公开(公告)号：US07310563B2

公开(公告)日：2007-12-18

申请号：US11320778

申请日：2005-12-30

申请人： Natsuki Yokoyama ,  Yoshifumi Kawamoto ,  Eiichi Murakami ,  Fumihiko Uchida ,  Kenichi Mizuishi ,  Yoshio Kawamura

发明人： Natsuki Yokoyama ,  Yoshifumi Kawamoto ,  Eiichi Murakami ,  Fumihiko Uchida ,  Kenichi Mizuishi ,  Yoshio Kawamura

IPC分类号： G06F19/00

CPC分类号： C23C14/568 ,  C23C16/54 ,  G05B19/41865 ,  G05B2219/45031 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67276 ,  H01L21/67727 ,  H01L21/67745 ,  Y02P90/14 ,  Y02P90/20 ,  Y02P90/28 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S438/908 ,  Y10T29/41

摘要： A fabricating method for a system including a plurality of processing apparatuses connected to each other by an inter-apparatus transporter. The semiconductor waters are processed in the processing apparatuses and are transported to specified processing apparatuses in different time interval that are set to N times a unit time interval. Since the fabricating system includes processing apparatuses and an inter-apparatus transporter that are periodically controlled at time intervals related to a unit time, intervals related to a unit time, the scheduling of a plurality of works can be made efficiently to enhance the level of optimization, thus improving the productivity.

摘要翻译： 一种用于系统的制造方法，包括通过机构间运送器彼此连接的多个处理装置。 半导体水在处理装置中进行处理，并以不同的时间间隔被传送到规定的处理装置，时间间隔设定为单位时间间隔的N倍。 由于制造系统包括以与单位时间相关的时间间隔周期性地控制的处理装置和装置间运输装置，所以与单位时间相关的间隔，可以有效地进行多个作业的调度以增强优化水平 ，从而提高生产率。

公开(公告)号：US20060111802A1

公开(公告)日：2006-05-25

申请号：US11320610

申请日：2005-12-30

申请人： Natsuki Yokoyama ,  Yoshifumi Kawamoto ,  Eiichi Murakami ,  Fumihiko Uchida ,  Kenichi Mizuishi ,  Yoshio Kawamura

发明人： Natsuki Yokoyama ,  Yoshifumi Kawamoto ,  Eiichi Murakami ,  Fumihiko Uchida ,  Kenichi Mizuishi ,  Yoshio Kawamura

IPC分类号： G06F19/00

CPC分类号： C23C14/568 ,  C23C16/54 ,  G05B19/41865 ,  G05B2219/45031 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67276 ,  H01L21/67727 ,  H01L21/67745 ,  Y02P90/14 ,  Y02P90/20 ,  Y02P90/28 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S438/908 ,  Y10T29/41

摘要： A fabricating method for a system including a plurality of processing apparatuses connected to each other by an inter-apparatus transporter. The semiconductor waters are processed in the processing apparatuses and are transported to specified processing apparatuses in different time interval that are set to N times a unit time interval. Since the fabricating system includes processing apparatuses and an inter-apparatus transporter that are periodically controlled at time intervals related to a unit time, intervals related to a unit time, the scheduling of a plurality of works can be made efficiently to enhance the level of optimization, thus improving the productivity.

公开(公告)号：US07023561B2

公开(公告)日：2006-04-04

申请号：US10620389

申请日：2003-07-17

申请人： Osamu Kakuchi ,  Eiichi Murakami

发明人： Osamu Kakuchi ,  Eiichi Murakami

IPC分类号： G01B9/02

CPC分类号： G03F7/706 ,  G01B9/02098

摘要： A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object, and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.

摘要翻译： 投影曝光装置包括：曝光光源，用于照射形成在第一物体上的图案的照明系统，其具有来自曝光光源的光;投影光学系统，用于将由光照射的图案投影到第二 物体和用于测量投影光学系统的光学特性的干涉仪，其中干涉仪可操作以通过使用来自曝光光源的光来进行测量。

公开(公告)号：US07023091B2

公开(公告)日：2006-04-04

申请号：US10465541

申请日：2003-06-20

申请人： Takako Funakoshi ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni

发明人： Takako Funakoshi ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni

IPC分类号： H01L23/48 ,  H01L23/52

CPC分类号： H01L23/53238 ,  H01L21/823871 ,  H01L23/5286 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a semiconductor integrated circuit device having plural layers of buried wirings, it is intended to prevent the occurrence of a discontinuity caused by stress migration at an interface between a plug connected at a bottom thereof to a buried wiring and the buried wiring. For example, in the case where the width of a first Cu wiring is not smaller than about 0.9 μm and is smaller than about 1.44 μm, and the width of a second Cu wiring and the diameter of a plug are about 0.18 μm, there are arranged two or more plugs which connect the first wirings and the second Cu wirings electrically with each other.

