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109 条记录 (耗时 0.031 秒)

    Epitaxial film, piezoelectric element, ferroelectric element, manufacturing methods of the same, and liquid discharge head
    55.
    发明授权
    Epitaxial film, piezoelectric element, ferroelectric element, manufacturing methods of the same, and liquid discharge head 有权
    外延膜，压电元件，铁电元件，其制造方法和液体排出头

    公开(公告)号：US08198199B2

    公开(公告)日：2012-06-12

    申请号：US12526308

    申请日：2008-03-05

    申请人： Jumpei Hayashi ,  Takanori Matsuda ,  Tetsuro Fukui ,  Hiroshi Funakubo

    发明人： Jumpei Hayashi ,  Takanori Matsuda ,  Tetsuro Fukui ,  Hiroshi Funakubo

    IPC分类号： H01L21/31

    CPC分类号： H01L41/0973 ,  H01L41/0815 ,  H01L41/319

    摘要： There are disclosed an epitaxial film, comprising: heating an Si substrate provided with an SiO2 layer with a film thickness of 1.0 nm or more to 10 nm or less on a surface of the substrate; andforming on the SiO2 layer by use of a metal target represented by the following composition formula: yA(1−y)B  (1), in which A is one or more elements selected from the group consisting of rare earth elements including Y and Sc, B is Zr, and y is a numeric value of 0.03 or more to 0.20 or less, the epitaxial film represented by the following composition formula: xA2O3−(1−x)BO2  (2), in which A and B are respectively same elements as A and B of the composition formula (1), and x is a numeric value of 0.010 or more to 0.035 or less.

    摘要翻译： 公开了一种外延膜，其包括：在基板的表面上加热具有膜厚为1.0nm以上至10nm以下的SiO 2层的Si基板; 并使用由以下组成式表示的金属靶在SiO 2层上形成：yA（1-y）B（1），其中A是选自由Y和 Sc，B为Zr，y为0.03以上且0.20以下的数值，外延膜由以下组成式表示：xA 2 O 3 - （1-x）BO 2（2），其中A和B分别为 与组成式（1）的A和B相同的元素，x是0.010以上至0.035以下的数值。

    Piezoelectric substance element, liquid discharge head utilizing the same and optical element
    57.
    发明授权
    Piezoelectric substance element, liquid discharge head utilizing the same and optical element 有权
    压电体元件，利用其的液体排出头和光学元件

    公开(公告)号：US07759845B2

    公开(公告)日：2010-07-20

    申请号：US11683100

    申请日：2007-03-07

    申请人： Tetsuro Fukui ,  Kenichi Takeda ,  Katsumi Aoki ,  Toshihiro Ifuku ,  Takanori Matsuda ,  Hiroshi Funakubo ,  Shintaro Yokoyama ,  Takashi Katoda ,  Ken Nishida

    发明人： Tetsuro Fukui ,  Kenichi Takeda ,  Katsumi Aoki ,  Toshihiro Ifuku ,  Takanori Matsuda ,  Hiroshi Funakubo ,  Shintaro Yokoyama ,  Takashi Katoda ,  Ken Nishida

    IPC分类号： H01L41/08

    CPC分类号： B41J2/14233 ,  B41J2202/03 ,  H01L41/1876

    摘要： An optical element satisfactory in transparency and characteristics as an optical modulation element, and a piezoelectric substance element satisfactory in precision and reproducibility as a fine element such as MEMS can be provided. The piezoelectric substance element includes, on a substrate, at least a first electrode, a piezoelectric substance film and a second electrode. The piezoelectric substance film does not contain a layer-structured boundary plane; the crystal phase constituting the piezoelectric substance film comprises at least two of a tetragonal, a rhombohedral, a pseudocubic, an orthorhombic and a monoclinic; and the piezoelectric substance film includes, in a portion in which a change in the composition is within a range of ±2%, a portion where a proportion of the different crystal phases changes gradually in a thickness direction of the film.

    摘要翻译： 可以提供作为光调制元件的透明度和特性令人满意的光学元件，以及作为微细元件如MEMS的精度和再现性良好的压电体元件。 压电体元件在基板上至少包括第一电极，压电体膜和第二电极。 压电体膜不含有层结构的边界面; 构成压电体膜的晶相包含四方晶，菱方，假立方，斜方晶和单斜晶中的至少两种; 并且压电体膜在组成的变化范围为±2％的范围内包括不同结晶相的比例在膜的厚度方向上逐渐变化的部分。