公开(公告)号：US20100008563A1

公开(公告)日：2010-01-14

申请号：US12380432

申请日：2009-02-27

申请人： Toshiaki Fujii ,  Junichi Tashiro ,  Mike Hassel-Shearer

发明人： Toshiaki Fujii ,  Junichi Tashiro ,  Mike Hassel-Shearer

IPC分类号： G06T7/00

CPC分类号： H01J37/28 ,  H01J37/3056 ,  H01J37/31 ,  H01J2237/28 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01L21/67282 ,  H01L23/544 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

摘要： a section processing method of the invention is the section processing method including a mark portion forming step of forming a mark portion capable of being processed by the removal processing and capable of identifying a mark shape in the section for observation within a range of capable of forming the section for observation at a vicinity of the observation target section, a section forming step of forming the section for observation by subjecting the sample and the mark portion to the removal processing within a range of including the mark portion formed by the mark portion forming step, and an observation image acquiring step of acquiring an observation image of the section for observation in the midst of being formed or after having been formed by the section forming step.

摘要翻译： 本发明的截面处理方法是包括标记部形成步骤的部分处理方法，该标记部分形成步骤形成能够通过去除处理加工的标记部分，并且能够在能够形成的范围内的用于观察的部分中识别标记形状 用于在观察对象部分附近观察的部分，在包括由标记部分形成步骤形成的标记部分的范围内通过使样品和标记部分进行去除处理来形成用于观察的部分的部分形成步骤 以及观察图像获取步骤，获取在形成步骤中形成之后或在通过区段形成步骤形成之后的观察部分的观察图像。

公开(公告)号：US20060157341A1

公开(公告)日：2006-07-20

申请号：US10563515

申请日：2004-07-05

申请人： Toshiaki Fujii

发明人： Toshiaki Fujii

IPC分类号： C23C14/00

CPC分类号： H01J37/3005 ,  G01N1/32 ,  H01J37/304 ,  H01J37/3053 ,  H01J37/3056 ,  H01J2237/31745 ,  Y10T436/25

摘要： At the same time as making a lamina by performing a sputtering etching working of a 1st focused ion beam 101, a scanning ion microscope observation is made by performing an irradiation of a 2nd focused ion beam 102 from a direction parallel to a side wall of the lamina, thereby measuring a thickness of the lamina. And, the working by the focused ion beam is finished by confirming the fact that the thickness of the lamina has become a predetermined thickness.

摘要翻译： 在通过对第一聚焦离子束101进行溅射蚀刻加工来制造薄片的同时，通过从平行于所述第一聚焦离子束101的侧壁的方向进行第二聚焦离子束102的照射来进行扫描离子显微镜观察 从而测量层的厚度。 并且，通过确认薄片的厚度已经变成预定厚度的事实来完成聚焦离子束的加工。

公开(公告)号：US07029518B2

公开(公告)日：2006-04-18

申请号：US11079252

申请日：2005-03-15

申请人： Toshiaki Fujii ,  Tsukuru Suzuki ,  Hidetomo Suzuki ,  Kazuhiko Sakamoto

发明人： Toshiaki Fujii ,  Tsukuru Suzuki ,  Hidetomo Suzuki ,  Kazuhiko Sakamoto

IPC分类号： B01D53/04

CPC分类号： B01D46/12 ,  B01D53/04 ,  B01D53/0407 ,  B01D53/0462 ,  B01D53/047 ,  B01D53/26 ,  B01D2253/10 ,  B01D2253/102 ,  B01D2253/106 ,  B01D2253/108 ,  B01D2256/10 ,  B01D2257/11 ,  B01D2257/702 ,  B01D2257/80 ,  B01D2258/0216 ,  B01D2259/40083 ,  B01D2267/40 ,  B01D2279/51 ,  F24F3/1411 ,  F24F3/161 ,  F24F2003/144 ,  F24F2003/1625

摘要： A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.

摘要翻译： 防止基板或基板表面污染的方法和装置，特别涉及防止在诸如生产中的高科技工业中的原材料，半成品，产品的基材和基板表面的污染 的半导体和液晶。 与基材或基材接触的气体通过除尘装置和吸附和/或吸收装置进行净化，使得气体中的微粒浓度低于1000，非甲烷烃浓度低于0.2ppm。 此后，将基材或基板表面暴露于该气体。

公开(公告)号：US07020152B1

公开(公告)日：2006-03-28

申请号：US09830382

申请日：1999-11-02

申请人： Toshio Doi ,  Masashi Muramatsu ,  Hiroshi Matsumura ,  Toshiaki Fujii

发明人： Toshio Doi ,  Masashi Muramatsu ,  Hiroshi Matsumura ,  Toshiaki Fujii

IPC分类号： H04L12/28

CPC分类号： H04L12/28

摘要： A network system has a first LAN, a second LAN, and a storage device for storing data accessible from the first LAN and the second LAN. A control apparatus controls accessibility of the data stored in the storage device from the first LAN and the second LAN. The control apparatus includes an access prevention device for preventing access from the first LAN to the second LAN and from the second LAN to the first LAN and a device for overriding a setting of the access prevention device to allow accessibility of the second LAN from the first LAN.

