公开(公告)号：US20110094442A1

公开(公告)日：2011-04-28

申请号：US12983474

申请日：2011-01-03

申请人： Masahiko SEKIMOTO ,  Seiji Katsuoka ,  Naoki Dai ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Yasuyuki Motoshima ,  Ryo Kato

发明人： Masahiko SEKIMOTO ,  Seiji Katsuoka ,  Naoki Dai ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Yasuyuki Motoshima ,  Ryo Kato

IPC分类号： B05C3/02 ,  B05C13/00

CPC分类号： H01L21/67086 ,  H01L21/67051 ,  H01L21/687

摘要： A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section.

摘要翻译： 基板保持装置可以满足对较小尺寸的小型装置的要求，同时确保基板在处理液体中的足够的浸入深度。 基板保持装置包括：基板保持件，用于通过使基板（W）的表面的周边部分与第一密封构件接触来支撑基板（W）; 以及基板按压部，其相对于基板保持件下降，以将由基板保持件保持的基板（W）向下压，从而使第一密封部件与基板（W）压力接触。 基板按压部设置有与基板保持件的环状保持部的上表面压力接触的第二环状密封部件，从而密封基板按压部的周边区域。

公开(公告)号：US20100221432A1

公开(公告)日：2010-09-02

申请号：US12771176

申请日：2010-04-30

申请人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima

发明人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima

IPC分类号： B05D3/10

CPC分类号： H01L21/68721 ,  C23C18/163 ,  C23C18/1632 ,  C23C18/1886 ,  C25D7/123 ,  C25D17/001 ,  H01L21/67126 ,  H01L21/67766 ,  Y10S134/901

摘要： A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.

摘要翻译： 基板处理方法和装置可以可靠地执行能够在基板的表面的必要区域中均匀镀覆的预镀处理。 基板处理方法对作为预镀处理的基板的表面进行清洗处理和催化剂赋予处理，然后在基板的赋予催化剂的表面上化学镀金属膜。 在通过催化剂赋予处理赋予催化剂的区域的基板的表面的更宽的区域中进行清洗处理。

公开(公告)号：US20100154837A1

公开(公告)日：2010-06-24

申请号：US12654437

申请日：2009-12-18

申请人： Takahiro Ogawa ,  Naoki Matsuda ,  Koichi Fukaya ,  Hiroyuki Kaneko

发明人： Takahiro Ogawa ,  Naoki Matsuda ,  Koichi Fukaya ,  Hiroyuki Kaneko

IPC分类号： B08B3/00

CPC分类号： B08B17/00 ,  B08B3/02 ,  B08B17/025 ,  H01L21/67051 ,  H01L21/6708

摘要： A liquid-scattering prevention cup, provided in a substrate processing apparatus, is capable of attaching a hydrophilic member, such as a PVA sponge, to an inner surface of a liquid-scattering prevention cup body easily and efficiently. The liquid-scattering prevention cup includes a liquid-scattering prevention cup body, and a liquid-scattering prevention sheet having a surface hydrophilic material layer, attached to an entire area or a predetermined area of the inner surface of the liquid-scattering prevention cup body. The liquid-scattering prevention sheet has been attached to the liquid-scattering prevention cup body by an attachment such that the hydrophilic material layer is exposed.

摘要翻译： 设置在基板处理装置中的液体散射防止杯能够容易且有效地将亲水构件如PVA海绵附着到防止液体散射的杯体的内表面。 液体散射防止杯包括液体散射防止杯体和具有表面亲水材料层的液体散射防止片，附着在防止液体散射杯体的内表面的整个区域或预定区域 。 通过使亲水性材料层露出的附着物将液体散射防止片附着在防止散射液体的杯体上。

