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公开(公告)号:US20240045943A1
公开(公告)日:2024-02-08
申请号:US18356524
申请日:2023-07-21
Applicant: Samsung Electronics Co., Ltd.
Inventor: Gunhee LEE , Mijeong SONG , Jinmo KANG , Hyunwoo KIM , Sungoh KIM , Chanmin PARK , Donghyun YEOM , Sanghun LEE
CPC classification number: G06F21/36 , G06F3/013 , G06T19/006 , G06T19/20 , G06T7/70 , G06F3/0346 , G06T2219/2021 , G06T2219/2004
Abstract: An electronic device is provided. The electronic device obtains current spatial information on a physical space where a user is positioned using a sensor, generates a greater number of virtual objects than the number of unavailable authentication objects based on at least one authentication object among a plurality of authentication objects being unavailable in the current spatial information, outputs the generated virtual objects to a plurality of positions including a physical position of an unavailable authentication object, and determines that authentication is successful based on a user input that selects a generated virtual object and an available authentication object as a registered sequence.
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公开(公告)号:US20230330850A1
公开(公告)日:2023-10-19
申请号:US18210955
申请日:2023-06-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hyunwoo KIM , Sahnggyu PARK , Hyunseok HONG
CPC classification number: B25J9/1633 , B25J15/08
Abstract: A grip device includes a first finger with a groove on a gripping surface thereof; a second finger facing the first finger; a middle member inserted into the groove of the first finger and covering the gripping surface; a plurality of mono-axial force sensors each positioned on one of a plurality of inclined surfaces of the groove and configured to detect a force applied to the middle member; a driving motor configured to adjust a gripping force of the first finger and the second finger; and a processor. The processor is configured to calculate a force vector applied to the middle member based on sensing values received from the force sensors, and, based on a force component of the force vector in a direction parallel to a surface of the middle member being less than a preset value, apply a greater gripping force by the first and second fingers.
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53.
公开(公告)号:US20230296983A1
公开(公告)日:2023-09-21
申请号:US18154184
申请日:2023-01-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sung Hwan PARK , Juhyeon PARK , Hyunwoo KIM , Suk Koo HONG
IPC: G03F7/039 , C08F212/14 , G03F7/038
CPC classification number: G03F7/0397 , C08F212/22 , G03F7/0382 , C08F2800/10
Abstract: An extreme ultraviolet (EUV) photosensitive polymer includes a first repeating unit represented by Chemical Formula 1.
(in Chemical Formula 1, R1 is a C1 to C10 alkyl group, a C1 to C10 haloalkyl group, a C6 to C18 aryl group, a haloaryl group, a C7 to C18 arylalkyl group, a C7 to C18 alkylaryl group, or a C6 to C18 haloaryl group, and R2 is a direct bond, a C1 to C10 alkylene group, a C2 to C10 alkenyl group, a C2 to C10 alkynyl group, a C6 to C18 aryl group, a C7 to C18 arylalkyl group, or a C7 to C18 alkylaryl group).-
公开(公告)号:US20230288806A1
公开(公告)日:2023-09-14
申请号:US18098233
申请日:2023-01-18
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jiyup KIM , Hyunwoo KIM , Sung Hwan PARK , Juhyeon PARK , Giyoung SONG
IPC: G03F7/039 , G03F7/004 , C08F220/28 , C08F216/10 , H01L21/027
CPC classification number: G03F7/0397 , C08F216/10 , C08F220/283 , G03F7/0045 , H01L21/0274
Abstract: A photosensitive polymer includes a first repeating unit represented by Formula 1 below:
wherein, in Formula 1, R1 is a hydrogen atom or a methyl group, R2 is a substituted or unsubstituted C1 to C30 acid-labile hydrocarbylene group having a tertiary carbon atom, R3 is a C1 to C10 linear or branched alkyl group, a C3 to C30 tertiary alicyclic group, a C6 to C20 aryl group, a C2 to C20 heteroaryl group, a C7 to C20 arylalkyl group, or a C2 to C20 heteroarylalkyl group, and n is 0 or 1. To manufacture an integrated circuit (IC) device, a change in the polarity of the photosensitive polymer is induced by causing a multi-step deprotection reaction of the first repeating unit.-
55.
