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51.发明授权公开(公告)号：US08092977B2
公开(公告)日：2012-01-10
申请号：US12043356
申请日：2008-03-06
申请人： Kazuyoshi Mizutani
发明人： Kazuyoshi Mizutani
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392
摘要： A positive resist composition, includes: (A) a resin having a repeating unit represented by formula (A) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (A) in an alkali developer; and a pattern forming method uses the composition.
摘要翻译： 正型抗蚀剂组合物包括：（A）具有本说明书中定义的由式（A）表示的重复单元的树脂，其在酸的作用下分解，以增加树脂（A）在碱显影剂中的溶解度 ; 并且图案形成方法使用该组合物。
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公开(公告)号：US08084187B2
公开(公告)日：2011-12-27
申请号：US12410829
申请日：2009-03-25
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/113 , Y10S430/114
摘要： Provided is a resist composition including a compound having a molecular weight of 1,000 or less and containing at least one sulfonamide group (—SO2NH—).
摘要翻译： 提供了含有分子量为1000以下且含有至少一个磺酰胺基（-SO 2 NH-）的化合物的抗蚀剂组合物。
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53.发明授权公开(公告)号：US07887988B2
公开(公告)日：2011-02-15
申请号：US11717645
申请日：2007-03-14
CPC分类号： G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.
摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能产生酸的化合物：其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。
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54.发明申请PATTERN FORMING METHOD, RESIST COMPOSITION TO BE USED IN THE PATTERN FORMING METHOD, NEGATIVE DEVELOPING SOLUTION TO BE USED IN THE PATTERN FORMING METHOD AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT TO BE USED IN THE PATTERN FORMING METHOD 有权图案形成方法，用于图案形成方法的抗蚀组合物，用于图案形成方法的阴极开发解决方案和用于图案形成方法的负面开发的冲洗解决方案公开(公告)号：US20090011366A1
公开(公告)日：2009-01-08
申请号：US12145151
申请日：2008-06-24
CPC分类号： G03F7/0397 , G03F7/325 , Y10S430/106 , Y10S430/111
摘要： A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.
摘要翻译： 图案形成方法包括：（a）用包含由以下通式（NGH-1）表示的重复单元的树脂的抗蚀剂组合物涂布基材，并且通过酸的作用增加极性，并降低 在负显影液中的溶解度; （b）曝光; 和（d）用负显影液显影：其中RNGH1表示氢原子或烷基; 并且RNGH 2至RNGH 4各自独立地表示氢原子或羟基，条件是RNGH 2至RNGH 4中的至少一个表示羟基。
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55.发明申请公开(公告)号：US20080050675A1
公开(公告)日：2008-02-28
申请号：US11844591
申请日：2007-08-24
IPC分类号： G03C1/00
CPC分类号： G03F7/0048 , G03F7/0046 , G03F7/0392
摘要： A positive resist composition comprising: (A) a resin having a repeating unit represented by a specific formula (I) and a repeating unit represented by a specific formula (A1); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (F) a surfactant represented by a specific formula (II); and a pattern forming method using the same.
摘要翻译： 正型抗蚀剂组合物，其包含：（A）具有由特定式（I）表示的重复单元的树脂和由特定式（A1）表示的重复单元; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（F）由特定式（II）表示的表面活性剂; 以及使用该图案形成方法的图案形成方法。
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公开(公告)号：US20070224539A1
公开(公告)日：2007-09-27
申请号：US11727002
申请日：2007-03-23
IPC分类号： G03C1/00
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0382
摘要： A resist composition comprising at least one kind of a nitrogen-containing compound selected from the group consisting of an amine compound having a phenoxy group, an ammonium salt compound having a phenoxy group, an amine compound having a sulfonic acid ester group and an ammonium salt compound having a sulfonic acid ester group; and a pattern forming method using the composition.