摘要翻译： 网络系统具有第一LAN，第二LAN和用于存储从第一LAN和第二LAN可访问的数据的存储设备。 控制装置控制从第一LAN和第二LAN存储在存储装置中的数据的可访问性。 该控制装置包括用于防止从第一LAN到第二LAN和从第二LAN到第一LAN的访问的访问防止装置，以及用于覆盖访问防止装置的设置的装置，以允许第二LAN从第一LAN 局域网

公开(公告)号：US20050236587A1

公开(公告)日：2005-10-27

申请号：US10520982

申请日：2003-07-09

申请人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fujii ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

发明人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fujii ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

IPC分类号： G01N1/32 ,  G01N1/28 ,  G01N1/34 ,  G21K5/08 ,  H01J37/20 ,  H01J37/30 ,  H01J37/305 ,  H01L21/302 ,  G21K5/10

CPC分类号： H01J37/3056 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

摘要： An apparatus has a holder member (21) which holds a sample (3), and a removing beam source (13) which irradiates an inert ion beam onto a cross section (4) of the sample (3) held by a holder member (21) and removes a fracture layer on the cross section (4). Then, the removing beam source (13) is disposed on the holding end side of the sample (3) with respect to the normal L of the cross section (4) so that the irradiating direction of the inert ion beam is tilted at the tilt angle θ to the normal L with respect to the cross section (4).

摘要翻译： 一种装置具有保持样品（3）的保持器构件（21）和将惰性离子束照射到由保持器构件保持的样品（3）的横截面（4）上的去除束源（13） 21）并且去除横截面（4）上的断裂层。 然后，移除光束源（13）相对于截面（4）的法线L配置在样品（3）的保持端侧，使得惰性离子束的照射方向倾斜 相对于横截面（4）的角度θ相对于法线L。

公开(公告)号：US06934920B2

公开(公告)日：2005-08-23

申请号：US10130880

申请日：2001-10-05

申请人： Toshiaki Fujii ,  Masamichi Oi ,  Atsushi Yamauchi

发明人： Toshiaki Fujii ,  Masamichi Oi ,  Atsushi Yamauchi

IPC分类号： H01L21/66 ,  G06F17/50 ,  G01N21/00 ,  G06K9/00

CPC分类号： H01L22/20 ,  H01J2237/2817 ,  H01L2223/5448

摘要： In a sample analysis method, positional coordinates of reference points on a surface of the sample are measured using a first device. Positional coordinates of an object on the surface of the sample to be analyzed are also measured using the first device. A sample piece containing on a surface thereof a preselected number of the reference points and the object is removed from the sample. The sample piece is then mounted on a second device different from the first device. The positional coordinates of the reference points on the surface of the sample piece are then measured using the second device. The positional coordinates of the object on the surface of the sample piece are then calculated using the positional coordinates of the reference points measured by the second device and the positional coordinates of the object measured by the first device. The object on the surface of the sample piece is then analyzed.

摘要翻译： 在样本分析方法中，使用第一装置测量样品表面上的参考点的位置坐标。 待分析样品表面上的物体的位置坐标也使用第一装置测量。 从样品中除去包含在其表面上的预选数量的参考点和物体的样品片。 然后将样品片安装在与第一装置不同的第二装置上。 然后使用第二装置测量样品片表面上的参考点的位置坐标。 然后使用由第二装置测量的参考点的位置坐标和由第一装置测量的物体的位置坐标来计算样品的表面上的物体的位置坐标。 然后分析样品的表面上的物体。