摘要翻译： 在具有多层埋地布线的半导体集成电路器件中，旨在防止在其底部连接到埋地布线的插头与埋地布线之间的界面处的应力迁移引起的不连续性的发生。 例如，在第一Cu布线的宽度不小于约0.9μm且小于约1.44μm的情况下，并且第二Cu布线的宽度和塞子的直径为约0.18μm的情况下，存在 布置两个或更多个将第一布线和第二铜布线彼此电连接的插头。

公开(公告)号：US20060027928A1

公开(公告)日：2006-02-09

申请号：US11239371

申请日：2005-09-30

申请人： Takako Funakoshi ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni

发明人： Takako Funakoshi ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni

IPC分类号： H01L23/52

CPC分类号： H01L23/53238 ,  H01L21/823871 ,  H01L23/5286 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a semiconductor integrated circuit device having plural layers of buried wirings, it is intended to prevent the occurrence of a discontinuity caused by stress migration at an interface between a plug connected at a bottom thereof to a buried wiring and the buried wiring. For example, in the case where the width of a first Cu wiring is not smaller than about 0.9 μm and is smaller than about 1.44 μm, and the width of a second Cu wiring and the diameter of a plug are about 0.18 μm, there are arranged two or more plugs which connect the first wirings and the second Cu wirings electrically with each other.

公开(公告)号：US06924881B2

公开(公告)日：2005-08-02

申请号：US10642699

申请日：2003-08-19

申请人： Eiichi Murakami ,  Osamu Kakuchi

发明人： Eiichi Murakami ,  Osamu Kakuchi

IPC分类号： H01L21/027 ,  G01M11/02 ,  G03B27/42 ,  G03F7/20 ,  G03B27/54 ,  G03B27/68

CPC分类号： G01M11/0264 ,  G01M11/0271 ,  G03B27/42 ,  G03F7/70058 ,  G03F7/706

摘要： A projection exposure apparatus includes an illumination optical system for illuminating a pattern formed on a first object, with light, a projection optical system for projecting the pattern of the first object, illuminated by the illumination optical system, onto a second object for exposure of the same with the pattern, a main system including the illumination optical system and the projection optical system, and an interferometer for use in measurement of an optical characteristic of the projection optical system and being mounted on the main system.

摘要翻译： 投影曝光装置包括用于照亮形成在第一物体上的图案的照明光学系统，具有用于将由照明光学系统照明的第一物体的图案投射到第二物体上的投影光学系统，用于曝光 与图案相同，包括照明光学系统和投影光学系统的主系统，以及用于测量投影光学系统的光学特性并安装在主系统上的干涉仪。

公开(公告)号：US06826442B2

公开(公告)日：2004-11-30

申请号：US09819670

申请日：2001-03-29

申请人： Seiji Takeuchi ,  Eiichi Murakami

发明人： Seiji Takeuchi ,  Eiichi Murakami

IPC分类号： G06F1900

CPC分类号： H01L21/67276

摘要： A stocker includes a first sealing member for stocking an object to be stocked, an atmosphere control device for controlling an internal atmosphere of the first sealing member to a first atmosphere of an inert gas, and a transfer device for transporting an object to be stocked to an exposure apparatus using an F2 excimer laser or receiving the object to be stocked from the exposure apparatus while the object to be stocked is shielded from an external atmosphere of the first sealing member.

摘要翻译： 储料器包括用于储存待储存物体的第一密封构件，用于将第一密封构件的内部气氛控制到惰性气体的第一气氛的气氛控制装置，以及用于将待储存的物体运送到 使用F2准分子激光器的曝光装置或者从待曝光的物体接收待存放的物体，同时将被保持物体与第一密封部件的外部气氛隔离。

