公开(公告)号：US09494856B1

公开(公告)日：2016-11-15

申请号：US13154483

申请日：2011-06-07

申请人： Wei Fang ,  Jack Jau

发明人： Wei Fang ,  Jack Jau

IPC分类号： G03F1/84 ,  H05K1/00 ,  G03F1/00 ,  G06T7/00 ,  G01N21/956

CPC分类号： G03F1/84 ,  G01N21/9501 ,  G01N21/95607 ,  G01N23/2251 ,  G03F1/144 ,  G03F1/86 ,  G03F7/7065 ,  G06T7/0004 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/30141 ,  G06T2207/30148 ,  H05K1/00

摘要： A method and system for inspecting defects saves scanned raw data as an original image so as to save time for repeated scanning and achieve faster defect inspection and lower false rate by reviewing suspicious defects and other regions of interest in the original image by using the same or different image-processing algorithm with the same or different parameters.

摘要翻译： 用于检查缺陷的方法和系统将扫描的原始数据保存为原始图像，从而节省重复扫描的时间，并通过使用相同的方式检查原始图像中的可疑缺陷和其他感兴趣的区域，从而实现更快的缺陷检查和降低错误率 不同的图像处理算法具有相同或不同的参数。

公开(公告)号：US09411244B2

公开(公告)日：2016-08-09

申请号：US14107819

申请日：2013-12-16

申请人： ASML HOLDING N.V.

发明人： Lev Ryzhikov ,  Yuli Vladimirsky ,  James H. Walsh

IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B15/14 ,  G03F7/20 ,  G02B13/04 ,  G02B13/18 ,  G03F1/84 ,  G01N21/94

CPC分类号： G03F7/7015 ,  G01N21/94 ,  G02B13/04 ,  G02B13/18 ,  G03F1/84 ,  G03F7/7085 ,  G03F7/70908

摘要： Systems and methods for inspection are provided utilizing a wide angle optical system. The optical system includes a wide angle input lens group and an output lens group. The wide angle input lens group is configured to receive wide-angle radiation, e.g., having an angular spread of 60 degrees or more, from an object surface, and produce imageable radiation. The wide angle input lens group is arranged such that no intermediate focused image is formed within or after the wide angle input lens group. The output lens group is configured to receive the imageable radiation from the wide angle input lens group and focus the imageable radiation onto an image plane to image at least part of the object surface. A detector receives the image of the at least part of the object surface and, based on the received image, detects, for example, contamination on the object surface.

摘要翻译： 使用广角光学系统来提供用于检查的系统和方法。 光学系统包括广角输入透镜组和输出透镜组。 广角输入透镜组被配置为从物体表面接收例如具有60度或更大角度扩展的广角辐射，并且产生可成像的辐射。 广角输入透镜组被布置成使得在广角输入透镜组之内或之后不形成中间聚焦图像。 输出透镜组被配置为从广角输入透镜组接收可成像的辐射，并将可成像的辐射聚焦到图像平面上以对物体表面的至少一部分进行成像。 检测器接收对象表面的至少一部分的图像，并且基于接收到的图像来检测例如物体表面上的污染物。

公开(公告)号：US09400424B2

公开(公告)日：2016-07-26

申请号：US14688141

申请日：2015-04-16

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Fu-Sheng Chu ,  Yuan-Chih Chu

IPC分类号： G03F1/72 ,  G03F1/84 ,  G03F7/20 ,  G01N21/956

CPC分类号： G03F1/72 ,  G01N21/956 ,  G01N21/95607 ,  G03F1/84 ,  G03F7/2002

摘要： The present disclosure provides a method of repairing a mask. The method includes inspecting the mask using a mask inspection tool to identify a defect on a circuit pattern of the mask; repairing the defect using a mask repair tool to form a repaired pattern; forming a first group of diffraction images of the repaired pattern and a second group of diffraction images of a reference feature; and validating the mask by comparing the first group of diffraction images with the second group of diffraction images.

摘要翻译： 本公开提供了修复掩模的方法。 该方法包括使用掩模检查工具检查掩模以识别掩模的电路图案上的缺陷; 使用掩模修复工具修复缺陷以形成修复的图案; 形成修复图案的第一组衍射图像和参考特征的第二组衍射图像; 以及通过将第一组衍射图像与第二组衍射图像进行比较来验证掩模。

公开(公告)号：US20160203595A1

公开(公告)日：2016-07-14

申请号：US14987951

申请日：2016-01-05

申请人： NuFlare Technology, Inc.