公开(公告)号:US20230194985A1
公开(公告)日:2023-06-22
申请号:US18076818
申请日:2022-12-07
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jinjoo KIM , Sumin KIM , Hyunwoo KIM , Yechan KIM , Juyoung KIM , Jicheol PARK , Giyoung SONG , Suk Koo HONG
IPC: G03F7/039 , H01L21/027
CPC classification number: G03F7/0392 , H01L21/0276 , H01L21/0275
Abstract: A brush polymer for a photoresist, a photoresist composition, and a method of manufacturing an integrated circuit device, the brush polymer including a core and a plurality of side polymer chains, the plurality of side polymer chains being bonded to the core and extending from the core to form a bottle-brush polymer or a star-brush polymer, together with the core, wherein each of the plurality of side polymer chains includes a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2:
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公开(公告)号:US20230157022A1
公开(公告)日:2023-05-18
申请号:US17986371
申请日:2022-11-14
Applicant: Samsung Electronics Co., Ltd.
Inventor: Keunwook SHIN , Changhyun KIM , Sehun PARK , Hyunwoo KIM , Kyung-Eun BYUN , Dongjin YUN , Changseok LEE
IPC: H01L27/11582 , G06N3/063
CPC classification number: H01L27/11582 , G06N3/0635
Abstract: A vertical nonvolatile memory device may include a channel layer extending in a first direction; a plurality of gate electrodes and a plurality of spacers each extending in a second direction crossing the first direction, the plurality of gate electrodes and the plurality of spacers being alternately arranged with each other in the first direction; and a gate insulating layer extending in the first direction between the channel layer and the plurality of gate electrodes. Each of the plurality of gate electrodes may include a metal-doped graphene.
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公开(公告)号:US20230120542A1
公开(公告)日:2023-04-20
申请号:US18080348
申请日:2022-12-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sumin KIM , Hyunwoo KIM , Sukkoo HONG , Yechan KIM , Juyoung KIM , Jinjoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI
IPC: G03F7/004 , C07C381/12 , G03F7/039 , C07C309/12
Abstract: A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.
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58.
公开(公告)号:US20230040334A1
公开(公告)日:2023-02-09
申请号:US17859214
申请日:2022-07-07
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hyunwoo KIM , Kazuki HARANO , Kiyoshi MURATA , Haruyoshi SATO , Younsoo KIM , Seungmin RYU , Atsushi YAMASHITA , Gyuhee PARK , Younjoung CHO
Abstract: An yttrium compound and a method of manufacturing an integrated circuit device, the compound being represented by General Formula (I):
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公开(公告)号:US20230016491A1
公开(公告)日:2023-01-19
申请号:US17949711
申请日:2022-09-21
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jungil CHO , Soonhong KWON , Hyunwoo KIM , Minkyu SONG , Jongsung LEE , Joonghwan LEE , Yongsu CHUNG , Daesung CHOI
IPC: H04W12/122 , H04W12/61 , H04W12/02 , H04W12/73
Abstract: A method of identifying a malicious access point (AP) by a terminal apparatus includes obtaining first performance information related to hardware of a first AP based on a first beacon signal received from the first AP, comparing the first performance information with previously stored second performance information of a second AP, and determining whether the first AP is a malicious AP, based on a result of the comparing.
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公开(公告)号:US20220171284A1
公开(公告)日:2022-06-02
申请号:US17238355
申请日:2021-04-23
Applicant: Samsung Electronics Co., Ltd.
Inventor: Eunkyung LEE , Sumin KIM , Hyunwoo KIM , Juhyeon PARK , Giyoung SONG , Sukkoo HONG , Yoonhyun KWAK , Youngmin NAM , Byunghee SOHN , Sunyoung LEE , Aram JEON , Sungwon CHOI
IPC: G03F7/004 , G03F7/038 , G03F7/039 , C07C381/12 , C07C309/12 , C07D333/76
Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.
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