公开(公告)号：US20220137506A1

公开(公告)日：2022-05-05

申请号：US17084993

申请日：2020-10-30

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Tomas Marangoni ,  Emad Aqad ,  James W. Thackeray ,  James F. Cameron ,  Xisen Hou ,  ChoongBong Lee

IPC: G03F7/004

Abstract: A photoresist composition, comprising an acid-sensitive polymer comprising a repeating unit having an acid-labile group; an iodonium salt comprising an anion and a cation, the iodonium salt having Formula (1): wherein Z− is an organic anion; Ar1 is substituted or unsubstituted C4-60 heteroaryl group comprising a furan heterocycle; and R1 is substituted or unsubstituted hydrocarbon group as provided herein, wherein the cation optionally comprises an acid-labile group, wherein Ar1 and R1 are optionally connected to each other via a single bond or one or more divalent linking groups to form a ring, and wherein the iodonium salt is optionally covalently bonded through Ar1 or substituent thereof as a pendant group to a polymer, the iodonium salt is optionally covalently bonded through R1 or substituent thereof as a pendant group to a polymer, or the iodonium salt is optionally covalently bonded through Z− as a pendant group to a polymer; and a solvent.

公开(公告)号：US10831100B2

公开(公告)日：2020-11-10

申请号：US15817864

申请日：2017-11-20

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Emad Aqad ,  James W. Thackeray

IPC: G03F7/004 ,  C07D333/76 ,  C07C309/12 ,  C07C65/05 ,  C07C25/02 ,  G03F7/26 ,  C07C323/03 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  C07C323/09 ,  C07C381/12 ,  G03F7/32

Abstract: A photoacid generator compound having formula (I): wherein, in formula (I), groups and variables are the same as described in the specification.

公开(公告)号：US20200218149A1

公开(公告)日：2020-07-09

申请号：US16681142

申请日：2019-11-12

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Emad Aqad ,  James W. Thackeray ,  James F. Cameron

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/28 ,  C08L27/00 ,  C08F16/24 ,  H01L21/027 ,  C08L27/10 ,  G03F7/20 ,  C08L81/08 ,  C08L81/06 ,  C08L73/00

Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.

公开(公告)号：US20190163055A1

公开(公告)日：2019-05-30

申请号：US16205055

申请日：2018-11-29

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  James F. Cameron ,  James W. Thackeray

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/027

Abstract: New Te-salts are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.

公开(公告)号：US10248020B2

公开(公告)日：2019-04-02

申请号：US13730273

申请日：2012-12-28

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： James W. Thackeray ,  Paul J. LaBeaume ,  James F. Cameron

IPC: G03F7/004 ,  G03F7/028 ,  G03F7/029 ,  G03F7/20 ,  G03F7/038 ,  G03F7/039

Abstract: Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, photoresists are provided that comprise (i) a polymer; (ii) a first onium salt acid generator that produces a first acid upon exposure of the photoresist composition to activating radiation; and (iii) a second onium salt acid generator that 1) comprises a covalently bound acid-labile moiety and 2) produces a second acid upon exposure of the photoresist composition to activating radiation, wherein the first acid and second acid have pKa values that differ by at least 0.5.

公开(公告)号：US20180252645A1

公开(公告)日：2018-09-06

申请号：US15937080

申请日：2018-03-27

Applicant: THE UNIVERSITY OF QUEENSLAND ,  ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： James W. Thackeray ,  Ke Du ,  Peter Trefonas, III ,  Idriss Blakey ,  Andrew Keith Whittaker

IPC: G01N21/64 ,  G01N21/84 ,  A24B13/00 ,  A24B15/10 ,  B07C5/342 ,  B07C5/36 ,  B65G27/00 ,  C10L1/00 ,  G01N21/359 ,  G01N21/55 ,  G01N21/95 ,  G01N21/94 ,  G01N21/85 ,  A24B1/04 ,  G01N21/952

CPC classification number: G01N21/6428 ,  A24B1/04 ,  A24B13/00 ,  A24B15/10 ,  B05D1/005 ,  B07C5/3427 ,  B07C5/366 ,  B07C2501/0018 ,  B65G27/00 ,  C08F220/28 ,  C08F2220/281 ,  C08F2438/03 ,  C10L1/003 ,  C10N2240/56 ,  G01N21/359 ,  G01N21/55 ,  G01N21/6486 ,  G01N21/84 ,  G01N21/85 ,  G01N21/94 ,  G01N21/95 ,  G01N21/952 ,  G01N2021/6417 ,  G01N2021/6439 ,  G01N2021/646 ,  G01N2021/8411 ,  G01N2021/845 ,  G01N2021/8466 ,  G01N2021/8592 ,  G03F7/091 ,  G03F7/094 ,  G03F7/20 ,  C08F2220/286 ,  C08F2220/185 ,  C08F220/22

Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.

