公开(公告)号：US20170110290A1

公开(公告)日：2017-04-20

申请号：US15394583

申请日：2016-12-29

Applicant: Applied Materials, Inc.

Inventor： Satoru Kobayashi ,  Soonam Park ,  Dmitry Lubomirsky ,  Hideo Sugai

IPC: H01J37/32 ,  H01J37/244

CPC classification number: H01J37/32229 ,  H01J7/24 ,  H01J19/80 ,  H01J37/244 ,  H01J37/32201 ,  H01J37/32302 ,  H01J37/32311 ,  H01J37/32935 ,  H01J37/3299 ,  H05B41/16

Abstract: A system provides post-match control of microwaves in a radial waveguide. The system includes the radial waveguide, and a signal generator that provides first and second microwave signals that have a common frequency. The signal generator adjusts a phase offset between the first and second signals in response to a correction signal. The system also includes first and second electronics sets, each of which amplifies a respective one of the first and second microwave signals. The system transmits the amplified, first and second microwave signals into the radial waveguide, and matches an impedance of the amplified microwave signals to an impedance presented by the waveguide. The system also includes at least two monitoring antennas disposed within the waveguide. A signal controller receives analog signals from the monitoring antennas, determines the digital correction signal based at least on the analog signals, and transmits the correction signal to the signal generator.

公开(公告)号：US09548187B2

公开(公告)日：2017-01-17

申请号：US14095563

申请日：2013-12-03

Applicant: Tokyo Electron Limited

Inventor： Taro Ikeda ,  Tomohito Komatsu ,  Shigeru Kasai ,  Hiroyuki Miyashita ,  Yuki Osada ,  Akira Tanihara ,  Yutaka Fujino

IPC: H01J37/32

CPC classification number: H01J37/3222 ,  H01J37/32201

Abstract: A microwave radiation antenna includes an antenna body having a microwave radiation surface; a processing gas inlet configured to introduce a processing gas into the antenna body; a gas diffusion space configured to diffuse the processing gas in the antenna body; a plurality of gas outlets provided in the antenna body and configured to discharge the processing gas into the chamber; a plurality of slots provided in the antenna body under a state where the slots are separated from the gas diffusion space and the gas outlets; and an annular dielectric member provided in the microwave radiation surface side of the antenna body to cover a slot formation region where the slots are formed. A metal surface wave is formed in the microwave radiation surface by the microwave radiated through the slots and the annular dielectric member and a surface wave plasma is generated by the metal surface wave.

Abstract translation: 微波辐射天线包括具有微波辐射表面的天线体; 处理气体入口，被配置为将处理气体引入到天线体中; 气体扩散空间，其构造成将所述处理气体扩散到所述天线体中; 多个气体出口，其设置在所述天线体中并且被配置为将所述处理气体排出到所述室中; 在槽与气体扩散空间和气体出口分离的状态下设置在天线体中的多个槽; 以及设置在天线体的微波辐射面侧的环状电介质部件，以覆盖形成槽的槽形成区域。 通过微波辐射通过狭缝和环形电介质构成的微波辐射表面形成金属表面波，并通过金属表面波产生表面波等离子体。

公开(公告)号：US09299538B2

公开(公告)日：2016-03-29

申请号：US14221146

申请日：2014-03-20

Applicant: Applied Materials, Inc.

Inventor： Satoru Kobayashi ,  Soonam Park ,  Dmitry Lubomirsky

IPC: H01J7/24 ,  H01J37/32 ,  H01J37/244

CPC classification number: H01J37/32201 ,  H01J7/24 ,  H01J37/244 ,  H01J37/32229 ,  H01J37/32302 ,  H01J37/32311 ,  H01J37/32935 ,  H01J37/3299

Abstract: A system provides post-match control of microwaves in a radial waveguide. The system includes the radial waveguide, and a signal generator that provides first and second microwave signals that have a common frequency. The signal generator adjusts a phase offset between the first and second signals in response to a correction signal. The system also includes first and second electronics sets, each of which amplifies a respective one of the first and second microwave signals. The system transmits the amplified, first and second microwave signals into the radial waveguide, and matches an impedance of the amplified microwave signals to an impedance presented by the waveguide. The system also includes at least two monitoring antennas disposed within the waveguide. A signal controller receives analog signals from the monitoring antennas, determines the digital correction signal based at least on the analog signals, and transmits the correction signal to the signal generator.