公开(公告)号：US20100138122A1

公开(公告)日：2010-06-03

申请号：US12528389

申请日：2008-02-21

申请人： Helge Westerfeld ,  Takahiro Ogawa ,  Markus Hamm

发明人： Helge Westerfeld ,  Takahiro Ogawa ,  Markus Hamm

IPC分类号： G06F19/00

CPC分类号： B60T8/1706 ,  B60T8/1766 ,  B60T8/261 ,  B60T8/3225 ,  B60T13/686 ,  B60T2240/06

摘要： To further improve, in a brake control method and device for a two-wheeled motor vehicle that utilizes a wheel cylinder pressure as a parameter for predicting the potential for lifting of a rear wheel, the accuracy of predicting lifting of the rear wheel.A brake control method of the present invention comprises the steps of inputting a signal of an input sensor (step 100); detecting a front wheel cylinder pressure (step 102); detecting an amount of change in the front wheel cylinder pressure (step 104); determining whether or not the front wheel cylinder pressure and the amount of change in the front wheel cylinder pressure that have been detected correspond to a brake condition where lifting of a rear wheel can occur (step 106); and, when it is determined that the front wheel cylinder pressure and the amount of change in the front wheel cylinder pressure that have been detected correspond to the brake condition, reducing a pressure amplification gradient of the front wheel cylinder pressure.

摘要翻译： 为了进一步改进，在利用轮缸压力作为预测后轮提升潜力的参数的用于两轮机动车辆的制动控制方法和装置中，预测后轮提升的精度。 本发明的制动控制方法包括输入输入传感器的信号的步骤（步骤100）。 检测前轮缸压力（步骤102）; 检测前轮缸压力的变化量（步骤104）; 确定前轮缸压力和前轮缸压力的变化量是否与可能发生后轮的提升的制动条件相对应（步骤106）; 并且当确定前轮缸压力和检测到的前轮缸压力的变化量对应于制动条件时，减小前轮缸压力的压力放大梯度。

公开(公告)号：US07663885B2

公开(公告)日：2010-02-16

申请号：US12074158

申请日：2008-02-29

申请人： Takahiro Ogawa ,  Takahito Yamanaka

发明人： Takahiro Ogawa ,  Takahito Yamanaka

IPC分类号： H05K7/20

CPC分类号： H01L23/4006 ,  H01L2023/4031 ,  H01L2023/405 ,  H01L2023/4087 ,  H01L2924/0002 ,  H01L2924/00

摘要： The IC fixing component includes a locking case accommodating the IC in such a manner that a side of the IC out of a face-to-face contact with the heat dissipation plate is brought into a face-to-face contact with the locking case so as to be covered and a through hole and a rotation stop protrusion inserted into a rotation limiting hole. After the IC has been accommodated in the locking case, the screw member inserted through the through hole is screwed into a screw hole of the heat dissipation plate so that the side of the IC out of face-to-face contact with the locking case is pressed by the locking case thereby to be brought into a face-to-face contact with the heat dissipation plate.

摘要翻译： IC固定部件包括容纳IC的锁定壳体，使得IC的与散热板的面对面接触的一侧与锁定壳体进行面对面接触， 以及插入到旋转限制孔中的通孔和旋转止动突起。 在IC被容纳在锁定壳体中之后，插入通孔的螺钉构件被拧入散热板的螺纹孔中，使得与锁定壳体面对面接触的IC侧是 由锁定壳体按压而与散热板进行面对面的接触。

公开(公告)号：US20090305612A1

公开(公告)日：2009-12-10

申请号：US12457175

申请日：2009-06-03

申请人： Mitsuru Miyazaki ,  Seiji Katsuoka ,  Naoki Matsuda ,  Junji Kunisawa ,  Kenichi Kobayashi ,  Hiroshi Sotozaki ,  Hiroyuki Shinozaki ,  Osamu Nabeya ,  Shinya Morisawa ,  Takahiro Ogawa ,  Natsuki Makino

发明人： Mitsuru Miyazaki ,  Seiji Katsuoka ,  Naoki Matsuda ,  Junji Kunisawa ,  Kenichi Kobayashi ,  Hiroshi Sotozaki ,  Hiroyuki Shinozaki ,  Osamu Nabeya ,  Shinya Morisawa ,  Takahiro Ogawa ,  Natsuki Makino

IPC分类号： B24B51/00 ,  B08B3/00 ,  B08B1/02 ,  F26B5/00

CPC分类号： B24B37/345 ,  H01L21/30625 ,  H01L21/67219 ,  H01L21/67739 ,  H01L21/67742 ,  H01L21/67754 ,  Y10T137/0318 ,  Y10T137/8593

摘要： An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.