公开(公告)号：US06870161B2

公开(公告)日：2005-03-22

申请号：US10644696

申请日：2003-08-20

申请人： Tatsuya Adachi ,  Toshiaki Fujii ,  Hiroshi Sawaragi ,  Yasuhiko Sugiyama

发明人： Tatsuya Adachi ,  Toshiaki Fujii ,  Hiroshi Sawaragi ,  Yasuhiko Sugiyama

IPC分类号： G01N1/28 ,  H01J37/20 ,  H01J37/305 ,  G01N1/04 ,  H01J37/26

CPC分类号： G01N1/286 ,  G01N2001/2873 ,  H01J37/20 ,  H01J37/3056 ,  H01J2237/2817 ,  H01J2237/31745

摘要： An apparatus for processing and observing a sample has a sample stage for supporting a sample at a preselected location thereof, a focused ion beam irradiation system for irradiating the sample with a focused ion beam along an optical axis to cut out a portion from the sample, and a side entry stage disposed over the sample stage and extending slantingly with respect to the optical axis of the focused ion beam irradiated by the focused ion beam irradiation system. The side entry stage has a microscope sample holder for picking up the cut-out sample portion directly from the preselected location of the sample and for supporting the sample portion. The microscope sample holder is configured to be removed from the side entry stage while supporting the sample portion and to be connected to an entry stage of a microscope device for observing the sample portion.

摘要翻译： 用于处理和观察样品的装置具有用于在预选位置处支撑样品的样品台，用于沿着光轴照射具有聚焦离子束的样品的聚焦离子束照射系统，以从样品中切出一部分， 以及设置在样品台上并相对于由聚焦离子束照射系统照射的聚焦离子束的光轴倾斜延伸的侧入口台。 侧进入台具有用于从样品的预选位置直接拾取切出的样品部分并用于支撑样品部分的显微镜样品架。 显微镜样品架被配置为在支撑样品部分的同时从侧入口台移除并连接到用于观察样品部分的显微镜装置的入口台。

公开(公告)号：US06620385B2

公开(公告)日：2003-09-16

申请号：US09853762

申请日：2001-05-14

申请人： Toshiaki Fujii

发明人： Toshiaki Fujii

IPC分类号： B01J1908

CPC分类号： B01D53/66 ,  B01D53/007 ,  B01D53/8668 ,  B01D2255/802 ,  B01D2257/106 ,  B01D2258/0216 ,  B01D2259/804

摘要： A method and an apparatus for purifying a gas containing contaminants are disclosed. The gas is irradiated with an ultraviolet ray and/or a radiation ray so as to produce microparticles of the contaminants. The resultant microparticles of the contaminants are contacted with a photocatalyst. Then, the photocatalyst is irradiated with light so as to decompose the contaminants held in contact with the photocatalyst. Organic compounds, organosilicon compounds, basic gas and the like can be decomposed by the action of the photocatalyst. Even when these species are present at a low concentration, they can be concentrated locally by transforming into microparticles, and hence can be removed.

公开(公告)号：US06384418B1

公开(公告)日：2002-05-07

申请号：US09314060

申请日：1999-05-18

申请人： Toshiaki Fujii ,  Yasuhiko Sugiyama

发明人： Toshiaki Fujii ,  Yasuhiko Sugiyama

IPC分类号： B21D2504

CPC分类号： H01L21/6831

摘要： A sample transfer apparatus has a transfer arm for supporting a sample and is mounted for undergoing movement to transfer the sample from a first station to a second station. The transfer arm has a holding portion for holding the sample by hydrogen bonding.

摘要翻译： 样品传送装置具有用于支撑样品的传送臂，并且安装成用于进行移动以将样品从第一站传送到第二站。 转移臂具有通过氢键保持样品的保持部。

公开(公告)号：US6146797A

公开(公告)日：2000-11-14

申请号：US204894

申请日：1998-12-03

申请人： Toshiaki Fujii

发明人： Toshiaki Fujii

IPC分类号： C23F4/00 ,  G03F7/00 ,  G03F7/20 ,  H01J37/252 ,  H01J37/30 ,  H01J37/305 ,  H01L21/302 ,  G03F9/00

CPC分类号： H01J37/3005 ,  G03F7/00 ,  G03F7/2059 ,  H01J2237/3174 ,  H01J2237/31755

摘要： A method for performing a cross-sectional analysis of a sample includes steps of observing a sample surface to locate a region of a sample at which a cross-sectional analysis is to be performed, tilting a sample by a predetermined angle, directing a focused ion beam to the surface of the tilted sample, etching a region of the tilted sample, and observing the sample by analyzing particles emitted during the etching process. The angle of tilt of the sample with respect to the angle of incidence of the focused ion beam can be increased to effectively increase the resolution of the focused ion beam etching process with respect to sub-surface structure of the sample.

摘要翻译： 用于进行样品的横截面分析的方法包括以下步骤：观察样品表面以定位要进行横截面分析的样品的区域，使样品倾斜预定角度，将聚焦离子 光束到倾斜样品的表面，蚀刻倾斜样品的区域，并通过分析在蚀刻过程中发射的颗粒来观察样品。 可以增加样品相对于聚焦离子束的入射角的倾斜角度，以有效地提高聚焦离子束蚀刻工艺相对于样品的亚表面结构的分辨率。