公开(公告)号：US06795161B2

公开(公告)日：2004-09-21

申请号：US09811419

申请日：2001-03-20

申请人： Masaya Ogura ,  Eiichi Murakami ,  Nobuaki Ogushi

发明人： Masaya Ogura ,  Eiichi Murakami ,  Nobuaki Ogushi

IPC分类号： G03B2752

CPC分类号： G03F7/70883

摘要： An exposure apparatus having an illuminating optics unit for irradiating a reticle, on which a predetermined pattern has been formed, with exposing light emitted from an exposure light source, a reticle stage on which the reticle is placed, a projection optics unit for projecting the predetermined pattern of the reticle onto a substrate, and a substrate stage on which the substrate is placed. The apparatus includes at least one chamber for internally accommodating the illuminating optics unit, the reticle stage, the projection optics unit and the substrate stage, a first pressure control device for making a value of pressure inside the at least one chamber higher than a value of pressure outside the at least one chamber, and a first correction device for correcting optical characteristics of the projection optics unit, by performing at least one of (i) moving an adjustment unit for adjusting the optical characteristics of the projection optics unit and (ii) shifting a wavelength of the exposing light, in accordance with the value of the pressure inside the at least one chamber.

摘要翻译： 一种曝光装置，具有照射光学单元，用于对已经形成预定图案的掩模版进行曝光，曝光从曝光光源发射的光，其上放置有掩模版的标线片台，投影光学单元， 掩模版到基板上的图案，以及放置基板的基板台。 该装置包括用于内部容纳照明光学单元，标线片台，投影光学单元和基板台的至少一个室，用于使至少一个室内的压力值高于第一压力控制装置的值的第一压力控制装置 以及第一校正装置，用于通过执行（i）移动用于调整投影光学单元的光学特性的调节单元和（ii）至少一个腔室的光学特性的调整单元中的至少一个来校正投影光学单元的光学特性; 根据至少一个室内的压力值移动曝光光的波长。

公开(公告)号：US06569608B2

公开(公告)日：2003-05-27

申请号：US09398010

申请日：1999-09-17

申请人： Ichiro Tanaka ,  Eiichi Murakami

发明人： Ichiro Tanaka ,  Eiichi Murakami

IPC分类号： G03C500

CPC分类号： G03F7/0035 ,  G02B5/1857 ,  G03F7/0005

摘要： A method of manufacturing an element having a multiple-level step-like shape through plural lithographic processes, or a mold for production of such an element is disclosed, wherein a position of at least one step of the step-like shape is determined by an end of at least a portion of a pattern of a first mask to be formed through a first lithographic process of the plural lithographic processes.

摘要翻译： 公开了一种通过多个平版印刷工艺制造具有多级阶梯形状的元件的方法或用于制造这种元件的模具，其中步骤形状的至少一个步骤的位置由 通过多个光刻工艺的第一光刻工艺形成的第一掩模的图案的至少一部分的末端。

公开(公告)号：US5820679A

公开(公告)日：1998-10-13

申请号：US713192

申请日：1996-09-12

申请人： Natsuki Yokoyama ,  Yoshifumi Kawamoto ,  Eiichi Murakami ,  Fumihiko Uchida ,  Kenichi Mizuishi ,  Yoshio Kawamura

发明人： Natsuki Yokoyama ,  Yoshifumi Kawamoto ,  Eiichi Murakami ,  Fumihiko Uchida ,  Kenichi Mizuishi ,  Yoshio Kawamura

IPC分类号： B65G49/07 ,  B23Q41/00 ,  B23Q41/02 ,  C23C14/56 ,  C23C16/54 ,  G05B19/418 ,  H01L21/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/205 ,  H01L21/285 ,  H01L21/304 ,  H01L21/3065 ,  H01L21/3205 ,  H01L21/677 ,  H01L21/68 ,  C23C16/00

CPC分类号： C23C14/568 ,  C23C16/54 ,  G05B19/41865 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67276 ,  H01L21/67727 ,  H01L21/67745 ,  G05B2219/45031 ,  Y02P90/14 ,  Y02P90/20 ,  Y02P90/28 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S438/908 ,  Y10T29/41

摘要： Disclosed is a fabricating system including a plurality of processing apparatuses connected to each other by means of an inter-apparatus transporter, wherein one group of semiconductor wafers are processed in processing apparatuses and other group of wafers are transported to specified processing apparatuses for a time interval from (To+T) to a time To; and another group of wafers are processed and the remaining group of wafers are transported for a time interval from (To+T) to (To+2T). Since processing apparatuses can receive at least one of works from the inter-apparatus transporter for a time interval T min, the distribution of works from the transporter to processing apparatuses is completed for the time interval T min. The transporter is emptied for each time interval T min, and works are unloaded to the emptied transporter, which makes easy the scheduling, control and management of the transporting of a plurality of works in the fabricating system. Moreover, since the fabricating system including processing apparatuses is periodically controlled at a cycle time T min, the scheduling of a plurality of works can be made easy, to enhance the level of optimization, thus improving the productivity.