公开(公告)号：US08570488B2

公开(公告)日：2013-10-29

申请号：US11718146

申请日：2005-12-08

申请人： Wilfried Clauss ,  Michael Totzeck ,  Gisela Rissmann

发明人： Wilfried Clauss ,  Michael Totzeck ,  Werner Mueller-Rissmann

IPC分类号： G03B27/52

CPC分类号： C04B35/443 ,  C04B35/053 ,  C04B35/44 ,  C04B35/6455 ,  C04B2235/3225 ,  C04B2235/72 ,  C04B2235/762 ,  C04B2235/77 ,  C04B2235/786 ,  C04B2235/9646 ,  G02B1/02 ,  G03F7/70341 ,  G03F7/70941 ,  G03F7/70958

摘要： A transmitting optical element adapted for use in an objective for a microlithographic projection exposure apparatus is composed of a polycrystalline material, with the polycrystalline material having crystallites with a cubic crystal structure, and with the mean crystallite size of these crystallites being at least micrometers, and at most micrometers.

摘要翻译： 适用于微光刻投影曝光装置的物镜的发射光学元件由多晶材料构成，多晶材料具有立方晶体结构的微晶，并且这些微晶的平均微晶尺寸至少为微米，并且 至多微米。

公开(公告)号：US08031326B2

公开(公告)日：2011-10-04

申请号：US12042621

申请日：2008-03-05

申请人： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

发明人： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

IPC分类号： G03B27/54 ,  G03B27/72

CPC分类号： G02B5/3083 ,  G02B27/286 ,  G03F7/70566 ,  G03F7/70966

摘要： In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.

摘要翻译： 在一些实施例中，本公开提供了一种光学系统，特别是微光刻曝光系统的照明系统或投影透镜，其具有光学系统轴线和包括三个双折射元件的至少一个元件组，每个元件组包括光学单轴材料并具有 非球面表面，其中该组的第一双折射元件具有其光学晶体轴的第一取向，该组的第二双折射元件具有其光学晶轴的第二取向，其中第二取向可被描述为从 第一取向的旋转，旋转不对应于围绕光学系统轴的旋转90°的角度或其整数倍，并且该组的第三双折射元件具有其光学晶轴的第三取向，其中， 可以将第三取向描述为从第二取向旋转而出现，旋转不对准 以围绕光学系统轴旋转90°的角度或其整数倍。

公开(公告)号：US20090306921A1

公开(公告)日：2009-12-10

申请号：US12421996

申请日：2009-04-10

申请人： Michael Totzeck ,  Daniel Kraehmer ,  Ralf Mueller ,  Johannes Ruoff ,  Vladan Blahnik

发明人： Michael Totzeck ,  Daniel Kraehmer ,  Ralf Mueller ,  Johannes Ruoff ,  Vladan Blahnik

IPC分类号： G01M11/02 ,  G06F19/00

CPC分类号： G01M11/0257

摘要： The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.

摘要翻译： 本公开涉及通过使用取向泽尔尼克多项式的光学系统的规范，优化和匹配。 在一些实施例中，提供了一种用于评估微光刻投影曝光设备的光学系统的适用性的方法。 该方法可以包括确定光学系统的琼斯光瞳，至少近似地使用扩展到定向泽尔尼克多项式来描述琼斯光瞳，并且基于至少一个取向的膨胀系数来评估光学系统的适用性 Zernike多项式在扩展中。

公开(公告)号：US07423727B2

公开(公告)日：2008-09-09

申请号：US11041873

申请日：2005-01-25

申请人： Michael Totzeck ,  Bernd Peter Geh ,  Skip Miller

发明人： Michael Totzeck ,  Bernd Peter Geh ,  Skip Miller

IPC分类号： G03B27/64

CPC分类号： G03F7/70966 ,  G03F7/70566

摘要： A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a radially varying birefringence.