公开(公告)号：US20150270106A1

公开(公告)日：2015-09-24

申请号：US14221146

申请日：2014-03-20

Applicant: Applied Materials, Inc.

Inventor： Satoru Kobayashi ,  Soonam Park ,  Dmitry Lubomirsky

IPC: H01J37/32 ,  H01J37/244

CPC classification number: H01J37/32201 ,  H01J7/24 ,  H01J37/244 ,  H01J37/32229 ,  H01J37/32302 ,  H01J37/32311 ,  H01J37/32935 ,  H01J37/3299

Abstract: A system provides post-match control of microwaves in a radial waveguide. The system includes the radial waveguide, and a signal generator that provides first and second microwave signals that have a common frequency. The signal generator adjusts a phase offset between the first and second signals in response to a correction signal. The system also includes first and second electronics sets, each of which amplifies a respective one of the first and second microwave signals. The system transmits the amplified, first and second microwave signals into the radial waveguide, and matches an impedance of the amplified microwave signals to an impedance presented by the waveguide. The system also includes at least two monitoring antennas disposed within the waveguide. A signal controller receives analog signals from the monitoring antennas, determines the digital correction signal based at least on the analog signals, and transmits the correction signal to the signal generator.

Abstract translation: 系统提供径向波导中微波的后匹配控制。 该系统包括径向波导和提供具有共同频率的第一和第二微波信号的信号发生器。 信号发生器响应于校正信号来调节第一和第二信号之间的相位偏移。 该系统还包括第一和第二电子设备组，每个电子组件放大第一和第二微波信号中相应的一个。 该系统将放大的第一和第二微波信号传输到径向波导中，并将放大的微波信号的阻抗与由波导呈现的阻抗相匹配。 该系统还包括设置在波导内的至少两个监控天线。 信号控制器从监控天线接收模拟信号，至少基于模拟信号确定数字校正信号，并将校正信号发送到信号发生器。

公开(公告)号：US20140299272A1

公开(公告)日：2014-10-09

申请号：US14307741

申请日：2014-06-18

Applicant: TOKYO ELECTRON LIMITED

Inventor： Akihiro TSUJI ,  Song yun KANG

IPC: H01J37/32

CPC classification number: H01J37/32201 ,  H01J37/32229 ,  H01J37/32238 ,  H01J37/32477

Abstract: There is provided a plasma generation device, comprising: a waveguide configured to propagate a microwave; a plasma generation vessel connected to the waveguide; and a dielectric window interposed between the waveguide and the plasma generation vessel to introduce the microwave propagated by the waveguide into the plasma generation vessel. The plasma generation vessel is sphere-shaped and is disposed adjacent to a processing vessel configured to accommodate a substrate, and an interior of the plasma generation vessel is in communication with an interior of the processing vessel.

Abstract translation: 提供了一种等离子体产生装置，包括：波导，被配置为传播微波; 连接到波导的等离子体发生器; 以及介于所述波导和所述等离子体发生容器之间的电介质窗口，以将由所述波导传播的微波引入所述等离子体发生容器。 等离子体发生容器是球形的，并且被设置成与配置成容纳衬底的处理容器相邻，并且等离子体产生容器的内部与处理容器的内部连通。

公开(公告)号：US20140262034A1

公开(公告)日：2014-09-18

申请号：US14349807

申请日：2012-10-03

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kiyotaka Ishibashi ,  Osamu Morita

IPC: H01J37/32

CPC classification number: H01J37/32201 ,  C23C16/45563 ,  C23C16/511 ,  H01J37/321 ,  H01J37/32192 ,  H01J37/3244 ,  H01J37/32495 ,  H05H2001/463

Abstract: This microwave plasma processing apparatus has, as a gas introduction mechanism for introducing a working gas inside a chamber (10), electrical discharge prevention members (96(1) to 96(8)), each of which is provided to a plurality of dielectric window gas passages (94(1) to (94(8)) through which a dielectric window (54) passes. Each electrical discharge prevention member (96(n)), a portion (114) of which protrudes only a height h, which is greater than or equal to a predetermined distance H, upward from the rear surface of a dielectric window (52) on the inlet side, passes through an opening (54a) of a slot plate (54), and inserts into a branched gas supply path (92(n)) of a gas branch part (90). The gas branch part (90), spring coils (116) and the slot plate (54), which surround the protruding portion (114) of each electrical discharge prevention member (96(n)), constitute an enclosing conductor (118).