摘要翻译： 一种抗蚀剂组合物，其包含至少一种选自具有苯氧基的胺化合物，具有苯氧基的铵盐化合物，具有磺酸酯基的胺化合物和铵盐的含氮化合物 具有磺酸酯基的化合物; 以及使用该组合物的图案形成方法。
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57.发明授权公开(公告)号：US07157208B2
公开(公告)日：2007-01-02
申请号：US11060533
申请日：2005-02-18
申请人： Tomoya Sasaki , Kazuyoshi Mizutani
发明人： Tomoya Sasaki , Kazuyoshi Mizutani
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition satisfying all of high sensitivity, high resolution, good pattern profile, good line edge roughness and good in-vacuum PED characteristics, is provided, the positive resist composition comprising: (A) a resin containing a repeating unit having a specific styrene skeleton, which is insoluble or hardly soluble in an alkali developer and becomes soluble in an alkali developer under the action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and (C) an organic basic compound, and a pattern formation method using the positive resist composition.
摘要翻译： 提供满足高灵敏度，高分辨率，良好图案轮廓，良好的线边缘粗糙度和良好的真空PED特性的正性抗蚀剂组合物，正型抗蚀剂组合物包含：（A）含有具有特定 苯乙烯骨架，其在碱性显影剂中不溶或难溶，并在酸的作用下变得可溶于碱显影剂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; 和（C）有机碱性化合物，以及使用正性抗蚀剂组合物的图案形成方法。
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58.发明授权公开(公告)号：US07147987B2
公开(公告)日：2006-12-12
申请号：US10911510
申请日：2004-08-05
申请人： Kazuyoshi Mizutani
发明人： Kazuyoshi Mizutani
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/108
摘要： A positive resist composition comprising (A) a compound that generates an acid upon irradiation of an actinic ray or radiation and (B) a resin having a property of increasing solubility in an alkali developing solution by the action of an acid and including a repeating unit containing a partial structure represented by formula (X) defined in the specification and a repeating unit represented by formula (Y) defined in the specification.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）在光化学射线或辐射照射时产生酸的化合物和（B）具有通过酸作用增加在碱性显影液中的溶解性的性质的树脂，并且包括重复单元 含有由说明书中定义的式（X）表示的部分结构和由说明书中定义的式（Y）表示的重复单元。
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59.发明申请公开(公告)号：US20050069808A1
公开(公告)日：2005-03-31
申请号：US10911510
申请日：2004-08-05
申请人： Kazuyoshi Mizutani
发明人： Kazuyoshi Mizutani
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03C1/76
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/108
摘要： A positive resist composition comprising (A) a compound that generates an acid upon irradiation of an actinic ray or radiation and (B) a resin having a property of increasing solubility in an alkali developing solution by the action of an acid and including a repeating unit containing a partial structure represented by formula (X) defined in the specification and a repeating unit represented by formula (Y) defined in the specification.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）在光化学射线或辐射照射时产生酸的化合物和（B）具有通过酸作用增加在碱性显影液中的溶解性的性质的树脂，并且包括重复单元 含有由说明书中定义的式（X）表示的部分结构和由说明书中定义的式（Y）表示的重复单元。
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60.发明授权Positive resist composition to be irradiated with one of an electron beam and X-ray 有权要用电子束和X射线之一照射正电子抗蚀剂组合物公开(公告)号：US06727040B2
公开(公告)日：2004-04-27
申请号：US10024358
申请日：2001-12-21
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/115 , Y10S430/143 , Y10S430/167
摘要： A positive resist composition to be irradiated with one of an electron beam and X-ray, comprises: (a) a compound capable of generating an acid upon irradiation with one of electron beam and X-ray; (b1) a resin: increasing the solubility in an alkali developer by the action of an acid; and having a group capable of leaving by the action of an acid, in which the leaving group includes a residue of a compound, the compound having a smaller ionization potential value than p-ethylphenol; and (c) a solvent.
摘要翻译： 用电子束和X射线之一照射的正性抗蚀剂组合物包括：（a）在用电子束和X射线之一照射时能够产生酸的化合物; （b1）树脂：通过酸的作用增加在碱性显影剂中的溶解度; 并且具有能够通过酸的作用离开的基团，其中离去基团包括化合物的残基，具有比对乙基苯酚更小的电离电位值的化合物; 和（c）溶剂。
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