摘要翻译： 光刻设备包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化;衬底台，其被配置为保持衬底;以及投影系统，被配置为将所述光束作为图案投影到 基板的目标部分。 光刻设备还包括设置在光束的路径中的偏振修正器。 偏振调节剂包括具有径向变化的双折射的材料。

公开(公告)号：US07411656B2

公开(公告)日：2008-08-12

申请号：US11337491

申请日：2006-01-24

申请人： Michael Totzeck ,  Birgit Enkisch ,  Karl-Heinz Schuster

发明人： Michael Totzeck ,  Birgit Enkisch ,  Karl-Heinz Schuster

IPC分类号： G03B27/72 ,  G03B27/28 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70566 ,  G02B5/1809 ,  G02B5/3083 ,  G02B27/286 ,  G03F7/70308

摘要： A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of polarization states of the input radiation, is designed as a reflective retardation arrangement. A useful cross section of the retardation arrangement has a multiplicity of retardation zones of different retardation effect. Such a mirror arrangement having a retardation effect varying as a function of location can be used to compensate undesired fluctuations in the polarization state over the cross section of an input radiation beam and/or to set specific output polarization states, for example in order to set radial or tangential polarization.

摘要翻译： 用于将从延迟装置的输入侧入射的输入辐射束转换成输出辐射束的延迟装置，该输出辐射束在其横截面上具有可被延迟装置影响的极化状态的空间分布，并且与空间 输入辐射的极化状态的分布被设计为反射延迟布置。 延迟结构的有用的截面具有不同的延迟效果的多个延迟区域。 可以使用具有作为位置的函数而变化的延迟效应的这种反射镜装置来补偿在输入辐射束的横截面上的偏振状态的不期望的波动和/或设置特定的输出偏振状态，例如以设定 径向或切向极化。

公开(公告)号：US20080037905A1

公开(公告)日：2008-02-14

申请号：US11874493

申请日：2007-10-18

申请人： Ulrich Wegmann ,  Michael Hartl ,  Markus Mengel ,  Manfred Dahl ,  Helmut Haidner ,  Martin Schriever ,  Michael Totzeck

发明人： Ulrich Wegmann ,  Michael Hartl ,  Markus Mengel ,  Manfred Dahl ,  Helmut Haidner ,  Martin Schriever ,  Michael Totzeck

IPC分类号： G06K9/03

CPC分类号： G03F7/70566 ,  G01J4/04 ,  G01M11/0271 ,  G01M11/0285 ,  G02B27/0025 ,  G03F7/70591

摘要： A method and an apparatus for determining the influencing of the state of polarization of optical radiation by an optical system under test, wherein radiation with a defined entrance state of polarization is directed onto the optical system, the exit-side state of polarization is measured, and the influencing of the state of polarization is determined by the optical system with the aid of evaluation of the exit state of polarization with reference to the entrance state of polarization. An analyser arrangement which can be used for this purpose is also disclosed. The method and the apparatus are used, e.g., to determine the influencing of the state of polarization of optical radiation by an optical imaging system of prescribable aperture, the determination being performed in a pupil-resolved fashion.

摘要翻译： 一种用于通过被测光学系统确定光辐射的偏振状态的影响的方法和装置，其中具有限定的入射极化状态的辐射被引导到光学系统上，测量出射侧的偏振态， 并且通过参考偏振的入射状态来评估偏振的退出状态，由光学系统确定极化状态的影响。 还公开了可用于此目的的分析装置。 使用该方法和装置，例如通过具有规定孔径的光学成像系统来确定光学辐射的偏振状态的影响，该确定以瞳孔分辨的方式执行。

公开(公告)号：US07053988B2

公开(公告)日：2006-05-30

申请号：US10721378

申请日：2003-11-26

申请人： Michael Totzeck ,  Birgit Enkisch ,  Karl-Heinz Schuster

发明人： Michael Totzeck ,  Birgit Enkisch ,  Karl-Heinz Schuster

IPC分类号： G03B27/72 ,  G03B27/28

CPC分类号： G03F7/70566 ,  G02B5/1809 ,  G02B5/3083 ,  G02B27/286 ,  G03F7/70308

摘要： A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of polarization states of the input radiation, is designed as a reflective retardation arrangement. A useful cross section of the retardation arrangement has a multiplicity of retardation zones of different retardation effect. Such a mirror arrangement having a retardation effect varying as a function of location can be used to compensate undesired fluctuations in the polarization state over the cross section of an input radiation beam and/or to set specific output polarization states, for example in order to set radial or tangential polarization.