Abstract translation: 这种微波等离子体处理装置具有作为将室内（10）内的工作气体引入的气体导入机构，设置在多个电介质中的放电防止部件（96（1）〜96（8）） 每个防放电部件（96（n）），其中仅部分高度h的部分（114） 大于或等于预定距离H，从入口侧的电介质窗口（52）的后表面向上延伸通过槽板（54）的开口（54a），并插入分支气体 供给路径（92（n）），气体分支部（90），弹簧线圈（116）和槽板（54），其围绕各放电的突出部（114） 防护构件（96（n））构成封闭导体（118）。

公开(公告)号：US08800483B2

公开(公告)日：2014-08-12

申请号：US12776132

申请日：2010-05-07

Applicant: Peter F. Vandermeulen

Inventor： Peter F. Vandermeulen

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC classification number: H01J37/32229 ,  C23C16/511 ,  C23C16/513 ,  H01J37/05 ,  H01J37/08 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/3244 ,  H01J37/32669 ,  H01J2237/057 ,  H01J2237/0817 ,  H01J2237/3323 ,  H01P3/12 ,  H01P3/127 ,  H01Q21/0043

Abstract: A plasma deposition apparatus includes a waveguide conduit having a plurality of slots therein. The waveguide conduit is coupled to a microwave source for transmitting microwaves from the microwave source through the plurality of slots. One or more pipes have an outlet end positioned at each of the plurality of slots for transporting material from one or more material sources to the plurality of slots. The apparatus also includes a plasma chamber in communication with the waveguide tube through the plurality of slots. The plasma chamber receives through said plurality of slots microwaves from the waveguide tube and material to be melted or evaporated from the one or more pipes. The plasma chamber includes a plurality of magnets disposed in an outer wall of the plasma chamber for forming a magnetic field in the plasma chamber. The plasma chamber further includes one or more outlet openings for discharging plasma containing material to be deposited on a substrate.

Abstract translation: 等离子体沉积设备包括其中具有多个狭槽的波导管道。 波导管道耦合到微波源，用于从微波源通过多个狭槽传送微波。 一个或多个管道具有位于多个狭槽中的每一个的出口端，用于将材料从一个或多个材料源输送到多个狭槽。 该装置还包括通过多个狭槽与波导管连通的等离子体室。 等离子体腔室通过所述多个槽从波导管接收微波，并且从一个或多个管道熔化或蒸发的材料。 等离子体室包括设置在等离子体室的外壁中的多个磁体，用于在等离子体室中形成磁场。 等离子体室还包括一个或多个出口开口，用于排放待沉积在衬底上的等离子体材料。

公开(公告)号：US20120247676A1

公开(公告)日：2012-10-04

申请号：US13425872

申请日：2012-03-21

Applicant: Yutaka FUJINO ,  Atsushi UEDA ,  Shigenori OZAKI ,  Junichi KITAGAWA

Inventor： Yutaka FUJINO ,  Atsushi UEDA ,  Shigenori OZAKI ,  Junichi KITAGAWA

IPC: C23C16/511 ,  H01P3/12 ,  B05C9/00

CPC classification number: H01J37/32201 ,  C23C16/511 ,  H01J37/32211 ,  H01J37/32238 ,  H01J37/32431 ,  H05H1/46 ,  H05H2001/463

Abstract: A plasma processing apparatus includes a microwave introduction device which introduces a microwave into a process chamber. The microwave introduction device includes a plurality of microwave transmitting plates which is fitted into a plurality of openings of a ceiling. The microwave transmitting plates are arranged on one virtual plane parallel to a mounting surface of a mounting table, with the microwave transmitting plates fitted into the respective openings. The microwave transmitting plates includes first to third microwave transmitting plates. The first to third microwave transmitting plates are arranged in such a manner that a distance between the center point of the first microwave transmitting window and the center point of the second microwave transmitting window becomes equal or approximately equal to a distance between the center point of the first microwave transmitting window and the center point of the third microwave transmitting window.