公开(公告)号：US09581901B2

公开(公告)日：2017-02-28

申请号：US14528096

申请日：2014-10-30

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Vipul Jain ,  Owendi Ongayi ,  James W. Thackeray ,  James F. Cameron

IPC: G03F7/004 ,  C08F224/00 ,  G03F7/039 ,  C08F220/30 ,  C09D133/06 ,  C09D133/14

CPC classification number: G03F7/004 ,  C08F220/30 ,  C08F224/00 ,  C09D133/06 ,  C09D133/14 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  C08F2220/303 ,  C08F2220/302 ,  C08F2220/382

Abstract: A copolymer includes repeat units derived from an acid-labile monomer, an aliphatic lactone-containing monomer, a C1-12 alkyl (meth)acrylate in which the C1-12 alkyl group includes a specific base-soluble group, a photoacid-generating monomer that includes an aliphatic anion, and a neutral aromatic monomer having the formula wherein R1, R2, R3, X, m, and R5 are defined herein. The copolymer is used as a component of a photoresist composition. A coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using the coated substrate are described.

Abstract translation: 共聚物包括衍生自酸不稳定单体，含脂肪族内酯的单体，C1-12烷基（甲基）丙烯酸酯的重复单元，其中C1-12烷基包括特定的碱溶性基团，光产酸单体 其包括脂族阴离子和具有下式的中性芳族单体：其中R1，R2，R3，X，m和R5如本文所定义。 共聚物用作光致抗蚀剂组合物的组分。 描述了包括光致抗蚀剂组合物层的涂覆基材，以及使用该涂布基板形成电子器件的方法。

公开(公告)号：US09557642B2

公开(公告)日：2017-01-31

申请号：US14833284

申请日：2015-08-24

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Paul J. LaBeaume ,  Vipul Jain ,  Suzanne M. Coley ,  James W. Thackeray ,  James F. Cameron ,  Amy M. Kwok ,  David A. Valeri

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  C07C309/12 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F220/38 ,  G03F7/039 ,  G03F7/16 ,  H01L21/027

CPC classification number: G03F7/038 ,  C07C309/12 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  H01L21/0274

Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

公开(公告)号：US09551930B2

公开(公告)日：2017-01-24

申请号：US14833278

申请日：2015-08-24

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Paul J. LaBeaume ,  Vipul Jain ,  Suzanne M. Coley ,  James W. Thackeray ,  James F. Cameron ,  Amy M. Kwok ,  David A. Valeri

IPC: G03F7/004 ,  G03F7/038 ,  C07C309/12 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F220/38 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/038 ,  C07C309/12 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  H01L21/0274

Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

Abstract translation: 光致抗蚀剂组合物包括其中至少一半的重复单元是产生光酸的重复单元的第一聚合物和在酸性作用下在碱性显影剂中显示出溶解度变化的第二聚合物。 在第一聚合物中，每个产生光酸的重复单元包括产生光酸的功能和碱溶性增强功能。

公开(公告)号：US09527936B2

公开(公告)日：2016-12-27

申请号：US14833245

申请日：2015-08-24

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Vipul Jain ,  Paul J. LaBeaume ,  James W. Thackeray ,  James F. Cameron ,  Suzanne M. Coley ,  Amy M. Kwok ,  David A. Valeri

IPC: G03F7/004 ,  C08F22/10 ,  C07C309/12 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F220/38 ,  G03F7/039 ,  G03F7/20 ,  G03F7/38 ,  H01L21/027

CPC classification number: C08F22/10 ,  C07C309/12 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/38 ,  H01L21/0274 ,  H01L21/0275

Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

Abstract translation: 聚合物包括重复单元，其中至少一半是产生光致酸的重复单元。 每个产生光酸的重复单元包括光产酸功能和碱溶性增强功能。 该聚合物可用作光致抗蚀剂组合物的组分，该组合物还包括在酸作用下在碱性显影剂中表现出溶解度变化的第二聚合物。