摘要翻译： 用于将从延迟装置的输入侧入射的输入辐射束转换成输出辐射束的延迟装置，该输出辐射束在其横截面上具有可被延迟装置影响的极化状态的空间分布，并且与空间 输入辐射的极化状态的分布被设计为反射延迟布置。 延迟结构的有用的截面具有不同的延迟效果的多个延迟区域。 可以使用具有作为位置的函数而变化的延迟效应的这种反射镜装置来补偿在输入辐射束的横截面上的偏振状态的不期望的波动和/或设置特定的输出偏振状态，例如以设定 径向或切向极化。

公开(公告)号：US08736849B2

公开(公告)日：2014-05-27

申请号：US13062566

申请日：2009-09-18

申请人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

发明人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

IPC分类号： G01N21/00 ,  G01B11/14 ,  G03B27/42

CPC分类号： G03F1/84 ,  G03F7/70141

摘要： The invention relates to a method for measuring structures on masks (1) for photolithography, wherein firstly the mask (1) is mounted on a spatially movable platform (2). The position of the platform (2) is controlled in this case. The structure on the mask (1) is illuminated with illumination light from an illumination light source which emits coherent light. The light coming from the mask (1) is imaged onto a detection device (6) by an imaging optical unit (4) and detected. The detected signals are evaluated in an evaluation device (7) and the positions and dimensions of the structures are determined. The invention also relates to an apparatus by which these method steps, in particular, can be carried out. In this case, the accuracy of the position and dimension determination is increased by the properties of the illumination light being coordinated with the structure to be measured. For this purpose, the illumination device (3, 3′) has setting means for coordinating the properties of the illumination light with the structure to be measured.

摘要翻译： 本发明涉及一种用于测量用于光刻的掩模（1）上的结构的方法，其中首先将掩模（1）安装在空间上可移动的平台（2）上。 在这种情况下，控制平台（2）的位置。 掩模（1）上的结构被来自发出相干光的照明光源的照明光照射。 来自掩模（1）的光通过成像光学单元（4）成像到检测装置（6）上并进行检测。 在评估装置（7）中评估检测到的信号，并确定结构的位置和尺寸。 本发明还涉及一种可以进行这些方法步骤的装置。 在这种情况下，通过与要测量的结构协调的照明光的特性来增加位置和尺寸确定的精度。 为此，照明装置（3,3'）具有用于使照明光的特性与被测量结构协调的设定装置。

公开(公告)号：US08593618B2

公开(公告)日：2013-11-26

申请号：US12971798

申请日：2010-12-17

申请人： Michael Totzeck

发明人： Michael Totzeck

IPC分类号： G03B27/54 ,  G02B5/30 ,  G03F7/20

CPC分类号： G03F7/70191 ,  G02B27/642 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70341 ,  G03F7/70566

摘要： The disclosure relates to an optical system of a microlithographic projection exposure apparatus and to a microlithographic exposure method. An optical system of a microlithographic projection exposure apparatus includes an image rotator, which is arranged in the optical system such that light impinging on the image rotator is at least partially polarized. The image rotator rotates, for light impinging on the image rotator, both the intensity distribution and the polarization distribution of through a given angle of rotation.

摘要翻译： 本公开涉及微光刻投影曝光装置的光学系统和微光刻曝光方法。 微光刻投影曝光装置的光学系统包括图像旋转器，其被布置在光学系统中，使得入射到图像旋转器上的光至少部分地偏振。 图像旋转器旋转，用于光照射在图像旋转器上，通过给定的旋转角度的强度分布和偏振分布。

公开(公告)号：US08169595B2

公开(公告)日：2012-05-01

申请号：US12357126

申请日：2009-01-21

申请人： Martin Schriever ,  Ulrich Wegmann ,  Stefan Hembacher ,  Bernhard Geuppert ,  Juergen Huber ,  Norbert Kerwien ,  Michael Totzeck ,  Markus Hauf

发明人： Martin Schriever ,  Ulrich Wegmann ,  Stefan Hembacher ,  Bernhard Geuppert ,  Juergen Huber ,  Norbert Kerwien ,  Michael Totzeck ,  Markus Hauf

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70825 ,  G03F7/70041 ,  G03F7/70266

摘要： The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a projection objective, and to a method for modifying the imaging behavior of such an apparatus, such as in a projection exposure machine.

摘要翻译： 本发明涉及一种光学装置，其包括以具有脉冲频率的光脉冲形式发光的光源，并且包括至少一个光学元件。 本公开还涉及包括脉冲光源和投影物镜的投影曝光机，以及用于修改诸如投影曝光机中的这种装置的成像行为的方法。