Abstract translation: 等离子体处理装置包括将微波引入处理室的微波引入装置。 微波引入装置包括多个安装在天花板的多个开口中的微波透射板。 微波传输板布置在平行于安装台的安装表面的一个虚拟平面上，其中微波传输板安装在相应的开口中。 微波透射板包括第一至第三微波透射板。 第一至第三微波透射板以这样的方式布置，使得第一微波透射窗口的中心点与第二微波透射窗口的中心点之间的距离变为等于或近似等于第二微波透射窗口的中心点之间的距离 第一微波发射窗口和第三微波发射窗口的中心点。

公开(公告)号：US07915827B2

公开(公告)日：2011-03-29

申请号：US12044625

申请日：2008-03-07

Applicant: Shigeru Kasai ,  Yuki Osada

Inventor： Shigeru Kasai ,  Yuki Osada

IPC: H01J25/50

CPC classification number: H05B6/666 ,  H01J37/32192 ,  H01J37/32201 ,  H05B6/806 ,  H05B2206/043

Abstract: A microwave generation device includes: a magnetron having a cathode containing a filament and an anode containing a hollow resonator arranged to oppose to each other; a filament current measuring unit; and an application voltage measuring unit for measuring voltage applied to the filament. Based on the current and the voltage obtained by the current measuring unit and the voltage measuring unit, a resistance value calculation unit obtains a resistance value of the filament. A temperature calculation unit calculates the filament temperature from the resistance value and the resistance-temperature dependent characteristic. A filament power source is controlled by a power control unit so that the filament temperature is within a predetermined temperature range.

Abstract translation: 微波发生装置包括：具有包含灯丝的阴极的磁控管和包含彼此相对的中空谐振器的阳极; 灯丝电流测量单元; 以及用于测量施加到灯丝​​上的电压的施加电压测量单元。 基于由电流测量单元和电压测量单元获得的电流和电压，电阻值计算单元获得灯丝的电阻值。 温度计算单元根据电阻值和电阻温度依赖特性来计算灯丝温度。 灯丝电源由功率控制单元控制，使得灯丝温度在预定的温度范围内。

公开(公告)号：US20110005461A1

公开(公告)日：2011-01-13

申请号：US12776132

申请日：2010-05-07

Applicant: Peter F. Vandermeulen

Inventor： Peter F. Vandermeulen

IPC: C23C16/511 ,  B01D59/44 ,  H05H1/46

CPC classification number: H01J37/32229 ,  C23C16/511 ,  C23C16/513 ,  H01J37/05 ,  H01J37/08 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/3244 ,  H01J37/32669 ,  H01J2237/057 ,  H01J2237/0817 ,  H01J2237/3323 ,  H01P3/12 ,  H01P3/127 ,  H01Q21/0043

Abstract: A plasma deposition apparatus includes a waveguide conduit having a plurality of slots therein. The waveguide conduit is coupled to a microwave source for transmitting microwaves from the microwave source through the plurality of slots. One or more pipes have an outlet end positioned at each of the plurality of slots for transporting material from one or more material sources to the plurality of slots. The apparatus also includes a plasma chamber in communication with the waveguide tube through the plurality of slots. The plasma chamber receives through said plurality of slots microwaves from the waveguide tube and material to be melted or evaporated from the one or more pipes. The plasma chamber includes a plurality of magnets disposed in an outer wall of the plasma chamber for forming a magnetic field in the plasma chamber. The plasma chamber further includes one or more outlet openings for discharging plasma containing material to be deposited on a substrate.

Abstract translation: 等离子体沉积设备包括其中具有多个狭槽的波导管道。 波导管道耦合到微波源，用于从微波源通过多个狭槽传送微波。 一个或多个管道具有位于多个狭槽中的每一个的出口端，用于将材料从一个或多个材料源输送到多个狭槽。 该装置还包括通过多个狭槽与波导管连通的等离子体室。 等离子体腔室通过所述多个槽从波导管接收微波，并且从一个或多个管道熔化或蒸发的材料。 等离子体室包括设置在等离子体室的外壁中的多个磁体，用于在等离子体室中形成磁场。 等离子体室还包括一个或多个出口开口，用于排放待沉积在衬底上的等离子体材料。