发明人： Hideo Tsuchiya ,  Nobutaka Kikuiri

IPC分类号： G06T7/00 ,  G06K9/62 ,  H04N5/225

CPC分类号： G06T7/0004 ,  G01R31/311 ,  G03F1/84 ,  G06K9/6201 ,  G06T7/0006 ,  G06T2207/10016 ,  G06T2207/30148 ,  H04N5/2256

摘要： An inspection apparatus includes a lighting unit, an imaging unit, an optical image comparison unit, a map creation unit, a map storage unit, a first storage unit, a map comparison unit, and a first determination unit. The lighting unit irradiates a sample including a defect to be inspected with a lighting light. The imaging unit obtains either or both of a first optical image formed by the lighting light transmitted through the sample to be inspected and a second optical image formed by the lighting light reflected by the sample to be inspected and obtains either or both of a third optical image formed by the lighting light transmitted through the sample to be inspected and having a corrected defect and a fourth optical image formed by the lighting light reflected by the sample to be inspected and having a corrected defect. The optical image comparison unit performs either or both of a first comparison between a first reference image referenced from an optical image formed by the lighting light transmitted through the sample to be inspected and the first optical image and a second comparison between a second reference image referenced from an optical image formed by the lighting light reflected by the sample to be inspected and the second optical image and performs either or both of a third comparison between the first reference image and the third optical image and a fourth comparison between the second reference image and the fourth optical image. The map creation unit creates either or both of a first map of the sample to be inspected based on the first comparison and a second map of the sample to be inspected based on the second comparison and creates either or both of a third map of the sample to be inspected based on the third comparison and a fourth map of the sample to be inspected based on the fourth comparison. The map storage unit stores either or both of the first map and the second map. The first storage unit stores defect correction method information on the defect. The map comparison unit performs either or both of a fifth comparison between the first map and the third map based on the defect correction method information and a sixth comparison between the second map and the fourth map based on the defect correction method information. The first determination unit determines, based on the defect correction method information and either or both of the fifth comparison and the sixth comparison, whether the correction is appropriate.

公开(公告)号：US09354164B2

公开(公告)日：2016-05-31

申请号：US14268768

申请日：2014-05-02

申请人： Sony Corporation

发明人： Hiroaki Yamana ,  Masanao Kamata

IPC分类号： G01N21/31 ,  G01N21/3581 ,  G01N21/3586 ,  G03F1/84 ,  G01B9/04 ,  G01J3/42

CPC分类号： G01N21/3581 ,  G01B9/04 ,  G01J3/42 ,  G01N21/3586 ,  G03F1/84

摘要： There is provided an optical system, including: an extracting section, the refractive index of the extracting section being approximately the same as the refractive index of an observed object, the extracting section being optically coupled with the observed object to thereby extract a terahertz electromagnetic wave generated from the observed object; and an ellipsoidal reflector surface having a first focal point and a second focal point, the observed object being to be arranged on the first focal point, a photoconductive device being on the second focal point, the photoconductive device being configured to detect the terahertz electromagnetic wave extracted by the extracting section, the ellipsoidal reflector surface guiding the extracted terahertz electromagnetic wave to the photoconductive device.

摘要翻译： 提供了一种光学系统，包括：提取部分，提取部分的折射率与观察对象的折射率大致相同，提取部分与观察对象光学耦合，从而提取太赫兹电磁波 从观察对象产生; 以及具有第一焦点和第二焦点的椭圆面反射器表面，所述被观察物体将被布置在所述第一焦点上，所述光电导装置在所述第二焦点上，所述光电导装置被配置为检测所述太赫兹电磁波 由提取部提取的椭圆反射器表面将提取的太赫兹电磁波引导到光电导装置。

公开(公告)号：US09335279B2

公开(公告)日：2016-05-10

申请号：US13450724

申请日：2012-04-19

申请人： Gildardo Delgado

发明人： Gildardo Delgado

IPC分类号： B08B9/00 ,  G01N21/956 ,  B08B7/00 ,  G03F1/82 ,  G03F1/84 ,  G03F7/20 ,  G01N21/94

CPC分类号： G01N21/956 ,  B08B7/0035 ,  B08B7/005 ,  B08B7/0057 ,  G01N21/94 ,  G03F1/82 ,  G03F1/84 ,  G03F7/70908

摘要： A method and apparatus for preventing or minimizing contamination on a critical surface is disclosed. The method and apparatus for preventing or minimizing contamination on the critical surface may be an integrated component of an inspection system, and the cleaning process may be applied prior to the inspection process (may be referred to as pre-cleaning) which may greatly reduce photon-induced contamination. In addition, the cleaning process in accordance with the present disclosure may also be applied upon completion of the inspection process (may be referred to as post-cleaning).