摘要翻译： 公开了一种用于处理衬底的设备。 该装置包括：抛光部，其被配置为对基板进行抛光;移动机构，被配置为传送基板;以及清洁部，其构造成清洁和干燥被抛光的基板。 清洗部具有多个用于清洗多个基板的清洗线。 多个清洁线具有多个清洁模块和用于传送基板的多个传送机器人。

公开(公告)号：US20090037063A1

公开(公告)日：2009-02-05

申请号：US12162220

申请日：2006-01-27

申请人： Takahiro Ogawa ,  Helge Westerfeld ,  Manabu Kanno

发明人： Takahiro Ogawa ,  Helge Westerfeld ,  Manabu Kanno

IPC分类号： B60T8/1755

CPC分类号： B60T8/1706 ,  B60T8/1755 ,  B60T8/1766 ,  B60T8/261 ,  B60T8/3225 ,  B60T2230/03 ,  B60T2240/06

摘要： To enable, with respect to a vehicle where lifting of the vehicle body easily occurs to a relatively large extent even in a relatively early stage when rear wheel lifting is detected, more rapid and reliable securement of the safety of the vehicle body with respect to that rear wheel lifting.When lifting of a rear wheel is detected, in contrast to what has conventionally been the case, the brake pressure of a front wheel is immediately reduced (S102) regardless of whether or not there is occurrence of skidding of the front wheel, so lifting of the entire vehicle body is rapidly and reliably controlled and prevented particularly in a vehicle whose entire vehicle body is easily lifted even by slight rear wheel lifting.

摘要翻译： 为了使得即使在检测到后轮提升时的相对较早的阶段中也容易发生车身的抬起的车辆，相对于该车身的安全性的更快速和可靠地确保 后轮提升。 当检测到后轮的提升时，与传统的情况相比，前轮的制动压力立即降低（S102），而不管前轮是否发生滑动，因此提升 整个车身能够快速可靠地控制和防止，特别是即使通过轻微的后轮提升也能够容易地提升整个车身的车辆。

公开(公告)号：US07471047B2

公开(公告)日：2008-12-30

申请号：US11442412

申请日：2006-05-25

申请人： Takahiro Ogawa

发明人： Takahiro Ogawa

IPC分类号： G09G3/10

CPC分类号： H02M1/32 ,  G09G2330/04 ,  H02M3/33507

摘要： At a primary power-supply board 40, a Vsus power supply and a Vadd power supply of prescribed voltages are derived and outputted to a plasma display panel 11. Secondary power supplies Vsub1, Vsub2, and Vsub3 are derived from prescribed voltage levels of a transformer 42 for deriving Vsus and Vadd power supplies at the primary power-supply board 40. The secondary power supplies Vsub1, Vsub2, and Vsub3 are outputted to a secondary power-supply board 20 which is a board different from the primary power-supply board 40. Vset, Ve, and Vscan power supplies which can be used by the plasma display panel 11 are derived by regulating the secondary power supplies Vsub1, Vsub2, and Vsub3. Thus, since the primary power-supply board 40 and the secondary power-supply board 20 are provided separately, the secondary power-supply board 20 alone can be replaced to cope with the changes of the plasma display panel 11.

