶片通孔在第三参考方向上的宽度大至少十倍。 第一,第二和第三参考方向彼此垂直。

    THROUGH-WAFER VIAS
    54.
    发明申请
    THROUGH-WAFER VIAS 有权
    通过六角形

    公开(公告)号:US20080274583A1

    公开(公告)日:2008-11-06

    申请号:US11690181

    申请日:2007-03-23

    Abstract: A through-wafer via structure and method for forming the same. The through-wafer via structure includes a wafer having an opening and a top wafer surface. The top wafer surface defines a first reference direction perpendicular to the top wafer surface. The through-wafer via structure further includes a through-wafer via in the opening. The through-wafer via has a shape of a rectangular plate. A height of the through-wafer via in the first reference direction essentially equals a thickness of the wafer in the first reference direction. A length of the through-wafer via in a second reference direction is at least ten times greater than a width of the through-wafer via in a third reference direction. The first, second, and third reference directions are perpendicular to each other.

    Abstract translation: 一种晶片通孔结构及其形成方法。 贯通晶片通孔结构包括具有开口和顶部晶片表面的晶片。 顶部晶片表面限定垂直于顶部晶片表面的第一参考方向。 贯通晶片通孔结构还包括在开口中的通晶片通孔。 贯通晶片通孔具有矩形板的形状。 贯通晶片通孔在第一参考方向上的高度基本上等于晶片在第一参考方向上的厚度。 贯穿晶片通孔在第二参考方向上的长度比通过晶片通孔在第三参考方向上的宽度大至少十倍。 第一,第二和第三参考方向彼此垂直。

    Radial self-propagation pattern generation for disk file servowriting
    56.
    发明授权
    Radial self-propagation pattern generation for disk file servowriting 失效
    用于磁盘文件伺服驱动的径向自传模式生成

    公开(公告)号:US5907447A

    公开(公告)日:1999-05-25

    申请号:US893316

    申请日:1997-07-16

    CPC classification number: G11B21/106 G11B21/10 G11B5/59633 G11B5/59644

    Abstract: A mechanism for servowriting on a storage medium of a storage device. The storage device has a transducer and a servo loop for positioning the transducer with respect to the storage medium. At least one transition is written on a track of the storage medium, while servoing on other transitions previously recorded on the storage medium. A reference waveform is derived as a function of a closed loop response of the servo loop and a position error waveform. The position error waveform corresponds to one or more position errors of the transducer relative to the previously recorded transitions. The reference waveform is usable in writing subsequent tracks on the storage medium. Using the reference waveform for writing subsequent tracks provides a substantial rejection of mechanical disturbances by the servo loop.

    Abstract translation: 一种用于在存储设备的存储介质上进行伺服驱动的机制。 存储装置具有用于相对于存储介质定位换能器的换能器和伺服回路。 至少一个转换被写在存储介质的轨道上,同时伺服在先前记录在存储介质上的其它转换。 作为伺服环路的闭环响应和位置误差波形的函数导出参考波形。 位置误差波形对应于传感器相对于先前记录的转换的一个或多个位置误差。 参考波形可用于将后续轨道写入存储介质上。 使用参考波形写入后续轨道可以显着抑制伺服回路的机械扰动。

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