摘要翻译： 公开了一种用于防止或最小化临界表面污染的方法和装置。 用于防止或最小化临界表面上的污染物的方法和装置可以是检查系统的集成部件，并且清洁过程可以在检查过程（可以被称为预清洁）之前应用，这可以大大减少光子 引起的污染。 此外，根据本公开的清洁处理也可以在完成检查过程（可以称为后清洗）时应用。

公开(公告)号：US20160093040A1

公开(公告)日：2016-03-31

申请号：US14890880

申请日：2014-05-14

申请人： KLA-TENCOR CORPORATION

发明人： Weston L. Sousa ,  Yalin Xiong ,  Rui-Fang Shi

IPC分类号： G06T7/00 ,  G01N21/88 ,  G03F1/84

CPC分类号： G01N21/8851 ,  G01N21/94 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/558 ,  G01N2021/8867 ,  G01N2021/95676 ,  G01N2201/12 ,  G03F1/84 ,  G06T7/0004 ,  G06T7/001 ,  G06T7/10 ,  G06T7/136 ,  G06T2207/30148

摘要： Methods and systems for integrated multi-pass reticle inspection are provided. One method for inspecting a reticle includes acquiring at least first, second, and third images for the reticle. The first image is a substantially high resolution image of light transmitted by the reticle. The second image is a substantially high resolution image of light reflected from the reticle. The third image is an image of light transmitted by the reticle that is acquired with a substantially low numerical aperture. The method also includes detecting defects on the reticle using at least the first, second, and third images for the reticle in combination.

摘要翻译： 提供了综合多通道掩模检测的方法和系统。 用于检查掩模版的一种方法包括获取用于掩模版的至少第一，第二和第三图像。 第一个图像是由光罩传输的光的基本上高分辨率的图像。 第二个图像是从掩模版反射的光的基本上高分辨率的图像。 第三图像是由具有基本上低的数值孔径获得的掩模版传输的光的图像。 该方法还包括组合使用至少第一，第二和第三图像来检测掩模版上的缺陷。

公开(公告)号：US09299135B2

公开(公告)日：2016-03-29

申请号：US13795584

申请日：2013-03-12

申请人： APPLIED MATERIALS ISRAEL, LTD.

发明人： Aviram Tam ,  Michael Ben-Yishai ,  Yaron Cohen

IPC分类号： G06K9/00 ,  G06T7/00 ,  G03F1/84

CPC分类号： G06T7/0004 ,  G03F1/84 ,  G06T7/0002 ,  G06T2207/30108 ,  G06T2207/30148 ,  G06T2207/30164

摘要： An inspection system, and a computer program product that stores instructions for: obtaining an aerial image of an area of the mask; wherein the aerial image represents an expected image to be formed on a photoresist of an object during a lithography process that involves illuminating the area of the mask, by a lithography tool; wherein the photoresist has a printability threshold; wherein the lithography process exhibits a process window that introduces allowable changes at pixels of the expected image that do not exceed an intensity threshold; and searching for at least one weak point at the area of the mask, which is either a local extremum point of the aerial image spaced apart from the printability threshold by a distance that does not exceed the intensity threshold or a crossing point of the printability threshold and being of a slope that is below a predefined threshold.

摘要翻译： 一种检查系统和一种计算机程序产品，其存储用于获得面罩区域的空中图像的指令; 其中所述空间图像表示在通过光刻工具照射所述掩模的区域的光刻工艺期间在物体的光致抗蚀剂上形成的预期图像; 其中所述光致抗蚀剂具有可印刷性阈值; 其中所述光刻工艺表现出在所述预期图像的不超过强度阈值的像素处引入允许变化的处理窗口; 并且在掩模的区域处搜索至少一个弱点，该区域是空间图像的与可印刷性阈值间隔距离不超过强度阈值的距离或可印刷性阈值的交叉点的区域极值点 并且处于低于预定阈值的斜率。

公开(公告)号：US20160078609A1

公开(公告)日：2016-03-17

申请号：US14950546

申请日：2015-11-24

申请人： KLA-Tencor Corporation

发明人： Stefan Eyring ,  Oliver Ache ,  Frank Laske

IPC分类号： G06T7/00 ,  G06T7/60 ,  G06T7/20 ,  G06K9/52

CPC分类号： G06T7/001 ,  G03F1/44 ,  G03F1/84 ,  G03F7/70633 ,  G06K9/52 ,  G06T7/248 ,  G06T7/337 ,  G06T7/62 ,  G06T7/74 ,  G06T2207/30148