摘要翻译： 在主电源板40中，导出Vsus电源和规定电压的Vadd电源并将其输出到等离子体显示面板11.次级电源Vsub1，Vsub2和Vsub3从变压器的规定电压电平导出 42，用于导出主电源板40上的Vsus和Vadd电源。次级电源Vsub1，Vsub2和Vsub3被输出到与主电源板40不同的板的辅助电源板20 可以通过调节次级电源Vsub1，Vsub2和Vsub3来导出可由等离子体显示面板11使用的Vset，Ve和Vscan电源。 因此，由于主电源板40和二次电源板20分开设置，所以可以更换二次电源板20以应对等离子体显示面板11的变化。

公开(公告)号：US07305179B2

公开(公告)日：2007-12-04

申请号：US11167107

申请日：2005-06-28

申请人： Takahiro Ogawa

发明人： Takahiro Ogawa

IPC分类号： G03B13/00 ,  G03B17/00 ,  G02B7/28 ,  H04N5/46 ,  H04N5/228

CPC分类号： H04N5/23287 ,  G03B17/02 ,  H04N5/23248

摘要： An anti-shake apparatus of a photographing apparatus comprises a movable unit, and a control apparatus. The movable unit has an imaging device, and can be moved in first and second directions. The control apparatus moves the movable unit to first, second, third, and fourth positions, and performs first, second, third, and fourth imaging operations, and a combination operation for obtaining an anti-shake image signal in which lag from hand-shake is corrected. In the first imaging operation, a first imaging position of a first photography frame in which lag corresponding to a first hand-shake quantity is corrected, is calculated, and a first image signal which is imaged at an overlapping area between an imaging field of the imaging device at the first position and the first photography frame, is obtained. In the combination operation, the anti-shake image signal is obtained by combining the first, second, third, and fourth image signals.

摘要翻译： 拍摄装置的防抖装置包括可移动单元和控制装置。 可移动单元具有成像装置，并且可以在第一和第二方向上移动。 控制装置将可移动单元移动到第一，第二，第三和第四位置，并执行第一，第二，第三和第四成像操作，以及用于获得其中从握手延迟的防抖图像信号的组合操作 被更正。 在第一成像操作中，计算第一拍摄帧的第一拍摄位置，其中对应于第一手抖动量的滞后被校正，并且第一图像信号被成像在重放区域之间的重叠区域 在第一位置和第一摄影帧处获得成像装置。 在组合操作中，通过组合第一，第二，第三和第四图像信号来获得防抖图像信号。

公开(公告)号：US20070273202A1

公开(公告)日：2007-11-29

申请号：US10577184

申请日：2004-10-29

申请人： Takahiro Ogawa

发明人： Takahiro Ogawa

IPC分类号： B60T7/12

CPC分类号： B62L3/08 ,  B60T8/3225 ,  B60Y2200/12

摘要： In an anti-lock brake system of a brake system including an interlocking brake device, the present invention reduces at a low cost the discomfort in brake manipulation feeling of a driver which is generated attributed to braking which exceeds the brake manipulation feeling at the time of operating the interlocking brake device. A cylinder pressure (symbol CB) of a second front wheel cylinder 136 is controlled such that speed difference between a vehicle body speed (symbol ST) and a vehicle wheel speed (symbol F) of a front wheel 131 becomes equal to or less than a fixed speed difference due to an open/close control of a holding valve 24 and an open-close control of a pressure reducing valve 25. With respect to a cylinder pressure (symbol RW) of a rear wheel cylinder 234, since an open control and a close control of a holding valve 21 are repeatedly performed (symbol EV) at a predetermined cycle, a sharp pressure increase of a brake working liquid pressure (symbol RM) in a rear master cylinder 204 is gradually pressurized in a distributed manner at a predetermined cycle.

摘要翻译： 本发明涉及一种包括联锁制动装置的制动系统的防抱死制动系统，本发明降低了由于制动而产生的驾驶员的制动操作感不适，超过了制动器操作感时 操作互锁制动装置。 控制第二前轮气缸136的气缸压力（符号CB），使得前轮131的车体速度（符号ST）和车轮速度（符号F）之间的速度差变为等于或小于 由于保持阀24的打开/关闭控制以及减压阀25的开闭控制而产生的固定速度差。相对于后轮缸234的缸体压力（符号RW），由于打开控制和 以预定的周期重复执行保持阀21的关闭控制（符号EV），后主制动缸204中的制动工作液体压力（符号RM）的急剧增加的压力以预定的分布式逐渐加压 周期。