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公开(公告)号：US20210066880A1
公开(公告)日：2021-03-04
申请号：US16962434
申请日：2018-12-17
申请人： Cymer, LLC
摘要： Disclosed is a laser discharge chamber in which useful lifetime is extended by local electrical tuning using one or a combination of design of the chamber internal geometry, placement and distribution of components within the chamber such as electrodes, current returns, and capacitors, and selective electrical isolation of portions of the components
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公开(公告)号：US20210018846A1
公开(公告)日：2021-01-21
申请号：US16980467
申请日：2019-03-01
申请人： Cymer, LLC
摘要： A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.
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公开(公告)号：US20210011302A1
公开(公告)日：2021-01-14
申请号：US17034132
申请日：2020-09-28
申请人： Cymer, LLC
发明人： Eric Anders Mason
IPC分类号： G02B27/42 , G01J3/06 , G01J3/14 , G01J3/18 , G03F7/20 , H01S3/08 , G02B26/00 , H01L21/027 , H01S3/00 , H01S3/23
摘要： A spectral feature selection apparatus includes a dispersive optical element arranged to interact with a pulsed light beam; three or more refractive optical elements arranged in a path of the pulsed light beam between the dispersive optical element and a pulsed optical source; and one or more actuation systems, each actuation system associated with a refractive optical element and configured to rotate the associated refractive optical element to thereby adjust a spectral feature of the pulsed light beam. At least one of the actuation systems is a rapid actuation system that includes a rapid actuator configured to rotate its associated refractive optical element about a rotation axis. The rapid actuator includes a rotary stepper motor having a rotation shaft that rotates about a shaft axis that is parallel with the rotation axis of the associated refractive optical element.
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公开(公告)号：US20200328074A1
公开(公告)日：2020-10-15
申请号：US16955952
申请日：2018-12-14
申请人： Cymer, LLC
发明人： Leyla Ramin
IPC分类号： H01J61/073 , H01J61/16 , H01S3/038 , H01S3/225 , H01J9/14
摘要： A discharge chamber for a deep ultraviolet (DUV) light source includes a housing; and a first electrode and a second electrode in the housing, the first electrode and the second electrode being separated from each other to form a discharge region between the first electrode and the second electrode, the discharge region being configured to receive a gain medium including at least one noble gas and a halogen gas. At least one of the first electrode and the second electrode includes a metal alloy including more than 33% and less than 50% zinc by weight.
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公开(公告)号：US20200321746A1
公开(公告)日：2020-10-08
申请号：US16910846
申请日：2020-06-24
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US20190324286A1
公开(公告)日：2019-10-24
申请号：US16503073
申请日：2019-07-03
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC分类号： G02B27/48 , G01J3/02 , H01S3/225 , H01S3/00 , G03F7/20 , H01S4/00 , G01J11/00 , G01J9/02 , G01J3/26 , G02F1/01
摘要： A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US20190310558A1
公开(公告)日：2019-10-10
申请号：US16439893
申请日：2019-06-13
申请人： Cymer, LLC
摘要： Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.
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公开(公告)号：US10345714B2
公开(公告)日：2019-07-09
申请号：US15619900
申请日：2017-06-12
申请人： Cymer, LLC
摘要： Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.
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公开(公告)号：US20190170635A1
公开(公告)日：2019-06-06
申请号：US16266501
申请日：2019-02-04
申请人： Cymer, LLC
摘要： Disclosed is an apparatus for and method of measuring the concentration of F2 in the laser gas used in an excimer laser. Quartz Enhanced Photoacoustic Spectroscopy is used to obtain a direct measurement of F2 concentration quickly and using only a small sample volume.
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公开(公告)号：US10234769B2
公开(公告)日：2019-03-19
申请号：US15602028
申请日：2017-05-22
申请人： Cymer, LLC
摘要： An optical lithography system is monitored. Information is received from the optical lithography system; a rule is accessed, the rule being associated with one or more of an event in the optical lithography system and an amount of time; a module stored in a library of modules is identified based on the accessed rule; whether a particular condition exists in the optical lithography system is determined using the identified module and the information received from the optical lithography system; and if the particular condition exists, a command signal is generated based on one or more characteristics of the particular condition and provided to an optical source of the optical lithography system. The command signal is based on the determined particular condition, and the command signal is sufficient to change one or more operating parameters of the optical source.
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