摘要： A method for correcting optical errors occurring in coordinates of positions of a plurality of targets measured via an imaging system comprising a field of view. The plurality of targets includes a first array of targets and a second array of targets overlapping the first array of targets, and a portion of the plurality of targets are outside of the field of view. The method broadly includes the following steps: a) placing the first array of targets in the field of view of the imaging system; b) measuring coordinates of each target within the first array of targets repeatedly via the imaging system; c) placing the second array of targets in the field of view of the imaging system; d) measuring coordinates of each target within the second array of targets repeatedly via the imaging system; e) determining an alignment function from the measurement results of step b, step d, or steps b and d, the alignment function being a function of coordinates of the field of view of the imaging system and giving an additive correction for optical errors of the coordinates of positions of the plurality of targets measured by the imaging system; f) correcting the coordinates of the positions of the plurality of targets measured by the imaging system by adding the respective value of the alignment function at the field-of-view coordinates at which the coordinates of the position of the respective target were measured; and, g) obtaining a final result for the position of each target of the plurality of targets by averaging over the corrected coordinates found in step f for the respective target at each relative position of the plurality of targets and field of view of the imaging system.

摘要翻译： 一种用于校正通过包括视场的成像系统测量的多个目标的位置坐标发生的光学误差的方法。 所述多个目标包括目标的第一阵列和与所述第一目标阵列重叠的目标的第二阵列，并且所述多个目标的一部分在所述视野外。 该方法广泛地包括以下步骤：a）将第一阵列的目标放置在成像系统的视野内; b）经由成像系统重复地测量第一阵列目标内的每个目标的坐标; c）将所述第二阵列阵列放置在所述成像系统的视野内; d）经由成像系统重复地测量第二阵列内的每个目标的坐标; e）根据步骤b，步骤d或步骤b和d的测量结果确定对准功能，所述对准功能是成像系统的视场坐标的函数，并给出对于所述成像系统的光学误差的附加校正 由成像系统测量的多个目标的位置坐标; f）通过在测量各个目标的位置的坐标的视场坐标附加相应的对准功能的值来校正由成像系统测量的多个目标的位置的坐标; 以及g）通过对所述多个目标的每个相对位置处的各个目标的步骤f中找到的所述校正坐标和所述成像系统的视场进行平均来获得所述多个目标中的每个目标的位置的最终结果 。

公开(公告)号：US20160004153A1

公开(公告)日：2016-01-07

申请号：US14768787

申请日：2014-02-20

申请人： HOYA CORPORATION

发明人： Tsutomu SHOKI ,  Kazuhiro HAMAMOTO ,  Yohei IKEBE

IPC分类号： G03F1/84 ,  G06T7/00 ,  G03F1/24 ,  C23C14/35 ,  C23C14/46

CPC分类号： G03F1/84 ,  C23C14/35 ,  C23C14/46 ,  G03F1/24 ,  G03F1/38 ,  G06T7/0004 ,  G06T2207/30148 ,  G06T2207/30204

摘要： A method of manufacturing a reflective mask blank comprising a multilayer reflective film formed on a substrate so as to reflect EUV light; and a laminated film formed on the multilayer reflective film. The method includes the steps of depositing the multilayer reflective film on the substrate to form a multilayer reflective film formed substrate; carrying out defect inspection for the multilayer reflective film formed substrate; depositing the laminated film on the multilayer reflective film of the multilayer reflective film formed substrate; forming a fiducial mark for an upper portion of the laminated film to thereby form a reflective mask blank comprising the fiducial mark, the fiducial mark serving as a reference for a defect position in defect information; and carrying out defect inspection of the reflective mask blank by using the fiducial mark as a reference.

摘要翻译： 一种制造反射掩模坯料的方法，包括形成在基板上以反射EUV光的多层反射膜; 以及形成在多层反射膜上的层叠膜。 该方法包括以下步骤：将多层反射膜沉积在衬底上以形成多层反射膜形成的衬底; 对多层反射膜形成基板进行缺陷检查; 将层叠膜沉积在多层反射膜形成基板的多层反射膜上; 形成层叠膜的上部的基准标记，从而形成包含基准标记的反射掩模坯料，基准标记作为缺陷信息中缺陷位置的基准; 并通过使用基准标记作为基准进行反射型掩模毛坯的缺陷检查。